Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2012
10/10/2012CN101241264B Liquid crystal display device having improved light guide plate
10/10/2012CN101160549B Composition comprising polymer having ethylene-dicarbonyl structure for use in forming anti-reflective coating for lithography
10/09/2012US8283644 Measuring in-situ UV intensity in UV cure tool
10/09/2012US8283253 Pattern forming method, semiconductor device manufacturing method and semiconductor device manufacturing apparatus
10/09/2012US8283112 Photoresist processing methods
10/09/2012US8283111 Method for creating gray-scale features for dual tone development processes
10/09/2012US8283110 Method for fabricating an image sensor device
10/09/2012US8283109 Method for obtaining microfluidic polymer structures
10/09/2012US8283107 Imageable elements and methods useful for providing waterless printing plates
10/09/2012US8283106 Sulfonic acid salt and derivative thereof, photoacid generator agent, and resist material and pattern formation method using the photoacid generator agent
10/09/2012US8283105 Positive resist composition and method of forming resist pattern
10/09/2012US8283104 Sulfonate and its derivative, photosensitive acid generator, and resist composition and patterning process using the same
10/09/2012US8283103 Composition for forming resist underlayer film for lithography and production method of semiconductor device
10/09/2012US8283102 Photoacid generator, copolymer, chemically amplified resist composition, and method of forming pattern using the chemically amplified resist composition
10/09/2012US8283101 Imageable elements with improved abrasion resistance
10/09/2012US8283100 Color forming compositions and associated methods
10/09/2012US8283095 Thiourethane compound and photosensitive resin composition
10/09/2012US8282383 Method for expelling gas positioned between a substrate and a mold
10/04/2012WO2012135278A2 Olefin-triggered acid amplifiers
10/04/2012WO2012134910A1 Method of slimming radiation-sensitive material lines in lithographic applications
10/04/2012WO2012134292A1 Alignment of an interferometer module for an exposure tool
10/04/2012WO2012134291A1 Interferometer module
10/04/2012WO2012134290A1 Lithography system with differential interferometer module
10/04/2012WO2012134226A2 Cleaning-solution composition for photolithography
10/04/2012WO2012133956A1 Method for producing molds
10/04/2012WO2012133939A1 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive resin film therefrom and method of forming pattern using the composition
10/04/2012WO2012133932A1 Method for forming resist patterns and method for producing patterend substrates employing the resist patterns
10/04/2012WO2012133891A1 Development method, method for forming wiring pattern, and method for manufacturing active matrix substrate
10/04/2012WO2012133862A2 Method for removing foreign particles adhered to molds
10/04/2012WO2012133617A1 Resin composition and semiconductor element substrate
10/04/2012WO2012133616A1 Discharge lamp
10/04/2012WO2012133597A1 Multilayer resist process pattern forming method and inorganic film forming composition for multilayer resist process
10/04/2012WO2012133595A1 Resist pattern formation method, radiation-sensitive resin composition, and resist film
10/04/2012WO2012133580A1 Photosensitive resin composition, photosensitive film, pattern forming method, forming method for hollow structure, and electronic component
10/04/2012WO2012133579A1 Photosensitive resin composition, photosensitive film, forming method for rib pattern, forming method for hollow structure, and electronic component
10/04/2012WO2012133429A1 Negative photosensitive resin composition
10/04/2012WO2012133382A1 Method for producing lithographic printing plate
10/04/2012WO2012133352A1 Photoresist composition
10/04/2012WO2012133257A1 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device and electronic device
10/04/2012WO2012133148A1 Black resin composition, resin black matrix substrate, and touch panel
10/04/2012WO2012133116A1 Photosensitive resin composition, photosensitive element using same, method for forming partition wall of image display device, and method for manufacturing image display device
10/04/2012WO2012133062A1 Positive-tone photosensitive resin composition, dry film, cured product, and printed wiring board
10/04/2012WO2012133050A1 Thiacalix[4]arene derivative
10/04/2012WO2012133040A1 Calixarene derivative
10/04/2012WO2012132755A1 Negative photosensitive resin composition and coating film
10/04/2012WO2012132741A1 Photosensitive composition, photosensitive film, photosensitive laminate, permanent pattern forming method, and printed board
10/04/2012WO2012132686A1 Composition for forming pattern reversal film, and method for forming reversal pattern
10/04/2012WO2012132676A1 Resist pattern forming method, resist pattern, crosslinkable negative chemical amplification resist composition for organic solvent development, resist film and resist-coated mask blanks
10/04/2012WO2012132675A1 Laser apparatus
10/04/2012WO2012132580A1 Photosensitive composition, photosensitive film, photosensitive laminate, permanent pattern formation method, and printed substrate
10/04/2012WO2012132558A1 Oxime ester compound and photoinitiator containing said compound
