Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
05/2012
05/23/2012CN102043178B Compound photon sieve for large-caliber imaging and manufacturing method thereof
05/23/2012CN102023485B Method for modifying photoresisting materials by photosensitive nano-silica
05/23/2012CN101957565B Organic film removing agent
05/23/2012CN101950131B Photomask processor and device producing method
05/23/2012CN101943862B Sulfonium salt photo-acid generator using stilbene as main body and preparation method thereof
05/23/2012CN101930175B Photosensitive imaging liquid containing alpha-diazonium-1,3-diketone structure and used for photosensitive macromolecule flat printing plate
05/23/2012CN101923289B Method and system of monitoring e-beam overlay and providing advanced process control
05/23/2012CN101916048B Determining method of exposure parameter and exposure method
05/23/2012CN101900952B Mask aligner mask platform adopting magnetic suspension technology
05/23/2012CN101900946B Detection method and system of zero mark exposure
05/23/2012CN101900945B Overlay error compensation method
05/23/2012CN101882580B Strip with reduced low-K dielectric damage
05/23/2012CN101872134B Method for improving electron beam exposure efficiency
05/23/2012CN101863166B Ink jet recording head, producing method therefor and composition for ink jet recording head
05/23/2012CN101859074B Cleaning method for dry plate developing tank
05/23/2012CN101840858B Method for removing anti-reflective coating in top-level metallic dielectric layer groove etching process
05/23/2012CN101833246B Optically compensated unidirectional reticle bender
05/23/2012CN101825842B Method for manufacturing nano-imprinting seal
05/23/2012CN101813884B Method for preparing nano-structured matrix on surface of uneven substrate
05/23/2012CN101802982B Liquid treatment apparatus and liquid treatment method
05/23/2012CN101800166B Method for manufacturing liquid repellent retaining wall
05/23/2012CN101775171B Method for processing surface superfine texture of ultrahigh molecular weight polyethylene material for artificial joint
05/23/2012CN101750664B Diffractive light guide film and preparation method thereof
05/23/2012CN101728224B Equipment and method for manufacturing semiconductor
05/23/2012CN101713732B Lithographic apparatus and humidity measurement system
05/23/2012CN101679555B Reactive urethane compound having ether bond, curable composition and cured product
05/23/2012CN101655672B Liquor circulation pipeline
05/23/2012CN101647089B Method of coating application
05/23/2012CN101527255B Ultraviolet irradiation set and ultraviolet irradiation processing unit
05/23/2012CN101482695B Optical mask for exposure
05/23/2012CN101477318B Photomask contraposition exposure method and photomask component
05/23/2012CN101373343B Colour photoresistive agent stripping solution composition for thin film transistor LCD
05/23/2012CN101369102B Lithographic apparatus and device manufacturing method
05/23/2012CN101286007B Manufacturing method of mask blank and manufacturing method of photomask
05/23/2012CN101256354B Moulding-die and method for manufacturing the same
05/23/2012CN101231467B Cured composition, color filter and method for manufacturing the same
05/23/2012CN101218541B Photoresist composition for imaging thick films
05/23/2012CN101201538B Soft template with alignment mark and its manufacture method
05/23/2012CN101186678B Acid-degradable resin compositions containing ketene-aldehyde copolymer
05/23/2012CN101154039B Curable composition, color filter and manufacturing method thereof
05/23/2012CN101061432B Decal transfer lithography
05/23/2012CN101004553B Photo curable composition, color filter and method of producing thereof
05/23/2012CN101002303B Exposure apparatus and method for manufacturing device
05/22/2012US8183195 Peroxide activated oxometalate based formulations for removal of etch residue
05/22/2012US8183084 Methods of manufacturing solid state image pickup devices
05/22/2012US8182982 Method and device for patterning a disk
05/22/2012US8182981 Pattern forming method
05/22/2012US8182980 Developing solution for lithographic printing plates and production method of lithographic printing plate
05/22/2012US8182979 Photopolymerization initiator containing unsaturated double bond and oxime ester group and photosensitive resin composition comprising the same
05/22/2012US8182978 Developable bottom antireflective coating compositions especially suitable for ion implant applications
05/22/2012US8182977 Polymer and positive-tone radiation-sensitive resin composition
