| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/08/2015 | DE102013212780A1 Spiegel für eine mikrolithographische Projektionslichtungsanlage sowie Verfahren zur Bearbeitung eines Spiegels Mirrors for a microlithography projection clearing system and method for processing a mirror |
| 01/08/2015 | DE102013107192A1 Reflektives optisches Element für streifenden Einfall im EUV-Wellenlängenbereich The reflective optical element for grazing incidence in the EUV wavelength range |
| 01/07/2015 | EP2821855A1 Lithographic printing plate original and method for producing lithographic printing plate |
| 01/07/2015 | EP2821854A1 Lithographic printing plate precursor, and production method for lithographic printing plate |
| 01/07/2015 | EP2821436A1 Transparent composite composition |
| 01/07/2015 | EP2821421A1 Acidified mono alkyl naphthalene formaldehyde resin |
| 01/07/2015 | EP2821403A1 Acrylic acid ester derivative and method for producing same, intermediate and method for producing same, high-molecular-weight compound, and photoresist composition |
| 01/07/2015 | EP2820480A1 Multiphoton curing methods using negative contrast compositions |
| 01/07/2015 | EP2820479A1 Method of processing a photosensitive structure |
| 01/07/2015 | EP2820478A1 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, photomask blank and method of forming pattern |
| 01/07/2015 | EP2820477A1 Clean flexographic printing plate and method of making the same |
| 01/07/2015 | CN204086814U 一种pcb防焊显影线 Developing one kind pcb solder wire |
| 01/07/2015 | CN204086813U 显影冲版废水再利用循环处理系统 The developing red version wastewater reuse loop processing system |
| 01/07/2015 | CN204086812U 一种用于曝光的新型光刻板夹具 The new light fixtures for the exposure of stereotypes |
| 01/07/2015 | CN204086811U 曝光设备的光源装置 A light source unit of the exposure apparatus |
| 01/07/2015 | CN204086810U 曝光机 Exposure Machine |
| 01/07/2015 | CN204086809U 曝光设备的光源模块 A light source module exposure apparatus |
| 01/07/2015 | CN204086808U 一种应用在涂胶机上的光刻胶过滤回收循环系统 An application on a photoresist coater recycled filtration system |
| 01/07/2015 | CN204086807U 感光材料版涂底胶装置 Photosensitive material coated primer device version |
| 01/07/2015 | CN104272193A 稀释剂组合物 Diluent composition |
| 01/07/2015 | CN104272192A 用于改变多个辐射束的性质的组件、光刻仪器、改变多个辐射束的性质的方法以及器件制造方法 The method for changing the nature of the components of a plurality of radiation beam lithography apparatus, a plurality of radiation beam to change the nature of the manufacturing method and device |
| 01/07/2015 | CN104272191A 光刻设备及器件制造方法 Lithographic apparatus and device manufacturing method |
| 01/07/2015 | CN104272190A 衬底保持器和光刻装置 Substrate holder and the lithographic apparatus |
| 01/07/2015 | CN104272189A 化学增幅型抗蚀剂组合物,使用化学增幅型抗蚀剂组合物的抗蚀剂膜,涂布抗蚀剂的掩模坯,形成光掩模和图案的方法,以及制造电子器件的方法和电子器件 Chemically amplified resist composition, a resist film using a chemically-amplified resist composition, a resist coated mask blank, a photomask and a method for forming a pattern, and a method of manufacturing an electronic device, and electronic devices |
| 01/07/2015 | CN104272188A 感光性树脂组合物、硬化膜的形成方法、硬化膜、有机el显示装置及液晶显示装置 The photosensitive resin composition, cured film forming method, cured film, an organic el display device and liquid crystal display device |
| 01/07/2015 | CN104272187A 织构化具有大表面积的基底的方法 Textured substrate having a large surface area method |
| 01/07/2015 | CN104272186A 清洁柔性印刷版及其制备方法 Clean the flexographic printing plate and its preparation method |
| 01/07/2015 | CN104271642A 部分水解缩合物、拒墨剂、负型感光性树脂组合物、固化膜、分隔壁和光学元件 Partially hydrolyzed condensate, the ink repellent agent, a negative-type photosensitive resin composition, a cured film, the partition wall and the optical element |
| 01/07/2015 | CN104267597A 超精密运动平台机械谐振的抑制方法 Ultra-precision motion platform mechanical resonance suppression method |
