Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
05/2012
05/16/2012EP2452932A2 Base reactive photoacid generators and photoresists comprising same
05/16/2012EP2452378A2 Patterning
05/16/2012EP2452356A2 Method and device for treating substrates
05/16/2012EP2452229A1 Mirror for the euv wavelength range, projection objective for microlithography comprising such a mirror, and projection exposure apparatus for microlithography comprising such a projection objective
05/16/2012EP2451878A1 Colored composition for light-shielding film, light-shielding pattern, method for forming the same, solid-state image sensing device, and method for producing the same
05/16/2012EP2451876A1 Method for producing pigments
05/16/2012EP2451821A1 Gallotannic compounds for lithographic printing plate coating compositions
05/16/2012EP2251742B1 Composition for forming resist underlayer film and method for forming resist pattern using the same
05/16/2012EP2189843B1 Imprinting machine and device manufacturing method
05/16/2012EP2150368B1 Direct to metal sintering of 17-4ph steel
05/16/2012EP2024791B1 Large-field unit-magnification projection optical system
05/16/2012EP1963920B1 Photosensitive sheets and method and apparatus for manufacturing the same
05/16/2012DE10236239B4 Koordinaten-Messtisch Coordinate measuring table
05/16/2012DE102011111244A9 Quellkollektormodul mit GIC-Spiegel- und Xenonflüssigkeits-EUV-LPP-Target-System Source collector module with GIC mirror and xenon liquid EUV LPP target system
05/16/2012DE102011075371A1 Assembly for projection lens of projection illumination system for microlithography for imaging semiconductor wafer structures, has evaluation device that determines adjusting parameter in degrees of freedom of movement of mask and sensor
05/16/2012DE102011006003A1 Illumination optics for use in extreme UV-projection exposure system to illuminate illuminating field in reticle plane for manufacturing microstructured component, has aperture diaphragm adapting main beam direction relative to field
05/16/2012CN202221515U Multi-region vacuum sucker for direct-write lithography machine
05/16/2012CN202221514U Multi-region vacuum sucker device for laser direct-write imaging equipment
05/16/2012CN102460310A Method of overlay measurement, lithographic apparatus, inspection apparatus, processing apparatus and lithographic processing cell
05/16/2012CN102460308A 制备具有增强的对比度的平版印版的方法 A method of preparing a lithographic printing plate having an enhanced contrast
05/16/2012CN102460307A 曝光设备、曝光方法及器件制造方法 Exposure apparatus, exposure method and device manufacturing method
05/16/2012CN102460306A 对基底进行感光成像的方法和设备 On the substrate may be a photosensitive imaging method and apparatus
05/16/2012CN102460305A 曝光装置及装置制造方法 Exposure apparatus and device manufacturing method
05/16/2012CN102460304A 曝光设备及器件制造方法 Exposure apparatus and device manufacturing method
05/16/2012CN102460303A 曝光设备、曝光方法和器件制造方法 Exposure apparatus, exposure method and device manufacturing method
05/16/2012CN102460302A 光刻设备和用于减小杂散辐射的方法 Lithographic apparatus and a method for reducing the unwanted radiation
05/16/2012CN102460301A 含有带硫醚键的硅的抗蚀剂下层膜形成用组合物 Resist underlayer film containing silicon with a thioether bond forming composition
05/16/2012CN102460300A Photopolymerizable resin composition
05/16/2012CN102460299A Photosensitive modified polyimide resin composition and use thereof
05/16/2012CN102460240A 滤色器用着色组合物、使用了该组合物的滤色器以及液晶显示装置 The coloring composition for color filter using the composition of a color filter and a liquid crystal display device
05/16/2012CN102459416A Process for production of polyhydroxyimide
05/16/2012CN102459392A 反应性氨基甲酸酯化合物、包含该化合物的活性能量射线固化型树脂组合物及其用途 Reactive urethane compound containing an active energy ray-curable resin composition and use of the compound
05/16/2012CN102459171A 肟酯化合物、自由基聚合引发剂、聚合性组合物、负型抗蚀剂以及图像图案 Oxime ester compound, a radical polymerization initiator, the polymerizable composition, a negative resist as well as an image pattern
05/16/2012CN102458855A A lithographic printing plate precursor
05/16/2012CN102458060A 一种具有渐变色图案效果的外壳及其制作方法 Shell and its production method has a gradient pattern effect
05/16/2012CN102456619A 阵列基板及其制造方法和液晶显示器 Array substrate and manufacturing method thereof, and a liquid crystal display
05/16/2012CN102456563A UV exposure method for reducing residue in de-taping process
05/16/2012CN102456542A 半导体制造工艺 The semiconductor manufacturing process
05/16/2012CN102455607A Lithographic apparatus for transferring pattern from patterning device onto substrate, and damping method
05/16/2012CN102455606A 载置台架 Mounting carriage
05/16/2012CN102455605A 气体歧管、用于光刻设备的模块、光刻设备和器件制造方法 Gas manifold, a module for a lithographic apparatus, a lithographic apparatus and device manufacturing method
05/16/2012CN102455604A A fluid handling structure, a lithographic apparatus and a device manufacturing method
05/16/2012CN102455603A 接触曝光方法及装置 Contact exposure method and apparatus
05/16/2012CN102455602A Program storage medium and method for determining exposure condition and mask pattern
05/16/2012CN102455601A 四自由度精密定位装置 Four degrees of freedom precision positioning device
05/16/2012CN102455600A 检测晶片表面形貌的方法 Detection methods wafer surface topography
05/16/2012CN102455599A Resist pattern improving material, method for forming resist pattern, and method for producing semiconductor device
