Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
06/2012
06/13/2012CN102496538A Discharge electrode used for capillary extreme ultraviolet photoetching light source
06/13/2012CN102495540A Exposure apparatus, exposure method, and method for producing device
06/13/2012CN102495539A Lithographic apparatus and device manufacturing method
06/13/2012CN102495538A A lithographic apparatus, a projection system and a device manufacturing method
06/13/2012CN102495537A Apparatus used for fabrication of printed circuit board
06/13/2012CN102495536A Photoetching machine
06/13/2012CN102495535A Method for obtaining mask three-dimensional vector space image based on Abbe vector imaging model
06/13/2012CN102495534A Galvanometer type laser direct writing photoetching machine
06/13/2012CN102495533A Method for detecting focal position of exposure device and system thereof
06/13/2012CN102495532A Single/double driving step scanning based double-workpiece table lateral exchange device
06/13/2012CN102495531A Double-stage revolving and switching method and apparatus based on independent synchronic direction-regulation
06/13/2012CN102495530A Cross-beam-type step-scanning and three-step double-stage exchanging apparatus and method
06/13/2012CN102495529A Lintel type dual-guide rail dual-drive stepping scanning double silicon wafer stage exchanging device and method thereof
06/13/2012CN102495528A Double-workpiece-table same-phase rotation exchange method and device based on follow-up rotation-resisting mechanisms
06/13/2012CN102495527A Double work-piece stage exchanging device based on single/double drive stepping scanning, and method thereof
06/13/2012CN102495526A Optical exposing method, and method for applying optical exposure in preparation of silicon material vertical hollow structure
06/13/2012CN102495525A Optically effective surface relief microstructures and method of making them
06/13/2012CN102495468A Projection objective structural optimization method for reducing deformation of extreme ultra-violet lithography system
06/13/2012CN102495444A Four-step grating and preparation method thereof
06/13/2012CN102495443A Method for manufacturing echelle grating by synthetic exposure method
06/13/2012CN102492060A Photoinitiator of diphenyl sulfide oxime esters as well as preparation method and application thereof
06/13/2012CN102492059A Diphenyl sulfide ketone oxime ester photoinitiator as well as preparation method and application thereof
06/13/2012CN102169218B Optical element axial adjusting device with aligning function
06/13/2012CN102162935B Adjustable vacuum sucker device for assembling and adjusting lens of photoetching machine
06/13/2012CN102162900B Device for clamping reflector at high accuracy
06/13/2012CN102103269B Method for adjusting collimated light in holographic grating exposure light path by using Moire fringes
06/13/2012CN102087481B Method for adjusting real-time monitor device in exposure path of concave holographic grating
06/13/2012CN102080683B Multi-functional vacuum chuck
06/13/2012CN101887214B Method for preparing fine metal mask bushing by wet etching
06/13/2012CN101881925B Method for copying micro-nano structure on any three-dimensional curve
06/13/2012CN101866116B Lithographic apparatus, control system, multi-core processor, and a method to start tasks on a multi-core processor
06/13/2012CN101809064B Polyamide resin, photosensitive resin composition, method for forming cured relief pattern, and semiconductor device
06/13/2012CN101794089B Resist removing method of electron beam resist optical mask plate and device thereof
06/13/2012CN101733546B Device for generating weft-intersected grid pattern on concave sphere
06/13/2012CN101632042B Cleaning composition and process for producing semiconductor device
06/13/2012CN101611351B Radiation system and lithographic apparatus
06/13/2012CN101556434B Negative resist composition
06/13/2012CN101556433B Light absorbent and organic antireflection coating composition containing the same
06/13/2012CN101546128B Method for forming patterns with gradually changed colors on surface of shell
06/13/2012CN101535896B Photosensitive resin composition, cured product thereof, and method for producing photosensitive resin
06/13/2012CN101410758B Photosensitive resin composition, photosensitive transfer material, partition wall and method for forming same, optical device and method for manufacturing same, and display
06/13/2012CN101390018B Process for the production of lithographic printing plates
06/13/2012CN101382740B Laser direct writing device and portrayal method
06/13/2012CN101382735B Photolithographic method and mask devices
06/13/2012CN101362812B Anti-reflective polymer, anti-reflective composition, and method for forming pattern using the same
06/13/2012CN101329511B Chemically amplified positive resist composition
06/13/2012CN101295134B Colored photopolymerizable composition, color filter using the same and method of producing color filter
06/13/2012CN101263425B Pattern forming material, pattern forming apparatus and pattern forming method
