Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2012
10/03/2012CN101297243B Microlithography projection objective
10/03/2012CN101276111B Liquid crystal display panel, manufacturing method thereof, and liquid crystal display device
10/03/2012CN101187789B Formulation for removal of photoresist, etch residue and BARC
10/03/2012CN101053063B Apparatus and plasma ashing process for increasing photoresist removal rate
10/02/2012US8279524 Polarization-modulating optical element
10/02/2012US8279405 Lithographic apparatus and device manufacturing method
10/02/2012US8279402 Optical arrangement for immersion lithography with a hydrophobic coating, as well as projection exposure apparatus comprising the same
10/02/2012US8278760 Semiconductor integrated circuit and method for manufacturing same, and mask
10/02/2012US8278659 Uniform large-grained and grain boundary location manipulated polycrystalline thin film semiconductors formed using sequential lateral solidification and devices formed thereon
10/02/2012US8278387 Resin composition for laser engraving, image forming material, relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate
10/02/2012US8278030 Sulfonium salt, photoacid generator, and photocurable composition and cured body thereof
10/02/2012US8278029 Stamper production method and read-only optical disc production method
10/02/2012US8278028 Material pattern, and mold, metal thin-film pattern, metal pattern using thereof, and methods of forming the same
10/02/2012US8278025 Material for forming resist protection films and method for resist pattern formation with the same
10/02/2012US8278024 Photosensitive adhesive composition, and obtained using the same, adhesive film, adhesive sheet, semiconductor wafer with adhesive layer, semiconductor device and electronic part
10/02/2012US8278023 Salt and photoresist composition containing the same
10/02/2012US8278022 Positive resist composition and method of forming resist pattern
10/02/2012US8278014 Photomask and pattern formation method using the same
10/02/2012US8277884 Coating and processing apparatus and method
10/02/2012US8277701 Photosensitive resin composition for color filter and color filter using same
10/02/2012CA2555665C Microelectronic cleaning composition containing halogen oxygen acids, salts and derivatives thereof
09/2012
09/27/2012WO2012129162A2 Methods of making patterned structures of materials, patterned structures of materials, and methods of using same
09/27/2012WO2012129026A1 Method of producing color change in a substrate
09/27/2012WO2012128526A2 Noble polyamic acid, photosensitive resin composition, dry film, and circuit board
09/27/2012WO2012128481A2 Method for duplicating pattern using exposure process on cylindrical mold
09/27/2012WO2012128322A1 Lithography rinsing fluid and pattern formation method using same
09/27/2012WO2012128318A1 Colored resin composition, color filter, liquid crystal display device, organic el display device
09/27/2012WO2012128251A1 Polymer-containing developer
09/27/2012WO2012127964A1 Radiation-sensitive composition, cured film of same, and method for forming cured film
09/27/2012WO2012127946A1 Positive-working lithographic printing plate precursor and method for preparing same
09/27/2012WO2012127698A1 Lithographic printing plate precursor and plate making method thereof
09/27/2012WO2012127342A1 Method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices having patterned material layers with line-space dimensions of 50 nm and less
09/27/2012WO2012127205A1 Photopatternable structure containing substrate with two-side photoresist coatings
09/27/2012WO2012126887A1 Optical device
09/27/2012WO2012126851A1 Dispensing method and device for dispensing
09/27/2012WO2012126830A1 Optical element
09/27/2012WO2012126803A1 Array of controllable mirrors
09/27/2012WO2012126718A1 Method and apparatus for determining structure parameters of microstructures
09/27/2012WO2012126695A1 Stable curable thiol-ene composition
09/27/2012WO2012126684A1 Substrate and patterning device for use in metrology, metrology method and device manufacturing method
09/27/2012WO2012126364A1 Method for measuring distortion of projection objective
09/27/2012WO2012076629A3 Criss-cross writing strategy
09/27/2012WO2012047449A3 Processes and compositions for removing substances from substrates
09/27/2012WO2011122707A9 Colored composition, inkjet ink, color filter and method of producing the same, solid-state image sensor and display device
09/27/2012US20120244690 Ion implanted resist strip with superacid
09/27/2012US20120244478 Resist pattern formation method
09/27/2012US20120244477 Pellicle for lithography
09/27/2012US20120244476 Photolithography method including technique of determining distribution of energy of exposure light passing through slit of exposure apparatus
09/27/2012US20120244475 Method to produce a fuel cell flowfield with photopolymer walls
09/27/2012US20120244474 Method of forming pattern
09/27/2012US20120244473 Photosensitive resin composition, laminate utilizing same and solid-state imaging device
09/27/2012US20120244472 Actinic ray-sensitive or radiation-sensitive resin composition, film formed using the composition and pattern forming method using the same
09/27/2012US20120244471 Photoresist resin composition and method of forming patterns by using the same
09/27/2012US20120244468 Polyvinyl acetal/polyester graft copolymer, and dispersant
09/27/2012US20120244461 Overlay control method and a semiconductor manufacturing method and apparatus employing the same
