Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
05/2012
05/31/2012US20120135356 Semiconductor device
05/31/2012US20120135355 Method of forming patterns
05/31/2012US20120135354 Method of producing a relief image for printing
05/31/2012US20120135353 Functionally gradient inorganic resist, substrate with functionally gradient inorganic resist, cylindrical base material with functionally gradient inorganic resist, method for forming functionally gradient inorganic resist and method for forming fine pattern, and inorganic resist and method for forming the same
05/31/2012US20120135352 Preparation of Norbornane-based PAC Ballasts
05/31/2012US20120135351 Salt and photoresist composition comprising the same
05/31/2012US20120135350 Positive resist composition and patterning process
05/31/2012US20120135349 Positive resist composition and patterning process
05/31/2012US20120135348 Actinic-ray-sensitive or radiation-sensitive resin composition, actinic-ray-sensitive or radiation-sensitive film, and pattern forming method
05/31/2012US20120135347 Resist composition, method of forming resist pattern, polymeric compound and compound
05/31/2012US20120135341 Method for double patterning lithography and photomask layout
05/31/2012US20120135338 Holographic recording medium with control of photopolymerization and dark reactions
05/31/2012US20120135237 Self-assembly of lithographically patterned polyhedral nanostructures and formation of curving nanostructures
05/31/2012US20120135235 Lock-Release Polymerization
05/31/2012US20120135207 Method of forming an image having multiple phases
05/31/2012US20120133078 Step and Flash Imprint Lithography
05/31/2012DE19912047B4 Resistzusammensetzung des Negativtyps The resist composition of the negative type,
05/31/2012DE112009003508T5 Elektronenstrahl-Lithographiegerät und Elektronenstrahl-Lithographieverfahren Electron beam lithography and electron beam lithography unit process
05/31/2012DE112004001155B4 Positivresist-Zusammensetzung und Methode zur Bildung von Resistmustern unter Verwendung derselben Positive resist composition and method of forming resist patterns using the same
05/31/2012DE10345903B4 Reaktive thermisch oder kombiniert thermisch und UV-initiiert härtbare Lacke, deren Verwendung sowie Verfahren zu deren Härtung Reactive thermal or combined thermal and UV-initiated curable coatings, their use and processes for their cure
05/31/2012DE102011004375B3 Device for guiding electromagnetic radiation in projection exposure system for semiconductor lithography, has actuator to mechanically manipulate optical fiber so that intensity profile at exit end emerging radiation is homogenized
05/31/2012DE102010061950A1 Verfahren sowie Anordnung zum Bestimmen des Erwärmungszustandes eines Spiegels in einem optischen System Method and arrangement for determining the heat status of a mirror in an optical system
05/31/2012DE102010029321B4 Verfahren und Vorrichtung zur räumlich periodischen Modifikation einer Substratoberfläche Method and apparatus for spatially periodic modification of a substrate surface
05/31/2012DE102009049640B4 Projektionsobjektiv für eine mikrolithographische EUV-Projektionsbelichtungsanlage Projection objective for a microlithographic EUV projection exposure apparatus
05/31/2012DE102009009062B4 Verfahren zum Anordnen eines optischen Moduls in einer Messvorrichtung sowie Messvorrichtung A method of arranging an optical module in a measuring device and measurement device
05/31/2012DE102005051972B4 Kombiniertes Elektronenstrahl- und optisches Lithographieverfahren Combined electron beam and optical lithography processes
05/30/2012EP2458650A2 Radiation detector, method of manufacturing a radiation detector, and lithographic apparatus comprising a radiation detector
05/30/2012EP2458441A2 Measuring method, apparatus and substrate
05/30/2012EP2458440A1 Photoacid generators
05/30/2012EP2458425A1 Illumination system of a microlithographic projection exposure apparatus
05/30/2012EP2457250A1 Vacuum coupled tool apparatus for dry transfer printing semiconductor elements
05/30/2012EP2457126A2 Method and materials for double patterning
05/30/2012EP2457125A2 Method and materials for reverse patterning
05/30/2012EP2456823A2 Curable composition, method of coating a phototool, and coated phototool
05/30/2012EP2456811A2 Method and materials for reverse patterning
05/30/2012EP1899697B1 Euv light source collector lifetime improvements
05/30/2012EP1652972B1 Production method for an exposure system
05/30/2012EP1612849B1 Exposure method and apparatus, and device manufacturing method
05/30/2012EP1456891B1 Imaging device in a projection exposure facility
05/30/2012EP1192506B1 Photoresist removal process using forming gas plasma
05/30/2012CN202257032U Focusing and leveling device with stepped focusing marks
05/30/2012CN202257031U Overflow-prevent device of developing machine
05/30/2012CN202257030U Large-field direct projection laser photoetching optical system
05/30/2012CN202257029U Large-area laser-projection scanning type exposure workbench
05/30/2012CN202257028U Lcd曝光平台装置及曝光系统 Lcd exposure apparatus and exposure system platform
05/30/2012CN202257027U Bearing system of photoresist coating machine and photoresist coating machine provided with bearing system
05/30/2012CN202257026U Film complex machine
05/30/2012CN202257025U Ultra-violet nanoimprinting soft template fixing and aligning assembly
05/30/2012CN202256755U Manufacture device of triangular optical fiber grating
05/30/2012CN1971421B Salt for acid generating agent and chemically amplifiable anticorrosion composition containing the salt
05/30/2012CN1947067B Rinse solution for lithography
