Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
05/2012
05/30/2012CN102072809B Device for measuring scattering property of light diffuser and measurement method thereof
05/30/2012CN102054721B Method and device for detecting coating condition of semiconductor wafer surface coating
05/30/2012CN102043343B Method for measuring focus point of exposure machine
05/30/2012CN102023486B Method for measuring key size swing curve of photo-etching technique
05/30/2012CN101995774B Method for monitoring performance of DMR
05/30/2012CN101980873B A method for treating a lithographic printing plate
05/30/2012CN101979435B Nanometer silicon-containing ultraviolet thick film positive photoresist and film forming resin thereof
05/30/2012CN101975983B High-resolution aspheric photoetching object lens
05/30/2012CN101900955B Film cleaning agent and using method thereof
05/30/2012CN101855085B Method for making a lithographic printing plate
05/30/2012CN101846880B Nanometer photolithography by excitating surface plasma
05/30/2012CN101799587B Optical system, projection system and manufacturing method of micro-structure semiconductor component
05/30/2012CN101770163B Manufacturing method of cavity
05/30/2012CN101699336B Liquid crystal display device and manufacturing method thereof
05/30/2012CN101685178B Diffraction light guide film and preparation method thereof
05/30/2012CN101681129B Photoresist remover composition
05/30/2012CN101681112B Composition for antireflection film formation and method for resist pattern formation using the composition
05/30/2012CN101681095B Pattern forming method
05/30/2012CN101681093B Methods for performing model-based lithography guided layout design
05/30/2012CN101666980B Nozzle cleaning in liquid treatment, method and device for preventing treatment liquid from drying
05/30/2012CN101661222B Substrate conveying device
05/30/2012CN101657739B Color filter, liquid crystal display device and hardening composition to be used in the production of the same
05/30/2012CN101634816B Developer control system
05/30/2012CN101632040B Imprint method, chip production process, and imprint apparatus
05/30/2012CN101609269B Developing method and developing apparatus
05/30/2012CN101598904B Lithographic apparatus and device manufacturing method
05/30/2012CN101588506B Solid-state imaging device, manufacturing method thereof, and electronic device
05/30/2012CN101578232B Methods using block copolymer self-assembly for sub-lithographic patterning
05/30/2012CN101568991B Composition for formation of top antireflection film and pattern formation method using the same and top antireflection film
05/30/2012CN101548241B Cleaning composition for removing photoresist
05/30/2012CN101533218B Method of lithography patterning
05/30/2012CN101523296B Method for formation of miniaturized pattern and resist substrate treatment solution for use in the method
05/30/2012CN101498898B Alignment scanning validation simulating device and its control method
05/30/2012CN101445644B White hardening resin composition
05/30/2012CN101443705B Positive photosensitive resin composition containing siloxane compound
05/30/2012CN101435993B Colorful optical filter and manufacturing method thereof
05/30/2012CN101435992B Photoresist pattern forming method
05/30/2012CN101421671B Photosensitive element, method for formation of resist pattern, and method for production of print circuit board
05/30/2012CN101421311B Resin composition containing catalytic precursor for chemical plating in preparing electro-magnetic shielding layer, forming method of metallic pattern using the same and metallic pattern formed therefor
05/30/2012CN101379433B UV-sensitive lithographic printing plate precursor with benzoxazole derivative and analogues thereof as sensitizer
05/30/2012CN101371199B Photoresist stripper composition for semiconductor manufacturing
05/30/2012CN101364049B Control system, lithographic projection apparatus, control method
05/30/2012CN101319314B Thin-layer metal membrane material and method of producing the same
05/30/2012CN101295139B Method for exposing photo-sensitive sam film and method for manufacturing semiconductor device
05/30/2012CN101288029B Top antireflective coating composition with low refractive index at 193 nm radiation wavelength
05/30/2012CN101281370B Light-sensitive polymer composition with low surface stickiness and application thereof
05/30/2012CN101236355B Pattern transcription device and method of fabricating bottom plate of the pattern transcription device for the same
05/30/2012CN101206400B Device and method for manufacturing photosensitive laminate
05/30/2012CN101196688B Photosensitive resin composition and spacer for liquid crystal panel
