| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/06/2015 | US8926758 Composition and method for removing photoresist and bottom anti-reflective coating for a semiconductor substrate |
| 01/06/2015 | US8926740 Pigment dispersion, and resist composition for color filter and ink composition each using the pigment dispersion |
| 01/01/2015 | US20150004802 Methods and Structures for Protecting One Area While Processing Another Area on a Chip |
| 01/01/2015 | US20150004801 Spin-on compositions of soluble metal oxide carboxylates and methods of their use |
| 01/01/2015 | US20150004791 Composition for forming a coating type bpsg film, substrate formed a film by said composition, and patterning process using said composition |
| 01/01/2015 | US20150004692 Device for guiding cell migration and guiding method implementing such a device |
| 01/01/2015 | US20150004549 Method for patterning flexible substrate |
| 01/01/2015 | US20150004548 Method for patterning flexible substrate |
| 01/01/2015 | US20150004547 Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same |
| 01/01/2015 | US20150004546 Method for fabricating photo spacer |
| 01/01/2015 | US20150004545 Photoresist composition, compound, and production method thereof |
| 01/01/2015 | US20150004544 Photoresist composition, resist pattern-forming method, acid diffusion control agent, and compound |
| 01/01/2015 | US20150004533 Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same |
| 01/01/2015 | US20150004531 Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns |
| 01/01/2015 | US20150004275 Mold |
| 01/01/2015 | US20150004058 Methods for Forming a Channel Through a Polymer Layer Using One or More Photoresist Layers |
| 01/01/2015 | US20150002833 Movable body drive method, movable body drive system, pattern formation method, pattern forming apparatus, exposure method, exposure apparatus, and device manufacturing method |
| 01/01/2015 | US20150002832 Lithographic Apparatus Comprising a Support for Holding an Object, and a Support for Use therein |
| 01/01/2015 | US20150002831 Movable body drive method, movable body drive system, pattern formation method, pattern forming apparatus, exposure method, exposure apparatus, and device manufacturing method |
| 01/01/2015 | US20150002830 Radiation source and lithographic apparatus |
| 01/01/2015 | US20150001179 Method for producing etchable structures using a laser having a wavelength in the infrared range |
| 01/01/2015 | US20150001178 Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition |
| 01/01/2015 | US20150000968 Wiring board and method of manufacturing the same |
| 12/31/2014 | CN204065662U 一种抽屉式棕片显影机 One kind of drawer brown film developing machine |
| 12/31/2014 | CN204065661U 大面积无掩膜板快速曝光的装置 Large area without mask fast exposure apparatus |
| 12/31/2014 | CN204065660U 一种用于dwl66fs型激光直写系统样品的定位夹具 A dwl66fs laser direct writing sample positioning fixture system |
| 12/31/2014 | CN204065659U 用于制造装饰基板上的抗蚀图案或导电图案的转印型感光性导电膜 Transfer type photosensitive conductive film or conductive pattern of the resist pattern on the substrate for the manufacture of decorative |
| 12/31/2014 | CN204065658U 纳米压印用匀胶铬版压模 Nanoimprint uniform plastic chrome version with die |
| 12/31/2014 | CN104255086A 基板的制造方法、基板以及掩蔽膜 Producing a substrate, the substrate and the masking film |
| 12/31/2014 | CN104254807A 负型感光性硅氧烷组合物 Negative photosensitive silicone composition |
| 12/31/2014 | CN104254806A 光学材料用永久膜的制造方法、利用所述方法制作的硬化膜、使用所述硬化膜的有机el显示装置及液晶显示装置 Optical material producing method for a permanent film, produced using the method of the hardened film, the cured film using an organic el display device and liquid crystal display device |
