Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
05/2012
05/09/2012CN101728295B Gas filling bearing piece, gas filling bearing piece set and gas filling equipment
05/09/2012CN101650532B Liquid processing apparatus, liquid processing method
05/09/2012CN101650530B Coating and developing device and method
05/09/2012CN101630632B Coating and developing apparatus, coating and developing method
05/09/2012CN101600995B Photosensitive element
05/09/2012CN101241304B Waterfast environment-friendly type rotary screen stenciling photoresist
05/09/2012CN101154034B Hologram recording material and hologram recording medium
05/09/2012CN101022943B Apparatus for the rapid development of photosensitive printing elements
05/08/2012US8174674 Lithographic apparatus and device manufacturing method
05/08/2012US8174668 Exposure apparatus and method for producing device
05/08/2012US8173985 Beam transport system for extreme ultraviolet light source
05/08/2012US8173975 Method and device for removing particles generated by means of a radiation source during generation of short-wave radiation
05/08/2012US8173584 Composition and method for treating semiconductor substrate surface
05/08/2012US8173358 Method of forming fine patterns of a semiconductor device
05/08/2012US8173357 Method of forming etching mask, etching method using the etching mask, and method of fabricating semiconductor device including the etching method
05/08/2012US8173356 Three dimensional scaffold and method of fabricating the same
05/08/2012US8173355 Gradient colored mask
05/08/2012US8173354 Sulfonium salt, resist composition, and patterning process
05/08/2012US8173353 Sulfonium compound
05/08/2012US8173352 Resist composition
05/08/2012US8173351 Compound and radiation-sensitive composition
05/08/2012US8173350 Oxime compound and resist composition containing the same
05/08/2012US8173349 Photosensitive resin composition, polymer compound, method of forming a pattern, and electronic device
05/08/2012US8173348 Method of forming pattern and composition for forming of organic thin-film for use therein
05/08/2012US8173347 Micropatterning of molecular surfaces via selective irradiation
05/08/2012US8173346 Printing members having permeability-transition layers and related methods
05/08/2012US8173329 Molded product and method for manufacturing same
05/08/2012US8171879 Maintenance system, substrate processing apparatus, remote operation unit and communication method
05/03/2012WO2012057993A1 Colloidal lithography methods for fabricating particle patterns on substrate surfaces
05/03/2012WO2012057707A1 Lithography method and apparatus
05/03/2012WO2012057618A1 Multilayered protective layer, organic opto-electric device and method of manufacturing the same
05/03/2012WO2012057388A1 Apparatus for forming fine patterns capable of switching direction of polarization interference pattern in laser scanning method and method of forming fine patterns using the same
05/03/2012WO2012057058A1 Photosensitive resin composition, patterned structure, display device, and partition wall
05/03/2012WO2012056901A1 Fluorinated sulfonic acid salts, photo-acid generator, and resist composition and pattern formation method utilizing same
05/03/2012WO2012056817A1 Scanning exposure apparatus using microlens array
05/03/2012WO2012056311A2 Edge bead remover for coatings
05/03/2012WO2012055833A1 Device for homothetic projection of a pattern onto the surface of a sample, and lithography method using such a device
05/03/2012WO2012055725A1 System for laser direct writing of mesa structures having negatively sloped sidewalls
05/03/2012WO2012021824A3 Carboxy ester ketal removal compositions, methods of manufacture, and uses thereof
05/03/2012WO2012008736A3 Positive-type photosensitive resin composition and black bank of an organic light-emitting device including same
05/03/2012US20120108486 Compositions and methods for removing organic substances
05/03/2012US20120108485 Multi-agent type cleaning kit for semiconductor substrates, cleaning method using the same and method of producing semiconductor element
05/03/2012US20120108067 Edge Bead Remover For Coatings
05/03/2012US20120108043 Pattern forming process
05/03/2012US20120107749 Resist pattern forming method and developer
05/03/2012US20120107748 Drawing apparatus and method of manufacturing article
05/03/2012US20120107747 Method of lithography
05/03/2012US20120107746 Method for manufacturing inkjet recording head
05/03/2012US20120107745 Via structure in multi-layer substrate and manufacturing method thereof
05/03/2012US20120107744 Resist composition, method of forming resist pattern, novel compound and acid generator
05/03/2012US20120107743 Lithography using photoresist with photoinitiator and photoinhibitor
05/03/2012US20120107742 Method and photoresist with zipper mechanism
05/03/2012US20120107734 Methods of forming sheeting with composite images that float and sheeting with composite images that float
05/03/2012US20120107733 Reflective mask blank for euv lithography
