Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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07/11/2012 | CN102576188A Method, inspection apparatus and substrate for determining an approximate structure of an object on the substrate |
07/11/2012 | CN102576141A Optical arrangement in an optical system, in particular in a microlithographic projection exposure apparatus |
07/11/2012 | CN102576093A Titanium black dispersion, photosensitive resin composition, wafer level lens, light blocking film, method for producing the light blocking film, and solid-state image pickup element |
07/11/2012 | CN102575201A Cleaning solution composition for substrate for preparation of flat panel display |
07/11/2012 | CN102575140A Base-generating agent, photosensitive resin composition, material for pattern-forming comprising said photosensitive resin composition, pattern-forming method using said photosensitive resin composition, and article |
07/11/2012 | CN102575127A Antifeflective composition for photoresists |
07/11/2012 | CN102575113A Colorant multimer, colored curable composition, color filter and method for producing the same, and solid-state image sensor, image display device, liquid crystal display device and organic el display with the color filter |
07/11/2012 | CN102575108A Colored curable composition, resist liquid, ink for inkjet printing, color filter, method of producing color filter, solid-state image sensor, liquid crystal display, organic el display, image display device and colorant compound |
07/11/2012 | CN102574963A Aromatic hydrocarbon resin and composition for forming underlayer film for lithograph |
07/11/2012 | CN102574703A Apparatus for reducing waste lithographic printing plate developing liquid |
07/11/2012 | CN102574410A Lithographic printing plate precursor and process for producing same |
07/11/2012 | CN102569538A Stripping method for use during manufacturing of light-emitting diode chip electrode |
07/11/2012 | CN102569169A Interconnection method based on press printing technology |
07/11/2012 | CN102569147A Silicon wafer adsorption mechanism and use method thereof |
07/11/2012 | CN102569113A Edging width detection method |
07/11/2012 | CN102569112A Cleaning room environment detection method |
07/11/2012 | CN102569073A Manufacturing method of semiconductor apparatus |
07/11/2012 | CN102568498A Block copolymer self-assembly methods and patterns formed thereby |
07/11/2012 | CN102566340A A digital mask-free photoetching aligning deivce based on phase shift moire fringe |
07/11/2012 | CN102566338A Method for correcting alignment positions in photoetching alignment system |
07/11/2012 | CN102566337A Method for determining marked expected position |
07/11/2012 | CN102566335A Template image acquisition method |
07/11/2012 | CN102566334A Supply System Of Photoresist Stripping Solution And Supply Method Thereof |
07/11/2012 | CN102566333A Low-temperature aqueous positive-photoresist stripping solution and preparation method thereof |
07/11/2012 | CN102566332A Thick film photoresist cleaning solution |
07/11/2012 | CN102566331A Cleaning fluid for thick-film photoresist |
07/11/2012 | CN102566330A Thick film photoresist cleaning solution |
07/11/2012 | CN102566329A Real-time dynamic control method for concentration and replenishment of developing solution of plate printing machine |
07/11/2012 | CN102566328A Method for improving edge development effect of wafer |
07/11/2012 | CN102566327A Developing uniformity debugging method |
07/11/2012 | CN102566326A Developing device |
07/11/2012 | CN102566325A Optical processing system and method |
07/11/2012 | CN102566324A Lithographic apparatus and device manufacturing method that compensates for reticle induced CDU |
07/11/2012 | CN102566323A Compositions and processes for immersion lithography |
07/11/2012 | CN102566322A Multiple photoetching equipment correcting method |
07/11/2012 | CN102566321A Method for monitoring offset of focal length of lithography machine |
07/11/2012 | CN102566320A Exposure apparatus, exposure method and device manufacturing method |
07/11/2012 | CN102566319A Lithographic device and method of manufacturing device |
07/11/2012 | CN102566318A Light beam transmission stabilizing device |
07/11/2012 | CN102566317A Exposure method, exposure device, and device manufacturing method |
07/11/2012 | CN102566316A Silicon chip stage aligning mechanism of projection mask aligner |
07/11/2012 | CN102566315A Method for detecting offset of focus of lithography machine |
07/11/2012 | CN102566314A Lithography machine key code system and application thereof |
07/11/2012 | CN102566313A Photoresist back exposure process |
07/11/2012 | CN102566312A Method for calculating gray value of graphic data in mask-free direct-write type lithography machine system |
07/11/2012 | CN102566311A Dynamic stability measuring method for plate making photoetching device |
07/11/2012 | CN102566310A Light energy monitoring system for photolithographic system |
