Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
06/2012
06/26/2012US8208120 Lithographic apparatus and device manufacturing method
06/26/2012US8208119 Exposure apparatus, exposure method, and method for producing device
06/26/2012US8208117 Exposure method, substrate stage, exposure apparatus, and device manufacturing method
06/26/2012US8207576 Pitch reduced patterns relative to photolithography features
06/26/2012US8207514 Charged particle beam drawing apparatus and proximity effect correction method thereof
06/26/2012US8207067 Method of processing resist, semiconductor device, and method of producing the same
06/26/2012US8206895 Method for forming pattern and method for manufacturing semiconductor device
06/26/2012US8206894 Resist pattern-forming method and resist pattern miniaturizing resin composition
06/26/2012US8206893 Photoimageable branched polymer
06/26/2012US8206892 Solution processed thin films and laminates, devices comprising such thin films and laminates, and method for their use and manufacture
06/26/2012US8206891 Positive resist composition and method of forming resist pattern
06/26/2012US8206890 Resist composition, method of forming resist pattern, compound and acid generator
06/26/2012US8206889 Manufacturing method of semiconductor integrated circuit device
06/26/2012US8206888 Radiation-sensitive resin composition
06/26/2012US8206887 Positive resist composition and resist pattern forming method
06/26/2012US8206886 Photosensitive composition and pattern-forming method using the photosensitive composition
06/26/2012CA2590502C Method for enabling transmission of substantially equal amounts of energy
06/26/2012CA2562872C Method of making a photopolymer sleeve blank having an integral cushion layer for flexographic printing
06/21/2012WO2012082705A1 Transparent layer forming polymer
06/21/2012WO2012082555A2 Cyclic error compensation in inteferometric encoder systems
06/21/2012WO2012081865A2 Cleaning liquid composition for photolithography
06/21/2012WO2012081863A2 Photosensitive polymer, photoresist composition including same, and method for forming resist pattern using same
06/21/2012WO2012081680A1 Photosensitive element, method for forming resist pattern, and method for producing printed circuit board
06/21/2012WO2012081623A1 Surface inspection device and method therefor
06/21/2012WO2012081619A1 Composition for forming resist underlayer film and method for forming resist pattern using same
06/21/2012WO2012081587A1 Inspection method, inspection device, exposure management method, exposure system, and semiconductor device
06/21/2012WO2012081507A1 Photosensitive negative resin composition
06/21/2012WO2012081295A1 Novel photosensitive resin composition and use thereof
06/21/2012WO2012081292A1 Spatial light modulator, method of driving same, and exposure method and apparatus
06/21/2012WO2012081234A1 Exposure method, exposure apparatus, and device manufacturing method
06/21/2012WO2012080278A1 Lithography system and method of processing substrates in such a lithography system
06/21/2012WO2012080008A2 Method and apparatus for correcting errors on a wafer processed by a photolithographic mask
06/21/2012WO2012079919A1 Fluoroalcohol containing molecular photoresist materials and processes of use
06/21/2012WO2012079672A1 Method for structuring a flexographic printing forme
06/21/2012WO2012044077A3 Light-exposure system
06/21/2012WO2012041461A3 Projection exposure tool for microlithography and method for microlithographic exposure
06/21/2012WO2012031056A3 High resolution, solvent resistant, thin elastomeric printing plates
06/21/2012US20120157551 Use of Polymers
06/21/2012US20120157368 Processing agent composition for semiconductor surface and method for processing semiconductor surface using same
06/21/2012US20120157367 Composition and method for removing photoresist and bottom anti-reflective coating for a semiconductor substrate
06/21/2012US20120156881 Method for defining a separating structure within a semiconductor device
06/21/2012US20120156879 Resist pattern improving material, method for forming resist pattern, and method for producing semiconductor device
06/21/2012US20120156814 Phase-shift mask with assist phase regions
06/21/2012US20120156626 Coating and developing system and coating and developing method
06/21/2012US20120156625 Nano-fabrication method
06/21/2012US20120156624 Waterless printing members and related methods
06/21/2012US20120156623 Semiconductor device manufacturing method, exposure method for exposure apparatus, exposure apparatus, and light source for exposure apparatus
06/21/2012US20120156622 Ortho-Nitrobenzyl Ester Compound and Positive Type Photosensitive Resin Composition Including the Same
06/21/2012US20120156621 Radiation-sensitive resin composition
06/21/2012US20120156620 Resist composition and method for producing resist pattern
06/21/2012US20120156619 Acrylate-based compounds and photosensitive composition comprising the same