| 12/31/2014 | CN104254805A 化学增幅型正型感光性树脂组合物、硬化膜的制造方法、硬化膜、有机el显示装置及液晶显示装置 Chemically-amplified positive-type photosensitive resin composition, cured film, method of manufacturing, the hardened film, an organic el display device and liquid crystal display device |
| 12/31/2014 | CN104254790A 黑色矩阵用炭黑分散体 Black matrix with carbon black dispersion |
| 12/31/2014 | CN104254557A 用于纳米平版印刷术的聚丙交酯/含硅嵌段共聚物 Polypropylene for nano-lithography lactide / silicon block copolymer |
| 12/31/2014 | CN104253066A 防静电热板结构 Anti-static hot plate structure |
| 12/31/2014 | CN104252816A 一种电子产品玻璃面板的制造工艺 A manufacturing process of electronic products glass panel |
| 12/31/2014 | CN104252815A 电子产品玻璃面板的制造工艺 Manufacturing processes of electronic products glass panel |
| 12/31/2014 | CN104252103A 光刻返工后残留光刻胶的去除方法 After lithography rework the residual photoresist removal method |
| 12/31/2014 | CN104252102A 负型感光性树脂组合物、固化膜、电子装置和聚合物 The negative photosensitive resin composition, a cured film, an electronic device and a polymer |
| 12/31/2014 | CN104252101A 膜形成用组合物 Film forming composition |
| 12/31/2014 | CN104252100A 感光性硬化组成物及其应用 Harden photosensitive composition and its application |
| 12/31/2014 | CN104252099A 一种柔性制版工艺 A flexible plate-making process |
| 12/31/2014 | CN104249420A 模具 Mold |
| 12/31/2014 | CN103293877B 采用四极曝光方式的光刻装置、通光单元及光刻方法 Quadrupole exposure mode using a lithographic apparatus, through the light unit and lithography methods |
| 12/31/2014 | CN103091778B 双全息曝光制备量子级联激光器掩埋双周期光栅方法 Preparation of double quantum cascade laser holographic exposure buried doubly periodic grating method |
| 12/31/2014 | CN103064136B 用于集成成像3d显示的组合微透镜阵列及其制作方法 Combination of microlens array and integrated production methods for imaging 3d display |
| 12/31/2014 | CN102901997B 一种曲面复眼的制备方法 One kind of compound eye surface preparation |
| 12/31/2014 | CN102879845B 基于pdms的纳米级光栅制作方法 Production method based on nanoscale gratings pdms of |
| 12/31/2014 | CN102738049B 基板输送方法、基板输送装置和涂敷显影装置 Substrate transfer method, the substrate transfer means and the coating and developing apparatus |
| 12/31/2014 | CN102713758B 抗蚀剂底层组合物以及利用其制造半导体集成电路器件的方法 The resist layer composition and the use thereof a method for manufacturing a semiconductor integrated circuit device |
| 12/31/2014 | CN102707574B 光刻设备和器件制造方法 Lithographic apparatus and device manufacturing method |
| 12/31/2014 | CN102640057B 包含偏转镜的折反射投射物镜以及投射曝光方法 Catadioptric projection objective contain deflecting mirror and a projection exposure method |
| 12/31/2014 | CN102621817B 沉积物去除、光学元件保护方法、器件制造法和光刻设备 Sediment removal, optics protection method, device manufacturing method and lithography equipment |
| 12/31/2014 | CN102603579B 可聚合光产酸剂 Polymerizable photoacid |
| 12/31/2014 | CN102365341B 碱产生剂、感光性树脂组合物、含有该感光性树脂组合物的图案形成用材料、使用该感光性树脂组合物的图案形成方法以及物品 Alkali generating agent, the photosensitive resin composition, comprising the photosensitive resin composition pattern-forming material, using a pattern of the photosensitive resin composition and a method for forming article |
| 12/31/2014 | CN102338994B 一种光刻胶的清洗液 A photoresist cleaning solution |
| 12/31/2014 | CN102138201B 用可变形束光刻的光学邻近校正、设计和制造光刻板方法 Deformable beam lithography using an optical proximity correction, design and manufacturing method of the reticle |
| 12/31/2014 | CN101982807B 图案形成方法 Pattern forming method |
| 12/31/2014 | CN101762987B 微光刻投射曝光设备的照明系统 Microlithographic projection exposure apparatus the illumination system |
| 12/30/2014 | US8924897 Mask pattern design method and semiconductor manufacturing method and semiconductor design program |
| 12/30/2014 | US8923601 Method for inspecting overlay shift defect during semiconductor manufacturing and apparatus thereof |
| 12/30/2014 | US8922786 Detector, imprint apparatus, and article manufacturing method |
| 12/30/2014 | US8922774 Method of manufacturing device, and substrate |
