Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
06/2012
06/20/2012CN1664697B Manufacturing method for exposure mask, generating method for mask substrate information
06/20/2012CN1652022B Manufacture method of exposure mask
06/20/2012CN102510869A Copolymers, polymeric particles comprising said copolymers and copolymeric binders for radiation-sensitive coating compositions for negative-working radiation-sensitive lithographic printing plates
06/20/2012CN102510856A 芳香族锍盐化合物 The aromatic sulfonium salt compound
06/20/2012CN102509704A Method for manufacturing T-shaped gate by adopting single electron beam exposure
06/20/2012CN102509699A Metal layer photoresist repainting method and photoetching method
06/20/2012CN102508415A Photoetching process flow and method for eliminating photoetching defects
06/20/2012CN102508414A Rotary exchanging method and rotary exchanging device for double workpiece platforms based on synchronous steering of turntable gear
06/20/2012CN102508413A Method for acquiring thickness change of photoresist and monitoring influence of photoresist thickness on graphic dimension
06/20/2012CN102508412A Line width and line roughness measuring method
06/20/2012CN102508411A Method for manufacturing X-ray diffraction optical element
06/20/2012CN102508410A Composite nanometer impressing mold plate with sandwich structure and preparation method of composite nanometer impressing mold plate
06/20/2012CN102508409A Ultraviolet-light-assisted thermocuring nanoimprint lithography technology and material
06/20/2012CN102508408A Dual-solidification nanoimprint lithography transporting layer material
06/20/2012CN102508360A Plane fine-tuning mechanism device of movable mirror
06/20/2012CN102508359A Two-dimensional plane adjusting device of movable mirror
06/20/2012CN102508353A High-resolution Forbes aspherical photoetching objective lens
06/20/2012CN102504137A Thermoplastic nano-micron particle
06/20/2012CN102097303B Photolithographic process for thick metal
06/20/2012CN102073217B Real-time measuring device and method for wave aberration
06/20/2012CN102012637B Accurately-aligned correction model in photolithographic process
06/20/2012CN101986209B Exposure apparatus, exposure method and device manufacturing method
06/20/2012CN101944475B Method of manufacturing semiconductor device and pattern formation method
06/20/2012CN101930949B Method for improving defects of photoresist coating in manufacturing process of flash memory
06/20/2012CN101930171B Ultraviolet curing composition and preparation method thereof and pattern preparation method
06/20/2012CN101924077B Manufacturing method for reducing area of SONOS storage unit
06/20/2012CN101750038B Test wafer for edge detection and wafer edge detection method
06/20/2012CN101617272B Photo-sensitive resin composition for black matrix, black matrix produced by the composition and liquid crystal display including the black matrix
06/20/2012CN101522737B Polyorganosiloxane composition
06/20/2012CN101438210B Photosensitive composition, photosensitive film, photosensitive laminate, method of forming permanent pattern and printed board
06/20/2012CN101419398B Method for manufacturing mask blank and method for manufacturing photomask
06/20/2012CN101401039B Photosensitive composition, photosensitive film, method for permanent pattern formation using said photosensitive composition, and printed board
06/20/2012CN101256360B Radiosensitive resin composition, laminated insulation film and micro lens, preparation method thereof
06/20/2012CN101256356B Radiation sensitive composition, color filter, and liquid crystal display device
06/20/2012CN101086618B Photosensitive compound, photosensitive composition, method for resist pattern formation, and process for elements production
06/19/2012US8202685 Method of forming semiconductor device by using reduction projection aligner
06/19/2012US8202683 Method for forming pattern of semiconductor device
06/19/2012US8202682 Method of manufacturing semiconductor device, and resist coating and developing system
06/19/2012US8202681 Hybrid multi-layer mask
06/19/2012US8202680 TARC material for immersion watermark reduction
06/19/2012US8202678 Wet developable bottom antireflective coating composition and method for use thereof
06/19/2012US8202677 Chemically-amplified positive resist composition and patterning process thereof
06/14/2012WO2012078544A2 Benzylidene substituted 2,4-pentanedione compounds and use thereof as stabilizers
06/14/2012WO2012077770A1 Negative-type photosensitive resin composition, partition wall for use in optical elements and manufacturing method thereof, manufacturing method of an optical element having said partition walls, and ink-repellent agent solution
06/14/2012WO2012077640A1 Composition for forming resist underlayer film containing hydroxyl group-containing carbazole novolac resin
06/14/2012WO2012077461A1 Photoreactive resin composition
06/14/2012WO2012077433A1 Pattern forming method and radiation-sensitive resin composition
06/14/2012WO2012076629A2 Criss-cross writing strategy
06/14/2012WO2012076454A1 Illumination optical system for projection lithography
