Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
07/2012
07/04/2012CN101776848B Liquid immersion lithography system
07/04/2012CN101754588B Method for flattening film layer
07/04/2012CN101752162B Photosensitive conductive paste, and electrode and plasma display panel formed using the same
07/04/2012CN101746957B Method of glass surface fine processing
07/04/2012CN101740343B High-accuracy composite disk structure and application thereof
07/04/2012CN101738722B Method for manufacturing micro-opto-electro-mechanical system-based wave-adjustable harmonic filter
07/04/2012CN101713930B Lithographic apparatus and lorentz actuator
07/04/2012CN101697065B Development device and developing method
07/04/2012CN101694564B Lithographic apparatus and device manufacturing method
07/04/2012CN101657761B Photoresist developing solution
07/04/2012CN101657506B Polyimide composition and flexible wiring board
07/04/2012CN101641644B Composition for forming under-resist film
07/04/2012CN101636049B Manufacturing method of shell
07/04/2012CN101611068B Process for producing photosensitive resin, photosensitive resin obtained by the process, and photosensitive resin composition
07/04/2012CN101598896B Printing method using a structure coated with ultraviolet radiation responsive material
07/04/2012CN101595071B Photosensitive glass paste and chip part with multilayer wiring
07/04/2012CN101563651B Photosensitive element
07/04/2012CN101560323B Composition for formation of underlayer film for lithography containing epoxy compound and carboxylic acid compound
07/04/2012CN101551602B Substrate cleaning method and substrate cleaning apparatus
07/04/2012CN101548239B Negative-working radiation-sensitive compositions and imageable materials
07/04/2012CN101546133B Exposure device and an exposure method
07/04/2012CN101546129B Method for monitoring exposure device by adopting side wall angles
07/04/2012CN101546120B White cured resin composition and printed circuit board having insulation layer formed with the same
07/04/2012CN101533228B Method and lithographic apparatus for measuring and acquiring height data relating to a substrate surface
07/04/2012CN101526757B A method of providing alignment marks on a substrate, device production and photoetching devices
07/04/2012CN101506737B Getter and cleaning arrangement for a lithographic apparatus and method for cleaning a surface
07/04/2012CN101498902B Substrate transfer appartus
07/04/2012CN101482698B Resist composition
07/04/2012CN101479662B Printing form precursor and process for preparing a stamp from the precursor
07/04/2012CN101454722B Negative-working radiation-sensitive compositions and imageable materials
07/04/2012CN101416111B Photosensitive composition, photosensitive film, method of forming permanent pattern, and printed wiring board
07/04/2012CN101382613B Color filter manufacturing method
07/04/2012CN101371196B Antireflective coating material
07/04/2012CN101369095B Exposure manufacture process, production method of image element structure and semi-modulation type photomask using the same
07/04/2012CN101354538B Lithographic apparatus and contamination removal or prevention method
07/04/2012CN101320213B Light sensitive resin composition and flexible printed circuit board produced with the same
07/04/2012CN101315524B Substrate carrying device
07/04/2012CN101312794B Process for removing material from substrates
07/04/2012CN101299131B Preparation of chemical reinforced type resist
07/04/2012CN101292196B Photosensitive resin composition and color filter
07/04/2012CN101241316B Lithography device and its manufacture method
07/04/2012CN101236357B Chemically amplified corrosion-resisitng agent composition
07/04/2012CN101221279B Projection objectives having mirror elements with reflective coatings
07/04/2012CN101183219B Alkali developable paste composition
07/04/2012CN101154045B Photopolymerization type photosensitive lithographic printing plate precursor
07/04/2012CN101154042B Curing composition for nano-imprint lithography and pattern forming method using the same
07/04/2012CN101131540B Photonasty composition and shading film of display using the same
07/04/2012CN101097320B Liquid crystal display device and method of fabricating the same
07/04/2012CN101086617B Light solidifying composition and burned object pattern obtained using the same
07/04/2012CN101067723B Radiation sensitive composition for forming a colored layer, color filter and color liquid crystal display device
07/04/2012CN101044185B Photosensitive compositions based on polycyclic polymers
07/04/2012CN101038443B Lithographic apparatus, control system and device manufacturing method
07/04/2012CN101030038B Polymer solutions, aqueous developable thick film compositions, processes of making and electrodes formed thereof
07/04/2012CN101021689B Semiconductor manufacturing method and related apparatus
07/04/2012CN101002127B Projection optical system, exposing method and device
