Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
09/2012
09/18/2012US8268529 Positive resist composition, method of forming resist pattern using the same, and polymeric compound
09/18/2012US8268528 Resist composition and patterning process
09/18/2012US8268518 Method and lithography device with a mask reflecting light
09/18/2012US8268220 Imprint lithography method
09/18/2012US8268181 Plasma ashing apparatus and endpoint detection process
09/13/2012WO2012121418A2 Nanoimprinting method and nanoimprinting apparatus for executing the nanoimprinting method
09/13/2012WO2012121416A2 Nanoimprinting mold
09/13/2012WO2012121401A2 Nanoimprinting method
09/13/2012WO2012121278A1 Resist pattern formation method and resist composition for negative-working image development
09/13/2012WO2012121235A1 Photosensitive composition, cured article, and method for producing actinically cured article
09/13/2012WO2012121138A1 Method for forming resist pattern, method for forming wiring pattern, and method for manufacturing active matrix substrate
09/13/2012WO2012120946A1 Apparatus for developing lithographic printing plate and method for developing lithographic printing plate
09/13/2012WO2012120280A1 Laser fabrication system and method
09/13/2012WO2012119672A1 Lithograpic apparatus, spectral purity filter and device manufacturing method
09/13/2012WO2012119502A1 Split type aerostatic bearing
09/13/2012WO2012083587A8 Cleaning liquid for thick film photoresists
09/13/2012US20120231517 Miniaturized electroporation-ready microwell aray for high-throughput genomic screening
09/13/2012US20120231397 Wafer Fabrication Process
09/13/2012US20120231396 Resin pattern, method for producing the pattern, method for producing mems structure, method for manufacturing semiconductor device, and method for producing plated pattern
09/13/2012US20120231395 Iterative rinse for semiconductor fabrication
09/13/2012US20120231394 Imageable elements with colorants
09/13/2012US20120231393 Actinic-ray- or radiation-sensitive resin composition and method of forming a pattern using the same
09/13/2012US20120231392 Salt, resist composition and method for producing resist pattern
09/13/2012US20120231378 Reflective layer-equipped substrate for euv lithography, reflective mask blank for euv lithography, reflective mask for euv lithography, and process for production of the reflective layer-equipped substrate
09/13/2012US20120231377 Photopolymer formulation having different writing comonomers
09/13/2012US20120231376 Fluorourethane as an additive in a photopolymer formulation
09/13/2012US20120229739 Liquid crystal display device and manufacturing method therefor
09/13/2012US20120229556 Photosensitive resin composition, method for manufacturing structural body, and liquid discharge head
09/13/2012US20120228804 Near-field exposure mask, resist pattern forming method, device manufacturing method, near-field exposure method, pattern forming method, near-field optical lithography member, and near-field nanoimprint method
09/13/2012US20120228747 Resist pattern improving material, method for forming resist pattern, method for producing semiconductor device, and semiconductor device
09/12/2012EP2498275A2 EUV light source, EUV exposure system, and production method for semiconductor device
09/12/2012EP2498133A2 Resin pattern, method for producing the pattern, method for producing MEMS structure, method for manufacturing semiconductor device, and method for producing plated pattern
09/12/2012EP2498132A1 Illumination optical apparatus, exposure apparatus, and device manufacturing method
09/12/2012EP2498131A2 Exposure apparatus and method for producing device
09/12/2012EP2498130A2 Curable composition for solid-state imaging device, and photosensitive layer, permanent pattern, wafer-level lens, solid-state imaging device and pattern forming method each using the composition
09/12/2012EP2498129A1 Focus test mask, focus measuring method, exposure apparatus, and exposure method
09/12/2012EP2497837A1 Antireflective coatings for high-resolution photolithographic synthesis of DNA array
09/12/2012EP2497083A1 Photopolymer formulation having different writing comonomers
09/12/2012EP2496989A1 Method and device for nanoimprint lithography
09/12/2012EP2496617A2 Urethanes used as additives in a photopolymer formulation
09/12/2012EP2496549A2 Novel non-crystallizing methacrylates, production and use thereof
09/12/2012EP2496198A1 Method of producing color change in overlapping layers
09/12/2012CN202433674U Device for maintaining stability of developing solution
09/12/2012CN202433673U Horizontal developer conveying device
09/12/2012CN202433672U Spraying and developing system of developer
09/12/2012CN202433671U Non-contact conveying device
