Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
09/2012
09/19/2012CN202443247U Exposure device based on adjustable mask plate
09/19/2012CN202443246U Digital ultraviolet exposure quantity controller
09/19/2012CN102687079A Method for processing waste solution in plate-making process of photosensitive lithographic printing plate
09/19/2012CN102687078A Exposure apparatus, liquid crystal display device, and method for manufacturing liquid crystal display device
09/19/2012CN102687077A An optical imaging writer system
09/19/2012CN102687076A Plate monitoring system
09/19/2012CN102687075A Composition for the bottom layer of a resist, and method using same to manufacture a semiconductor integrated circuit device
09/19/2012CN102687074A Lithographic printing plate precursors
09/19/2012CN102687071A Reflective-layer-equipped substrate for EUV lithography, reflective mask blank for EUV lithography, reflective mask for EUV lithography, and process for producing reflective-layer-equipped substrate
09/19/2012CN102687067A Photosensitive resin composition for photospacer, photosensitive resin transfer material, photospacer and process for production thereof, substrate for liquid crystal display device, and liquid crystal display device
09/19/2012CN102686642A Fluorinated coating and phototools made therewith
09/19/2012CN102686410A Method for manufacturing flexographic printing plate and flexographic printing plate
09/19/2012CN102686409A Support for planographic printing plate, method for producing support for planographic printing plate, and planographic printing original plate
09/19/2012CN102686057A Electronic device shell and manufacturing method thereof
09/19/2012CN102683191A Method forming gate pattern and semiconductor device
09/19/2012CN102683167A Method for preparing X-ray diffractive optical element with high aspect ratio based on nanometer island substrate
09/19/2012CN102681370A Photo-etching overlay method and method for improving breakdown stability of laterally diffused metal oxide semiconductor (LDMOS)
09/19/2012CN102681368A Pattern formation method, pattern formation device, and device fabrication method
09/19/2012CN102681367A Developer compositions and methods of forming photolithographic patterns
09/19/2012CN102681366A Exposure light path system in production of concave holographic grating and method for adjusting gyration center
09/19/2012CN102681365A Projection objective lens wave aberration detection device and method
09/19/2012CN102681364A Six-degree-of-freedom magnetic suspension micro-positioner
09/19/2012CN102681363A Multi-stage exchange system and exchange method for multi-station silicon wafer stage
09/19/2012CN102681362A Apparatus with plasma radiation source and method of forming a beam of radiation and lithographic apparatus
09/19/2012CN102681361A Photoetching simulation method and device
09/19/2012CN102681360A Alignment method for realizing circuit board double-sided figure alignment in laser imaging system
09/19/2012CN102681359A Method for measuring time delay by synchronous signal trigger sweep
09/19/2012CN102681358A Space image detection-based projection objective wave aberration in-situ measurement method
09/19/2012CN102681357A Design method for extreme ultraviolet photoetching projection lens
09/19/2012CN102681356A Local exposure method and local exposure device
09/19/2012CN102681355A Scanning data correcting device and drawing device
09/19/2012CN102681354A Decision method and computer
09/19/2012CN102681353A Projection system, lithographic apparatus and device manufacturing method
09/19/2012CN102681352A 光刻设备 Lithography equipment
09/19/2012CN102681351A Lithographic apparatus and device manufacturing method
09/19/2012CN102681350A Local site exposure apparatus
09/19/2012CN102681349A Work-piece platform
09/19/2012CN102681348A Photoresist compositions and methods of forming photolithographic patterns
09/19/2012CN102681347A Colored photosensitive resin composition
09/19/2012CN102681346A Colored photosensitive resin composition
09/19/2012CN102681345A Colored photosensitive resin composition
09/19/2012CN102681344A Photosensitive resin composition, low dielectric constant light shielding layer and liquid crystal display apparatus using the same
09/19/2012CN102681343A Colored photosensitive resin composition
09/19/2012CN102681342A Photosensitive resin for ultraviolet photo-curing ink and preparation method thereof
09/19/2012CN102681341A Photoresist compositions and methods of forming photolithographic patterns
09/19/2012CN102681340A Method for producing composition for the production of photoresist
09/19/2012CN102681339A Solvent or solvent composition for manufacturing photoresist
09/19/2012CN102681338A Resist pattern improving material, method for forming resist pattern, method for producing semiconductor device, and semiconductor device
