| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/18/2012 | CN101776846B Light-cured component for laser stereo lithography |
| 07/18/2012 | CN101750887B Photosensitive resin composition |
| 07/18/2012 | CN101735344B Photo-iniciative polymerizer comprising oxime ester with unsaturated double bonds and photosensative resin composition having the same |
| 07/18/2012 | CN101730864B Spacer lithography |
| 07/18/2012 | CN101727009B Liquid processing apparatus and liquid processing method |
| 07/18/2012 | CN101727003B Photosensitive resin composition for color filter and color filter prepared using the same |
| 07/18/2012 | CN101718954B Unit for providing chemical liquid, apparatus and method for treating substrate using the same |
| 07/18/2012 | CN101675390B Water-soluble resin composition for the formation of micropatterns and process for the formation of micropatterns with the same |
| 07/18/2012 | CN101675388B Photosensitive resin composition, photosensitive element, method of forming resist pattern, and process for producing printed wiring board |
| 07/18/2012 | CN101659813B Pigment dispersion, pigment photoresistor and preparation thereof |
| 07/18/2012 | CN101652408B Method for production of crosslinked polyvinyl acetal resin, and crosslinked polyvinyl acetal resin |
| 07/18/2012 | CN101639631B Exposure apparatus, exposure method, and method for producing elements |
| 07/18/2012 | CN101611352B Projection optical apparatus, exposure method and device manufacturing method |
| 07/18/2012 | CN101592870B Monitoring method of lithography equipment focus |
| 07/18/2012 | CN101556439B Method for removing polyimide (PI) film from simulation substrate |
| 07/18/2012 | CN101551545B Method for manufacturing color film substrate |
| 07/18/2012 | CN101515113B Radioactive ray sensibility resin composition, interlayer insulating film, microlens and method of forming the same |
| 07/18/2012 | CN101470349B Resist composition, method of forming resist pattern, novel compound, and acid generator |
| 07/18/2012 | CN101329510B Polymer having unsaturated side chain, radiation-sensitive resin composition and spacer for liquid crystal display element |
| 07/18/2012 | CN101277566B Light source device and exposure device using the same |
| 07/18/2012 | CN101261452B Inspection method and apparatus, lithographic processing cell and device manufacturing method |
| 07/18/2012 | CN101231936B Light source apparatus |
| 07/18/2012 | CN101216669B Photoresist composition and method for forming pattern of a semiconductor device |
| 07/18/2012 | CN101171550B Method for enhancing optical stability of three-dimensional micromolded product |
| 07/18/2012 | CN101101444B Light-sensitive resin composition, light-sensitive transfer printing material, separating wall and manufacturing method thereof, color filter and manufacturing method thereof, and displaying device |
| 07/18/2012 | CN101093353B Printing apparatus, patterning method, and method of fabricating liquid crystal display device using the same |
| 07/18/2012 | CN101034260B Photosensitive resin composition |
| 07/17/2012 | US8222636 Method for forming pattern, thin film transistor, display device, method for manufacturing thereof, and television apparatus |
| 07/17/2012 | US8222051 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server |
| 07/17/2012 | US8221965 Antireflective coating compositions |
| 07/17/2012 | US8221964 Integrated color mask |
| 07/17/2012 | US8221963 Method for producing fine structure |
| 07/17/2012 | US8221962 Method of manufacturing electronic device |
| 07/17/2012 | US8221961 Method of manufacturing semiconductor devices |
| 07/17/2012 | US8221960 On-press development of imaged elements |
| 07/17/2012 | US8221959 An aluminum support having a hydrophilic surface; photosensitive layer comprising a binder polymer comprising a pigment dispersed with a dispersant which is free from a carboxyl, phosphonate, or phosphate group; antisoilants, durability, discoloration inhibition |
| 07/17/2012 | US8221958 Photosensitive paste and sintered layer |
| 07/17/2012 | US8221957 Planographic printing plate precursor and printing method using the same |
| 07/17/2012 | US8221956 Resist composition for immersion exposure, method of forming resist pattern, and flourine-containing polymeric compound |
| 07/17/2012 | US8221665 Manufacturing a replication tool, sub-master or replica |
| 07/12/2012 | WO2012094545A1 Method of making holographic recording materials and articles formed thereby |
| 07/12/2012 | WO2012094068A1 Method of improving print performance in flexographic printing plates |
| 07/12/2012 | WO2012094011A1 Method and system for coherence reduction |
| 07/12/2012 | WO2012093736A1 Method for cleansing nanoimprinting molds |
| 07/12/2012 | WO2012093683A1 Device for depositing molecular resist composed of low-molecular-weight compound |
| 07/12/2012 | WO2012093534A1 Exposure device and exposure method |
| 07/12/2012 | WO2012066489A3 Method and apparatus for printing high-resolution two-dimensional periodic patterns |
| 07/12/2012 | WO2012051380A3 Composition for and method of suppressing titanium nitride corrosion |
| 07/12/2012 | US20120178650 Photochemical methods and photoactive compounds for modifying surfaces |
| 07/12/2012 | US20120178261 Silicon-containing composition having sulfonamide group for forming resist underlayer film |
| 07/12/2012 | US20120178029 Developable bottom antireflective coating compositions especially suitable for ion implant applications |