| 01/07/2015 | CN104267582A 一种用于dmd控制的电路板系统 A control circuit board system dmd |
| 01/07/2015 | CN104267581A 一种光学系统气压分段补偿像差的划分方法 An optical system pressure sectional method of compensating aberrations |
| 01/07/2015 | CN104267580A 掩模板、阵列基板及其制备方法、显示装置 Mask, array substrate and its preparation method, the display device |
| 01/07/2015 | CN104267579A 米级光栅玻璃光刻胶精密涂覆方法 Meter-scale raster precision glass photoresist coating method |
| 01/07/2015 | CN104267578A 一类含芴的硫鎓盐类光生酸剂、制备方法及其应用 A class of sulfonium salts containing fluorene photoacid generator, preparation method and application |
| 01/07/2015 | CN104267577A 一种激光制网机 A laser system Machine |
| 01/07/2015 | CN104267575A 光掩模储放装置 Photomask stock unit |
| 01/07/2015 | CN104267518A 液晶显示面板及其制造方法 A liquid crystal display panel and manufacturing method thereof |
| 01/07/2015 | CN104267495A 驱动微反射镜的方法和装置 Micromirror driving method and apparatus |
| 01/07/2015 | CN104267426A 电子束斑的测量方法和设备 Electron beam spot measurement methods and equipment |
| 01/07/2015 | CN104262219A 硫醇-烯光固化树脂及其制备方法 Thiol - ene light-cured resin and its preparation method |
| 01/07/2015 | CN104262193A 一种二硝基二苯胺重氮树脂、含有该树脂的光刻胶组合物及其制备方法 A two Nitrodiphenylamine Diazoresin, containing the photoresist resin composition and its preparation method |
| 01/07/2015 | CN103399466B 一种工件台宏动部分三自由度解耦建模方法 A work station macro move part three degrees of freedom decouple modeling |
| 01/07/2015 | CN103324037B 一种曝光装置及其曝光方法 An exposure apparatus and exposure method |
| 01/07/2015 | CN103235489B 可变周期多光束干涉光刻的方法 Variable cycle multi-beam interference lithography method |
| 01/07/2015 | CN103149614B 一种高温光栅的制作及转移方法 Production and transfer method for high-temperature grating |
| 01/07/2015 | CN103116250B 带激光干涉仪测量的具有六自由度粗动台的掩膜台系统 Mask table system with six degrees of freedom with coarse movement stage laser interferometer measurement |
| 01/07/2015 | CN103105743B 带平面衍射光栅测量的具有六自由度粗动台的掩膜台系统 Mask table system with six degrees of freedom with a flat platform coarse measurement of diffraction grating |
| 01/07/2015 | CN103092003B 一种激光干涉光刻系统 A laser interference lithography system |
| 01/07/2015 | CN103092002B 一种具有图形锁定功能的激光干涉光刻系统 Laser having a lock function graphics interference lithography system |
| 01/07/2015 | CN103019042B 改善高透光率掩膜板套刻精度稳定性的方法 Improve the high light transmittance of the mask overlay accuracy stability methods |
| 01/07/2015 | CN102967997B 用于确定重叠误差的方法和设备 Means for determining overlay error of a method and apparatus |
| 01/07/2015 | CN102955373B 接近式曝光装置及接近式曝光方法 Close proximity type exposure apparatus and exposure method |
| 01/07/2015 | CN102844712B 加成共聚物、感光性树脂组合物以及滤色器 Addition copolymer, a photosensitive resin composition and the color filters |
| 01/07/2015 | CN102819195B 曝光装置和曝光方法、以及曝光单元及使用该单元的曝光方法 Exposure apparatus and exposure method, and an exposure unit and an exposure method using the cell |
| 01/07/2015 | CN102782001B 可自成像膜形成聚合物及其组合物和由此制得的器件和结构 Available from the imaging device and the film-forming polymer and its composition and structure of the thus obtained |
| 01/07/2015 | CN102439523B 用于双重图案化的方法和材料 Methods and materials for double patterning |
| 01/07/2015 | CN102402128B 调整台移动方案中的速度和/或路线的方法和光刻设备 Methods and lithography equipment adjustment sets the speed of mobile solutions and / or routes |
| 01/07/2015 | CN102360167B 曝光装置和曝光方法以及器件制造方法 Exposure apparatus and exposure method, and device manufacturing method |
| 01/07/2015 | CN102339774B 基板清洗装置、涂覆显影装置以及基板清洗方法 Substrate cleaning apparatus, a developing device and the coating substrate cleaning method |
| 01/07/2015 | CN102324397B 衬底处理系统以及衬底搬送方法 A substrate processing system and a substrate transfer method |
| 01/07/2015 | CN102236273B 光掩模与基材的对位方法以及布线电路板的制造方法 Position method for a photomask to a substrate and method of manufacturing a wiring circuit board |
