Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
06/2012
06/07/2012US20120141943 Methods Of Forming Patterns
06/07/2012US20120141942 Method of preparing lithographic printing plates
06/07/2012US20120141941 Developing lithographic printing plate precursors in simple manner
06/07/2012US20120141940 Chemically amplified positive-type photoresist composition for thick film, and method for producing thick film resist pattern
06/07/2012US20120141939 Photoacid generators
06/07/2012US20120141938 Basic compound, chemically amplified resist composition, and patterning process
06/07/2012US20120141937 Photosensitive Composition and Photoresist
06/07/2012US20120141936 Photo-curing polysiloxane composition and protective film formed from the same
06/07/2012US20120141935 Developer and its use to prepare lithographic printing plates
06/07/2012US20120141926 Lcd panel photolithography process and mask
06/07/2012US20120140332 Method for fabricating micro-lens, and micro-lens array including the micro-lens
06/07/2012US20120140200 Immersion photolithography system and method using microchannel nozzles
06/07/2012US20120140197 Optical element and lithographic apparatus
06/07/2012US20120138877 Compound or its tautomer, metal complex compound, colored photosensitive curing composition, color filter, and production
06/07/2012US20120137908 Device and method for removing overcoat of on-press developable lithographic plate
06/06/2012EP2461350A1 Composition for forming resist underlayer film for nanoimprint lithography
06/06/2012EP2461215A1 Flexographic printing original plate
06/06/2012EP2461214A1 Resist underlayer film composition and patterning process using the same
06/06/2012EP2461213A1 Polymers, photoresist compositions and methods of forming photolithographic patterns
06/06/2012EP2460177A2 Post ion implant stripper for advanced semiconductor application
06/06/2012EP2460055A1 Methods for forming hydrogels on surfaces and articles formed thereby
06/06/2012EP2459519A1 Macrophotoinitiators
06/06/2012EP2304502B1 Print plate handling system
06/06/2012EP1814144B1 Substrate processing method and device production system
06/06/2012EP1670038B1 Optical element and exposure apparatus
06/06/2012DE102011007358A1 Method for operating projection exposure apparatus, involves canceling impact of corrected expansion coefficients on aberrations of image of object, relative to effect of non-correctable expansion coefficients on aberrations of image
06/06/2012DE102011006189A1 Method for exposing photosensitive layer for projection exposure system, involves supplementary-exposing photosensitive layer with supplementary exposure radiation with wavelength for producing intensity distribution on photosensitive layer
06/06/2012DE102009004392B4 Datenerzeugungsverfahren für Halbleitervorrichtung und Elektronenstrahlbelichtungssystem Data forming method for the semiconductor device and electron beam exposure system
06/06/2012CN202267821U Exposure positioning system for printed circuit board
06/06/2012CN1971416B Printing plate, method of manufacturing of printing plate and liquid crystal display device using the same
06/06/2012CN1612043B Lithographic apparatus and device manufacturing method
06/06/2012CN102486995A Dynamic wafer alignment method and exposure scanner system
06/06/2012CN102486991A Method of wafer surface photoresist edge removing
06/06/2012CN102486692A Production method of patterns and signal leads of touch inducer
06/06/2012CN102486623A Focusing control device and method used for photoetching equipment
06/06/2012CN102486622A Mask prealignment device of photoetching machine and method thereof
06/06/2012CN102486620A Composition of stripping solution for liquid crystal display process photoresist comprising primary alkanolamine
06/06/2012CN102486619A Cleaning solution composition
06/06/2012CN102486618A Method for development of water-resistant surface coating-free immersed photoresist
06/06/2012CN102486617A Precise adjusting apparatus
06/06/2012CN102486616A Exposure method
06/06/2012CN102486615A Method for determination of optimal object plane of lithography projection device, and mask therefor
06/06/2012CN102486614A Photosensitive composition and photoresist
06/06/2012CN102486613A Hole-sealing-free CTcP (Computer To conventional Plate) positive-type photosensitive resist, preparation thereof and hole-sealing-free PS (psensitized) plate
06/06/2012CN102486612A Hole-sealing-free CTcP photosensitive emulsion, preparation method thereof, and hole-sealing-free CTcP plate
06/06/2012CN102486611A Photosensitive emulsion and its preparation method
06/06/2012CN102486610A Coloring photosensitive resin composition
06/06/2012CN102486609A Photosensitive resin composition for color filter and color filter using same
06/06/2012CN102486608A Computer to conventional plate (CTcP) photosensitive resist, preparation method of the CTcP photosensitive resist and CTcP prepared from the CTcP photosensitive resist
