| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/04/2015 | CN104327206A 两末端羟基丁二烯低聚物、柔性印刷版、液晶取向膜和从两末端羟基丁二烯低聚物中除去低分子量成分的方法 Butadiene oligomers both terminal hydroxyl groups, flexographic printing plate, the liquid crystal alignment film and two terminal hydroxyl butadiene oligomers remove low molecular weight components from the method |
| 02/04/2015 | CN103384850B 正型光致抗蚀剂组合物、其涂膜及酚醛清漆型酚醛树脂 Positive type photoresist composition, coating film and novolak type phenolic resin |
| 02/04/2015 | CN103298841B 光敏树脂组合物和介电绝缘膜以及使用该介电绝缘膜的电子器件 The photosensitive resin composition and the dielectric insulating film and the dielectric insulating film using the electronic device |
| 02/04/2015 | CN103034059B 光致抗蚀剂和光刻方法 Photoresist and photolithographic method |
| 02/04/2015 | CN102998913B 同步定位光刻曝光装置及方法 Simultaneous Localization lithographic exposure apparatus and method |
| 02/04/2015 | CN102956475B 锗硅双极cmos跨多晶硅层的制备方法 SiGe bipolar cmos cross polysilicon layer preparation |
| 02/04/2015 | CN102687075B 用于抗蚀剂的下层的组合物和使用其来生产半导体集成电路装置的方法 Composition for the lower layer resist and use it to a method for producing a semiconductor integrated circuit device |
| 02/04/2015 | CN102171615B 微光刻投射曝光设备 Microlithographic projection exposure apparatus |
| 02/04/2015 | CN102109771B 一种半导体器件的检测方法 Detection method of a semiconductor device |
| 02/04/2015 | CN101657511B 用于在光致抗蚀剂图案上面涂覆的含内酰胺的组合物 Is used in the photoresist pattern on top of the coating composition containing the amide |
| 02/04/2015 | CN101061429B 包括用于沉浸光刻装置的真空清除的环境系统 Environmental system comprising a vacuum apparatus for immersion lithography removed |
| 02/03/2015 | US8949748 Recording medium recording program for generating mask data, method for manufacturing mask, and exposure method |
| 02/03/2015 | US8948562 Replication of patterned thin-film structures for use in plasmonics and metamaterials |
| 02/03/2015 | US8947643 Lithographic apparatus and method controlling parameter drift by performing multiple patterning passes on reference substrate |
| 02/03/2015 | US8947642 Method and apparatus for estimating model parameters of and controlling a lithographic apparatus by measuring a substrate property and using a polynomial model |
| 02/03/2015 | US8947641 Lithographic apparatus and method |
| 02/03/2015 | US8947640 Positioning device, lithographic apparatus, positioning method and device manufacturing method |
| 02/03/2015 | US8947639 Exposure method and apparatus measuring position of movable body based on information on flatness of encoder grating section |
| 02/03/2015 | US8947638 Actuation system and lithographic apparatus |
| 02/03/2015 | US8947637 Lithographic apparatus and device manufacturing method |
| 02/03/2015 | US8947636 Lithographic apparatus, device manufacturing method, and substrate exchanging method |
| 02/03/2015 | US8947635 Illumination optical system, exposure apparatus, and device manufacturing method |
| 02/03/2015 | US8947634 Apparatus for supporting an optical element, and method of making same |
| 02/03/2015 | US8947633 Optical system and method of use |
| 02/03/2015 | US8947631 Lithographic apparatus and device manufacturing method |
| 02/03/2015 | US8947630 Lithographic apparatus and device manufacturing method |
| 02/03/2015 | US8947629 Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method |
| 02/03/2015 | US8946866 Microelectronic substrate having removable edge extension element |
| 02/03/2015 | US8946852 Photosensitive resin composition, photosensitive resin composition film, and semiconductor device using the photosensitive resin composition or photosensitive resin composition film |
| 02/03/2015 | US8946661 Radiation source, lithographic apparatus and device manufacturing method |
| 02/03/2015 | US8946371 Photo-patternable dielectric materials curable to porous dielectric materials, formulations, precursors and methods of use thereof |