05/22/2012US8182976 Positive resist composition, method of forming resist pattern, and polymeric compound
05/22/2012US8182975 Decomposable under actinic radiation
05/22/2012US8182968 Color filter and method for producing the same
05/22/2012US8182882 For stereolithography, allow for variation in color, opacity, and surface properties, form opaque white or colored objects
05/22/2012US8182598 Violet colorant for colour filters, inks for ink-jet electrophotographic toners and developers and e-inks
05/22/2012US8181692 Method and apparatus for production of a cast component
05/18/2012WO2012064686A2 Development of printing members having post-anodically treated substrates
05/18/2012WO2012064097A2 Photoresist topcoat composition for extreme ultraviolet lithography, and pattern-forming method using same
05/18/2012WO2012064074A1 Photosensitive resin composition, and dielectric insulating film and electronic device using the same
05/18/2012WO2012063840A1 Radiation-sensitive resin composition, pattern forming method, and acid diffusion regulator
05/18/2012WO2012063636A1 Positive-type photoresist composition
05/18/2012WO2012063635A1 Positive-type photoresist composition
05/18/2012WO2012063633A1 Exposure method and exposure position verification method
05/18/2012WO2012063632A1 Film exposure method
05/18/2012WO2012063631A1 Exposure apparatus
05/18/2012WO2012063608A1 Exposure device
05/18/2012WO2012063607A1 Exposure device
05/18/2012WO2012063120A1 Underlayer developable coating compositions and processes thereof
05/18/2012WO2012062858A1 Metrology method and apparatus, lithographic system and device manufacturing method
05/18/2012WO2012062658A1 Photopolymer formulation for producing holographic media
05/18/2012WO2012062501A1 Metrology method and apparatus, and device manufacturing method
05/18/2012WO2012062058A1 Method for improving efficiency of electron beam lithography
05/18/2012WO2012039606A4 Lithography system arranged on a foundation, and method for arranging a lithography system on said foundation
05/18/2012WO2012034995A3 Imaging optical system
05/18/2012WO2012019598A4 Light integrator for rectangular beam cross sections of different dimensions
05/18/2012WO2012007527A3 Methods and systems for detecting, setting, monitoring, determining, storing and compensating the spatial situation of a mobile unit
05/17/2012US20120122038 Developing apparatus
05/17/2012US20120122037 Method And Materials For Reverse Patterning
05/17/2012US20120122036 Pattern forming method
05/17/2012US20120122035 Patterning method and method for fabricating dual damascene opening
05/17/2012US20120122034 Resin and photoresist composition comprising the same
05/17/2012US20120122033 Polymer precursor, high transparency polyimide precursor, polymer compound, resin composition and article using thereof
05/17/2012US20120122032 Salt and photoresist composition comprising the same
05/17/2012US20120122031 Photoresist composition for negative development and pattern forming method using thereof
05/17/2012US20120122030 Compositions comprising base-reactive component and processes for photolithography
05/17/2012US20120122029 Underlayer Developable Coating Compositions and Processes Thereof
05/17/2012US20120121983 Lithium Deposited Anode for a Lithium Second Battery and Its Manufacturing Method
05/17/2012US20120121861 Surface patterning with functional polymers
05/17/2012US20120120682 Illumination device with light guide coating
05/17/2012US20120120381 Exposure apparatus, exposure method, and method for producing device
05/17/2012US20120120377 Lithographic apparatus and device manufacturing method
05/17/2012US20120119202 Solution processed thin films and laminates, devices comprising such thin films and laminates, and method for their use and manufacture
05/17/2012US20120118616 Negative photosensitive resin composition, polyimide resin film using same, and flexible printed circuit board
05/17/2012US20120118613 Layout method for bridging electrode capable of shielding bright spot and structure of the bridging electrode
05/16/2012EP2453465A2 Exposure method, exposure apparatus, and method for producing a device
05/16/2012EP2453310A2 System for purging reticle storage
05/16/2012EP2453309A2 Compositions comprising sugar component and processes for photolithography
05/16/2012EP2453308A1 Compositions comprising base-reactive component and processes for photolithography
05/16/2012EP2452941A1 Lactone photoacid generators and resins and photoresists comprising same
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