Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/2012
08/29/2012CN1938647B Composition and process for post-etch removal of photoresist and/or sacrificial anti-reflective material deposited on a substrate
08/29/2012CN102652349A Liquid immersion member, method for manufacturing liquid immersion member, exposure apparatus, and device manufacturing method
08/29/2012CN102652286A Radiation source, lithographic apparatus and device manufacturing method
08/29/2012CN102652285A Photosensitive composition, partition wall, color filter and organic el element
08/29/2012CN102652284A Black curable composition, light-shielding color filter, light-shielding film and method for manufacturing the same, wafer level lens, and solid-state imaging device
08/29/2012CN102652283A Novel compound, pigment dispersion composition and photosensitive resin composition including the same, and color filter using the same
08/29/2012CN102651316A Through hole etching method, array base plate, liquid crystal panel and display equipment
08/29/2012CN102650836A Flat-screen developing machine
08/29/2012CN102650835A Developing method and apparatus using organic-solvent containing developer
08/29/2012CN102650834A Gas manifold, module for a lithographic apparatus, lithographic apparatus and device manufaturing method
08/29/2012CN102650833A Lithographic apparatus,a method of controlling the apparatus and a device manufacturing method
08/29/2012CN102650832A Method of calculating model parameters of a substrate, a lithographic apparatus and an apparatus for controlling lithographic processing
08/29/2012CN102650831A Exposure machine stand and method for freely setting shades in exposure machine stand
08/29/2012CN102650830A Positive resist composite, resist pattern forming method
08/29/2012CN102650829A Coloring cured resin composite
08/29/2012CN102650828A Colored photosensitive resin composition, color filter and LCD (Liquid Crystal Display) device
08/29/2012CN102650827A Photosensitive resin composition and liquid crystal display applying same
08/29/2012CN102650826A Dry film photoresist containing special adhesive additive and plasticizer
08/29/2012CN102650825A Dry film photoresist containing adhesive additive and plasticizer
08/29/2012CN102650824A Forming method of pixel pattern, color filter, display element and coloring radioactive ray sensitive composite
08/29/2012CN102650823A Color filter with polarization ability and manufacturing method thereof
08/29/2012CN102650822A Method for forming double patterned nano-imprinting module
08/29/2012CN102650819A Photo mask and positioning method of photo mask
08/29/2012CN102650757A Color-film substrate, preparation method thereof and liquid crystal display panel
08/29/2012CN102649343A Lithographic printing plate precursor and plate making method thereof
08/29/2012CN102176107B Offset print water-borne UV (ultraviolet) photo-sensitive resist jetting plate-making method
08/29/2012CN102147575B Grayscale exposure method for direct-writing photo-etching machine
08/29/2012CN102117026B Method for detecting and correcting period of alignment signal of lithography tool
08/29/2012CN102109765B Rotating platform
08/29/2012CN102081312B Double-sided alignment apparatus and alignment method thereof
08/29/2012CN102033438B Focusing and levelling device with expandable measuring range and focusing and levelling method
08/29/2012CN101950126B Method for manufacturing three-dimensional smooth curved surface microstructure based on SU-8 thick photo-resist
08/29/2012CN101861245B Multi-layer imageable element with improved properties
08/29/2012CN101849211B Method and system for determining a suppression factor of a suppression system and a lithographic apparatus
08/29/2012CN101840157B Proximity exposure apparatus, method for determining a substrate position in the proximity exposure apparatus and method of manufacturing a display panel substrate
08/29/2012CN101738855B Flexible micro-positioning stage with two degrees of freedom
08/29/2012CN101738676B Manufacturing method of light guide plate
08/29/2012CN101726863B Polarization-modulating optical element
08/29/2012CN101669070B Photosensitive composition, partition wall, black matrix, and method for producing color filter
08/29/2012CN101663618B Positive photosensitive resin composition and cured film forming method using the same
08/29/2012CN101639559B Spacing piece array, lens combining device and manufacturing method thereof
08/29/2012CN101533223B Colored curable resin composition, colored pattern forming method, colored pattern, method for manufacturing color filter, liquid crystal display element
08/29/2012CN101517489B Optical element and method
08/29/2012CN101405837B Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
08/29/2012CN101341443B Photosensitive transfer material, member for display device, process for producing the member, black matrix, color filter, process for producing the color filter, substrate for display device, and display device
08/29/2012CN101315522B Photosensitive composition, photosensitive film, and printed circuit board