| 02/03/2015 | US8946093 Imprint method, imprint apparatus, and method of manufacturing semiconductor device |
| 02/03/2015 | US8946080 Pattern transfer method |
| 02/03/2015 | US8945954 Inspection method, inspection apparatus, exposure control method, exposure system, and semiconductor device |
| 02/03/2015 | US8945822 Resist pattern thickening material, method for forming resist pattern, semiconductor device and method for manufacturing the same |
| 02/03/2015 | US8945821 Method for patterning flexible substrate |
| 02/03/2015 | US8945820 Silicon-containing resist underlayer film-forming composition and patterning process |
| 02/03/2015 | US8945816 Method for forming resist pattern, semiconductor device and production method thereof |
| 02/03/2015 | US8945815 Alkaline soluble resin and light sensible resin composition comprising same and use thereof |
| 02/03/2015 | US8945814 Acid generators and photoresists comprising same |
| 02/03/2015 | US8945813 Mask forming imageable material and use |
| 02/03/2015 | US8945812 Resist composition and method of forming resist pattern |
| 02/03/2015 | US8945811 Miniaturized microparticles |
| 02/03/2015 | US8945810 Positive resist composition and pattern-forming method |
| 02/03/2015 | US8945809 Fluorinated monomer, fluorinated polymer, resist composition, and patterning process |
| 02/03/2015 | US8945808 Self-topcoating resist for photolithography |
| 02/03/2015 | US8945803 Smart subfield method for E-beam lithography |
| 02/03/2015 | US8945802 Flare-measuring mask, flare-measuring method, and exposure method |
| 02/03/2015 | US8945800 Method of preparing a pattern, method of forming a mask set, device manufacturing method and computer program |
| 02/03/2015 | US8945798 Near-field exposure mask and pattern forming method |
| 02/03/2015 | US8945797 Mask, pattern disposing method thereof and exposing method thereof |
| 02/03/2015 | US8945444 High throughput imprint based on contact line motion tracking control |
| 02/03/2015 | US8945441 Methods and materials for fabricating laminate nanomolds and nanoparticles therefrom |
| 02/03/2015 | US8945406 Electronic device, and method for manufacturing symbol on exterior of electronic device |
| 02/03/2015 | US8945310 Method and device for cleaning at least one optical component |
| 02/03/2015 | US8944615 Projection objective and method for its manufacture |
| 02/03/2015 | US8944580 Photosensitive resin composition, method for manufacturing structural body, and liquid discharge head |
| 01/29/2015 | WO2015013621A1 Reflection symmetric scatterometry overlay targets and methods |
| 01/29/2015 | WO2015013396A1 Cross-linkable fluorinated photopolymer |
| 01/29/2015 | WO2015012982A1 Scanned-spot-array duv lithography system |
| 01/29/2015 | WO2015012272A1 Photosensitive resin composition for projection exposure, photosensitive element, method for forming resist pattern, process for producing printed wiring board and process for producing lead frame |
| 01/29/2015 | WO2015012228A1 Negative-type photosensitive white composition for touch panel, touch panel, and production method for touch panel |
| 01/29/2015 | WO2015012212A1 Microfluidic device and process for producing same, and photosensitive resin composition for forming flow path |
| 01/29/2015 | WO2015012177A1 Method for forming pattern |
| 01/29/2015 | WO2015012172A1 Additive for resist underlayer film-forming composition, and resist underlayer film-forming composition containing same |
| 01/29/2015 | WO2015012151A1 Substrate with multilayered reflective film, reflective mask blank for euv lithography, reflective mask for euv lithography, process for producing same, and process for producing semiconductor device |
| 01/29/2015 | WO2015011893A1 Resin composition, method for forming pattern using same, and electronic component |