07/11/2012 | CN102566309A Method for measuring dynamic stability of plate-making lithography equipment |
07/11/2012 | CN102566308A Lithographic apparatus and device manufacturing method |
07/11/2012 | CN102566307A Local exposure method and local exposure apparatus |
07/11/2012 | CN102566306A Lithographic apparatus and device manufacturing method |
07/11/2012 | CN102566305A Exposure device and exposure method |
07/11/2012 | CN102566304A Lithographic apparatus and removable member |
07/11/2012 | CN102566303A Method for automatically embedding plotting parameters into Barco plotter |
07/11/2012 | CN102566302A Patterning device support |
07/11/2012 | CN102566301A Measuring method, apparatus and substrate |
07/11/2012 | CN102566300A A positioning system, a lithographic apparatus and a method for positional control |
07/11/2012 | CN102566299A Pattern-dependent proximity matching/tuning including light manipulation by projection optics |
07/11/2012 | CN102566298A Light irradiation device |
07/11/2012 | CN102566297A Photoetching system |
07/11/2012 | CN102566296A Integration assembly method for photoetching exposure system |
07/11/2012 | CN102566295A Lithography device and method for measuring multi-light spot zero offset |
07/11/2012 | CN102566294A Photoetching lamp optical system |
07/11/2012 | CN102566293A Two-dimensional long-stroke table movement system |
07/11/2012 | CN102566292A Switching structure and switching method for double workpiece tables |
07/11/2012 | CN102566291A Test system for projection mask |
07/11/2012 | CN102566290A Projection ramp exposure photoetching machine device and method |
07/11/2012 | CN102566289A Method for testing diaphragm of illumining system of photoetching equipment |
07/11/2012 | CN102566288A Exposure method and system |
07/11/2012 | CN102566287A Vertical direction control device and method for photoetching machine |
07/11/2012 | CN102566286A Method for improving precision of rotating stage |
07/11/2012 | CN102566285A Manufacturing method for microstructure and microstructure |
07/11/2012 | CN102566284A Test method for temperature evenness of hot plate |
07/11/2012 | CN102566283A Washed flexible resin plate capable of achieving laser direct imaging |
07/11/2012 | CN102566282A Hardmask composition, method of forming a pattern, and semiconductor integrated circuit device including the pattern |
07/11/2012 | CN102566281A Hardmask composition and method of forming patterns and semiconductor integrated circuit device including the patterns |
07/11/2012 | CN102566280A Positive thermosensitive lithographic printing plate containing photo-acid generator in bottom resin layer |
07/11/2012 | CN102566279A Positive photosensitive resin composite and permanent slushing compound |
07/11/2012 | CN102566278A Siloxane polymer composition, cured film and method for forming the cured film |
07/11/2012 | CN102566277A Cationic polymerization imaging composition for high-sensitive photopolymerization plate |
07/11/2012 | CN102566276A Positive photosensitive resin composition and method of forming cured film therefrom |
07/11/2012 | CN102566275A Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film |
07/11/2012 | CN102566274A Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film |
07/11/2012 | CN102566273A Positive photosensitive resin composite and method for forming pattern |
07/11/2012 | CN102566272A Resin composition for optical waveguide, optical waveguide produced by using the resin composition, and production method of the optical waveguide |
07/11/2012 | CN102566271A Photosensitive resin composition |
07/11/2012 | CN102566270A Photoresist composition |
07/11/2012 | CN102566269A Color component, color filter and display element |
07/11/2012 | CN102566268A Photosensitive Resin Composition For Forming Spacer, Spacer Manufactured By The Same For Display Device, And Display Device With The Spacer |
07/11/2012 | CN102566267A Resist composition, method of forming resist pattern, novel compound, and acid generator |
07/11/2012 | CN102566266A Coloring Photosensitive Composition, Color Filter, Manufacturing Method Of Color Filter, And Liquid Crystal Display Device |
07/11/2012 | CN102566265A Photosensitive resin composition and color filter using the same |
07/11/2012 | CN102566264A Photopolymerization non-silver multi-band laser photosensitive resin, laser photosensitive plate and manufacturing methods of laser photosensitive resin and laser photosensitive plate |
07/11/2012 | CN102566263A Imprint lithography |
07/11/2012 | CN102566262A Device and method suitable for carrying out wafer-level nano imprinting on uneven substrate |
07/11/2012 | CN102566261A Underlayer composition and method of imaging underlayer |
07/11/2012 | CN102566260A Method for rapidly processing graphical surface of ultralong grating ruler rolling die |
07/11/2012 | CN102566259A Nano-fabrication method |
07/11/2012 | CN102566258A Double imprint method |
07/11/2012 | CN102566255A Photomask for aligning exposure machine and photomask alignment mark production method |