05/30/2012CN1928721B Moving phase grating mark and method for utilizing same in detecting image forming quality of photoetching machine
05/30/2012CN1924703B Lithographic printing plate precursor, lithographic printing method, and novel cyanine dye
05/30/2012CN102484057A Processing agent composition for semiconductor surface and method for processing semiconductor surface using same
05/30/2012CN102484046A 支承装置以及曝光装置 Supporting apparatus and exposure apparatus
05/30/2012CN102484045A Plasma light source system
05/30/2012CN102483591A 抗蚀剂剥离剂组合物和使用该组合物的抗蚀剂的剥离方法 Resist stripping compositions and use of the composition of the peeling method of the resist
05/30/2012CN102483590A 用于形成铜基配线的光刻胶剥离剂组合物 For forming a copper-based wiring photoresist stripper composition
05/30/2012CN102483589A 用于柔性版印刷版的显影溶液以及使用方法 A developing solution and a flexographic printing plate using a method for
05/30/2012CN102483588A Method and apparatus for drying after single-step-processing of lithographic printing plates
05/30/2012CN102483587A 曝光装置用光照射装置、光照射装置的控制方法、曝光装置以及曝光方法 The exposure apparatus irradiating apparatus, a control method of the light irradiation apparatus, exposure apparatus and exposure method
05/30/2012CN102483586A 光谱纯度滤光片、光刻设备以及制造光谱纯度滤光片的方法 The spectral purity filters, lithographic apparatus and a method for manufacturing a spectral purity filter
05/30/2012CN102483585A 光谱纯度滤光片、光刻设备、和制造光谱纯度滤光片的方法 The spectral purity filters, lithographic apparatus and a method for manufacturing a spectral purity filter
05/30/2012CN102483584A 照射系统、光刻设备和调节照射模式的方法 An illumination system of the lithographic apparatus and a method of adjusting the irradiation pattern
05/30/2012CN102483583A 光谱纯度滤光片、光刻设备以及制造光谱纯度滤光片的方法 The spectral purity filters, lithographic apparatus and a method for manufacturing a spectral purity filter
05/30/2012CN102483582A 量测方法和设备、光刻设备、光刻处理单元和包括量测目标的衬底 Measuring method and apparatus, lithographic apparatus, the lithographic processing unit comprises a measurement target and the substrate of
05/30/2012CN102483581A 光学设备和定向反射元件的方法 Optical apparatus and a method for the directional reflection element
05/30/2012CN102483580A 物体处理装置、曝光装置及曝光方法、以及元件制造方法 Object processing apparatus, exposure apparatus and exposure method, and device manufacturing method
05/30/2012CN102483579A Object moving apparatus, object processing apparatus, exposure apparatus, object inspecting apparatus and device manufacturing method
05/30/2012CN102483578A 物体处理装置、曝光装置及曝光方法、以及元件制造方法 Object processing apparatus, exposure apparatus and exposure method, and device manufacturing method
05/30/2012CN102483577A Rotor imaging system and method with variable-rate pixel clock
05/30/2012CN102483576A 低表面外形变形的光学元件 Optics low surface shape deformation
05/30/2012CN102483575A 正作用可光致成像底部抗反射涂层 Positive-acting photoimageable bottom antireflective coating
05/30/2012CN102483574A Radiation-sensitive resin composition and compound
05/30/2012CN102483573A Alkali-developable photocurable resin composition, dried film and cured product of the composition, and printed wiring board comprising the dried film or the cured product
05/30/2012CN102483572A 光聚合性组合物、滤色片及其制造方法、固体摄像元件、液晶显示装置、平版印刷版原版、以及新型化合物 An optical device, the planographic printing plate precursor, and a novel compound of the polymerizable composition, a color filter and a manufacturing method of the solid imaging device, a liquid crystal display
05/30/2012CN102483571A Photosensitive composition and printed wiring board
05/30/2012CN102483570A Photosensitive resin composition containing copolymer
05/30/2012CN102483569A Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition
05/30/2012CN102483516A 在像场中成像物场的成像光学系统和照明物场的照明光学系统 In forming the image field of the object field of the imaging optical system and the illumination of the object field of the illumination optical system
05/30/2012CN102483479A Color filter and image display device comprising same
05/30/2012CN102483472A Black curable composition for wafer level lens and wafer level lens
05/30/2012CN102482508A Color curable composition and method of preparing the same, color filter and method of producing the same, and solid-state image pick-up device
05/30/2012CN102482310A Gallotannic compounds for lithographic printing plate coating compositions
05/30/2012CN102482240A Novel compound, process for preparation thereof, radiation -sensitive compositions containing the novel compound, and cured films
05/30/2012CN102479688A 晶圆表面光阻去边的方法 Method to the side of the wafer surface resist
05/30/2012CN102479687A 提高后层曝光工艺宽容度的方法 Methods to improve the layer after exposure process latitude
05/30/2012CN102479682A Method of lift off and manufacturing method of TFT array substrate
05/30/2012CN102479280A Method and apparatus for achieving multiple patterning technology compliant design layout
05/30/2012CN102478768A 一种厚膜光刻胶清洗液 A thick film photoresist cleaning solution
05/30/2012CN102478767A 无掩膜光刻装置 Maskless lithography apparatus
05/30/2012CN102478766A 着色感光性树脂组合物、图案形成方法、彩色滤光片及其制造方法、以及显示装置 The colored photosensitive resin composition, a pattern forming method, a color filter and manufacturing method thereof, and a display device
05/30/2012CN102478765A Method for fabricating micro-structure
05/30/2012CN102478764A 双重图形化方法 Double patterning method
05/30/2012CN102478763A 光刻方法 Photolithographic method
05/30/2012CN102478762A 光刻方法 Photolithographic method
05/30/2012CN102478685A 一种soi光子晶体器件 One kind of soi photonic crystal device
05/30/2012CN102096349B System for automatic dual-grating alignment in proximity nanometer lithography
05/30/2012CN102081300B Photoetching method of round-hole pattern
05/30/2012CN102073219B Balancing mass system and workbench
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