| 12/30/2014 | US8922757 Photo-alingment apparatus, and method for fabricating liquid crystal display |
| 12/30/2014 | US8922756 Position measurement system, lithographic apparatus and device manufacturing method |
| 12/30/2014 | US8922755 Support structure, inspection apparatus, lithographic apparatus and methods for loading and unloading substrates |
| 12/30/2014 | US8922754 Immersion exposure apparatus and device fabricating method with two substrate stages and metrology station |
| 12/30/2014 | US8922753 Optical system for a microlithographic projection exposure apparatus |
| 12/30/2014 | US8922752 Method and apparatus for alignment processing |
| 12/30/2014 | US8922750 Magnification control for lithographic imaging system |
| 12/30/2014 | US8922749 Lithographic apparatus and patterning device |
| 12/30/2014 | US8922748 Exposure apparatus, exposure method, and device manufacturing method |
| 12/30/2014 | US8921814 Photon source, metrology apparatus, lithographic system and device manufacturing method |
| 12/30/2014 | US8921812 Reticle protection member, reticle carrying device, exposure device and method for carrying reticle |
| 12/30/2014 | US8921501 Ultraviolet curable resin composition for transparent color-painted steel sheet, and steel sheet using same |
| 12/30/2014 | US8921283 Method for generating microscopic patterns of protein and other macromolecules |
| 12/30/2014 | US8921133 Method of forming a sampled grating and method of producing a laser diode |
| 12/30/2014 | US8921035 Polymer washout solvent, and the use thereof for developing a flexographic printing plate |
| 12/30/2014 | US8921034 Patterned bases, and patterning methods |
| 12/30/2014 | US8921033 Method of preparing lithographic printing plate and developer for lithographic printing plate precursor |
| 12/30/2014 | US8921032 Self-assemblable polymer and method for use in lithography |
| 12/30/2014 | US8921031 Photoresist overcoat compositions and methods of forming electronic devices |
| 12/30/2014 | US8921030 Tone inversion of self-assembled self-aligned structures |
| 12/30/2014 | US8921029 Resist composition and method for producing resist pattern |
| 12/30/2014 | US8921028 Salt, resist composition and method for producing resist pattern |
| 12/30/2014 | US8921027 Radiation-sensitive resin composition |
| 12/30/2014 | US8921026 Basic compound, chemically amplified resist composition, and patterning process |
| 12/30/2014 | US8921025 Positive resist compositions and patterning process |
| 12/30/2014 | US8921024 Photosensitive polysiloxane composition and applications thereof |
| 12/30/2014 | US8921019 Positive photosensitive resin composition, and photosensitive resin layer and display device using the same |
| 12/30/2014 | US8921012 Photopolymer formulations having the adjustable mechanical modulus GUV |
| 12/30/2014 | US8920689 Photosensitive resin composition for color filter and color filter using the same |
| 12/30/2014 | US8920577 Process for treatment of substrates with water vapor or steam |
| 12/30/2014 | US8920569 Pollutant removal method and apparatus, and exposure method and apparatus |
| 12/30/2014 | US8920153 Apparatus comprising substrate and conductive layer |
| 12/25/2014 | US20140377951 Apparatus and Method for Removing Challenging Polymer Films and Structures from Semiconductor Wafers |
| 12/25/2014 | US20140377709 Method for manufacturing semiconductor device |
| 12/25/2014 | US20140377708 Double patterning by ptd and ntd process |
| 12/25/2014 | US20140377707 Composition for forming liquid immersion upper layer film, resist pattern-forming method, polymer, and compound |
| 12/25/2014 | US20140377706 Developer for photosensitive resist material and patterning process |