06/14/2012WO2012076335A1 Method for measuring an optical system
06/14/2012WO2012076300A1 Lithographic apparatus and device manufacturing method
06/14/2012WO2012076216A1 Methods and apparatus for inspection of articles, euv lithography reticles, lithography apparatus and method of manufacturing devices
06/14/2012WO2012076207A1 Electrostatic clamp, lithographic apparatus and method of manufacturing an electrostatic clamp
06/14/2012WO2012076188A1 Euv lithography system
06/14/2012WO2012075686A1 Thick-film photoresist stripper solution
06/14/2012US20120148960 Method of manufacturing printed circuit board
06/14/2012US20120148959 Pattern forming method
06/14/2012US20120148958 Sulfur-containing macromolecules and methods for their preparation
06/14/2012US20120148957 Pattern forming method, chemical amplification resist composition and resist film
06/14/2012US20120148956 Resist composition and method of forming resist pattern
06/14/2012US20120148955 Resist composition, method of forming resist pattern, and new compound
06/14/2012US20120148954 N-acyl-b-lactam derivative, macromolecular compound, and photoresist composition
06/14/2012US20120148953 Resist composition, and method of forming resist pattern
06/14/2012US20120148952 Radiation-sensitive resin composition and compound
06/14/2012US20120148945 Resist composition and patterning process
06/14/2012US20120148943 Method for Determining A Grey Level Etch Mask
06/14/2012US20120148942 Diagonal interconnect for improved process margin with off-axis illumination
06/14/2012US20120147722 Nanometer Scale Instrument for Biochemically, Chemically, or Catalytically Interacting with a Sample Material
06/14/2012US20120145972 Photosensitive Resin Composition for Color Filter and Color Filter Using the Same
06/14/2012US20120145971 Photosensitive Resin Composition and Light Blocking Layer Using the Same
06/14/2012US20120145668 Forming sloped resist, via, and metal conductor structures using banded reticle structures
06/14/2012DE112010000772T5 Lichtempfindliches lithographisches Druckplattenmaterial A photosensitive lithographic printing plate material
06/14/2012DE102010062779A1 Beleuchtungsoptik für die Projektionslithographie Illumination optics for projection lithography
06/14/2012DE102010062763A1 Verfahren zum Vermessen eines optischen Systems A method of surveying an optical system
06/14/2012DE102010062720A1 EUV-Lithographiesystem EUV lithography system
06/14/2012DE102007024122B4 Belichtungskonfigurator in Maskalignern Exposure configurator Maskalignern
06/14/2012DE10118976B4 Photoresist-Zusammensetzung für ein Resist-Fließverfahren und Verfahren zur Bildung eines Kontaktlochs unter Verwendung desselben Of the same photoresist composition for a resist-flow process and method for forming a contact hole using
06/13/2012EP2463716A2 Surface position detection apparatus, exposure apparatus, and exposure method
06/13/2012EP2463715A2 Surface position detection apparatus, exposure apparatus, and exposure method
06/13/2012EP2463714A1 Basic compound, chemically amplified resist composition and patterning process
06/13/2012EP2463693A2 Micro-mirror assembly with coating and method for its production
06/13/2012EP2462593A1 Spectral filter, lithographic apparatus including such a spectral filter, device manufacturing method, and device manufactured thereby
06/13/2012EP2462487A2 Adjacent field alignment
06/13/2012EP2126636B1 Illumination system of a microlithographic projection exposure apparatus
06/13/2012EP1797479B1 Device obtained by nanoprinting comprising metallic patterns and method for nanoprinting of metallic patterns
06/13/2012EP1759247B1 Method for the electrostatic structuring of a substrate surface and raster probe lithography method
06/13/2012EP1724815B1 Aligner, device manufacturing method, maintenance method and aligning method
06/13/2012EP1630856B1 Mutilayer film reflector and x-ray exposure system
06/13/2012EP1485944B1 Radiation assisted direct imprint lithography
06/13/2012CN1959529B Method of forming etching mask
06/13/2012CN1955845B Salt suitable for an acid generator and a chemically amplified resist composition containing the same
06/13/2012CN1904736B Positive-type photosensitive resin composition and cured film manufactured therefrom
06/13/2012CN102498441A Metrology method and apparatus, lithographic system, and lithographic processing cell
06/13/2012CN102498440A Silicon-containing composition having sulfonamide group for forming resist underlayer film
06/13/2012CN102498439A Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound
06/13/2012CN102498437A Limiting plate shifting within a plate pallet
06/13/2012CN102498141A 固化性树脂组合物 Curable resin composition
06/13/2012CN102498104A Cyclic compound, process for production of the cyclic compound, radiation-sensitive composition, and method for formation of resist pattern
06/13/2012CN102496586A Method for detecting photoresist defects
06/13/2012CN102496551A Method for generating EUV (extreme ultraviolet) radiation light by using capillary discharge electrode UV (ultraviolet) photoetching light source