09/27/2012US20120243099 Black curable composition, light-shielding color filter, light-shielding film and method for manufacturing the same, wafer level lens, and solid-state imaging device
09/27/2012US20120242940 Radiation-sensitive colored composition, color filter, method for producing a color pattern, method for producing color filter, solid-state imaging device, and liquid crystal display apparatus
09/27/2012US20120242938 Methods for manufacturing lcd substrates and lcds
09/27/2012US20120241740 Method of forming a photosensitive pattern, method of manufacturing a display substrate, and display substrate
09/27/2012DE19954365B4 Verfahren zum bildweisen Bestrahlen eines Resists A method for imagewise exposing a resist
09/27/2012DE112010004884T5 Verfahren für die Gerichtete Selbstorganisation und damit Hergestellte Schichtstrukturen Method for Directional self-organization and thus Produced layer structures
09/27/2012DE112010004848T5 Verfahren zur gezielten Selbstorganisation mit Immersionslithographie bei 193 NM und daraus gebildete Schichtstrukturen Method for the selective self-assembly with immersion lithography at 193 NM and layered structures formed therefrom
09/27/2012DE102011082065A1 Field facet-mirror array for microlithography manufacturing of microchip, has total reflecting surface with two regions displaced against each other and forming diffraction structure for diffraction of radiation in preset wavelength range
09/27/2012DE102011006100A1 Spiegel-Array Mirror array
09/27/2012DE102011006055A1 Position measuring device for mask inspection device for inspecting lithographic mask of arrangement of a positioning system, is configured by location or tilted position or certain position of object
09/27/2012DE102011006024A1 Anordnung zur Vibrationsisolation einer Nutzlast Arrangement for vibration isolation of a payload
09/27/2012DE102011005940A1 Extreme ultraviolet mirror arrangement for optical system for extreme ultraviolet microlithography, comprises multiple mirror elements that are arranged side by side, such that mirror elements form mirror surface
09/27/2012DE102011005885A1 Lithographievorrichtung Lithography apparatus
09/27/2012DE102011005840A1 Steuerbare Mehrfachspiegelanordnung, optisches System mit einer steuerbaren Mehrfachspiegelanordnung sowie Verfahren zum Betreiben einer steuerbaren Mehrfachspiegelanordnung Controllable multi-mirror array optical system with a controllable multi-mirror array and method for operating a controllable multi-mirror array
09/26/2012EP2503590A1 Optical characteristic measurement method, exposure method and device manufacturing method
09/26/2012EP2503393A1 Method for preparation of lithographic printing plate
09/26/2012EP2503392A1 Radiation-sensitive resin composition, polymer and resist pattern formation method
09/26/2012EP2503391A2 Use of dual-hardening compositions for coating
09/26/2012EP2503389A2 Non-resonant two-photon absorbing material, non-resonant two-photon emitting material, and method for inducing absorption or generating emission of non-resonant two photon by using the material.
09/26/2012EP2503388A2 Non-resonant two-photon absorbing material, non-resonant two-photon emitting material, and method for inducting absorption or generating emission of non-resonant two photons by using the material
09/26/2012EP2502963A1 Dispersion composition, photosensitive resin composition, and solid-state image pickup element
09/26/2012EP2502926A1 Compound
09/26/2012EP2502915A1 Aromatic sulfonium salt compound
09/26/2012EP2502728A1 Lightweight and High Strength Three-Dimensional Articles Producible by Additive Fabrication Processes
09/26/2012EP2502117A2 Magnification control for lithographic imaging system
09/26/2012EP2502116A2 Photoresist composition
09/26/2012EP2501550A1 Carrier sheet for a photosensitive printing element
09/26/2012CN202453649U Low-pressure-drying preliminary drying device
09/26/2012CN202453648U 曝光机 Exposure Machine
09/26/2012CN202453647U Mask, exposure device and system
09/26/2012CN202453606U Exposure device
09/26/2012CN1981240B Anti-reflective coatings using vinyl ether crosslinkers
09/26/2012CN1952790B Substrate, method of exposing a substrate, machine readable medium
09/26/2012CN102696099A Substrate carrier device, substrate carrying method, substrate supporting member, substrate holding device, exposure apparatus, exposure method and device manufacturing method
09/26/2012CN102696095A Optical characteristic measurement method, exposure method and device manufacturing method
09/26/2012CN102695990A A method of making a patterned dried polymer and a patterned dried polymer
09/26/2012CN102695989A Illumination system, lithographic apparatus and illumination method
09/26/2012CN102695988A Lithographic apparatus and device manufacturing method
09/26/2012CN102695987A Composition for the bottom layer of a photoresist, and method using same to manufacture semiconductor device
09/26/2012CN102695986A Polymer containing an aromatic ring for a resist underlayer, and resist underlayer compound including the polymer
09/26/2012CN102695762A Near-infrared absorbing film compositions
09/26/2012CN102694094A Patterned substrate, mask and patterned substrate manufacturing method
09/26/2012CN102693901A Coating film forming apparatus and coating film forming method
09/26/2012CN102693898A Method for narrowing pitch
09/26/2012CN102692831A Counterpoint mark and method for using same to manufacture workpieces in exposure process
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