06/13/2012CN101154038B Curing colouration composition, color filtering device and liquid crystal display using the color filtering device
06/12/2012US8199284 Ink composition for a color filter, a color filter substrate manufactured using the ink composition and method of manufacturing a color filter substrate using the ink composition
06/12/2012US8198105 Monitor for variation of critical dimensions (CDs) of reticles
06/12/2012US8198017 Producing method of wired circuit board
06/12/2012US8198016 Patterning process
06/12/2012US8198015 Method of forming mask pattern
06/12/2012US8198014 Resist cover film forming material, resist pattern forming method, and electronic device and method for manufacturing the same
06/12/2012US8198013 Method for preparing a printing form
06/12/2012US8198012 Method of using mask film to form relief images
06/12/2012US8198011 Method of imaging and developing positive-working imageable elements
06/12/2012US8198010 Lithographic imaging with printing members having hydrophilic, surfactant-containing top layers
06/12/2012US8198009 Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for producing the same
06/12/2012US8198008 Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board
06/12/2012US8198007 Negative-working resist composition and pattern forming method using the same
06/12/2012US8198006 Process for producing semiconductor device
06/12/2012US8198005 Method of forming resist pattern
06/12/2012US8198004 Resist composition
06/12/2012US8198003 Photosensitive paste composition, barrier rib prepared using the composition and plasma display panel comprising the barrier rib
06/12/2012US8198002 Positive photosensitive resin composition
06/12/2012US8197995 Method of manufacturing array substrate of transreflective liquid crystal display
06/12/2012US8197994 Compound or its tautomer, metal complex compound, colored photosensitive curing composition, color filter, and production
06/12/2012US8197991 Manufacturing method of a semiconductor device
06/12/2012US8197033 Ink jet cartridge comprising a layer made by a curable resin composition
06/12/2012US8196510 Method for the productuion of a flexographic plate and flexographic plate obtained according to said method
06/12/2012CA2581496C Method and device for the production of photopolymerisable cylindrical jointless flexographic printing elements
06/07/2012WO2012075062A1 Developer and its use to pepare lithographic printing plates
06/07/2012WO2012074903A1 Developing lithographic printing plate precursors in simple manner
06/07/2012WO2012074753A1 Hydrophobic property alteration using ion implantation
06/07/2012WO2012074749A1 Method of preparing lithographic printing plates
06/07/2012WO2012074392A1 Slidable bushing assembly
06/07/2012WO2012074136A1 Polymerizable composition, and photosensitive layer, permanent pattern, wafer-level lens, solid-state imaging device and pattern forming method, each using the composition
06/07/2012WO2012074122A1 Negative pattern forming method and resist pattern
06/07/2012WO2012074077A1 Radiation-sensitive resin composition and radiation-sensitive acid generator
06/07/2012WO2012074076A1 Fluorine-containing hyperbranched polymer, and photo-sensitive composition containing same
06/07/2012WO2012074064A1 Fluorine-containing hyperbranched polymer, and photo-cationically polymerizable composition containing same
06/07/2012WO2012074025A1 Radiation-sensitive resin composition, method for forming pattern using same, polymer, and compound
06/07/2012WO2012073968A1 Polymer for lithography, process for manufaturing same, and resist resin for semiconductors
06/07/2012WO2012073811A1 Display panel substrate and substrate exposure method
06/07/2012WO2012073810A1 Substrate for display panel and substrate exposure method
06/07/2012WO2012073743A1 Liquid supply device and resist developing device
06/07/2012WO2012073742A1 Photosensitive resin composition for microlenses
06/07/2012WO2012073522A1 Substrate processing apparatus and substrate processing method
06/07/2012WO2012073176A1 Method and apparatus for surface treatment using inorganic acid and ozone
06/07/2012WO2012073087A1 Optical device, laser apparatus including the optical device, and extreme ultraviolet light generation system including the laser apparatus
06/07/2012WO2012073086A1 Optical device, laser apparatus, and extreme ultraviolet light generation
06/07/2012WO2012072914A2 Machine for exposing panels
06/07/2012WO2012072090A1 Method of determining a border of an intensity distribution
06/07/2012WO2012072004A1 Projection objective lens system and microlithography system using the same
06/07/2012WO2012071748A1 Liquid crystal panel exposure process and mask thereof
06/07/2012WO2012041720A3 Projection exposure apparatus for euv microlithography and method for microlithographic exposure
06/07/2012WO2012028569A9 Projection exposure apparatus
06/07/2012US20120141944 Method for manufacturing semiconductor device
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