09/12/2012CN202433670U Developer
09/12/2012CN202433669U Developer machine with plate discharging sensing device
09/12/2012CN202432193U Supporting table with high stability
09/12/2012CN1970657B Printing oil ink and production method of coating film using the oil ink
09/12/2012CN102668046A 半导体元件基板 Semiconductor element substrate
09/12/2012CN102668025A Exposure device
09/12/2012CN102667935A Photopolymer formulation having different writing comonomers
09/12/2012CN102667934A Fluorourethane as an additive in a photopolymer formulation
09/12/2012CN102667628A Nonaqueous resist stripper composition
09/12/2012CN102667627A Exposure method and exposure device
09/12/2012CN102667626A Methods of making patterned structures of fluorine-containing polymeric materials and fluorine-containing polymers
09/12/2012CN102667625A Positive photosensitive resin composition, cured film formed from the same, and device having cured film
09/12/2012CN102667624A Negative-working imageable elements
09/12/2012CN102667623A Methods of directed self-assembly and layered structures formed therefrom
09/12/2012CN102667622A Photomask
09/12/2012CN102667531A Black curable composition for wafer-level lens, and wafer-level lens
09/12/2012CN102666732A Compound and color filter
09/12/2012CN102666469A Novel non-crystallizing methacrylates, production and use thereof
09/12/2012CN102666461A Cyclic compound, process for production thereof, radiation-sensitive composition, and resist pattern formation method
09/12/2012CN102666113A Carrier sheet for a photosensitive printing element
09/12/2012CN102662313A Photoetching alignment parameter prediction method and photoetching method
09/12/2012CN102662312A Cleaning fluid and cleaning method for light sensing coating on metal matrix poly styrene (PS) plate
09/12/2012CN102662311A Chemical conveying device, developing device and developing system
09/12/2012CN102662310A Method for detecting template indexer
09/12/2012CN102662309A System and method for mask verification using individual mask error model
09/12/2012CN102662308A Automatic aligning image processing method of lithography machine
09/12/2012CN102662307A High-resolution projection optical system
09/12/2012CN102662306A Photosensitive element, method for formation of resist pattern, and method for production of print circuit board
09/12/2012CN102662305A Micro-lens mould structure and manufacturing method thereof
09/12/2012CN102662304A New process for double-side lithography etching
09/12/2012CN102662247A Method for manufacturing a patterned retarder
09/12/2012CN102054498B Method for preparing photopolymer holographic storage optical disk
09/12/2012CN101201537B Checking device for grey mask, manufacture method and pattern transprinting method thereof
09/11/2012USRE43643 Lithographic manufacturing process, lithographic projection apparatus, and device manufactured thereby
09/11/2012US8264663 System for accumulating exposure energy information of wafer and management method of mask for exposure utilizing exposure energy information of wafer accumulated with the system
09/11/2012US8264466 Touch screen having reduced visibility transparent conductor pattern
09/11/2012US8263675 Photosensitive resin composition for color filter and color filter made using the same
09/11/2012US8263442 Thin film transistor substrate of horizontal electric field type liquid crystal display device and fabricating method thereof
09/11/2012US8263323 Method of forming fine pattern using block copolymer
09/11/2012US8263322 Method of forming resist pattern
09/11/2012US8263321 Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer
09/11/2012US8263320 Method, program and system for processing substrate
09/11/2012US8263319 Display member exposing method and plasma display member manufacturing method
09/11/2012US8263318 Methods for mastering microstructures through a substrate using negative photoresist
09/11/2012US8263316 Electronic device manufacture
09/11/2012US8263315 Pattern-forming method
09/11/2012US8263314 Method for preparing a composite printing form
09/11/2012US8263313 Photosensitive resin composition and photosensitive film made with the same
09/11/2012US8263312 Antireflective coating material
09/11/2012US8263309 Composition and method for reducing pattern collapse
09/11/2012US8263308 Polyimide silicone, photosensitive resin composition containing the novel polyimide silicone, and method for pattern formation
09/11/2012US8263307 Positive resist composition and method of forming resist pattern
09/11/2012US8263306 Use of blended solvents in defectivity prevention
09/11/2012US8263294 Lithographic mask and manufacturing method thereof
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