Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
09/2012
09/26/2012CN102692830A Method for evaluating overlay error and mask for the same
09/26/2012CN102692829A Aligning method based on double-light source multicycle marker and aligning system
09/26/2012CN102692828A Lithography equipment aligning method
09/26/2012CN102692827A Aligning device for photolithography equipment
09/26/2012CN102692825A Device and method for photo-etching with incoherent light
09/26/2012CN102692824A Multiple-light-source optical imaging system of circuit exposure machine
09/26/2012CN102692823A Methods and apparatus for calculating electromagnetic scattering properties of a structure and for reconstruction of approximate structures
09/26/2012CN102692822A Multi-wavelength based aligning system and aligning method
09/26/2012CN102692821A Mask aligner rotating platform
09/26/2012CN102692820A Device and method for measuring projection lens distortion
09/26/2012CN102692819A Photosensitive resin composite and liquid crystal board
09/26/2012CN102692818A Color nano-imprint process
09/26/2012CN102692817A Template, surface processing method of template, surface processing apparatus of template, and pattern formation method
09/26/2012CN102692816A Manufacturing method of optical mask, image transferring method and manufacturing method of display device
09/26/2012CN102692813A Manufacturing method of optical mask, image transferring method and manufacturing method of display device
09/26/2012CN102692812A Extreme UV-Light photomask, manufacturing method for the same, and method for patterning base material
09/26/2012CN102692673A Method for manufacturing flat light-guided film by using mask plate
09/26/2012CN102692661A Color filter, manufacture method of color filter and LCD
09/26/2012CN102691093A Method for rapidly corroding and patterning indium tin oxide surface by using electrochemical technology
09/26/2012CN102157643B Method for preparing GaN-based photonic crystal LED based on nanoimprint lithography
09/26/2012CN102117018B Lithographic apparatus and device manufacturing method
09/26/2012CN102060262B Method for manufacturing micro-nano fluid control system by using low-pressure bonding technology
09/26/2012CN102043356B Cleaning solution composition for cleaning substrate
09/26/2012CN102033437B Photoresist-removing method
09/26/2012CN102023499B Device and method for testing different baking conditions of photoetching films with one control wafer
09/26/2012CN101930183B Lithographic apparatus and device manufacturing method
09/26/2012CN101918898B Lithographic apparatus, method for levelling an object, and lithographic projection method
09/26/2012CN101868763B A lithographic apparatus, a projection system and a device manufacturing method
09/26/2012CN101846885B High-volume manufacturing massive e-beam maskless lithography system
09/26/2012CN101807011B Lithographic apparatus and device manufacturing method
09/26/2012CN101775197B Viscosity reducible radiation curable resin composition
09/26/2012CN101772735B Radiation-sensitive resin composition
09/26/2012CN101713932B Lithographic apparatus and device manufacturing method
09/26/2012CN101713924B A device for treating substrate and a method of cardinal plate loading
09/26/2012CN101685268B Lithographic apparatus and method
09/26/2012CN101681121B Exposure apparatus, exposure method, and device manufacturing method
09/26/2012CN101666974B Mold, imprint apparatus, and process for producing structure
09/26/2012CN101650528B System and method for using a two part cover for protecting a reticle
09/26/2012CN101630640B Photoresist burr edge-forming method and TFT-LCD array substrate-manufacturing method
09/26/2012CN101430506B Photo-curing resin composition, design of cured composition and printed circuit board
09/26/2012CN101398631B Maskless exposure device
09/26/2012CN101398624B Photo acid generator, chemical amplified photoresist combination comprising the same and relative method
09/26/2012CN101320210B A method of preparing a substrate having a layer or pattern of metal on it
09/26/2012CN101256349B Defect correction method and manufacturing method for grey level mask and grey level mask
09/26/2012CN101174097B Mask etch plasma reactor with variable process gas distribution
09/26/2012CN101069879B Method for coating composition, semiconductor element and flat display
09/26/2012CN101052918B Photosensitive composition, pattern forming material, photosensitive laminate, pattern forming apparatus and method of pattern formation
09/26/2012CN101038442B Lithographic apparatus and device manufacturing method
09/25/2012US8273524 Liquid discharging head, producing method thereof, structure, and producing method thereof
09/25/2012US8273523 By-die-exposure for patterning of holes in edge die
09/25/2012US8273522 Exposure mask and method for manufacturing semiconductor device using the same
09/25/2012US8273521 Radiation-sensitive resin composition and compound
09/25/2012US8273520 Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate and method of producing the same
09/25/2012US8273519 Organosilicon copolymer having a component that provides increased storage stability in combination with a component having a linking group which may enhance etch resistance and increase hydrophilicity of the copolymer; for semiconductor integrated circuit devices
09/25/2012US8273270 Photosensitive resin composition and light blocking layer using the same
09/25/2012US8272544 Exposure apparatus, exposure method, and device fabrication method