| 01/29/2015 | WO2015011457A1 Method of forming a desired pattern on a substrate |
| 01/29/2015 | WO2015011253A1 Method for producing a medical device or a device with structure elements, method for modifying the surface of a medical device or of a device with structure elements, medical device and laminated composite with a substrate |
| 01/29/2015 | WO2015011110A1 Patterned stamp manufacturing method, patterned stamp imprinting method and imprinted article |
| 01/29/2015 | WO2015011035A1 Process for controlling the period characterizing the morphology obtained from a blend of block copolymers and of (co) polymers of one of the blocks |
| 01/29/2015 | WO2015010777A1 Use of disazo compounds for color filters |
| 01/29/2015 | US20150031808 Photosensitive polysiloxane composition and uses thereof |
| 01/29/2015 | US20150031206 Composition for forming highly adhesive resist underlayer film |
| 01/29/2015 | US20150030985 Multiphoton Curing Methods Using Negative Contrast Compositions |
| 01/29/2015 | US20150030984 Method of manufacturing a flexographic printing plate for high-resolution printing |
| 01/29/2015 | US20150030983 Resist top coat composition and patterning process |
| 01/29/2015 | US20150030982 Fluorinated photopolymer with fluorinated sensitizer |
| 01/29/2015 | US20150030981 Cross-linkable fluorinated photopolymer |
| 01/29/2015 | US20150030980 Radiation-sensitive composition |
| 01/29/2015 | US20150030973 Birefringent lens material for stereoscopic image display device and method for producing birefringent lens for stereoscopic image display device |
| 01/29/2015 | US20150030972 Photo-sensitive resin composition for bezel of touch screen module and bezel for touch screen module using the same |
| 01/29/2015 | US20150029485 Substrate holder and method of manufacturing a substrate holder |
| 01/29/2015 | US20150029484 Stage apparatus, lithography apparatus and method of manufacturing article |
| 01/29/2015 | US20150029483 Exposure Device, Exposure Method and Method of Manufacturing Semiconductor Device |
| 01/29/2015 | US20150029482 Projection optical system, exposure apparatus, and exposure method |
| 01/29/2015 | US20150029481 Method of operating a patterning device and lithographic apparatus |
| 01/29/2015 | US20150029480 Optical system of a microlithographic projection exposure apparatus |
| 01/29/2015 | US20150029479 Projection exposure method and projection exposure apparatus for microlithography |
| 01/29/2015 | US20150029478 Fuel Stream Generator, Source Collector Apparatus and Lithographic Apparatus |
| 01/29/2015 | US20150029477 Optical system for a microlithographic projection exposure apparatus |
| 01/29/2015 | US20150029476 Projection optical system, exposure apparatus, and exposure method |
| 01/29/2015 | US20150029459 Contact lenses with embedded labels |
| 01/29/2015 | US20150029428 Color filter substrate, manufacturing process thereof and liquid crystal display panel |
| 01/29/2015 | US20150029411 Touch panel, conductive film and method for manufacturing the same |
| 01/29/2015 | DE112012006295T5 Maske und Reparaturverfahren dafür Mask and repair procedures for |
| 01/29/2015 | DE102014208770A1 Projektionsoptik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen Projektionsoptik Projection optics for imaging an object field in an image field and projection exposure apparatus having such a projection optics |
| 01/29/2015 | DE102013214459A1 Optisches System für eine mikrolithographische Projektionsbelichtungsanlage Optical system for a microlithography projection exposure apparatus |
| 01/29/2015 | DE102013107976A1 Verfahren und Vorrichtung zur Positionsbestimmung von Strukturen auf einer Maske für die Mikrolithographie Method and apparatus for determining the position of structures on a mask for microlithography |
| 01/28/2015 | EP2829917A1 Optical system for a microlithographic projection exposure apparatus |