| 07/12/2012 | US20120178028 Spatial light modulator unit, illumination optical system, exposure device, and device manufacturing method |
| 07/12/2012 | US20120178027 Multiple exposure photolithography methods |
| 07/12/2012 | US20120178026 Imaging devices, methods of forming same, and methods of forming semiconductor device structures |
| 07/12/2012 | US20120178025 Charged particle beam drawing apparatus and article manufacturing method |
| 07/12/2012 | US20120178024 Polymer, radiation-sensitive composition, monomer, and method of producing compound |
| 07/12/2012 | US20120178023 (meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it |
| 07/12/2012 | US20120178022 Positive photosensitive resin composition, cured film obtained using same, and optical device |
| 07/12/2012 | US20120178021 Resin and photoresist composition comprising the same |
| 07/12/2012 | US20120178020 Method and composition for reducing waste in photo-imaging applications |
| 07/12/2012 | US20120177716 Methods for Making Controlled Delivery Devices Having Zero Order Kinetics |
| 07/12/2012 | US20120176680 Patterned backside optical coating on transparent substrate |
| 07/12/2012 | US20120176571 Polymerizable composition, color filter, and method of producing the same, solid-state imaging device, and planographic printing plate precursor, and novel compound |
| 07/12/2012 | US20120174808 Silicon-based explosive devices and methods of manufacture |
| 07/12/2012 | DE102011085358B3 Optical arrangement i.e. projection lens, for use in extreme UV lithography system, has substrates, where increase of coefficients of one of substrates and/or another increase of coefficients of other substrate includes negative sign |
| 07/12/2012 | DE102010062720B4 EUV-Lithographiesystem EUV lithography system |
| 07/12/2012 | DE102010047832A1 Optical element e.g. lens of microlithographic projection exposure system used in manufacture of integrated circuit, has excitation light mirror that is arranged to irradiate excitation light with respect to region of optical material |
| 07/12/2012 | CA2820793A1 Method of improving print performance in flexographic printing plates |
| 07/11/2012 | EP2475000A1 Processing agent composition for semiconductor surface and method for processing semiconductor surface using same |
| 07/11/2012 | EP2474998A1 Coating material composition for liquid immersion exposure apparatus, laminate, method for forming laminate, and liquid immersion exposure apparatus |
| 07/11/2012 | EP2474997A1 Plasma light source system |
| 07/11/2012 | EP2474862A1 Resist remover composition and method for removing resist using the composition |
| 07/11/2012 | EP2474861A1 Resist underlayer film composition and patterning process using the same |
| 07/11/2012 | EP2474565A1 Cyclic compound, manufacturing method therefor, radiation-sensitive composition, and method for forming a resist pattern |
| 07/11/2012 | EP2474538A1 Cyclic compound, process for production of the cyclic compound, radiation-sensitive composition, and method for formation of resist pattern |
| 07/11/2012 | EP2474518A1 Cyclic compound, process for production of the cyclic compound, radiation-sensitive composition, and method for formation of resist pattern |
| 07/11/2012 | EP2474372A2 Super-hydrophobic microstructure |
| 07/11/2012 | EP2473881A2 Pattern generation system |
| 07/11/2012 | EP2473565A1 Color curable composition and method of preparing the same, color filter and method of producing the same, and solid-state image pick-up device |
| 07/11/2012 | EP2297611B1 On-press developable imageable elements |
| 07/11/2012 | EP2233977B1 Composition for formation of top antireflective film, and pattern formation method using the composition |
| 07/11/2012 | EP1616888B1 Resin for under-layer material, under-layer material, laminate and method for forming resist pattern |
| 07/11/2012 | EP1289769B1 Lithographic printing form precursor and method of producing a lithographic printing form |
| 07/11/2012 | EP1200341B1 Patterned carbon nanotube films |
| 07/11/2012 | CN202331222U 显影机废液箱报警控制装置及显影控制系统 Developing machine waste tank and alarm control means developing control system |
| 07/11/2012 | CN202331010U 烘烤设备 Baking Equipment |
| 07/11/2012 | CN202331009U 一种工件台密珠轴承二维运动装置 A work station dense ball bearing two-dimensional motion device |
| 07/11/2012 | CN1839355B Stripping and cleaning compositions for microelectronics |
| 07/11/2012 | CN102576660A Chemical liquid supply device and chemical liquid supply method |
| 07/11/2012 | CN102576199A Method and apparatus for treating substrates |
| 07/11/2012 | CN102576198A Plate developer with a configurable transport path |
| 07/11/2012 | CN102576197A Method of improving print performance in flexographic printing plates |
| 07/11/2012 | CN102576196A Reflective optical element and method for operating an EUV lithography apparatus |
| 07/11/2012 | CN102576195A Source collector apparatus, lithographic apparatus and device manufacturing method |
| 07/11/2012 | CN102576194A Spectral purity filter, lithographic apparatus, and device manufacturing method |
| 07/11/2012 | CN102576193A Positive-working photoimageable bottom antireflective coating |
| 07/11/2012 | CN102576192A Photosensitive resin composition |
| 07/11/2012 | CN102576191A Photosensitive resin composition and use thereof |
| 07/11/2012 | CN102576190A Colored photosensitive resin composition, color filter, and liquid crystal display device |
| 07/11/2012 | CN102576189A Method and device for active wedge error compensation between two objects that can be positioned substantially parallel to each other |