09/20/2012WO2012125986A1 Method of analyzing an analyte using combinatorial arrays and uniform patterns
09/20/2012WO2012125409A2 Modeling euv lithography shadowing effect
09/20/2012WO2012125328A1 Flexographic printing plate precursor, imaging assembly, and use
09/20/2012WO2012125009A2 Chemically amplified positive photosensitive composition for an organic insulation film, and method for forming an organic insulation film using same
09/20/2012WO2012124792A1 Water-insoluble coloring compound, ink, resist composition for color filter, and thermal transfer recording sheet
09/20/2012WO2012124597A1 Resist underlayer film formation composition and method for forming resist pattern using same
09/20/2012WO2012124438A1 Photosensitive conductive paste and method of manufacturing conductive pattern
09/20/2012WO2012124177A1 Lithographic printing plate precursor, plate making method thereof and polyvalent isocyanate compound
09/20/2012WO2012123205A1 Lithographic apparatus, method for measuring radiation beam spot focus and device manufacturing method
09/20/2012WO2012123188A1 Electrostatic clamp, lithographic apparatus, and device manufacturing method
09/20/2012WO2012123144A1 Electrostatic clamp apparatus and lithographic apparatus
09/20/2012WO2012123000A1 Method of operating a microlithographic projection exposure apparatus
09/20/2012WO2012067457A3 Photosensitive composition comprising an acrylate compound
09/20/2012US20120238752 Compound or its tautomer, metal complex compound, colored photosensitive curing composition, color filter, and production
09/20/2012US20120238095 Patterning process and composition for forming silicon-containing film usable therefor
09/20/2012US20120238090 Production method for thick film metal electrode and production method for thick film resist
09/20/2012US20120237880 Methods of Forming Patterns on Substrates
09/20/2012US20120237879 Pattern forming method, semiconductor device manufacturing method and phase shift photomask having dummy gate patterns
09/20/2012US20120237878 Method and system for providing a side shield for a perpendicular magnetic recording pole
09/20/2012US20120237877 Electron beam data storage system and method for high volume manufacturing
09/20/2012US20120237876 Radiation-sensitive resin composition, monomer, polymer, and production method of radiation-sensitive resin composition
09/20/2012US20120237875 Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound
09/20/2012US20120237874 Actinic-Ray- or Radiation-Sensitive Resin Composition, Compound and Method of Forming Pattern Using the Composition
09/20/2012US20120237873 Positive photosensitive resin composition, cured film formed from the same, and device having cured film
09/20/2012US20120237872 Black and white silver halide photosensitive material
09/20/2012US20120237871 Flexographic printing plate precursor, imaging assembly, and use
09/20/2012US20120237857 Photomask and method for forming overlay mark using the same
09/20/2012US20120236426 Polymerizable composition, color filter, method of producing color filter and solid-state image sensor
09/20/2012US20120236285 Illumination optical system, exposure apparatus, and exposure method
09/20/2012US20120236278 Image processing-based lithography system and method of coating target object
09/20/2012US20120235558 Insulating Pattern, Method of Forming the Insulating Pattern, Light-Emitting Device, Method of Manufacturing the Light-Emitting Device, and Lighting Device
09/20/2012US20120235099 Radiation-sensitive colored composition, colored cured film, color filter and method of producing the same, solid-state imaging device, liquid crystal display apparatus, and method of producing dye
09/20/2012US20120234574 Housing for electronic device and method for making the same
09/20/2012DE102011080819A1 Facet mirror unit for use in micro lithography device for micro lithography utilized during manufacturing of microelectronic circuits, has facet element designed as separately manufactured component connected with another facet element
09/20/2012DE102011077185A1 Optical assembly of projection exposure system for manufacturing semiconductor device, has filter comprising grid strips that are provided in filter to absorb or to reflect the stray light outside the beam paths
09/20/2012DE102011015141A1 Verfahren zum Herstellen eines reflektiven optischen Bauelements für eine EUV-Projektionsbelichtungsanlage und derartiges Bauelement A method for producing a reflective optical component for EUV projection exposure apparatus and such a component
09/20/2012DE102011005778A1 Optisches Element An optical element
09/20/2012DE102011005543A1 Verfahren zur Korrektur der Oberflächenform eines Spiegels A method of correcting the surface form of a mirror
09/20/2012DE102011005483A1 Method for operating lighting device of microlithographic projection exposure system utilized for manufacturing e.g. LCD, involves carrying out illumination of area of optical element with short duration than illumination of another area
09/19/2012EP2500777A1 Method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices having patterned material layers with line-space dimensions of 50 nm and less
09/19/2012EP2500776A2 Method for optimization of photoresist exposure parameters in photolithography process and device for implementing the method
09/19/2012EP2500775A2 Patterning process and composition for forming silicon-containing film usable therefor
09/19/2012EP2499659A1 Curable composition for imprints, patterning method and pattern
09/19/2012EP2499529A1 Imaging optics