Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
01/2015
01/21/2015CN102147573B 光照射装置 Light irradiation device
01/21/2015CN102034732B 吸附用构件、使用其的吸附装置及带电粒子线装置 Adsorption member, adsorption means and using its charged particle apparatus
01/21/2015CN102007450B 用于黑矩阵的光敏树脂组合物 The photosensitive resin composition for a black matrix
01/21/2015CN101900949B 流体处理结构、光刻设备和器件制造方法 Fluid handling structure, a lithographic apparatus and device manufacturing method
01/21/2015CN101228608B 具有改善的可靠性的无掩模光刻系统 Having improved reliability maskless lithography system
01/20/2015US8938699 Multivariable solver for optical proximity correction
01/20/2015US8938694 Three-dimensional mask model for photolithography simulation
01/20/2015US8938135 Method for manufacturing optical waveguide and optical waveguide manufactured by the method
01/20/2015US8937710 Exposure method and apparatus compensating measuring error of encoder due to grating section and displacement of movable body in Z direction
01/20/2015US8937709 Reflective optical element for EUV lithography
01/20/2015US8937708 Illumination optics for microlithography
01/20/2015US8937707 Lithographic apparatus, device manufacturing method, and method of calibrating a displacement measuring system
01/20/2015US8937706 Lithographic apparatus and method
01/20/2015US8937705 Lithographic apparatus and device manufacturing method with radiation beam inspection using moveable reflecting device
01/20/2015US8937704 Lithographic apparatus and device manufacturing method involving a resistivity sensor
01/20/2015US8937703 Liquid immersion member, immersion exposure apparatus, liquid recovering method, device fabricating method, program, and storage medium
01/20/2015US8937289 High heat load optics with vibration isolated hoses in an extreme ultraviolet lithography system
01/20/2015US8937019 Techniques for generating three dimensional structures
01/20/2015US8936994 Method of processing a substrate in a lithography system
01/20/2015US8936903 Photo-resist with floating acid
01/20/2015US8936902 Positive-working imageable elements and method of use
01/20/2015US8936901 Laser-markable compositions
01/20/2015US8936900 Calixarene and photoresist composition comprising same
01/20/2015US8936899 Positive-working lithographic printing plate precursors and use
01/20/2015US8936898 Photosensitive resin composition for imprinting process and method for forming organic layer over substrate
01/20/2015US8936891 Photosensitive polysiloxane composition and uses thereof
01/20/2015US8936890 Electroless plating method
01/20/2015US8936832 Device and method for wet treating plate-like-articles
01/20/2015US8935981 High contrast alignment marks through multiple stage imprinting
01/15/2015WO2015006695A1 Drop pattern generation for imprint lithography with directionally-patterned templates
01/15/2015WO2015005546A1 Black photosensitive resin composition and light blocking layer using same
01/15/2015WO2015005333A1 High-refractive-index film forming composition
01/15/2015WO2015005310A1 Light-blocking composition, light-blocking film and method for producing same
01/15/2015WO2015005265A1 Coloring composition, cured film, color filter, method for producing color filter, solid-state imaging element, and image display device
01/15/2015WO2015005118A1 Substrate processing apparatus, device manufacturing system, device manufacturing method, and pattern formation apparatus
01/15/2015WO2015005077A1 Photosensitive thermosetting resin composition and flexible printed circuit board
01/15/2015WO2015005051A1 Compound, active light sensitive or radiation sensitive resin composition, resist film using same, resist-coated mask blank, photomask, pattern forming method, method for manufacturing electronic device, and electronic device
01/15/2015WO2015004433A1 Direct imaging of a sealed wet photopolymer pouch
01/15/2015WO2015004392A1 Method for the perpendicular orientation of nanodomains of block copolymers, using statistical or gradient copolymers, the monomers of which differ at least in part from those present in each of the blocks of the block copolymer
01/15/2015WO2015004110A1 Support system and projection printing system
01/15/2015WO2008023816A9 Optical element, method for manufacturing master for manufacturing optical element, and photoelectric conversion device
01/15/2015US20150018901 Neural prosthetic device and method of making same
01/15/2015US20150017869 Display substrate, display device including the same, and method of manufacturing the display substrate
01/15/2015US20150017804 Method of forming a pattern in a semiconductor device and method of forming a gate using the same
01/15/2015US20150017791 Film-forming composition and ion implantation method
01/15/2015US20150017590 Coating agent for forming fine pattern
01/15/2015US20150017589 Apparatus and method for compensating a defect of a channel of a microlithographic projection exposure system
01/15/2015US20150017588 Photolithographic patterning of a cylinder
01/15/2015US20150017587 Composition for forming fine resist pattern and pattern forming method using same
01/15/2015US20150017586 Positive resist composition and patterning process