| 01/07/2015 | CN102033436B 微光刻投射系统 Microlithography projection system |
| 01/07/2015 | CN101878452B 剥离液组合物、使用了该剥离液组合物的树脂层的剥离方法 Stripping liquid composition, using a lift-off method of the stripping liquid composition of the resin layer |
| 01/07/2015 | CN101738863B 感光性树脂组合物及显示装置 The photosensitive resin composition and a display device |
| 01/07/2015 | CN101622019B 亲水性涂层 A hydrophilic coating |
| 01/06/2015 | US8930860 Layout decomposition method and method for manufacturing semiconductor device applying the same |
| 01/06/2015 | US8930172 Methods and systems for parameter-sensitive and orthogonal gauge design for lithography calibration |
| 01/06/2015 | US8930011 Method of measuring an overlay of an object |
| 01/06/2015 | US8929007 Color filter and manufacturing method thereof |
| 01/06/2015 | US8928980 Micromirror arrangement having a coating and method for the production thereof |
| 01/06/2015 | US8928972 Reflective optical element for EUV lithography |
| 01/06/2015 | US8928871 Reflective mask |
| 01/06/2015 | US8928861 Lithographic apparatus |
| 01/06/2015 | US8928860 Lithographic apparatus having a chuck with a visco-elastic damping layer |
| 01/06/2015 | US8928859 Illumination system of a microlithographic projection exposure apparatus |
| 01/06/2015 | US8928857 Lithographic apparatus and method of operating the apparatus |
| 01/06/2015 | US8928856 Exposure apparatus and device fabrication method |
| 01/06/2015 | US8928855 Lithographic apparatus comprising an internal sensor and a mini-reactor, and method for treating a sensing surface of the internal sensor |
| 01/06/2015 | US8927949 Measuring apparatus, drawing apparatus, and article manufacturing method |
| 01/06/2015 | US8927906 Heating device, coating/developing system, heating method, coating/developing method, and recording medium having program for executing heating method or coating/developing method |
| 01/06/2015 | US8927870 Suspension board with circuit and producing method thereof |
| 01/06/2015 | US8927681 Coating composition for use with an overcoated photoresist |
| 01/06/2015 | US8927648 Surface modification of pigments and compositions comprising the same |
| 01/06/2015 | US8927201 Multilayer resist process pattern-forming method and multilayer resist process inorganic film-forming composition |
| 01/06/2015 | US8927200 Double patterning method |
| 01/06/2015 | US8927197 Negative-working lithographic printing plate precursors |
| 01/06/2015 | US8927195 Photosensitive composition, planographic printing plate precursor, polyurethane, and method for producing polyurethane |
| 01/06/2015 | US8927194 Chemical amplified photoresist composition |
| 01/06/2015 | US8927193 Coloring photosensitive composition, lithographic printing plate precursor and plate making method |
| 01/06/2015 | US8927192 Production method of resist composition for lithography |
| 01/06/2015 | US8927191 Resist composition, method of forming resist pattern and polymeric compound |
| 01/06/2015 | US8927190 Photoresist comprising nitrogen-containing compound |
| 01/06/2015 | US8927189 Photoresist composition and method of manufacturing display device using same |
| 01/06/2015 | US8927182 Photosensitive resist composition for color filters for use in electronic paper display devices |
| 01/06/2015 | US8927179 Optical member for EUV lithography, and process for production of reflective layer-equipped substrate |
| 01/06/2015 | US8927178 Process for preparing a polymeric relief structure |
| 01/06/2015 | US8927147 Negative electrode base member |
| 01/06/2015 | US8927090 Method for bonding bodies and composite body |
| 01/06/2015 | US8927058 Photoresist coating process |
| 01/06/2015 | US8926888 Fluorinated silazane release agents in nanoimprint lithography |