Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
05/2012
05/24/2012US20120129085 Method for producing a color filter
05/24/2012US20120128942 Double patterning with inline critical dimension slimming
05/24/2012US20120128935 Sidewall image transfer pitch doubling and inline critical dimension slimming
05/24/2012US20120128917 Manufacturing method of master disc for optical disc, and master disc for optical disc
05/24/2012US20120127445 Isolation system for an optical element of an exposure apparatus
05/24/2012US20120127443 Method of producing a relief image for printing
05/24/2012US20120126372 Resist pattern thickening material and process for forming resist pattern, and semiconductor device and method for manufacturing the same
05/24/2012US20120125216 Methods of processing using silicate-free developer compositions
05/24/2012DE102011085132A1 Optische Baugruppe für die Projektionslithografie Optical assembly for projection lithography
05/24/2012DE102011055542A1 Verfahren zum Herstellen eines strukturierten Verzögerers A method of manufacturing a structured retarder
05/23/2012EP2455813A1 Positive lift-off resist composition and patterning process
05/23/2012EP2455812A2 Photosensitive copolymer and photoresist composition
05/23/2012EP2455811A1 Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method
05/23/2012EP2454636A1 Microlithographic projection exposure apparatus and method of measuring a parameter related to an optical surface contained therein
05/23/2012EP2454635A2 Leveling devices and methods
05/23/2012EP1880249B1 Optical system for a lithographic device
05/23/2012CN202230299U Super resolution direct writing lithography machine based on guided mode interference
05/23/2012CN202230298U Printed circuit board exposure machine
05/23/2012CN202230270U Silicon substrate liquid crystal screen production line ultraviolet frame glue exposure machine structure
05/23/2012CN1987645B Imprint lithography
05/23/2012CN1967384B Stamp and fabricating method thereof, thin film transistor using the stamp, and liquid crystal display device having the thin film transistor
05/23/2012CN1879058B Curable compositions and rapid prototyping process using the same
05/23/2012CN1782875B Photosensitive resin composition
05/23/2012CN102473669A 图像补偿可寻址的静电卡盘系统 Image compensation addressable electrostatic chuck system
05/23/2012CN102473638A Post ion implant stripper for advanced semiconductor application
05/23/2012CN102473637A Method of removing photoresist and etch-residues from vias
05/23/2012CN102473600A Exposure condition setting method and surface inspection apparatus
05/23/2012CN102473588A Substrate processing system
05/23/2012CN102472986A Processing system
05/23/2012CN102472985A Resist stripping solution composition, and method for stripping resist by using same
05/23/2012CN102472984A 剥除铜或铜合金光阻的组成物 Copper or copper alloy strip photoresist composition
05/23/2012CN102472983A 聚合物冲洗溶剂及其用于显影柔性印刷版的用途 Wash solvents and polymers for developing flexographic printing purposes
05/23/2012CN102472982A 光刻用共聚物及其评价方法 Copolymer lithography and evaluation methods
05/23/2012CN102472981A Euv辐射系统和光刻设备 Euv radiation system and lithography equipment
05/23/2012CN102472980A 极紫外微光刻的基底与反射镜以及制造它们的方法 The substrate and the mirror EUV microlithography and method of manufacturing thereof
05/23/2012CN102472979A 用于光刻的检验方法 Test methods for lithography
05/23/2012CN102472978A 图案形成设备、图案形成方法及装置制造方法 A pattern forming apparatus, a pattern forming method and device manufacturing method
05/23/2012CN102472977A 图案形成装置、图案形成方法以及装置制造方法 A patterning device, the patterning method, and device manufacturing method
05/23/2012CN102472976A Mirror for the euv wavelength range, projection objective for microlithography comprising such a mirror, and projection exposure apparatus for microlithography comprising such a projection objective
05/23/2012CN102472975A 光谱纯度滤光片、光刻设备和用于制造光谱纯度滤光片的方法 The spectral purity filter, the spectral purity filter lithographic apparatus and a method for manufacturing
05/23/2012CN102472974A 微光刻投射曝光设备以及测量有关包含在其中的光学表面的参数的方法 The method of microlithography projection exposure apparatus and a measurement of which contains parameters related to the optical surface in the
05/23/2012CN102472973A Resist underlayer film-forming composition for lithography containing resin having aliphatic ring and aromatic ring
05/23/2012CN102472972A 柔性版印刷原版 Flexographic printing original
05/23/2012CN102472971A 化学放大型光致抗蚀剂组合物及其使用方法 Chemically amplified photoresist composition and method of use
05/23/2012CN102472970A 光固化性热固化性树脂组合物 The photocurable and thermosetting resin composition of the
05/23/2012CN102472969A Photosensitive resin composition, photosensitive resin laminate, and method for forming resist pattern
05/23/2012CN102472968A Photocurable resin composition
05/23/2012CN102472967A 光固化性树脂组合物 The photocurable resin composition
05/23/2012CN102472966A Negative photosensitive resin composition, polyimide resin film using same, and flexible printed circuit board
05/23/2012CN102472965A 光固化性树脂组合物 The photocurable resin composition
05/23/2012CN102472964A Positive photosensitive resin composition, cured film obtained using same, and optical device