07/04/2012CN101000467B Resist remover composition and resist removing method
07/03/2012US8212988 Projection objective for microlithography
07/03/2012US8211984 Ring-opening metathesis polymer, hydrogenated product thereof, method for preparing the same, and use thereof
07/03/2012US8211957 Negative pattern of carbon nanotubes and carbon nanotube composite comprising surface-modified carbon nanotubes
07/03/2012US8211627 Method and apparatus for structuring a radiation-sensitive material
07/03/2012US8211626 Reducing poisoning of the photoresist during imaging by treating the surface of the dielectric anti-reflection coating film with a hydrogen or helium-containing plasma which is capable of removing hydroxyl groups
07/03/2012US8211624 Method for pattern formation and resin composition for use in the method
07/03/2012US8211623 Ink composition, inkjet recording method, printed material, method for producing planographic printing plate, and planographic printing plate
07/03/2012US8211622 Conditioning of a litho strip
07/03/2012US8211621 Antireflective coating compositions
07/03/2012US8211620 Thermoplastic material comprising polychromic substances
07/03/2012US8211619 Positive photosensitive composition, positive permanent resist, and method for producing positive permanent resist
07/03/2012US8211618 Positive resist composition and patterning process
07/03/2012US8211617 Solid inks for printed masks
07/03/2012US8211616 Positive resist composition and method of forming resist pattern
07/03/2012US8211615 Copolymer for immersion lithography and compositions
07/03/2012US8211614 Photoresist composition and patterning method thereof
07/03/2012US8211613 prints, color filters, electronics, layer insulation films, wire covering films, optics, circuits, antireflection films, holograms and construction materials comprising a cured mixture of photosensitive resins and photoiniitiators having a naphthalimide structure
07/03/2012US8211612 Fluorine-containing polymer coating composition, method for forming fluorine-containing polymer film using coating composition, and method for forming photoresist or lithographic pattern
07/03/2012US8211598 Black photosensitive resin composition, and color filter and method of producing the same
07/03/2012US8211597 Color photoresist with gold nanoparticles and color filters made thereby
07/03/2012US8211596 Optically variable security device
07/03/2012CA2560084C Method for establishing a light beam with substantially constant luminous intensity
06/2012
06/28/2012WO2012087352A2 Superhydrophobic and superoleophobic nanosurfaces
06/28/2012WO2012087075A2 Method for forming fine pattern in large area using laser interference exposure, method for non-planar transfer of the fine pattern formed by the method, and article to which the fine pattern is transferred by the transfer method
06/28/2012WO2012086959A2 Photo-curable resin composition for printing process
06/28/2012WO2012086850A1 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition
06/28/2012WO2012086849A1 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition
06/28/2012WO2012086610A1 Photosensitive resin composition, partition wall, color filter, and organic el element
06/28/2012WO2012086410A1 Photosensitive transparent composition for color filter of solid-state imaging device, and production method of color filter of solid-state imaging device, color filter of solid-state imaging device, and solid-state imaging device, each using the same
06/28/2012WO2012086371A1 Photosensitive resin composition
06/28/2012WO2012086370A1 Photosensitive resin composition
06/28/2012WO2012086266A1 Flexographic printing original plate
06/28/2012WO2012085845A1 System and method for production of nanostructures over large areas
06/28/2012WO2012085164A1 Nanoimprint lithography method
06/28/2012WO2012084824A1 PROCESS OF PREPARING PRODUCT BASED ON COPPER PHTHALOCYANINE (CuPc) PARTICLES
06/28/2012WO2012084811A1 A curable jettable fluid for making a flexographic printing master
06/28/2012WO2012084786A1 A curable jettable fluid for making a flexographic printing master
06/28/2012WO2012084706A1 A curable jettable fluid for making a flexographic printing master
06/28/2012WO2012084675A1 Arrangement for mounting an optical element
06/28/2012WO2012084558A1 Methods for providing patterned orientation templates for self-assemblable polymers for use in device lithography
06/28/2012WO2012084457A2 Method of controlling a patterning device in a lithographic apparatus, device manufacturing method and lithographic apparatus
06/28/2012WO2012084363A1 Method and system for monitoring the integrity of an article, and euv optical apparatus incorporating the same
06/28/2012WO2012084142A1 Method for characterizing a structure on a mask and device for carrying out said method
06/28/2012WO2012083776A1 Photoresist composition, led device and method of preparing the same
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