05/03/2012US20120107730 Recording medium recording program for generating mask data, method for manufacturing mask, and exposure method
05/03/2012US20120107583 Block copolymer self-assembly methods and patterns formed thereby
05/03/2012US20120107563 Photosensitive resin composition, method for producing pattern, mems structure, method for producing the structure, method for dry etching, method for wet etching, mems shutter device, and image display apparatus
05/03/2012US20120104529 Colored composition for light-shielding film, light-shielding pattern, method for forming the same, solid-state image sensing device, and method for producing the same
05/03/2012US20120103507 Photosensitive composite and build-up insulation film with the photosensitive composite, and method for manufacturing circuit board using the build-up insulation film
05/03/2012DE10296370B4 Belichtungsvorrichtung für Lasersysteme Exposure apparatus for laser systems
05/03/2012DE102011075401A1 Adhesive, which is curable by UV radiation, useful for bonding components in optical systems e.g. lighting devices, comprises an epoxide resin, a reactive diluent, an adhesion promoter, a UV polymerization initiator, and nanoscale filler
05/03/2012DE102011005881A1 Method for adjusting projection exposure system's illumination system during manufacturing e.g. nanostructure electronic semiconductor component, involves displacing correction elements so that actual variation matches with target variation
05/02/2012EP2447780A1 Method for preparation of lithographic printing plate
05/02/2012EP2447779A1 Method for preparation of lithographic printing plate
05/02/2012EP2447778A2 Gantry apparatus
05/02/2012EP2447777A2 Lithographic apparatus for transferring pattern from patterning device onto substrate, and damping method
05/02/2012EP2447776A2 Vibration control apparatus, lithography apparatus, and method of manufacturing article
05/02/2012EP2447775A1 Resist underlayer film composition and patterning process using the same
05/02/2012EP2447774A1 Positive photosensitive resin composition and method of forming cured film from the same
05/02/2012EP2447773A1 Photosensitive resin composition, method for producing pattern, MEMS structure, method for producing the structure, method for dry etching, method for wet etching, MEMS shutter device, and image display apparatus
05/02/2012EP2447753A1 Imaging optics and projection exposure installation for microlithography with an imaging optics of this type
05/02/2012EP2447259A1 Polymerisable photoinitiators for LED curable compositions
05/02/2012EP2447085A2 Lithographic printing plate support and presensitized plate
05/02/2012EP2446067A1 Methods of wet etching a self-assembled monolayer patterned substrate and metal patterned articles
05/02/2012EP2171537B1 Alignment system and method for a substrate in a nano-imprint process
05/02/2012EP2159236B1 Photocurable composition and process for producing molded object having fine pattern in surface
05/02/2012EP1950610B1 Immersion lithographic composition for forming upper film and method for forming photoresist pattern
05/02/2012EP1716588B1 Imprinting apparatus with independently actuating separable modules
05/02/2012EP1063689B1 Stripping agent against resist residues
05/02/2012CN202210214U Platform device for exposure machine
05/02/2012CN202210213U Self-adaptive wafer bearing platform for nanometer impression of full wafer
05/02/2012CN1922142B Oxime ester compound, photopolymerizable composition and color filter utilizing the same
05/02/2012CN1732410B Alkali-soluble gap filling material forming composition for lithography
05/02/2012CN102439523A Method and materials for double patterning
05/02/2012CN102439522A Method and materials for reverse patterning
05/02/2012CN102439521A Light-sensitive resin composition and a dry film comprising the same
05/02/2012CN102439520A Photosensitive resin composition
05/02/2012CN102439069A Method and materials for reverse patterning
05/02/2012CN102437064A Manufacturing method of silicon Nano-wire (SiNW)
05/02/2012CN102437049A Method for simplifying double pattern exposure process of side wall definition
05/02/2012CN102437018A Baking method and equipment for improving critical dimension uniformity in etched wafer
05/02/2012CN102436154A Photoresist stripping method in repairing process of TFT (thin film transistor) liquid crystal display
05/02/2012CN102436153A Photosensitive rubber stripping agent for printing screen and stripping method
05/02/2012CN102436152A Deep-ultraviolet lithography illumination system
05/02/2012CN102436151A Forming method of photoetching layout
05/02/2012CN102436150A Exposure device and exposure method
05/02/2012CN102436149A Method for confirming photoetching process window
05/02/2012CN102436148A Exposure method for improving size of solder mask window, and exposure frame implementing same
05/02/2012CN102436147A Planographic printing plate precursor, and method of manufacturing planographic printing plate precursor
05/02/2012CN102436146A Photosensitive resin composition
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