01/15/2015US20150017576 Pattern forming method, method for selecting heating temperature in pattern forming method, extreme ultraviolet-sensitive resin composition, resist film, manufacturing method of electronic device using the same, and electronic device
01/15/2015US20150017574 Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method
01/15/2015US20150017573 Reflective original, exposure method, and device manufacturing method
01/15/2015US20150017571 Photolithogrpahy scattering bar structure and method
01/15/2015US20150017397 Forming method and substrate
01/15/2015US20150017353 Layer composite consisting of a photopolymer film and an adhesive layer
01/15/2015US20150017329 Drop pattern generation for imprint lithography with directionally-patterned templates
01/15/2015US20150016072 Dry film, printed wiring board using same, method for producing printed wiring board, and flip chip mounting substrate
01/15/2015US20150015867 Method and apparatus for forming pattern
01/15/2015US20150015866 Radiating device and media exposure device
01/15/2015US20150015865 Illumination intensity correction device for predefining an illumination intensity over an illumination field of a lithographic projection exposure apparatus
01/15/2015US20150015864 Projection exposure apparatus for microlithography for the production of semiconductor components
01/15/2015US20150015863 Radiation Source and Lithographic Apparatus
01/15/2015US20150015862 Illumination optical unit for projection lithography
01/15/2015US20150015861 Calibration method, measurement apparatus, exposure apparatus, and method of manufacturing article
01/15/2015US20150015860 Reticles, And Methods Of Mitigating Asymmetric Lens Heating In Photolithography
01/15/2015US20150015859 Digital exposure device using digital micro-mirror device and a method for controlling the same
01/15/2015US20150015858 Lithographic apparatus and device manufacturing method
01/15/2015US20150015857 Lithographic apparatus, drying device, metrology apparatus and device manufacturing method
01/15/2015US20150015856 Lithographic apparatus and device manufacturing method
01/15/2015US20150015813 Black resin film, capacitance type input device, method for producing them, and image display apparatus using the same
01/15/2015US20150015801 Touch panel and method of manufacturing the same
01/15/2015US20150014894 Curable composition for imprints, cured product and method for manufacturing a cured product
01/15/2015US20150014029 Photosensitive composition, hardened coating films therefrom, and printed wiring boards using same
01/15/2015US20150013603 Substrate processing apparatus
01/15/2015US20150013559 Imprint method, imprint apparatus, and article manufacturing method
01/15/2015US20150013481 Micro-scale pendulum
01/15/2015DE102013213564A1 Optische Hohlwellenleiter-Baugruppe Hollow optical waveguide assembly
01/15/2015DE102013213545A1 Beleuchtungsoptik für die Projektionslithografie Illumination optics for projection lithography
01/15/2015DE102013213544A1 Tragsystem und Projektionsbelichtungsanlage Support system and projection exposure apparatus
01/15/2015DE102013212462A1 Oberflächenkorrektur von Spiegeln mit Entkopplungsbeschichtung Surface correction of mirrors with decoupling coating
01/14/2015EP2824512A2 Illumination lens for projection lithography
01/14/2015EP2824497A1 Device for forming an immersion film
01/14/2015EP2824487A1 Reflective optical element for oblique incidence in the EUV wavelength range
01/14/2015EP2823360A1 Illumination optics for euv projection lithography and optical system having such an illumination optics
01/14/2015EP2823359A1 Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the composition
01/14/2015EP2823358A1 Method for removing a high definition nanostructure, a partly freestanding layer, a sensor comprising said layer and a method using said sensor
01/14/2015EP2823357A1 A method for manufacturing a tool part for an injection molding process, a hot embossing process, a nano-imprint process, or an extrusion process
01/14/2015EP2823356A1 Large area imprint lithography
01/14/2015CN204101796U 四维euv反射镜装调装置 Euv dimensional mirror alignment device
01/14/2015CN204101764U 一种光栅 A raster
01/14/2015CN104285184A 负型感光性树脂组合物、固化浮雕图案的制造方法、及半导体装置 The negative photosensitive resin composition, method of producing the cured relief pattern, and a semiconductor device
01/14/2015CN104284888A 肟酯光敏引发剂 Oxime ester photoinitiator
01/14/2015CN104282630A 一种制作闪存的方法 Method of making a flash memory
01/14/2015CN104282360A 感光性导电膜、导电膜的形成方法、导电图形的形成方法以及导电膜基板 Photosensitive conductive film forming method of forming method, a conductive pattern of a conductive film and a conductive film substrate
01/14/2015CN104281020A 一种改善光刻对位能力的方法 A method of improving the ability of photolithography bits
01/14/2015CN104281018A 一种感光胶剥离剂 One photosensitizing plastic strippers
01/14/2015CN104281017A 干膜抗蚀剂剥离剂组合物以及使用该组合物的干膜抗蚀剂的除去方法 The method for removing the dry film resist stripper composition and use of the composition of the dry film resist
01/14/2015CN104281016A 一种制造简便的ps版显影液及其配制方法 A simple method of preparation ps plate developer and manufacturer
01/14/2015CN104281015A 一种显影装置及显影方法 A developing apparatus and a developing method
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