Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/2012
08/23/2012US20120214091 Resist film, resist coated mask blanks and method of forming resist pattern using the resist film, and chemical amplification type resist composition
08/23/2012US20120214089 Method for producing a holographic film
08/23/2012US20120212816 Substrate having low reflection and high contact angle, and production method for same
08/23/2012US20120212724 Illumination optical system, exposure apparatus, and method of manufacturing device
08/23/2012US20120212718 Optical Apparatus, Method of Scanning, Lithographic Apparatus and Device Manufacturing Method
08/23/2012US20120212713 Lithographic apparatus and method having substrate and sensor tables
08/23/2012DE112010002795T5 Schleifvorrichtung, Schleifverfahren, Belichtungsvorrichtung undVerfahren zum Herstellen eines Bauelements Grinding device, grinding method, the exposure apparatus for producing a component undVerfahren
08/23/2012DE102012002633A1 Wärmemanagementsysteme, -anordnungen und -verfahren für Kollektoren mit streifendem Einfall für die EUV-Lithographie Thermal management systems, arrangements can and procedures for collectors with grazing incidence for EUV lithography
08/23/2012DE102011004494A1 Filter for filtering undesired light portions in projection exposure system for microlithography, has lattice arrangement formed on glass plate that is transparent to light having particular wavelength or wavelength range
08/23/2012DE102011004446A1 Optical element for optical device e.g. projection exposure apparatus, has optically active element that is formed from silicon, and cooling element that is formed of silicon carbide or siliconized silicon carbide
08/23/2012DE102011004326A1 Optical assembly for projection exposure system used in manufacture of micro structured component, has controllably driven components to control reflected partial beams so that beam intensity distribution variations of light is varied
08/23/2012DE102011004299A1 Arrangement for supporting mirror in extreme UV projection exposure system for use during manufacture of micro-structured component for e.g. LCD, has damping element attenuating pin arranged between actuator and mirror in lateral direction
08/23/2012CA2825465A1 Photosensitive resin laminate and thermal processing of the same
08/22/2012EP2490262A2 Light-shielding film, method of producing the same and solid-state imaging device
08/22/2012EP2490248A2 Exposure apparatus and device manufacturing method
08/22/2012EP2490227A1 Multilayer film reflector and X-ray exposure system
08/22/2012EP2490073A1 Substrate holder, lithographic apparatus, and method of manufacturing a substrate holder
08/22/2012EP2490072A2 Method for producing curable composition for imprints
08/22/2012EP2490064A1 Systems and methods for scanning a beam of light across a specimen
08/22/2012EP2489638A1 Apparatus for reducing waste lithographic printing plate developing liquid
08/22/2012EP2488919A1 Method for producing microparticles
08/22/2012EP2488588A1 Colored curable composition, resist liquid, ink for inkjet printing, color filter, method of producing color filter, solid-state image sensor, liquid crystal display, organic el display, image display device and colorant compound
08/22/2012EP2488370A1 Personalization of physical media by selectively revealing and hiding pre-printed color pixels
08/22/2012CN202389954U LCD (Liquid Crystal Display) high-efficiency double-station automatic conveying platform
08/22/2012CN202388902U System for performing high-accuracy screen printing by direct plate making technology
08/22/2012CN1422394B Liquid, radiation-curable composition, especially for stereolithography
08/22/2012CN102648518A Substrate supporting apparatus, substrate supporting member, substrate transfer apparatus, exposure apparatus, and device manufacturing method
08/22/2012CN102648438A Functional nanoparticles
08/22/2012CN102648402A Optical system, in particular in a microlithographic projection exposure apparatus
08/22/2012CN102648173A Cyclic compound, method for producing same, radiation sensitive composition, and method for forming resist pattern
08/22/2012CN102647143A Degree of freedom (DOF) vibration isolating device of linear electric motor and motion control method thereof
08/22/2012CN102646625A Forming method of semiconductor device
08/22/2012CN102646576A Method for fabricating semiconductor devices with fine patterns
08/22/2012CN102646568A Direct-current and low-frequency alternating-current signal combination amplifying device for beam motion control of electron beam equipment
08/22/2012CN102645855A Enhanced global alignment (EGA) mark and photolithograph pattern
08/22/2012CN102645854A Developing solution spraying system and method and substrate product
08/22/2012CN102645853A Diffractive annular illumination generator and method for manufacturing same
08/22/2012CN102645852A Lithographic apparatus and device manufacturing method
08/22/2012CN102645851A Illumination source and photomask optimization
08/22/2012CN102645850A Electromagnetic actuator, stage apparatus and lithographic apparatus