05/16/2012CN102455598A 着色组合物、着色图案、滤色器、彩色显示元件以及滤色器的制造方法 The coloring composition, a colored pattern, a color filter, a color display device and a method of manufacturing a color filter
05/16/2012CN102455597A 射线敏感性树脂组合物、固化膜及其形成方法、液晶显示元件的阵列基板及其形成方法 Radiation-sensitive resin composition, and a cured film forming method, the liquid crystal display element array substrate and method of forming
05/16/2012CN102455596A Photoresist and lift off method as well as manufacturing method of TFT (Thin Film Transistor) array substrate
05/16/2012CN102455595A Method for prolonging storage period of photoresist solvent and device thereof
05/16/2012CN102455594A Resist pattern calculation method and calculation program storage medium
05/16/2012CN102455593A Method for forming photoresist pattern and manufacturing method of array substrate
05/16/2012CN102455592A Preparation method of film
05/16/2012CN102455591A Manufacturing method for thin film pattern and array substrate
05/16/2012CN102455542A Manufacturing method of color film base plate
05/16/2012CN102455247A Device and method for detecting optimal focal plane of projection objective
05/16/2012CN102455169A Zero-position sensor
05/16/2012CN102454733A Leaf spring, stage system and lithographic apparatus
05/16/2012CN102453354A Pigment dispersion, preparation method thereof, pigment photoresist and color filter
05/16/2012CN101770167B Positive type infrared light sensitive composition and positive heat-sensitive lithographic plate
05/16/2012CN101768232B Vinyl polymer, light-sensitive combination containing vinyl polymer and lithographic printing plate
05/16/2012CN101765809B Imprint method and processing method of substrate using the imprint method
05/16/2012CN101676802B Light sensitive liquid coating apparatus
05/16/2012CN101614960B Slit coating device with nozzle lip cleaning device
05/16/2012CN101592869B Exposure equipment focal distance monitoring method
05/16/2012CN101359132B Interval piece and production method thereof, substrate for liquid crystal display device and liquid crystal display device
05/16/2012CN101332650B Casting die for preparing elastic plastics casting with three dimensional structure
05/16/2012CN101326465B Analysis device with an array of focusing microstructures
05/16/2012CN101211804B Detection system and method
05/16/2012CN101059656B Photo-sensitive resin composition containing inorganic particle, photo-sensitive film, and process of forming inorganic pattern
05/15/2012US8179621 Apparatus for manipulation of an optical element
05/15/2012US8179530 Methods and systems for determining a critical dimension and overlay of a specimen
05/15/2012US8179516 Protective layer on objective lens for liquid immersion lithography applications
05/15/2012US8178639 Polymer for forming organic anti-reflective coating layer
05/15/2012US8178289 System and method for photolithography in semiconductor manufacturing
05/15/2012US8178287 Photoresist composition and method of forming a resist pattern
05/15/2012US8178286 Double patterning method
05/15/2012US8178285 Method for manufacturing piezoelectric/electrostrictive film type element
05/15/2012US8178284 Method of forming pattern
05/15/2012US8178283 Method of treating rinsing wastewater from developing apparatus for photosensitive lithographic printing plate, method of development, and developing apparatus
05/15/2012US8178282 Heat-sensitive imaging element
05/15/2012US8178279 Negative radiation-sensitive resin composition
05/15/2012US8178278 Miniaturized microparticles
05/15/2012US8178277 Electromagnetic radiation or thermally sensitive composition
05/15/2012US8178198 Adhesive sheet
05/15/2012US8178159 Organosilicate resin formulation for use in microelectronic devices
05/15/2012CA2541160C Photocurable composition for producing cured articles having high clarity and improved mechanical properties
05/15/2012CA2520790C Lithium salt of polyacetylene as radiation sensitive filaments and preparation and use thereof
05/10/2012WO2012060916A1 Biodegradable film for flexographic printing plate manufacture and method of using the same
05/10/2012WO2012060827A1 Lithography using photoresist with photoinitiator and photoinhibitor
05/10/2012WO2012060441A1 Exposure device
05/10/2012WO2012060413A1 Printing device using endless belt-shaped printing plate, printing method thereof, and method for attaching belt-shaped printing plate
05/10/2012WO2012060099A1 Light source adjustment method, exposure method, device manufacturing method, illumination optical system, and exposure device
05/10/2012WO2012060083A1 Illumination device, exposure device, program, and illumination method
05/10/2012WO2012060024A1 Illumination shape optimization method, mask shape optimization method, and pattern formation method
05/10/2012WO2012059582A1 Method and device scanning a two-dimensional brush through an acousto-optic deflector (aod) having an extended field in a scanning direction
05/10/2012WO2012059581A1 Method and device with an advanced acousto-optic deflector (aod) and a dense brush of flying spots
05/10/2012WO2012059537A1 Projection objective of a microlithographic exposure apparatus
05/10/2012WO2012059087A2 Arrangement for the production of structured substrates
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