| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/25/2012 | CN102608871A Lithographic apparatus and device manufacturing method |
| 07/25/2012 | CN102608870A Wave aberration measuring device and method |
| 07/25/2012 | CN102608869A Photoetching method under low-k1 condition |
| 07/25/2012 | CN102608868A Photosensitive element |
| 07/25/2012 | CN102608867A Photosensitive water developing corrosion-resistant composition and photosensitive water developing corrosion-resistant dry film |
| 07/25/2012 | CN102608866A Acrylic acid positive photoresist and preparation method thereof |
| 07/25/2012 | CN102608865A High-temperature-resisting transparent thick-film photoresist and application thereof in preparing LED phosphor layer |
| 07/25/2012 | CN102608864A Method for manufacturing nanoscale component with large height-width ratio |
| 07/25/2012 | CN102608863A Method for preparing diffraction optical element with large aspect ratio |
| 07/25/2012 | CN102608862A Method for producing device in structure with large height-to-width ratio |
| 07/25/2012 | CN102608861A Method for improving morphology of photoresist on periphery of silicon wafer |
| 07/25/2012 | CN102608860A Photoetching method, photomask combination and exposure system |
| 07/25/2012 | CN102608859A Mask plate and method for applying it to manufacture thin film transistor array substrate |
| 07/25/2012 | CN102608737A Extreme-ultraviolet-projection photoetching objective lens |
| 07/25/2012 | CN102608687A Large height-width ratio photon sieve and preparation method thereof |
| 07/25/2012 | CN102607772A Testing method for marginal adaptation of exposure table of exposure machine |
| 07/25/2012 | CN102604454A Nano stamping photoresist surface modifier |
| 07/25/2012 | CN102604429A Salts for dyes |
| 07/25/2012 | CN102603967A Water-soluble resin composition and method of forming fine patterns by using the same |
| 07/25/2012 | CN102603701A Monomers, polymers, photoresist compositions and methods of forming photolithographic patterns |
| 07/25/2012 | CN102603587A Sulfonium compound, photo-acid generator, and method for manufacturing the same |
| 07/25/2012 | CN102603586A Base reactive photoacid generators and photoresists comprising same |
| 07/25/2012 | CN102603579A Polymerizable photoacid generators |
| 07/25/2012 | CN102603578A Method of preparing photoacid-generating monomer |
| 07/25/2012 | CN102601084A Automatic cleaning device for exhaust duct and gluing and developing cabinet |
| 07/25/2012 | CN102323717B High fluorine-containing aromatic-aliphatic negative photoresist and application thereof to preparing polymer waveguide devices |
| 07/25/2012 | CN102269924B Method for optimizing attenuated phase-shifting mask (ATTPSM) of nonideal photoetching system based on Abbe vector imaging model |
| 07/25/2012 | CN102163547B Method for depositing photoresist on microelectronic or photoelectronic chip |
| 07/25/2012 | CN102141741B Micro leveling mechanism of projection objective of lithography machine |
| 07/25/2012 | CN102135728B Method for manufacturing three-dimensional nano grid structure based on one-dimensional soft template nanoimprinting |
| 07/25/2012 | CN102122116B Method and system for automatically controlling thickness of optical resist |
| 07/25/2012 | CN102081181B Method for preparing color separation grating by using chemical method |
| 07/25/2012 | CN102023389B Homogenizer of array partial zone photon sieve |
| 07/25/2012 | CN101963753B Multi-color photomask and method of manufacturing the same, and pattern transfer method |
| 07/25/2012 | CN101907631B Double-liquid capillary micro-flow control valve in micro-flow control chip, and manufacturing method thereof |
| 07/25/2012 | CN101900954B Slope monitoring method for post-exposure baking (PEB) hot plate of developer |
| 07/25/2012 | CN101842747B Corrosion inhibitor for semiconductor chip metal substrate and use method thereof |
| 07/25/2012 | CN101794086B Device and method for separating waste developer from DI water |
| 07/25/2012 | CN101738868B High-precision photoresist dispensing pump control device and control method thereof |
| 07/25/2012 | CN101738861B Light-sensitive resin composite and method for manufacturing printed circuit board using same |
| 07/25/2012 | CN101681092B Photomask substrate, photomask substrate forming member, photomask substrate manufacturing method, photomask, and exposure method using photomask |
| 07/25/2012 | CN101657759B Alkali-developable photosensitive resin composition and beta-diketone |
| 07/25/2012 | CN101628289B System and method for cleaning masks |
| 07/25/2012 | CN101561635B System and method for controlling positioning of bilateral driving device |
| 07/25/2012 | CN101501570B Photoresist composition and patterning method thereof |
| 07/25/2012 | CN101441416B Dry film photoresist and preparing method thereof |
| 07/25/2012 | CN101324752B Method for preparing polymer LCD photosensitive material capable of recording reflection holography |
| 07/25/2012 | CN101315518B Photomask testing method, photomask manufacture method, electronic component manufacture method |
