Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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10/03/2012 | CN202472238U Light energy monitoring system for lithography system |
10/03/2012 | CN202472009U Glasses formed by intelligent antifog resin eyeglasses |
10/03/2012 | CN1988956B Process for the photoactivation and use of a catalyst by an inverted two-stage procedure |
10/03/2012 | CN1784487B Non-aqueous, non-corrosive microelectronic cleaning compositions |
10/03/2012 | CN1442752B Anticorrosion image improved material |
10/03/2012 | CN102714707A Image projection apparatus and method |
10/03/2012 | CN102714157A Spin-on formulation and method for stripping an ion implanted photoresist |
10/03/2012 | CN102714141A Liquid-immersion member, exposing device, exposing method, and device manufacturing method |
10/03/2012 | CN102713761A Arrangement for and method of characterising the polarisation properties of an optical system |
10/03/2012 | CN102713760A Light irradiation device, light irradiation method and liquid crystal panel manufacturing method |
10/03/2012 | CN102713759A Pattern generation system |
10/03/2012 | CN102713758A Composition for the bottom layer of a resist, and method using same to manufacture a semiconductor integrated circuit device |
10/03/2012 | CN102713757A Composition for bottom layer of resist, and method using same to manufacture semiconductor integrated circuit device |
10/03/2012 | CN102713756A Light-sensitive polymer composition, method for producing pattern, and electronic component |
10/03/2012 | CN102713755A Hydrogel patterning and cell culture product |
10/03/2012 | CN102713754A 感光树脂组合物 A photosensitive resin composition |
10/03/2012 | CN102713753A Positive photosensitive resin composition, method for producing patterned cured film and electronic component |
10/03/2012 | CN102713752A Method and process for metallic stamp replication for large area nanopatterns |
10/03/2012 | CN102713751A Injection molding tools with micro/nano-meter pattern |
10/03/2012 | CN102713695A Method for exposing color filter base |
10/03/2012 | CN102713694A Method for exposing color filter base |
10/03/2012 | CN102713690A Mirror for the EUV wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objective |
10/03/2012 | CN102712664A Compound |
10/03/2012 | CN102712599A Novel sulfonic acid derivative compound and novel naphthalic acid derivative compound |
10/03/2012 | CN102712561A Bicyclohexane derivative and production method for same |
10/03/2012 | CN102707588A Positioning alignment apparatus of double-side driving workpiece platform without being connected by cross beam |
10/03/2012 | CN102707587A Technology for stripping metal of touch screen |
10/03/2012 | CN102707586A Prebaking device and exhaust method of prebaking device |
10/03/2012 | CN102707585A Photoresist recovery system |
10/03/2012 | CN102707584A Double-light-beam exposure system and method for manufacturing photonic crystal mask layer |
10/03/2012 | CN102707583A Multi-light-beam exposure system and method for manufacturing photonic crystal mask layer |
10/03/2012 | CN102707582A Light source-mask synchronous optimization based on Abbe vector imaging model |
10/03/2012 | CN102707581A Distortion compensation method of lithography objective |
10/03/2012 | CN102707580A Hermetic sealing and gas-liquid separation and recovery device for immersed photoetching machine |
10/03/2012 | CN102707579A Driver switching device used in position exchange of double workpiece benches |
10/03/2012 | CN102707578A Laser ruler measurement signal switching device and method used in exchange process of double benches |
10/03/2012 | CN102707577A Servo-controlling system of macro-micro mechanism and control method thereof |
10/03/2012 | CN102707576A Work structure for providing scanning path of immersion photoetching machine |
10/03/2012 | CN102707575A Mask plate and method for manufacturing array substrate |
10/03/2012 | CN102707574A Lithographic apparatus and device manufacturing method |
10/03/2012 | CN102707573A Lithographic apparatus and stage system |
10/03/2012 | CN102707572A Device and method for scanning and spraying photoresist on convex spherical surface |
10/03/2012 | CN102707571A Photosensitive element |
10/03/2012 | CN102707570A Photosensitive resin composition, interval body and liquid display component comprising the same |
10/03/2012 | CN102707569A Solder resist composition and printed circuit board |
10/03/2012 | CN102707568A Photo-etching method of bottom surface of multi-step apparatus structure |
10/03/2012 | CN102707567A Flexible-substrate-based nano-imprint template replication method |
10/03/2012 | CN102707566A Photo-etching method |
10/03/2012 | CN102707565A Manufacturing method of black matrix, color filter and display device |
10/03/2012 | CN102707564A Color filter and manufacturing method thereof |