09/19/2012CN102681337A Microstructural materials and fabrication method thereof
09/19/2012CN102681336A Compositions comprising base-reactive component and processes for photolithography
09/19/2012CN102681335A Method for preparing phase type diffraction optical element according to wet etching
09/19/2012CN102681332A Resist film peeling method, mask blank manufacturing method and transfer mask manufacturing method
09/19/2012CN102681330A Photomask and method for forming overlay mark using the same and precision improvement method for counterpoint of secondary pattern technology
09/19/2012CN102681261A Method for producing spacer on substrate
09/19/2012CN102681170A Method for manufacturing array phase zone photon sieve dodging device
09/19/2012CN102681167A Optical apparatus, method of scanning, lithographic apparatus and device manufacturing method
09/19/2012CN102681126A Lens fixing device and method for fixing lens
09/19/2012CN102681083A Light guide plate with concave microstructure and manufacturing method thereof
09/19/2012CN102681068A Colored filter and manufacturing method thereof
09/19/2012CN102681058A Preparing method of porous-alumina-based phase transmission grating
09/19/2012CN102681046A Method for preparing large-area NOA73 curved-surface micro lens array
09/19/2012CN102676081A Photosensitive film protective film and preparation method thereof
09/19/2012CN102675973A Liquid state photosensitive line ink and preparation method thereof
09/19/2012CN102675514A Preparation method of aqueous nano-pigment dispersion liquid
09/19/2012CN102675159A Photoacid generating monomer and precursor thereof
09/19/2012CN102673096A Thermal positive-type planographic original printing plate and method of making planographic printing plate
09/19/2012CN102671832A Spin coating device
09/19/2012CN102162894B Optical element centering device in projection lens system
09/19/2012CN102141738B Nanometer-level automatic focusing system for projection lithography
09/19/2012CN102140116B Method for synthesizing silicon-containing polymerizing monomer terminated by vinyl ether and allyl ether
09/19/2012CN102096190B Metallic photo-thermal drive microswitch and manufacturing method thereof
09/19/2012CN102012644B Method for reducing characteristic dimension of photoresist pattern
09/19/2012CN101872132B Exposing device, exposing light beam illuminating method and method for manufacturing display panel substrate
09/19/2012CN101857825B Composition for stripping and cleaning and use thereof
09/19/2012CN101641642B Photosensitive resin, method for preparing the resin, photosensitive resin composition and cured product of the resin composition
09/19/2012CN101630123B Manufacturing method of lens array
09/19/2012CN101625523B Resist patterning forming process and manufacturing method of photo mask
09/19/2012CN101576712B Cavity manufacturing method
09/19/2012CN101452141B Display device and method of fabricating the same
09/19/2012CN101271267B Production method of exposure light shield and thin film graphic pattern layer
09/19/2012CN101206397B Photosensitive resin composition and method for manufacturing roasts obtained thereby
09/19/2012CN101000465B Rinse processing method and developing processing apparatus
09/18/2012US8269946 Cleanup method for optics in immersion lithography supplying cleaning liquid at different times than immersion liquid
09/18/2012US8269944 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
09/18/2012US8269358 Bis(aminophenol) derivative, process for producing same, polyamide resin, positive photosensitive resin composition, protective film, interlayer dielectric film, semiconductor device, and display element
09/18/2012US8268657 Laser induced thermal imaging apparatus
09/18/2012US8268546 Variations in wettability; optically forming pattern; photocatalyst action upon pattern-wisw exposure;color filters, lenses, printing plates
09/18/2012US8268545 Formation of a device using block copolymer lithography
09/18/2012US8268544 Stamp for patterning, method for manufacturing such stamp and method for manufacturing an object using the stamp
09/18/2012US8268543 Methods of forming patterns on substrates
09/18/2012US8268542 Method for reducing side lobe printing using a barrier layer
09/18/2012US8268541 Mask and blank storage inner gas
09/18/2012US8268540 Method of manufacturing light receiving device
09/18/2012US8268538 Method for producing a thin film transistor
09/18/2012US8268537 Method for manufacturing printed circuit board
09/18/2012US8268535 Pattern formation method
09/18/2012US8268534 Self-aligned, sub-wavelength optical lithography
09/18/2012US8268533 Flexographic printing forme precursor for laser engraving
09/18/2012US8268531 Photoacid generator compounds and compositions
09/18/2012US8268530 Positive resist composition, method of forming resist pattern, polymeric compound, and compound