| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/22/2015 | WO2015007511A1 Determination and application of non-monotonic dose sensitivity |
| 01/22/2015 | WO2015007385A1 Positioning device for moving a substrate |
| 01/22/2015 | WO2015007298A1 Microlithographic apparatus and method of varying a light irradiance distribution |
| 01/22/2015 | WO2015007062A1 Photoresist composition and preparation method therefor, colour film substrate and display device |
| 01/22/2015 | WO2015007049A1 Photoresist monomer, photoresist, preparation methods therefor, and colour filter |
| 01/22/2015 | WO2015007044A1 Exposure device and exposure method |
| 01/22/2015 | WO2015006887A1 Illumination device for projection mask aligner and application method |
| 01/22/2015 | US20150024327 Negative photoresist composition and patterning method for device |
| 01/22/2015 | US20150024326 Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates |
| 01/22/2015 | US20150024325 Lithographic printing original plate |
| 01/22/2015 | US20150024308 Flexible nanoimprint mold, method for fabricating the same, and mold usage on planar and curved substrate |
| 01/22/2015 | US20150024173 Photosensitive resin composition, method for manufacturing patterned cured film, and electronic component |
| 01/22/2015 | US20150022808 System for distributing and controlling color reproduction at multiple sites |
| 01/22/2015 | US20150022799 Microlithographic imaging optical system including multiple mirrors |
| 01/22/2015 | US20150022798 Illumination system for microlithography |
| 01/22/2015 | US20150022797 Lithography apparatus, lithography method, and article manufacturing method |
| 01/22/2015 | US20150022796 Interferometer, lithography apparatus, and method of manufacturing article |
| 01/22/2015 | US20150022795 Power supply for a discharge produced plasma euv source |
| 01/22/2015 | US20150022794 Semiconductor device manufacturing method and semiconductor device manufacturing apparatus |
| 01/22/2015 | US20150022793 Lithography apparatus, lithography method, lithography system, storage medium, and article manufacturing method |
| 01/22/2015 | US20150022792 Microlithographic apparatus and method of changing an optical wavefront in such an apparatus |
| 01/22/2015 | US20150022791 Exposure apparatus and transfer characteristics measuring method |
| 01/22/2015 | US20150022790 Continuously Producing Digital Micro-Scale Patterns On A Thin Polymer Film |
| 01/22/2015 | US20150021597 Photopatternable Materials and Related Electronic Devices and Methods |
| 01/22/2015 | US20150021289 Photoresist composition, coated substrate, and method of forming electronic device |
| 01/22/2015 | DE102014202132A1 Vergrößernde abbildende Optik sowie EUV-Maskeninspektionssystem mit einer derartigen abbildenden Optik Magnifying imaging optics and EUV mask inspection system with such imaging optics |
| 01/22/2015 | DE102013214008A1 Optikanordnung Optics assembly |
| 01/22/2015 | DE102013213842A1 Optisches Bauelement Optical component |
| 01/22/2015 | DE102013107571A1 Verfahren und Vorrichtung zum Herstellen eines dreidimensionalen Objekts sowie Belichtungsmaskenerzeugungseinrichtung Method and apparatus for producing a three-dimensional object and exposure mask generating means |
| 01/22/2015 | DE102013107570A1 Verfahren und Vorrichtung zum Herstellen eines dreidimensionalen Objekts sowie Belichtungsmaskenerzeugungseinrichtung Method and apparatus for producing a three-dimensional object and exposure mask generating means |
| 01/22/2015 | DE102013107568A1 Verfahren und Vorrichtung zum Herstellen eines dreidimensionalen Objekts sowie Belichtungsmaskenerzeugungseinrichtung Method and apparatus for producing a three-dimensional object and exposure mask generating means |
| 01/21/2015 | EP2827194A1 Apparatus and method for forming lubricant recess having minute configuration in curved inner surface |
| 01/21/2015 | EP2827193A1 Continuously producing digital micro-scale patterns on a thin polymer film |
| 01/21/2015 | EP2827192A1 Continuously producing digital micro-scale patterns on a thin polymer film |