| 07/25/2012 | CN101300289B Silsesquioxane-titania hybrid polymers |
| 07/25/2012 | CN101299133B Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method |
| 07/25/2012 | CN101281365B Material pattern, and mold, metal thin-film pattern, and methods of forming metal pattern |
| 07/25/2012 | CN101236359B Inspection method and apparatus, lithographic apparatus, lithographic processing cell |
| 07/25/2012 | CN101231461B Method for manufacturing optical element |
| 07/25/2012 | CN101128775B Immersion liquid, exposure apparatus, and exposure process |
| 07/25/2012 | CN101078887B Lithographic apparatus and lithographic apparatus cleaning method |
| 07/24/2012 | US8229062 Transmission mask with differential attenuation to improve ISO-dense proximity |
| 07/24/2012 | US8228484 Coupling apparatus, exposure apparatus, and device fabricating method |
| 07/24/2012 | US8228455 Exposing device, methods for forming pattern, channel, and hole by using the same, and liquid crystal display device therewith and method for fabricating the same |
| 07/24/2012 | US8227395 Process solutions containing surfactants |
| 07/24/2012 | US8227353 Method for manufacturing semiconductor device |
| 07/24/2012 | US8227336 Structure with self aligned resist layer on an interconnect surface and method of making same |
| 07/24/2012 | US8227254 Sensor molecules incorporating a boronic acid sensor group |
| 07/24/2012 | US8227183 Stable formation of high precision fine patterns utilizing positive resist whose solubility increases in positive developer and decreases in negative developer upon irradiation |
| 07/24/2012 | US8227182 Methods of forming a photosensitive film |
| 07/24/2012 | US8227181 Method of preparing a patterned film with a developing solvent |
| 07/24/2012 | US8227180 Photolithography focus improvement by reduction of autofocus radiation transmission into substrate |
| 07/24/2012 | US8227179 Manufacturing cross-structures of nanostructures |
| 07/24/2012 | US8227178 Manufacturing method of planar optical waveguide device with grating structure |
| 07/24/2012 | US8227177 Method for multiple irradiation of a resist |
| 07/24/2012 | US8227176 Method for forming fine pattern in semiconductor device |
| 07/24/2012 | US8227174 Patterning methods and masks |
| 07/24/2012 | US8227173 Method of manufacturing multi-layer circuit board |
| 07/24/2012 | US8227172 Method of producing semiconductor device using resist underlayer film by photo-crosslinking curing |
| 07/24/2012 | US8227171 Photosensitive self-assembled monolayer for selective placement of hydrophilic structures |
| 07/24/2012 | US8227170 Resist composition, method of forming resist pattern, polymeric compound, and compound |
| 07/24/2012 | US8227169 Compound, acid generator, resist composition, and method of forming resist pattern |
| 07/24/2012 | US8227151 Flare correction method, method for manufacturing mask for lithography, and method for manufacturing semiconductor device |
| 07/24/2012 | US8227048 Photocurable compositions for preparing ABS-like articles |
| 07/24/2012 | US8227035 Templated monolayer polymerization and replication |
| 07/19/2012 | WO2012096368A1 Method for producing mold for fine pattern transfer, method for producing diffraction grating using same, and method for manufacturing organic el element which comprises the diffraction grating |
| 07/19/2012 | WO2012096264A1 Radiation-sensitive resin composition and radiation-sensitive acid generator |
| 07/19/2012 | WO2012096069A1 Exposure device and exposure method |
| 07/19/2012 | WO2012095795A2 Method and system for printing high-resolution periodic patterns |
| 07/19/2012 | WO2012069807A3 Photoimaging |
| 07/19/2012 | WO2012067349A3 Polymer compound, and resist-protecting film composition including same for a liquid immersion exposure process |
| 07/19/2012 | WO2012044099A3 Photosensitive resin composition |
| 07/19/2012 | US20120184101 Chemically amplified positive resist composition and patterning process |
| 07/19/2012 | US20120184100 Chemically amplified positive resist composition and patterning process |
| 07/19/2012 | US20120183990 Microfluidic system and method for producing same |
| 07/19/2012 | US20120183946 Fabrication of Microfilters and Nanofilters and Their Applications |
| 07/19/2012 | US20120183909 Developing treatment method |
| 07/19/2012 | US20120183908 Resist pattern-forming method |
| 07/19/2012 | US20120183907 Patterning process for small devices |
| 07/19/2012 | US20120183906 Mask pattern generating method, manufacturing method of semiconductor device, and computer program product |
| 07/19/2012 | US20120183905 Charged-particle beam drawing apparatus and article manufacturing method |
| 07/19/2012 | US20120183904 Nitrogen-containing monomer, polymer, resist composition, and patterning process |
| 07/19/2012 | US20120183903 Patterning process and resist composition |
| 07/19/2012 | US20120183902 Radiation-sensitive resin composition |
| 07/19/2012 | US20120183901 Method for producing lithographic printing plate precursor |
| 07/19/2012 | US20120183900 Resist composition, method of forming resist pattern and polymeric compound |