10/04/2012WO2012132529A1 Method for screening for anion
10/04/2012WO2012132491A1 Photosensitive composition, photosensitive laminate, permanent pattern forming method, and printed board
10/04/2012WO2012132371A1 Resist pattern formation method, and method for manufacturing patterned substrate using same
10/04/2012WO2012131912A1 Photosensitive resin composition and laminate thereof
10/04/2012WO2012131644A1 Method for forming patterns of objects on the surface of a substrate
10/04/2012WO2012131479A1 Antireflective coating composition and process thereof
10/04/2012WO2012131288A1 Surface planarisation
10/04/2012WO2012130532A1 Measurement of the position of a radiation beam spot in lithography
10/04/2012WO2012130108A1 Dual wafer stage switching system for lithography machine
10/04/2012WO2012091401A3 Photosensitive resin composition for resin black matrix
10/04/2012WO2012082856A3 Improved waterless printing members and related methods
10/04/2012US20120252215 Method for fabricating semiconductor device, pattern writing apparatus, recording medium recording program, and pattern transfer apparatus
10/04/2012US20120251957 Substrate transfer method for performing processes including photolithography sequence
10/04/2012US20120251956 Antireflective coating composition and process thereof
10/04/2012US20120251955 Composition for formation of resist underlayer film
10/04/2012US20120251954 Lithographic printing plate precursor and method of preparing the same
10/04/2012US20120251953 Photoresist composition
10/04/2012US20120251952 Copolymer for resist comprising novel acryl based monomer and resin composition for resist comprising the same
10/04/2012US20120251951 Resist composition and method of forming resist pattern
10/04/2012US20120251950 Composition for forming photosensitive resist underlayer film
10/04/2012US20120251949 Positive type photosensitive resin composition
10/04/2012US20120251948 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same composition
10/04/2012US20120251947 Cyclic compound, method of producing the same, radiation sensitive composition, and method of forming resist pattern
10/04/2012US20120251946 Photoresist composition
10/04/2012US20120251945 Photoresist composition
10/04/2012US20120251944 Photolithography method and apparatus
10/04/2012US20120251943 Antireflective coating composition and process thereof
10/04/2012US20120251931 Transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device
10/04/2012US20120251929 Phase shift mask blank, phase shift mask, and method for manufacturing phase shift mask blank
10/04/2012US20120251928 Method of manufacturing a transfer mask and method of manufacturing a semiconductor device
10/04/2012US20120251927 Hologram-recording medium
10/04/2012US20120251521 Technical field and industrial applicability of the invention
10/04/2012US20120250268 Photosensitive resin composition, dry film thereof, and printed wiring board using them
10/04/2012US20120249989 Illumination optical device, illumination method, and exposure method and device
10/04/2012US20120249945 Liquid-crystal display panel and method for manufacturing liquid-crystal display panel
10/04/2012US20120248632 Photosensitive adhesive composition, film-like adhesive, adhesive sheet, adhesive pattern, semiconductor wafer with adhesive layer, semiconductor device
10/04/2012US20120247220 Strain gage and manufacturing method thereof
10/04/2012DE102011082821A1 Extreme-UV radiation source for use in e.g. reflectometer of projection exposure system for extreme UV-lithography to manufacture memory chip, has overlapping device arranged in optical path to overlap electronic radiation with light rays
10/04/2012DE102011016058A1 Verfahren und Vorrichtung zur Einstellung von Eigenschaften eines Strahlenbündels aus einem Plasma emittierter hochenergetischer Strahlung Method and apparatus for setting the properties of a beam emitted from a plasma of high energy radiation
10/04/2012DE102011006468A1 Vermessung eines abbildenden optischen Systems durch Überlagerung von Mustern Measuring an imaging optical system by superimposing patterns
10/04/2012DE102011001785A1 Belichtungseinrichtung zur strukturierten Belichtung einer Fläche Exposure means for structured exposure of a surface
10/04/2012DE102010013298B4 Positionierverfahren für eine optische Anordnung einer Projektionsbelichtungsanlage Positioning method for an optical arrangement of a projection exposure apparatus
10/04/2012DE102006060180B4 Verfahren und Vorrichtung zum räumlich hochaufgelösten Abbilden einer mit einer Substanz markierten Struktur Method and apparatus for high spatial resolution imaging of a structure labeled with a substance
10/04/2012CA2830592A1 Black resin composition, resin black matrix substrate, and touch panel
10/03/2012EP2506289A2 Exposure apparatus and method for manufacturing device
10/03/2012EP2506077A2 Lithographic printing plate precursor and method of preparing the same
10/03/2012EP2506061A1 Image-forming optical system, exposure apparatus, and device producing method
10/03/2012EP2505576A1 Cyclic compound, process for production thereof, radiation-sensitive composition, and resist pattern formation method
10/03/2012CN202472239U PCB (Printed Circuit Board) locator of high-precision parallel light exposure machine
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