10/03/2012 | CN102707415A Photoetching projection objective |
10/03/2012 | CN102707414A Photoetching projection objective |
10/03/2012 | CN102707404A Optical element X, Y and theta Z three-freedom-degree jogging regulation device |
10/03/2012 | CN102707378A Method for manufacturing silicone micro-nano optical structure by using imprinting technology |
10/03/2012 | CN102707357A Color filter and manufacturing method thereof |
10/03/2012 | CN102707355A Transreflective color filter and manufacturing method thereof |
10/03/2012 | CN102707353A Color filter and method for producing same |
10/03/2012 | CN102707352A Color filter and method for manufacturing same |
10/03/2012 | CN102707351A The producing of diffraction optical element with structured glass coating |
10/03/2012 | CN102706785A Method for testing blocking ability of photoresist layer for ion implantation |
10/03/2012 | CN102702431A Cyclohexyl copolymer resin and preparation method thereof as well as color photoresist and preparation method thereof |
10/03/2012 | CN102702406A Photosensitive resin and preparation method and application thereof |
10/03/2012 | CN102702073A Oxime ester photoinitiators |
10/03/2012 | CN102701142A Wafer-integrated micro-lens optical system manufacturing method and apparatus structure |
10/03/2012 | CN102393606B Heat-sensitive positive image CTP (Computer To Plate) photosensitive resist liquid and preparation method thereof |
10/03/2012 | CN102200688B Photosensitive resin composition, black matrix prepared from the photosensitive resin composition, and application of the black matrix |
10/03/2012 | CN102183875B Roller-type ultraviolet ray soft stamping method |
10/03/2012 | CN102169219B Radial adjustment device for optical system |
10/03/2012 | CN102157629B Method for manufacturing graphical sapphire substrate |
10/03/2012 | CN102147567B Cell-based hierarchical optical proximity correction (OPC) method |
10/03/2012 | CN102129178B Photoetching mark structure for SiGeC device |
10/03/2012 | CN102109769B Joint adjusting device and joint adjusting method of workpiece stage interferometer and mask stage interferometer |
10/03/2012 | CN102087482B Synchronized motion error correction and control system of photoetching machine worktable |
10/03/2012 | CN102073225B Precision rotating, positioning and focusing system of nano-photon straight write head |
10/03/2012 | CN102043341B Alignment signal acquisition system for photo-etching equipment and alignment method |
10/03/2012 | CN102043340B Method for uniformly spraying photoresist |
10/03/2012 | CN101995709B Fringing field switching (FFS) type thin film transistor liquid crystal display (TFT-LCD) array substrate and manufacturing method thereof |
10/03/2012 | CN101989083B Photoresist management system of glue spreader |
10/03/2012 | CN101974119B Nano silicon containing deep ultraviolet positive photoresist and forming resin thereof |
10/03/2012 | CN101943865B Alignment marks for photoetching equipment and alignment method |
10/03/2012 | CN101937879B Preparation technique of SiGe Bi-CMOS appliance |
10/03/2012 | CN101937838B Methods of forming electronic devices |
10/03/2012 | CN101930169B Separator of stamping die |
10/03/2012 | CN101924013B Method for increasing photo-etching alignment precision after extension |
10/03/2012 | CN101872130B Lithographic projection apparatus |
10/03/2012 | CN101866115B Lithographic apparatus, positioning system, and positioning method |
10/03/2012 | CN101840153B Metal artware relief color-painting method |
10/03/2012 | CN101788763B Compositions and processes for immersion lithography |
10/03/2012 | CN101782723B Pulse modifier with adjustable etendue |
10/03/2012 | CN101750902B Atomization effect compensation method of exposure conditions of diverse electron beams and exposure method thereof |
10/03/2012 | CN101740334B Photoetching pretreating method and photoetching method |
10/03/2012 | CN101581884B Intaglio printing plate, production method for intaglio printing plate, production method for electronic substrate, and production method for display device |
10/03/2012 | CN101482893B Semiconductor-device manufacturing method |
10/03/2012 | CN101454721B Alkali developable black photosensitive resin composition for formation of light-tight partition |
10/03/2012 | CN101414534B 电子束曝光系统 Electron beam exposure system |
10/03/2012 | CN101387830B Radiation-sensitive resin composition for forming a colored layer and color filter |
10/03/2012 | CN101349865B Photosensitive compositions, curable compositions, color filters, and method for manufacturing the same |
10/03/2012 | CN101324755B Radiation sensitive resin composition, interlayer dielectric and microlens, and method for producing thereof |
10/03/2012 | CN101320220B Exposure ploting device |
10/03/2012 | CN101313246B Radiation-sensitive resin composition |