Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
06/2012
06/28/2012WO2012083587A1 Cleaning liquid for thick film photoresists
06/28/2012WO2012083578A1 Device and method for nano-imprinting full wafer
06/28/2012WO2012059087A3 Arrangement for the production of structured substrates
06/28/2012WO2012041457A3 Projection exposure tool for microlithography and method for microlithographic imaging
06/28/2012WO2012039606A9 Lithography system arranged on a foundation, and method for arranging a lithography system on said foundation
06/28/2012WO2012036477A3 Light-sensitive resin composition, a dry film solder resist and a circuit substrate
06/28/2012WO2012031058A3 Processes for making high resolution, solvent resistant, thin elastomeric printing plates
06/28/2012US20120164587 Hybrid lithographic method for fabricating complex multidimensional structures
06/28/2012US20120164586 Patern forming method
06/28/2012US20120164585 Local exposure method and local exposure apparatus
06/28/2012US20120164584 Method of Improving Print Performance in Flexographic Printing Plates
06/28/2012US20120164583 Drawing apparatus and method of manufacturing article
06/28/2012US20120164582 Radiation-sensitive composition and compound
06/28/2012US20120164581 Negative resist composition, method of forming resist pattern and polymeric compound
06/28/2012US20120164580 Novel compound and method of producing the same, acid generator, resist composition and method of forming resist pattern
06/28/2012US20120164579 Salt, photoresist composition and process for producing photoresist pattern
06/28/2012US20120164578 Resist composition, method of forming resist pattern
06/28/2012US20120164577 Positive resist composition and patterning process
06/28/2012US20120164576 Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern
06/28/2012US20120164575 Cyclic compound, manufacturing method therefor, radiation-sensitive composition, and method for forming a resist pattern
06/28/2012US20120164574 Actinic-ray-sensitive or radiation-sensitive resin composition, and actinic-ray-sensitive or radiation-sensitive film and pattern forming method using the same
06/28/2012US20120164573 Actinic-ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same
06/28/2012US20120164572 Coating method, coating device, and storage medium
06/28/2012US20120164390 Processes to pattern small features for advanced patterning needs
06/28/2012US20120163699 Mask determination method, exposure method, and semiconductor device manufacturing method
06/28/2012US20120162657 Coherency Reduction for Bandwidth Measurement
06/28/2012US20120162625 Catadioptric projection objective with intermediate images
06/28/2012US20120162590 Liquid crystal display devices and methods of manufacturing liquid crystal display devices
06/28/2012US20120161088 Photosensitive Resin Composition and Color Filter Using the Same
06/28/2012US20120161087 Photosensitive Resin Composition and Color Filter Using the Same
06/28/2012DE10205189B4 Verfahren zur Erzeugung von extrem ultravioletter Strahlung auf Basis eines strahlungsemittierenden Plasmas A method of generating extreme ultraviolet radiation, based on a radiation-emitting plasma
06/28/2012DE102011087851A1 Verschlusseinrichtung für eine Lithographievorrichtung und Lithographievorrichtung Closure device for a lithographic apparatus and lithographic apparatus
06/27/2012EP2469340A2 Lithographic apparatus and device manufacturing method
06/27/2012EP2469339A1 Lithographic apparatus and device manufacturing method
06/27/2012EP2469338A1 Resist underlayer film-forming composition for lithography containing resin having aliphatic ring and aromatic ring
06/27/2012EP2469337A1 Positive photosensitive resin composition, method for forming pattern, and electronic component
06/27/2012EP2468780A1 Copolymer and top coating composition
06/27/2012EP2468742A1 Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compound
06/27/2012EP2467756A1 Substrates and mirrors for euv microlithography, and methods for producing them
06/27/2012EP2467755A1 Apparatus and method for a sub microscopic and optically variable image carrying device
06/27/2012EP2467741A1 A reflective optical element and method of producing it
06/27/2012EP2041625B1 Illumination system of a microlithographic projection exposure apparatus
06/27/2012EP1454194B1 Method and apparatus for patterning a workpiece
06/27/2012CN1928722B Testing mark for detecting projection object lens image errors, mask and detection method
06/27/2012CN102523756A Photosensitive resin composition, and stencil for screen printing using said photosensitive resin composition
06/27/2012CN102522316A Discharge lamp, cable for connection, light source device, and exposure device
06/27/2012CN102520594A Marker structure used for Alignment or superposition, mask pattern for defining, photolithography projection apparatus using mask pattern
06/27/2012CN102520593A Alignment verification method for exposure machine
06/27/2012CN102520592A Exposure method, exposure apparatus, method for manufacturing device, and film evaluation method