05/23/2012CN102472963A 功能梯度型无机抗蚀剂、带有功能梯度型无机抗蚀剂的基板、带有功能梯度型无机抗蚀剂的圆筒基材、功能梯度型无机抗蚀剂的形成方法和微细图案形成方法、以及无机抗蚀剂和其制造方法 Functionally Gradient type inorganic resist, the substrate with a functional gradient type inorganic resist, the cylindrical base with a functionally graded type inorganic resist method of forming a functional gradient type inorganic resist pattern forming method and fine , and an inorganic resist, and the manufacturing method thereof
05/23/2012CN102472891A 用于反射元件阵列的旋转的安装部件以及包括所述安装部件的光刻设备 Rotating means for mounting an array of reflective elements and the mounting member comprises a lithographic apparatus
05/23/2012CN102472850A Colored resin composition, colored cured film, color filter, liquid crystal display device, organic el display, and solid-state imaging element
05/23/2012CN102472833A Photosensitive resin composition for microlens
05/23/2012CN102472614A 低压和高压接近式传感器 Low and high pressure proximity sensors
05/23/2012CN102471664A Photosensitive adhesive, and film adhesive, adhesive sheet, adhesive pattern, semiconductor wafer with adhesive layer, and semiconductor device, which are made using same
05/23/2012CN102471616A Colored composition for light-shielding film, light-shielding pattern, method for forming the same, solid-state image sensing device, and method for producing the same
05/23/2012CN102471598A 颜料的制备方法 Preparation pigments
05/23/2012CN102471424A Photocurable resin composition
05/23/2012CN102471387A Polymer production method, polymer for use in lithography, resist composition and substrate production method
05/23/2012CN102471255A 芳香族锍盐化合物 The aromatic sulfonium salt compound
05/23/2012CN102471150A D1492 liquid bapo photoinitiator and its use in radiation curable compositions
05/23/2012CN102470664A Lithographic printing plate precursors and stacks
05/23/2012CN102468450A 一种有机发光显示器件制备方法 An organic light emitting display device production method
05/23/2012CN102468274A 阴影效应分析结构、其形成方法和其分析方法 Shadow effect analysis structures, methods and analysis method thereof which is formed
05/23/2012CN102468209A 锗硅hbt的埋层形成方法 SiGe hbt method for forming a buried layer
05/23/2012CN102468136A 双重图形化方法 Double patterning method
05/23/2012CN102468129A 用于半导体制备中的表面平坦化的方法 Preparation of a semiconductor surface planarization method for
05/23/2012CN102466988A 高温水蒸气和水混合射流清洗系统及方法 High-temperature steam and water jet cleaning system and method
05/23/2012CN102466987A 硅片烘干可控装置 Wafer drying controllable devices
05/23/2012CN102466986A 一种防腐蚀碱性显影液组合物 An anti-corrosive alkaline developer composition
05/23/2012CN102466985A Pattern-independent and hybrid matching/tuning including light manipulation by projection optics
05/23/2012CN102466984A 源、掩模和投影光学装置的优化 Optimization of the source, a mask and a projection optical device
05/23/2012CN102466983A Lighting device for alignment and exposure device having the same
05/23/2012CN102466982A Test method for line width uniformity
05/23/2012CN102466981A Method for testing linewidth uniformity
05/23/2012CN102466980A 基于电子束光刻和x射线曝光制作多层膜闪耀光栅的方法 Electron beam lithography and x-ray exposure of manufacturing a multilayer film blazed grating-based approach
05/23/2012CN102466979A 光刻胶边缘洗边数据测量系统及测量监控方法 Photoresist edge wash edge data measurement systems and measurement monitoring method
05/23/2012CN102466978A Lithographic exposure machine and lithographic exposure method
05/23/2012CN102466977A 用于测量投影物镜畸变的标记结构及方法 Tag structure and method for measuring the projection lens distortion
05/23/2012CN102466976A 用于光刻设备的照明系统及方法 The illumination system of the lithographic apparatus and method for
05/23/2012CN102466975A 连杆驱动工件台系统 Rod drive system worktable
05/23/2012CN102466974A 光罩抬取器 Mask lift to take control
05/23/2012CN102466973A Photosensitive resin composition for color filter and color filter using same
05/23/2012CN102466972A Photosensitive resin composition for color filter and color filter using same
05/23/2012CN102466971A 光敏复合物和具有光敏复合物的积层绝缘膜、以及使用积层绝缘膜制造电路板的方法 A photosensitive compound and a laminated insulating film of a photosensitive compound, and a method of manufacturing an insulating film using a laminated board
05/23/2012CN102466970A Method and photoresist with zipper mechanism
05/23/2012CN102466969A 双重图形化方法 Double patterning method
05/23/2012CN102466968A 一种光学微镜阵列的制作方法 A method of making an optical micromirror array
05/23/2012CN102466967A 一种大高宽比衍射光学元件的制作方法 A high aspect ratio diffractive optical element fabrication method
05/23/2012CN102466966A Method for improving electron beam exposure efficiency
05/23/2012CN102466963A 一种掩膜版及一种掩膜曝光的方法 A mask and a mask exposure method
05/23/2012CN102466891A 分划板的制造方法 Reticle manufacturing method
05/23/2012CN102466832A 一种制作大高宽比光子筛的方法 A high aspect ratio photon sieve method of making
05/23/2012CN102464452A 玻璃制品及其制作方法 Glass products and production methods
05/23/2012CN102109767B Method and system for determining alignment precision matching between lithography machines
05/23/2012CN102109676B Designing method for multi-partition optical phase plate in photo-etching illumination
05/23/2012CN102096318B Method for preparing multi-level structural microarray by laser direct-writing technology
05/23/2012CN102096298B Exposure lighting set and exposure machine
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