08/29/2012CN101281371B Photosensitive paste composition and method for forming plasma display battier wall using the same
08/29/2012CN101271270B Radiation sensitive resin composition, space body for liquid crystal display element and manufacturing method thereof
08/29/2012CN101144973B Method of etching extreme ultraviolet light photomasks
08/29/2012CN101107566B Alkali-developable photosensitive color composition
08/29/2012CN101084471B Support structure and lithographic apparatus
08/28/2012US8253934 Method and apparatus for inspecting a pattern formed on a substrate
08/28/2012US8253929 Stage apparatus, fixation method, exposure apparatus, exposure method, and device-producing method
08/28/2012US8253921 Exposure apparatus and device fabricating method
08/28/2012US8252784 Photoactivable nitrogen bases
08/28/2012US8252638 Method for forming under a thin layer of a first material portions of another material and/or empty areas
08/28/2012US8252518 Chemically amplified positive resist composition and resist patterning process
08/28/2012US8252517 Stop flow interference lithography system
08/28/2012US8252515 Method for removing photoresist
08/28/2012US8252514 Flexographic printing plate assembly
08/28/2012US8252513 Method for on-press developing laser sensitive lithographic printing plate
08/28/2012US8252512 Epoxy compound, alkali-developable resin composition, and alkali-developable photosensitive resin composition
08/28/2012US8252511 Method for modifying first film and composition for forming acid transfer resin film used therefor
08/28/2012US8252509 Resist composition and method of forming resist pattern
08/28/2012US8252508 Positive photosensitive composition and method of forming resist pattern
08/28/2012US8252507 Photoactive compound and photosensitive resin composition comprising the same
08/28/2012US8252506 Hot melt compositions
08/28/2012US8252505 Compound and method of producing same, acid generator, resist composition, and method of forming resist pattern
08/28/2012US8252504 Polymer, resist composition, and patterning process
08/28/2012US8252503 Photoresist compositions
08/28/2012US8252488 Mask blank substrate manufacturing method, and reflective mask blank manufacturing method
08/28/2012US8252487 Use in lithography; a transparent substrate, a patterned absorber layer to impart projection beam with a pattern in its cross-section
08/28/2012US8252364 Metal pattern forming method, metal pattern obtained by the same, printed wiring board, conductive film forming method, and conductive film obtained by the same
08/23/2012WO2012112381A1 Photoinitiator compositions and uses
08/23/2012WO2012112294A1 Photocurable and photocured compositions
08/23/2012WO2012112238A1 Photosensitive resin laminate and thermal processing of the same
08/23/2012WO2012111927A2 Compound and organic electrical element using same, and electronic device and heat-resistance measuring method therewith
08/23/2012WO2012111694A1 Method for producing substrate having surface nanostructure
08/23/2012WO2012111637A1 Member with concave portion and method for manufacturing same
08/23/2012WO2012111459A1 Gap embedding composition, method of embedding gap and method of producing semiconductor device by using the composition
08/23/2012WO2012111450A1 Photoresist composition and resist pattern formation method
08/23/2012WO2012111400A1 Photosensitive coloring composition
08/23/2012WO2012111238A1 Printing plate developing solution composition, developing solution, and method of manufacturing printing plate precursor
08/23/2012WO2012111183A1 Photosensitive composition and printed circuit board
08/23/2012WO2012110847A1 Mirror device
08/23/2012WO2012110465A2 System for magnetic shielding
08/23/2012WO2012110406A1 Optical mount and euv exposure apparatus
08/23/2012WO2012110144A1 Lithographic apparatus and device manufacturing method.
08/23/2012WO2012091271A3 Method for manufacturing nano-imprint mould, method for manufacturing light-emitting diode using the nano imprint mould manufactured thereby, and light-emitting diode manufactured thereby
08/23/2012WO2012084457A3 Method of controlling a programmable patterning device in a lithographic apparatus, device manufacturing method and lithographic apparatus
08/23/2012WO2012081863A3 Photosensitive polymer, photoresist composition including same, and method for forming resist pattern using same
08/23/2012WO2012050388A3 Maskless exposure apparatus including spatial filter having phase shifter pattern and exposure method
08/23/2012US20120214104 Method for producing microstructure
08/23/2012US20120214103 Method for fabricating semiconductor devices with fine patterns
08/23/2012US20120214102 Photosensitive Resin Laminate and Thermal Processing of the Same
08/23/2012US20120214101 Resist composition and method of forming resist pattern
08/23/2012US20120214100 Resist composition and patterning process using the same
08/23/2012US20120214099 Photoresist compositions
08/23/2012US20120214094 Method of forming pattern
08/23/2012US20120214093 Photomask blank, photomask blank manufacturing method, and photomask manufacturing method
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