Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/2012
08/16/2012US20120208129 Process for forming an anti-oxidant metal layer on an electronic device
08/16/2012US20120208128 Resist composition, method of forming resist pattern and polymeric compound
08/16/2012US20120208127 Resist composition and patterning process
08/16/2012US20120208126 Novel cyanine dyes and lithographic printing plate precursors comprising such dyes
08/16/2012US20120208125 Resist composition and patterning process
08/16/2012US20120208124 Resist composition for euv, method for producing resist composition for euv, and method of forming resist pattern
08/16/2012US20120208115 Imaging optics
08/16/2012US20120208114 Pigment composition containing pyrimidines and derivatives thereof
08/16/2012US20120208113 Lithographic Processing Method, and Device Manufactured Thereby
08/16/2012US20120208112 Methods of manufacturing a mask blank substrate, a mask blank, a photomask, and a semiconductor device
08/16/2012US20120208109 Reflection hologram storage method
08/16/2012US20120207978 Actinic-ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same composition
08/16/2012US20120206705 Optical element and exposure apparatus
08/16/2012US20120205818 Self-aligned permanent on-chip interconnect structure formed by pitch splitting
08/16/2012DE102011078521A1 Apparatus for supplying fluid to subsystem of projection exposure apparatus for semiconductor lithography, has fluid line that includes constriction portion for partial fluid-mechanical suppression of flowing fluid
08/16/2012DE102011004182A1 Method for producing microlithography projection exposure apparatus, involves depositing glass material on turntable rotated to form round disk or ring of glass material which is separated by oxidizing silicon material
08/16/2012DE102011003928A1 Beleuchtungsoptik für die Projektionslithographie Illumination optics for projection lithography
08/15/2012EP2487543A2 Illumination lens for projection lithography
08/15/2012EP2487542A1 Mold-forming substrate and inspection method
08/15/2012EP2487148A1 Cyclic compound, method for producing same, radiation sensitive composition, and method for forming resist pattern
08/15/2012EP2486454A1 Plate monitoring system
08/15/2012EP2486453A1 Positive-working photoimageable bottom antireflective coating
08/15/2012EP2486452A1 Pattern forming method, chemical amplification resist composition and resist film
08/15/2012EP2486451A1 Negative-working imageable elements
08/15/2012EP2347036B1 Heterogenous liga method
08/15/2012EP2262848B1 Method for preparing a photo-crosslinkable composition
08/15/2012EP2208113B1 Illumination optical apparatus, exposure apparatus, and device manufacturing method
08/15/2012EP2158519B1 Optical device and method of in situ treating an euv optical component to enhance a reduced reflectivity
08/15/2012EP2122417B1 Fabrication of microstructures and nanostructures using etching resist
08/15/2012EP1975979B1 Coating apparatus and coating method
08/15/2012EP1565790B1 Radiation-sensitive elements and their storage stability
08/15/2012EP1297594B1 Gas discharge laser long life electrodes
08/15/2012CN202383420U System for detecting distance between mask and substrate and exposure machine
08/15/2012CN202383419U Maskless direct-write lithography machine with exposure horizontal line and vertical line of same width
08/15/2012CN202383418U High-resolution projection optical system for exposure of printed circuit board
08/15/2012CN102640058A Exposure apparatus
08/15/2012CN102640057A Catadioptric projection objective comprising deflection mirrors and projection exposure method
08/15/2012CN102640056A Optical arrangement in a microlithographic projection exposure apparatus
08/15/2012CN102640055A Uv-led curable compositions and inks
08/15/2012CN102640054A Photosensitive resin composition, laminate utilizing same, and solid-state imaging device
08/15/2012CN102640021A Optical member for euv lithography, and process for production of reflective-layer-attached substrate for euv lithography
08/15/2012CN102639501A Photoinitiators for uv-led curable compositions and inks
08/15/2012CN102636968A Holographic exposure device of any groove grating structure and exposure method thereof
08/15/2012CN102636967A Surface plasma nanometer photo-etching structure and method
08/15/2012CN102636966A Pattern formation method and pattern formation apparatus, exposure metho and exposure apparatus, and device manufacturing method
08/15/2012CN102636965A Super-resolution dry-method surface plasma photo-etching method
08/15/2012CN102636964A Lithographic apparatus and device manufacturing method