| 01/21/2015 | EP2826826A1 Composition for forming a coating type BPSG film, substrate formed a film by said composition, and patterning process using said composition |
| 01/21/2015 | EP2825913A1 Photoresist stripping and cleaning composition, method of its preparation and its use |
| 01/21/2015 | CN204116807U 适用于大面积奈米结构制作的拼接式雷射干涉微影设备 Suitable for large-area nanostructures produced by laser interference lithography tiled equipment |
| 01/21/2015 | CN204116806U 一种滚筒式纳米压印设备 A drum-type nano-imprint apparatus |
| 01/21/2015 | CN104303110A 切断机构、接合机构、基板处理系统、基板处理装置及基板处理方法 Cutting mechanism, the engagement mechanism, the substrate processing system, the substrate processing apparatus and a substrate processing method |
| 01/21/2015 | CN104303109A 热调节单元、光刻设备以及器件制造方法 Thermal conditioning unit, the lithographic apparatus and device manufacturing method |
| 01/21/2015 | CN104303108A 利用负对比组合物的多光子固化方法 The use of negative comparative compositions multiphoton curing method |
| 01/21/2015 | CN104303107A 用于形成抗蚀剂下层膜的组合物 The composition for forming a resist underlayer film of |
| 01/21/2015 | CN104303106A 感光性树脂组合物、感光性元件、抗蚀图案的形成方法以及配线板的制造方法 Method for producing a photosensitive resin composition, a photosensitive element, resist pattern forming method and the circuit board |
| 01/21/2015 | CN104303105A 液态制版方法 Liquid plate method |
| 01/21/2015 | CN104303104A 大面积压印光刻 A large area of imprint lithography |
| 01/21/2015 | CN104303103A 用于薄膜嵌段共聚物的取向控制的酸酐共聚物的面涂层 For controlling alignment of the top coat film anhydride copolymer block copolymer |
| 01/21/2015 | CN104302708A 辐射固化和热固化的树脂组合物、及阻焊干膜 Radiation curing and thermal curing of the resin composition, and the dry film solder mask |
| 01/21/2015 | CN104298081A 一种曝光机 An exposure machine |
| 01/21/2015 | CN104298080A 一种无掩膜激光直写叠加曝光方法 A non-laser direct writing mask overlay exposure method |
| 01/21/2015 | CN104298079A 一种曝光系统及曝光方法 An exposure system and exposure method |
| 01/21/2015 | CN104298078A 利用发光二极管单片阵列来提供高分辨率图像的系统和方法 The use of light-emitting diode array chip to provide a system and method for high-resolution images |
| 01/21/2015 | CN104298077A 滚动灰度光刻的dmd动作方法 Grayscale photolithography dmd rolling action method |
| 01/21/2015 | CN104298076A 一种光触媒材料 One kind of photocatalyst material |
| 01/21/2015 | CN104298075A 着色感光性树脂组合物、包含其的滤色器和显示装置 The colored photosensitive resin composition, which comprises a color filter and a display device |
| 01/21/2015 | CN104298074A 透明像素形成用感光性树脂组合物及使用其形成的滤色器 Transparent pixels forming a photosensitive resin composition and the use of a color filter formed |
| 01/21/2015 | CN104298073A 着色固化性树脂组合物 Colored curable resin composition |
| 01/21/2015 | CN104298072A 着色固化性树脂组合物 Colored curable resin composition |
| 01/21/2015 | CN104298071A 滤色器外覆层用树脂组合物、使用其的外覆层、图像显示元件及图像显示元件的制造方法 Color filter overcoat layer resin composition, using the same cover layer, an image display device and method of manufacturing an image display device |
| 01/21/2015 | CN104298070A 用于制备平版印刷版的方法 The method for preparing a lithographic printing plate |
| 01/21/2015 | CN104298011A 一种掩模板及使用掩模板制作光阻间隔物的方法 One kind of mask making and using the photoresist mask spacer approach |
| 01/21/2015 | CN104297843A 微机电可调氮化物谐振光栅制备方法 Nitride resonant MEMS tunable grating preparation |
| 01/21/2015 | CN104292889A 功能材料及其制备方法、树脂组合物、膜材、显示器件 Functional material and preparation method, the resin composition, membrane, display devices |
| 01/21/2015 | CN104290483A 平印版原版及其印刷方法 Lithographic printing plate precursor and method |
| 01/21/2015 | CN103488061B 极紫外光刻机中匹配多个物镜的照明系统调整与设计方法 EUV lithography machine to match multiple lens system to adjust lighting and design method |
| 01/21/2015 | CN103365124B 曝光对准方法 Exposure alignment method |
| 01/21/2015 | CN103353627B 微透镜阵列模具的制作方法 The method of making a microlens array mold |
| 01/21/2015 | CN103176366B 一种光刻机硅片台的主动驱动线缆台 An initiative to drive silicon lithography Taiwan cable station |
| 01/21/2015 | CN103163740B 一种倾斜物体位置测量装置 One kind of object position measuring device tilt |
| 01/21/2015 | CN103135359B 一种光机系统对心装置和方法 An optical system for cardiac devices and methods |