06/21/2012US20120156618 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition
06/21/2012US20120156617 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition
06/21/2012US20120156616 Positive Photosensitive Resin Composition
06/21/2012US20120156615 Cyclic compound, process for production of the cyclic compound, radiation-sensitive composition, and method for formation of resist pattern
06/21/2012US20120156614 Novel Phenol Compounds and Positive Photosensitive Resin Composition Including the Same
06/21/2012US20120156613 Anti-reflective coatings using vinyl ether crosslinkers
06/21/2012US20120156612 Radiation-sensitive resin composition, method for forming a resist pattern, compound, and polymer
06/21/2012US20120156611 Fluoroalcohol Containing Molecular Photoresist Materials and Processes of Use
06/21/2012US20120156598 Photosensitive resin composition for microlens
06/21/2012US20120156597 Lithographic mask and manufacturing method thereof
06/21/2012US20120156596 Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device
06/21/2012US20120156595 Compositions comprising sugar component and processes for photolithography
06/21/2012US20120156593 Method for patterning trenches with varying dimension
06/21/2012US20120155822 Optical waveguide and method of manufacturing the same, and optical waveguide device
06/21/2012US20120155819 Resin composition for optical waveguide, optical waveguide produced by using the resin composition, and production method of the optical waveguide
06/21/2012US20120154944 Color curable composition and method of preparing the same, color filter and method of producing the same, and solid-state image pick-up device
06/21/2012US20120154886 Display pixels, displays, and methods of operating display pixels
06/21/2012US20120154800 Nanostructures and lithographic method for producing highly sensitive substrates for surface-enhanced spectroscopy
06/21/2012DE102011088735A1 Anordnung zur Halterung eines optischen Elementes, insbesondere in einer EUV-Projektionsbelichtungsanlage Arrangement for mounting an optical element, especially in an EUV projection exposure apparatus
06/21/2012DE102011084958A1 Method for cleaning reflective optical element for illumination- and projection system, involves removing metallic deposits from optically utilized surface of reflective optical element by performing wet-chemical treatment
06/21/2012DE102010054527A1 Verfahren zur Strukturierung einer Flexodruckform Method for structuring a flexographic printing plate
06/20/2012EP2466625A2 Exposure apparatus, exposure method, and method for producing device
06/20/2012EP2466624A2 Exposure apparatus, exposure method, and method for producing device
06/20/2012EP2466623A2 Exposure apparatus, exposure method, and method for producing device
06/20/2012EP2466622A2 Exposure apparatus, exposure method, and method for producing device
06/20/2012EP2466621A2 Exposure apparatus, exposure method, and method for producing device
06/20/2012EP2466620A2 Exposure apparatus and method for producing device
06/20/2012EP2466619A2 Exposure apparatus and method for producing device
06/20/2012EP2466618A2 Exposure apparatus and method for producing device
06/20/2012EP2466617A2 Exposure apparatus and method for producing device
06/20/2012EP2466616A2 Exposure apparatus and method for producing device
06/20/2012EP2466615A2 Exposure apparatus and method for producing device
06/20/2012EP2466383A2 Wafer table for immersion lithography
06/20/2012EP2466382A2 Wafer table for immersion lithography
06/20/2012EP2466381A1 A processing apparatus for processing a flexographic plate, a method and a computer program product
06/20/2012EP2466380A1 A curable jettable fluid for making a flexographic printing master
06/20/2012EP2466379A1 Resist composition and patterning process
06/20/2012EP2466378A2 Radiation curable resin composition and rapid prototyping process using the same
06/20/2012EP2466377A1 Method for the creation of complex structures on a micrometric or nanometric scale, and the complex structure thus obtained
06/20/2012EP2465012A1 Lithographic apparatus and method
06/20/2012EP2465011A1 Method and device for keeping mask dimensions constant
06/20/2012EP2465010A1 Euv radiation system and lithographic apparatus
06/20/2012EP2090930B1 Precursor for waterless lithographic printing plate
06/20/2012EP1753016B1 Exposure apparatus and device producing method
06/20/2012EP1746637B1 Drive method for mobile body, stage device, and exposure device
06/20/2012EP1461142B1 Method of producing a sheet comprising through pores and the application thereof in the production of micronic and submicronic filters
06/20/2012CN202281901U 减少光刻胶在更换时被浪费的装置 Reduce wasted photoresist when replacing means
06/20/2012CN202281900U 网版和网版组件 Screen and screen components
06/20/2012CN1983030B Cationically polymerizable photo imageable thick film compositions, electrodes, and methods of forming thereof
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