06/06/2012CN102486607A Manufacturing method of panel decorative frame film pattern layer
06/06/2012CN102486606A Photoetching method
06/06/2012CN102486604A Phase shift mask, manufacturing method thereof and haze defect detection method thereof
06/06/2012CN102486569A Projection lens system
06/06/2012CN102486215A Gravity compensation device
06/06/2012CN102485636A Synchronous lifting component and synchronous lifting and horizontal moving mechanism
06/06/2012CN101963763B Double-driving double-bridge table changing station-based double-workpiece table high-accuracy exchange device
06/06/2012CN101900932B Multi-gradation photomask and method of manufacturing the same, and pattern transfer method
06/06/2012CN101840163B Illumination source and photomask optimization
06/06/2012CN101738870B Proximity exposure apparatus, method of delivering a mask of a proximity exposure apparatus and method of manufacturing a display panel substrate
06/06/2012CN101681810B Moving body driving method and apparatus, exposure method and apparatus, pattern forming method and apparatus, and device manufacturing method
06/06/2012CN101673048B Mask pattern inspection method, exposure condition verification method, and manufacturing method of semiconductor device
06/06/2012CN101663348B Polyimide precursor, polyimide, and coating solution for under layer film for image formation
06/06/2012CN101644891B Positively photosensitive insulating resin composition and cured object obtained therefrom
06/06/2012CN101636695B Illumination system of a microlithographic projection exposure apparatus
06/06/2012CN101517703B Coating/developing apparatus, coating/developing apparatus control method
06/06/2012CN101479661B A method for manufacturing a device using imprint lithography and direct write technology
06/06/2012CN101467100B Positive photosensitive resin composition containing polymer having ring structure
06/06/2012CN101454375B Crosslinkable prepolymer, process for production thereof, and use thereof
06/06/2012CN101377624B Exposure device and exposure process
06/06/2012CN101256366B Photoresist stripping compound and method for using same for stripping photoresist film
06/06/2012CN101191967B Liquid crystal display device array substrate and its manufacture method
06/06/2012CN101154040B Photoresist composition, its coating method and method of forming photoresist pattern
06/05/2012US8194302 Active chiral photonic metamaterial
06/05/2012US8193519 Illuminating waveguide fabrication method
06/05/2012US8193100 Exposure mask manufacturing method, drawing apparatus, semiconductor device manufacturing method, and mask blanks product
06/05/2012US8192923 Photoresist stripping solution and a method of stripping photoresists using the same
06/05/2012US8192922 Method of optical fabrication of three-dimensional polymeric structures with out of plane profile control
06/05/2012US8192921 Patterning process
06/05/2012US8192920 Lithography method
06/05/2012US8192919 Pattern forming method, semiconductor device manufacturing method and phase shift photomask having dummy gate patterns
06/05/2012US8192918 Lithographic printing plate precursor
06/05/2012US8192916 Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board
06/05/2012US8192915 Positive resist composition, method of forming resist pattern, and polymeric compound
06/05/2012US8192914 Resist composition for immersion exposure and method of forming resist pattern
06/05/2012US8192053 High efficiency solid-state light source and methods of use and manufacture
05/2012
05/31/2012WO2012071496A1 A self-imageable film forming polymer, compositions thereof and devices and structures made therefrom
05/31/2012WO2012070833A2 Radiation curable resin composition, and method for producing self-replicatable mold using same
05/31/2012WO2012070548A1 Radiation-sensitive composition and compound
05/31/2012WO2012069807A2 Photoimaging
05/31/2012WO2012069351A1 Method and arrangement for determining the heating condition of a mirror in an optical system
05/31/2012WO2012068879A1 High photosensibility carbazole oxime ester photoinitiator,preparation and use thereof
05/31/2012WO2012044070A3 Photosensitive resin composition for organic insulator
05/31/2012WO2012044027A3 Photosensitive resin composition
05/31/2012WO2012043983A3 Light-sensitive resin composition
05/31/2012WO2012037118A3 Nanoporous metal multiple electrode array and method of making same
05/31/2012WO2012031765A3 Method for operating a projection exposure tool and control apparatus
05/31/2012WO2012018375A3 Plasma mediated ashing processes
05/31/2012WO2012009108A3 Controllable transmission and phase compensation of transparent material
05/31/2012US20120135358 Coating treatment method, computer-readable storage medium, and coating treatment apparatus
05/31/2012US20120135357 Polymer, positive resist composition, and patterning process
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