| 01/21/2015 | CN103135358B 一种多光源的干涉曝光装置 Interference exposure apparatus of a multi-light source |
| 01/21/2015 | CN103105741B 对位补偿装置及曝光装置 Alignment compensation device and exposure apparatus |
| 01/21/2015 | CN103092005B 玻璃基板的曝光对位方法 Exposure to the position of a glass substrate |
| 01/21/2015 | CN103076718B 感光性树脂组合物、感光性树脂层压体、抗蚀图案形成方法、以及印刷线路板、引线框、半导体封装体和凹凸基板的制造方法 The photosensitive resin composition, a photosensitive resin laminate, a resist pattern forming method and printed wiring board, lead frame, and a method of manufacturing a semiconductor package substrate irregularities |
| 01/21/2015 | CN103034073B 带有浸液回收装置和激光干涉仪的硅片台双台交换系统 Infusion sets with silicon laser interferometer recovery and dual stage switching system |
| 01/21/2015 | CN103034072B 待曝光基材及底片的对位方法及影像检测对位系统 To position the substrate and the film to be exposed methods of detection and imaging alignment system |
| 01/21/2015 | CN102998906B 光刻机的支撑结构及其制造方法 The support structure and manufacturing method of lithography |
| 01/21/2015 | CN102939566B 微光刻投射曝光设备的光学系统 Microlithographic projection exposure apparatus optical system |
| 01/21/2015 | CN102902165B 叠层虚拟掩模版的装置及集成硅光子集成芯片的方法 Apparatus and method for integrated silicon photonic integrated chip stack virtual reticle |
| 01/21/2015 | CN102859400B 颜料分散液、彩色滤光片用负型抗蚀剂组合物、彩色滤光片、液晶显示装置以及有机发光显示装置 Pigment dispersion type color filter, a negative resist composition, color filter, liquid crystal display devices and organic light emitting display device |
| 01/21/2015 | CN102809902B 一种光刻机平衡质量系统 A lithographic machine mass balance system |
| 01/21/2015 | CN102687077B 光学成像写入系统 Write optical imaging system |
| 01/21/2015 | CN102681349B 工件台 Worktable |
| 01/21/2015 | CN102627018B 平版印刷版原版及其制版方法 Lithographic printing plate precursor and plate method |
| 01/21/2015 | CN102603967B 水溶性树脂组合物及微细图形的形成方法 The method of forming a water-soluble resin composition and a fine pattern |
| 01/21/2015 | CN102569037B 一种提高金属绝缘层金属电容层多次光刻重复性的方法 A reproducible method multiple lithographic metal insulation layer metal capacitance increase |
| 01/21/2015 | CN102566307B 局部曝光方法和局部曝光装置 Local exposure method and local exposure device |
| 01/21/2015 | CN102566299B 包括通过投影光学装置的光操纵的依赖图案的邻近匹配/调节 Including the manipulation of light through adjacent matching projection optical apparatus dependent pattern / adjustment |
| 01/21/2015 | CN102566278B 硅氧烷聚合物组合物、固化膜以及固化膜的形成方法 Silicone polymer composition, a cured film and a cured film forming method |
| 01/21/2015 | CN102545528B 平面电机及应用其的掩模台系统 Planar motor and apply its mask table system |
| 01/21/2015 | CN102540779B 用于光刻机中的掩模版固定装置及掩模版固定方法 Lithography reticle in reticle fixing means and a method for fixing |
| 01/21/2015 | CN102422228B 抗蚀剂剥离组合物和生产电气装置的方法 Resist stripping composition and method for the production of electrical equipment |
| 01/21/2015 | CN102402080B 液晶面板及其制作方法 LCD panel and manufacturing method thereof |
| 01/21/2015 | CN102388343B 用于投射曝光系统的具有至少一个磁体的致动器、致动器的制造方法、以及具有磁体的投射曝光系统 An actuator for the projection exposure system having at least one magnet, the manufacturing method of the actuator, and a projection exposure system having a magnet |
| 01/21/2015 | CN102314093B 局部曝光装置和局部曝光方法 Partial exposure apparatus and exposure method topical |
| 01/21/2015 | CN102290365B 基板保持装置、具备其之曝光装置及方法、元件制造方法 Substrate holding apparatus, which includes the exposure apparatus and method, device manufacturing method |
| 01/21/2015 | CN102262359B 照射系统和光刻设备 Illumination system and lithography equipment |
| 01/21/2015 | CN102236264B 流体处理结构、光刻设备和器件制造方法 Fluid handling structure, a lithographic apparatus and device manufacturing method |
| 01/21/2015 | CN102234247B 新化合物、放射线敏感性组合物、固化膜及其形成方法 The new compounds, radiation-sensitive composition, and a cured film forming method |
| 01/21/2015 | CN102224460B 成像颗粒组合物、纸张和方法以及使用双波长光对纸张成像的方法 Imaging particle compositions, methods, and the use of paper and dual wavelength optical imaging method for paper |
| 01/21/2015 | CN102161638B 化合物以及含有该化合物的放射线敏感性组合物 Compound and a radiation-sensitive composition comprising the compound |