Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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09/11/2012 | US8263192 Methods for modifying surfaces |
09/11/2012 | US8263129 Methods for fabricating isolated micro-and nano-structures using soft or imprint lithography |
09/11/2012 | CA2541993C White solid photoinitiator in the form of powder and preparation thereof |
09/07/2012 | WO2012118667A1 Parallel acquisition of spectra for diffraction based overlay |
09/07/2012 | WO2012118637A1 Imaging laser diodes with a lightwave circuit |
09/07/2012 | WO2012118621A2 Method and system for design of enhanced patterns for charged particle beam lithography |
09/07/2012 | WO2012118168A1 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film |
09/07/2012 | WO2012118031A1 Photosensitive resin composition, photoresist film using same, resist pattern forming method, and conductor pattern forming method |
09/07/2012 | WO2012117949A1 Membrane-forming composition containing silicon for multilayered resist process and pattern formation method |
09/07/2012 | WO2012117948A1 Composition for formation of resist underlayer film, method of forming pattern and resist underlayer film |
09/07/2012 | WO2012117882A1 Lithographic printing master plate and method for manufacturing lithographic printing plate |
09/07/2012 | WO2012117802A1 Exposure device and microlens array structure |
09/07/2012 | WO2012117801A1 Exposure device |
09/07/2012 | WO2012117800A1 Exposure device using micro-lens array |
09/07/2012 | WO2012117786A1 Photosensitive composition, photosensitive solder-resist composition, photosensitive solder-resist film, permanent pattern, method for forming same, and printed circuit board |
09/07/2012 | WO2012117763A1 Silica dispersion composition |
09/07/2012 | WO2012117762A1 Printed circuit board |
09/07/2012 | WO2012116710A1 Illumination system of a microlithographic projection exposure apparatus |
09/07/2012 | WO2012095795A3 Method and system for printing high-resolution periodic patterns |
09/07/2012 | WO2012081865A3 Cleaning liquid composition for photolithography |
09/07/2012 | WO2012070833A3 Radiation curable resin composition, and method for producing self-replicatable mold using same |
09/07/2012 | WO2012064097A3 Photoresist topcoat composition for extreme ultraviolet lithography, and pattern-forming method using same |
09/06/2012 | US20120225450 Carboxyl-containing polymers with improved storage stability and processability |
09/06/2012 | US20120225388 Pattern forming method and method for producing device |
09/06/2012 | US20120225387 Method of forming semiconductor device by using reduction projection aligner |
09/06/2012 | US20120225386 Chemically amplified resist composition and patterning process |
09/06/2012 | US20120225385 Salt and photoresist composition comprising the same |
09/06/2012 | US20120225384 Compositions and processes for photolithography |
09/06/2012 | US20120225383 Resist composition for immersion exposure and method of forming resist pattern |
09/06/2012 | US20120225375 Optical member for euv lithography |
09/06/2012 | US20120225245 Spacer forming method, method of manufacturing display panel substrate, spacer, and display panel substrate |
09/06/2012 | US20120224600 Two-stage laser system for aligners |
09/06/2012 | US20120224155 Direct write lithography system |
09/06/2012 | US20120224154 Exposure apparatus, exposure method, and method for producing device |
09/06/2012 | US20120224028 Method of fabricating microlens, and depth sensor including microlens |
09/06/2012 | US20120223047 Method of forming multilayer capacitors in a printed circuit substrate |
09/06/2012 | DE10313548B4 Binär geblazetes diffraktives optisches Element sowie ein solches Element enthaltendes Objektiv Binary blazed diffractive optical element and such an element containing lens |
09/06/2012 | DE102011111362A1 Optical component for use in e.g. illumination device for micro-lithographic extreme UV-projection exposure system, has mirror unit immersed in medium and supported in floating manner under operational conditions |
09/06/2012 | DE102011081914A1 Illumination optics for use in optical system of projection exposure system for illuminating e.g. lithography mask, for manufacturing memory chips, has facet mirror whose facets uncouple partial beam incident on energy sensor |
09/05/2012 | EP2495613A1 Lithographic apparatus |
09/05/2012 | EP2495234A1 Aromatic sulfonium salt compound |
09/05/2012 | EP2495220A1 Optical member for deep ultraviolet and process for producing same |
09/05/2012 | EP2494410A2 A method of making a patterned dried polymer and a patterned dried polymer |
09/05/2012 | EP2494409A2 Lithographic printing plate precursors |
09/05/2012 | EP2493991A1 Antifeflective composition for photoresists |
09/05/2012 | CN202423237U Photoresist container |
09/05/2012 | CN202421721U Long-stroke movable air bearing module, and exposure table using same |
09/05/2012 | CN202421720U Absolute grating scale roll embossing mold |
09/05/2012 | CN202421719U Imprinting platform for raster rule |
09/05/2012 | CN202421718U Grating ruler roll embossing production line |
09/05/2012 | CN1991579B Apparatus for fabricating flat panel display device and method for fabricating thereof |