06/27/2012CN102520591A Negative photoresist-based diffuser photo-etching process
06/27/2012CN102520590A Production method of light shield
06/27/2012CN102520589A Exposure method and apparatus, and device manufacturing method
06/27/2012CN102520588A Movable body drive method and movable body drive system, exposure method and apparatus
06/27/2012CN102520587A Two-workpiece-platform rotary exchange method and device based on cable-box anti-rotation mechanisms
06/27/2012CN102520586A Method of creating photolithographic structures with developer-trimmed hard mask
06/27/2012CN102520585A Alkali soluble transparent resin composition
06/27/2012CN102520584A Photosensitive benzocyclobutene resin compound and preparation method thereof as well as patterning method thereof
06/27/2012CN102520583A Photoresist compositions comprising acetals and ketals as solvents
06/27/2012CN102520582A White curable resin composition
06/27/2012CN102520581A Method for forming photoresist pattern
06/27/2012CN102520580A Method for forming photoresist pattern
06/27/2012CN102520551A Method and system for forming alignment film areas on basis of UV (ultraviolet) exposure
06/27/2012CN102520521A Three-stage two-dimensional photonic crystal beam compression device and manufacturing method thereof
06/27/2012CN102520482A Critical method for manufacturing fiber array by semiconductor technology
06/27/2012CN102519521A Phase displacement focal length detecting photomask, manufacture method and method for detecting focal length difference
06/27/2012CN102518954A Discharge lamp, light source apparatus, exposure apparatus, and exposure apparatus manufacturing method
06/27/2012CN102517247A Lattice-type three-dimensional cell culture support and its manufacturing method and use method
06/27/2012CN102516503A Main chain family polymer, antireflective hardmask composition and process for forming material layer
06/27/2012CN102516458A Molecularly imprinted polymer specially combined with specified glycoprotein and preparation method and application of molecularly imprinted polymer
06/27/2012CN102516453A Polymer, chemically amplified negative resist composition, and patterning process
06/27/2012CN102516181A Polymerizable monomers
06/27/2012CN102515091A Plastic functional micro-structured surface soft-lithography duplicating method used in plastic functional micro-structured surface batch production
06/27/2012CN102135726B Photoetching process method of direct photoresist mask for silicon substrate wet etching
06/27/2012CN102094221B Method for preparing SMT (surface mount technology) nickel-phosphorus alloy plate by dry-film wet process
06/27/2012CN102050946B Ultraviolet positive photoresist containing nano silicon polyamide and film-forming resin thereof
06/27/2012CN101960383B Method for processing work having photoresist layer
06/27/2012CN101836163B Projection objective having mirror elements with reflective coatings
06/27/2012CN101799638B Developing device, developing processing method and storage medium
06/27/2012CN101770171B Photosensitive composition, sealing structure and manufacturing method of sealing structure
06/27/2012CN101762992B Positive thermosensitive CTP version developer solution
06/27/2012CN101726137B Heat regenerator and manufacturing method thereof
06/27/2012CN101661229B Spray head positioning device and spray head positioning method
06/27/2012CN101615568B Substrate cleaning method and developing apparatus
06/27/2012CN101609258B Method for managing exposal intensity and evenness degree of photoetching machine
06/27/2012CN101606104B Apparatus with plasma radiation source and method of forming a beam of radiation and lithographic apparatus
06/27/2012CN101558358B Composition for forming resist foundation film containing low molecular weight dissolution accelerator
06/27/2012CN101551600B Exposure system and exposure method
06/27/2012CN101517486B Photosensitive resin composition
06/27/2012CN101435997B Test pattern of photolithography sleeve engraving accuracy and measuring method thereof
06/27/2012CN101398497B Color filter and manufacure method
06/27/2012CN101271273B Chemically amplified resist composition
06/27/2012CN101233452B Photosensitive resin composition and cured article thereof
06/27/2012CN101213070B Rapid-prototyping method and radiation-hardenable composition of application thereto
06/27/2012CN101180579B Polysilane compound-containing lower layer film forming composition for lithography
06/27/2012CN101051186B Negative photosensitive resin composition
06/27/2012CN101023395B Ink composition for etching resist, method of forming etching resist pattern using the same, and method of formng microchannel using the ink composition
06/26/2012US8209640 System and method for lithography simulation
06/26/2012US8208200 Imaging optical system
06/26/2012US8208124 Lithographic apparatus and device manufacturing method
06/26/2012US8208123 Lithographic apparatus and device manufacturing method
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