08/22/2012CN102645849A Photoetching device and photoetching projection method
08/22/2012CN102645848A Substrate holder, lithographic apparatus, device manufacturing method and method of manufacturing substrate holder
08/22/2012CN102645847A Measuring method, measuring device, lithographic device and device manufacturing method
08/22/2012CN102645846A Resin composition for laser engraving, relief printing plate precursor and process for producing the same, and relief printing plate
08/22/2012CN102645845A Photosensitive resin composition, color filter using the same and display device
08/22/2012CN102645844A Colored curable resin composition
08/22/2012CN102645843A Photosensitive resin composition, color filter using the same and display device
08/22/2012CN102645842A coloring composition, color filter and display element
08/22/2012CN102645841A Imprint method and imprint apparatus
08/22/2012CN102645840A Method for forming conductive pattern, and conductive film substrate
08/22/2012CN102645838A 掩膜及其制造方法 Mask and its manufacturing method
08/22/2012CN102645793A Generation method and system of columnar spacer matter as well as liquid crystal display panel
08/22/2012CN102645783A Manufacture method of color film base plate
08/22/2012CN102645752A Manufacturing device of a film patterned retarder for a three dimensional display device
08/22/2012CN102645730A Experimental immersed projective lithography objective lens
08/22/2012CN102645698A Method for manufacturing light guide plate mesh points and light guide plate, backlight module and display device
08/22/2012CN102645693A Color filter and method for manufacturing same
08/22/2012CN102645692A Light-shielding film, method of producing the same and solid-state imaging device
08/22/2012CN102645690A Color filter and manufacturing method thereof
08/22/2012CN102643574A Liquid photosensitive spraying ink
08/22/2012CN102292675B Positive-type photosensitive resin composition
08/22/2012CN102243435B Method for preparing micro-nanometer fluid system through compound developing of positive and negative photoresists
08/22/2012CN102213919B Gluing method for photoresist having hanger bracket structure
08/22/2012CN102200700B Stripping liquid as well as preparation method and application
08/22/2012CN102109777B Regeneration liquid of plasma display barrier wall slurry
08/22/2012CN102096338B Mask table system
08/22/2012CN101976020B Photoetching device and photoetching method
08/22/2012CN101937175B Photoetching method
08/22/2012CN101930179B Method for passivating photoresist surface and photoetching method
08/22/2012CN101910953B Cleaning composition for thick film resist
08/22/2012CN101846890B Parallel photoetching write-through system
08/22/2012CN101829394B Method for preparing step micro-needle array
08/22/2012CN101806973B Manufacturing method of segment liquid crystal display (LCD) with high contrast
08/22/2012CN101762984B Photoresist instillation system, photoresist nozzle and application method thereof
08/22/2012CN101753862B Solid-state imaging device, method of producing the same, and camera
08/22/2012CN101685274B Cleaning agent for thick-film photoresist
08/22/2012CN101666984B Plasma etching residue cleaning solution
08/22/2012CN101647074B Conductive film and method for producing the same
08/22/2012CN101430499B Storage container for photomask-forming synthetic quartz glass substrate
08/22/2012CN101078888B Polarizing transforming element, optical lighting device, exposure device and exposure method
08/21/2012US8247481 Photosensitive insulating resin composition, cured product thereof and ABA block copolymer
08/21/2012US8247166 Double patterning process
08/21/2012US8247165 Upper layer film forming composition for liquid immersion and method of forming photoresist pattern
08/21/2012US8247164 Resist film forming method
08/21/2012US8247163 Preparing lithographic printing plates with enhanced contrast
08/21/2012US8247162 Methods of forming a pattern using photoresist compositions
08/21/2012US8247161 Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing resin
08/21/2012US8247160 Resist composition, method of forming resist pattern, and novel compound and acid generator
08/21/2012US8247159 Positive resist composition and method of forming resist pattern
08/21/2012US8247158 Molecular resists based on functionalized polycarbocycles
08/21/2012US8247032 Methods utilizing scanning probe microscope tips and products therefor or produced thereby
08/21/2012US8246838 Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method
08/16/2012WO2012109077A1 Preparing lithographic printing plates
08/16/2012WO2012108464A1 Substrate having etching mask and method for producing same
08/16/2012WO2012108435A1 Colored curable composition, and color filter
08/16/2012WO2012108263A1 Substrate holding device and exposure device
08/16/2012WO2012107823A1 Underlayer coating composition and process for manufacturing a microelectronic device
08/16/2012WO2012064686A3 Development of printing members having post-anodically treated substrates
08/16/2012US20120208131 Method of forming resist pattern
08/16/2012US20120208130 Method for manufacturing structure