09/05/2012 | CN1991545B 显示器件及其制造方法 A display device and manufacturing method thereof |
09/05/2012 | CN1983034B A method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus |
09/05/2012 | CN1908816B Positive-type radiation-sensitive resin composition for producing a metal-plating formed material, transcription film and production method of a metal-plating formed material |
09/05/2012 | CN1873530B Display device, method of manufacturing the same and mask for manufacturing the same |
09/05/2012 | CN102656520A Exposure method and exposure apparatus |
09/05/2012 | CN102656519A Photosensitive composition, partition wall, color filter and organic EL element |
09/05/2012 | CN102656518A Photosensitive resin composition, dry film thereof, and printed wiring board formed using same |
09/05/2012 | CN102656517A Photosensitive composition, partition wall, color filter and organic EL element |
09/05/2012 | CN102656111A Methods of directed self-assembly with 193nm immersion lithography and layered structures formed therefrom |
09/05/2012 | CN102655192A Substrate manufacturing process for LED (light-emitting diode) chip |
09/05/2012 | CN102655191A Substrate embossing device for LED (light-emitting diode) chip |
09/05/2012 | CN102655103A Substrate holder positioning method and substrate processing system |
09/05/2012 | CN102654782A Manufacturing method of computer shell |
09/05/2012 | CN102654735A Substrate cleaning method and substrate cleaning apparatus |
09/05/2012 | CN102654734A Method for calculating cone-shaped diffractional field of dual-absorption layer alternating phase shift L/S (line/space) mask |
09/05/2012 | CN102654733A Wave aberration correcting device and method |
09/05/2012 | CN102654732A Negative photosensitive resin compound, color filter and liquid crystal display device |
09/05/2012 | CN102654731A Color photoresist, color filter and display device containing same |
09/05/2012 | CN102654698A Liquid crystal display array substrate and manufacturing method thereof as well as liquid crystal display |
09/05/2012 | CN102654683A Color-film substrate and manufacturing method thereof |
09/05/2012 | CN102654629A Lens module and method for manufacturing diaphragm of lens module |
09/05/2012 | CN102654595A Phase difference plate and manufacturing method thereof |
09/05/2012 | CN102654594A Half-transmitting and half-reflecting type color filter and manufacturing method thereof |
09/05/2012 | CN102654592A Color filter and manufacturing method thereof |
09/05/2012 | CN102654591A Cylindrical lenticulation and manufacturing method thereof |
09/05/2012 | CN102653581A Alkali soluble resin, preparation method thereof, photosensitive resin composite and photoresist |
09/05/2012 | CN102653576A Polymers, photoresist compositions and methods of forming photolithographic patterns |
09/05/2012 | CN102653454A Preparation method for patterned graphene membrane |
09/05/2012 | CN102653158A Lithographic printing plate precursor and plate making method thereof |
09/05/2012 | CN102653157A Lithographic printing plate precursor and plate making method thereof |
09/05/2012 | CN102652910A Non-ionic surface active agent, and preparation method and use thereof, as well as photoresist developing solution |
09/05/2012 | CN102253608B Method for removing photoresist on photomask |
09/05/2012 | CN102193310B Method for forming grating for machine tool measurement in two-step solidifying roll-pressing forming method |
09/05/2012 | CN102096337B Device for detecting eccentricity and focal surface position of spherical surface or curved surface in projection photoetching |
09/05/2012 | CN102053509B Method for manufacturing raised grating alignment mark in imprinting lithography |
09/05/2012 | CN102053508B Developer for positive thermosensitive CTP (Computer to Plate) |
09/05/2012 | CN102016721B Laser exposure method, photoresist layer working method, and pattern molding manufacturing method |
09/05/2012 | CN101976655B Thin film transistor substrate of liquid crystal display panel and manufacturing method thereof |
09/05/2012 | CN101937169B Method for manufacturing photo mask blank, method for manufacturing photo mask, and coating apparatus |
09/05/2012 | CN101916040B Focal plane detection system suitable for projection lithography system |
09/05/2012 | CN101900935B Ultraviolet impressing method and device thereof |
09/05/2012 | CN101872717B Coating and developing apparatus, coating and developing method |
09/05/2012 | CN101813889B Spraying device of liquid material thin film and spraying method thereof |
09/05/2012 | CN101809503B Positive-type photosensitive resin composition, and method for formation of cured film using the same |
09/05/2012 | CN101726988B Design and layout of phase shifting photolithographic masks |
09/05/2012 | CN101713931B An exposure device for display panel, exposure method and assembling or adjusting method of the display panel exposure device |
09/05/2012 | CN101689021B Imageable elements with low pH developer solubility |
09/05/2012 | CN101681009B Optical element holding device, lens barrel, exposure device, and device manufacturing method |
09/05/2012 | CN101675385B Improving process model accuracy by modeling mask corner rounding effects |