05/30/2012CN101131511B Polymer having unsaturated side chain, radiation-sensitive resin composition and spacer for liquid crystal display element
05/30/2012CN101122744B Light solidifying coloring composition and color filter using the same
05/30/2012CN101038440B Process for fabricating a monolayer or multilayer metal structure in LIGA technology, and structure obtained
05/30/2012CN101030551B Stage device
05/30/2012CN101013263B Photosensitive resin composition suitable for irrational and slit mold coating method
05/29/2012US8189903 Photomask evaluation based on lithographic simulation using sidewall angle of photomask pattern
05/29/2012US8189170 Optical element and exposure apparatus
05/29/2012US8189167 Mask holder for irradiating UV-rays
05/29/2012US8188659 Composition for forming a multi-layered electrode and plasma display panel manufactured with the same
05/29/2012US8187798 Method of forming fine patterns
05/29/2012US8187797 Method of manufacturing semiconductor device
05/29/2012US8187795 Patterning methods for stretchable structures
05/29/2012US8187794 Ablatable elements for making flexographic printing plates
05/29/2012US8187793 Ablatable elements for making flexographic printing plates
05/29/2012US8187792 Processing of positive-working lithographic printing plate precursor
05/29/2012US8187791 Lithographic printing plate precursor and plate making method thereof
05/29/2012US8187790 Polymer for resist and resist composition manufactured using the same
05/29/2012US8187789 Positive resist composition and method of forming resist pattern
05/29/2012US8187788 Photosensitive resin composition and photosensitive film
05/29/2012US8187786 Pattern forming materials and pattern formation method using the materials
05/29/2012US8187673 Methods utilizing scanning probe microscope tips and products thereof or produced thereby
05/24/2012WO2012068192A1 Silicate-free developer compositions
05/24/2012WO2012067807A1 Methods of processing using silicate-free developer compositions
05/24/2012WO2012067797A1 Silicate-free developer compositions
05/24/2012WO2012067755A2 Photoresist composition for negative development and pattern forming method using thereof
05/24/2012WO2012067742A1 Photopolymer printing plates with in situ non-directional floor formed during extrusion
05/24/2012WO2012067457A2 Photosensitive composition comprising an acrylate compound
05/24/2012WO2012067349A2 Polymer compound, and resist-protecting film composition including same for a liquid immersion exposure process
05/24/2012WO2012067246A1 Proximity exposure device and proximity exposure method
05/24/2012WO2012067239A1 Member for mounting and temperature controlled mounting device
05/24/2012WO2012067107A1 Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board
05/24/2012WO2012067040A1 Resist underlayer film forming composition, and method for forming resist pattern using same
05/24/2012WO2012067033A1 Substrate drying apparatus and substrate drying method
05/24/2012WO2012066489A2 Method and apparatus for printing high-resolution two-dimensional periodic patterns
05/24/2012US20120129747 Post ion implant stripper for advanced semiconductor application
05/24/2012US20120129273 Photolithographically defined contacts to carbon nanostructures
05/24/2012US20120129108 Base reactive photoacid generators and photoresists comprising same
05/24/2012US20120129107 Method for manufacturing a patterned retarder
05/24/2012US20120129106 Positive lift-off resist composition and patterning process
05/24/2012US20120129105 Photosensitive copolymer and photoresist composition
05/24/2012US20120129104 Lactone photoacid generators and resins and photoresists comprising same
05/24/2012US20120129103 Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method
05/24/2012US20120129102 Photosensitive composition including photopolymerizable polymer having fluorene skeleton
05/24/2012US20120129101 Self-Imageable Film Forming Polymer, Compositions Thereof and Devices and Structures Made Therefrom
05/24/2012US20120129100 Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same
05/24/2012US20120129099 Method For Producing Pigments
05/24/2012US20120129098 Method of preparing a substrate for lithography, a substrate, a device manufacturing method, a sealing coating applicator and a sealing coating measurement apparatus
05/24/2012US20120129097 Photopolymer Printing Plates with In Situ Non-Directional Floor Formed During Extrusion
05/24/2012US20120129096 Light reactive media
05/24/2012US20120129095 Silicate-free developer compositions
05/24/2012US20120129093 Silicate-free developer compositions
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