08/15/2012CN102636963A Inspection apparatus and method, lithographic apparatus, lithographic processing cell and device manufacturing method
08/15/2012CN102636962A Aerial image overlay test method and array base plate
08/15/2012CN102636961A Rotatory lithography machine
08/15/2012CN102636960A Unit for supplying treating liquid, and apparatus and method for treating substrate using the same
08/15/2012CN102636959A Decomposition and marking of semiconductor device design layout in double patterning lithography
08/15/2012CN102636958A Thin film structure capable of improving laser thermal etching graphics resolution and preparation method of thin film structure
08/15/2012CN102636957A Colored photosensitive resin composition and compound
08/15/2012CN102636956A Colored photosensitive resin composition
08/15/2012CN102636955A Photosensitive resin composition
08/15/2012CN102636954A Photocurable thermosetting resin composition, dry film and cured product thereof, and printed wiring board using the same
08/15/2012CN102636953A Mold-forming substrate and inspection method
08/15/2012CN102636904A Color filter and production method thereof as well as liquid crystal panel
08/15/2012CN102633984A Polyurethane-acrylate oligomer, and synthesis method and application thereof
08/15/2012CN102633321A Alkaline development plate punching waste water treating method and development treating method of planographic plate material
08/15/2012CN101710228B Imprint lithography processes and systems
08/15/2012CN101539568B Ice grip/photolithographic device for cooling/heating probes by convective heat transfer with gas
08/15/2012CN101125824B 锍化合物 Sulfonium compounds
08/15/2012CN101125823B Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same
08/15/2012CN101109898B Method for producing a three-dimensional object
08/14/2012US8243364 Reflective optical element and EUV lithography appliance
08/14/2012US8243253 Lyophobic run-off path to collect liquid for an immersion lithography apparatus
08/14/2012US8242470 Optical switching in a lithography system
08/14/2012US8241841 Patterning methods and products
08/14/2012US8241840 Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method
08/14/2012US8241838 Method of manufacturing semiconductor device
08/14/2012US8241837 Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor device
08/14/2012US8241836 Method of fabricating a line pattern in a photoresist layer by using a photomask having slanted unit patterns
08/14/2012US8241835 Device and method for preparing relief printing form
08/14/2012US8241833 Positive resist composition and pattern-forming method using the same
08/14/2012US8241832 Compositions and processes for photolithography
08/14/2012US8241831 Acid generating agent for chemically amplified resist compositions
08/14/2012US8241830 Positive resist composition and a pattern forming method using the same
08/14/2012US8241829 Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer
08/14/2012US8241822 Halogenated oxime derivatives and the use therof as latent acids
08/14/2012US8241819 Method for forming a volume holographic sensor in a porous medium
08/14/2012US8241707 Silsesquioxane resins
08/14/2012US8240943 On-press developable imageable elements
08/14/2012CA2571951C Photopolymerisable composition comprising triglycerides
08/09/2012WO2012105648A1 Composition for forming non-photosensitive resist underlayer film
08/09/2012WO2012105417A1 Photoresist composition
08/09/2012WO2012105393A1 Exposure device, liquid crystal display device, and method of manufacturing same
08/09/2012WO2012105382A1 Substrate treatment apparatus and substrate treatment method
08/09/2012WO2012105321A1 Acrylic acid ester derivative, polymer compound and photoresist composition
08/09/2012WO2012105288A1 Photosensitive resin composition for formation of microlenses
08/09/2012WO2012105178A1 Production method for film-like product, production apparatus for film-like product, and mask
08/09/2012WO2012104670A1 Optical system and extreme ultraviolet (euv) light generation system including the optical system
08/09/2012WO2012104669A1 Chamber apparatus and extreme ultraviolet (euv) light generation apparatus including the chamber apparatus
08/09/2012WO2012103933A1 Method and apparatus for correcting errors in an euv lithography system
08/09/2012WO2012080008A3 Method and apparatus for correcting errors on a wafer processed by a photolithographic mask
08/09/2012WO2012076188A8 Euv lithography system
08/09/2012WO2012064633A3 Nanoscale photolithography
08/09/2012US20120202349 Photo-imageable Hardmask with Dual Tones for Microphotolithography
08/09/2012US20120202159 Manufacturing method of metal structure in multi-layer substrate
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