Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/2012
08/08/2012CN101095082B Dissolution rate modifiers for photoresist compositions
08/07/2012US8237915 Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatus
08/07/2012US8237139 Method for detecting substrate position of charged particle beam photolithography apparatus and charged particle beam photolithography apparatus
08/07/2012US8236899 Zwitterionic block copolymers and methods
08/07/2012US8236485 Photoresist removal
08/07/2012US8236484 Single layer resist liftoff process for nano track width
08/07/2012US8236483 Method of forming resist pattern
08/07/2012US8236482 Photoresist compositions and methods of use in high index immersion lithography
08/07/2012US8236481 Method to fabricate a redirecting mirror in optical waveguide devices
08/07/2012US8236480 Fabrication method of topographically modulated microstructures using pattern homogenization with UV light
08/07/2012US8236479 Method for printing a pattern on a substrate
08/07/2012US8236477 Positive resist composition and method of forming resist pattern
08/07/2012US8236476 Multiple exposure photolithography methods and photoresist compositions
08/07/2012US8236466 Photochromic materials incorporated in polymer backbone
08/07/2012US8235605 Self-standing parallel plate beam splitter, method for manufacturing the same, and laser diode package structure using the same
08/07/2012US8235212 Mask transport system configured to transport a mask into and out of a lithographic apparatus
08/02/2012WO2012102395A1 Colored composition for color filters, and color filter
08/02/2012WO2012102314A1 Method for manufacturing semiconductor device and semiconductor device
08/02/2012WO2012102310A1 Photosensitive resin composition, photosensitive element, permanent mask resist, and process for production of permanent mask resist
08/02/2012WO2012102261A1 Composition for forming resist underlayer films, containing silicon that bears diketone-structure-containing organic group
08/02/2012WO2012102060A1 Driving system and driving method, light exposure device and light exposure method, and driving system designing method
08/02/2012WO2012101942A1 Method for forming resist pattern, and radiation-sensitive resin composition
08/02/2012WO2012101908A1 Photosensitive resin composition, photosensitive element, method for producing resist pattern, and method for manufacturing printed wiring board
08/02/2012WO2012101545A1 Use of surfactants having at least three short-chain perfluorinated groups for manufacturing integrated circuits having patterns with line-space dimensions below 50nm
08/02/2012WO2012101269A1 Magnifying imaging optical unit and metrology system comprising such an imaging optical unit
08/02/2012WO2012101189A1 Separating fluid, method and installation for separating multilayer systems
08/02/2012WO2012101090A1 Process for producing a substrate for a reflective optical element for euv lithography
08/02/2012WO2012101080A2 Optical arrangement for an euv projection exposure apparatus and method for cooling an optical component
08/02/2012WO2012100846A1 Conduit for radiation, suitable for use in a lithographic apparatus
08/02/2012WO2012100791A1 Illumination system of a microlithographic projection exposure apparatus
08/02/2012WO2012078544A3 Benzylidene substituted 2,4-pentanedione compounds and use thereof as stabilizers
08/02/2012WO2012056311A3 Edge bead remover for coatings
08/02/2012WO2012054254A3 On-press developable lithographic printing plate precursors
08/02/2012WO2012046133A3 Mirror, mirror device, laser apparatus, and extreme ultraviolet light generation apparatus
08/02/2012US20120196772 Compound synthesis method, microarray, acid-transfer composition, and biochip composition
08/02/2012US20120196381 Miniaturized Microparticles
08/02/2012US20120196231 Polymer Washout Solvent, and the Use Thereof for Developing a Flexographic Printing Plate
08/02/2012US20120196230 Layout decomposition method and apparatus for multiple patterning lithography
08/02/2012US20120196229 Embedding data into solid areas, text or line work
08/02/2012US20120196228 Resist composition and patterning process using the same
08/02/2012US20120196227 Chemically amplified positive resist composition, patterning process, and acid-decomposable keto ester compound
08/02/2012US20120196226 Resist composition and method of forming resist pattern
08/02/2012US20120196225 Photo Patternable Coating Compositions of Silicones and Organic-Inorganic Hybrids
08/02/2012US20120196209 L-shaped Feature, Method of Making an L-shaped Feature and Method of Making an L-shaped Structure
08/02/2012US20120196208 Multilayer mirror for euv lithography and process for its production
08/02/2012US20120194795 Optical element
08/02/2012US20120194793 Optical apparatus for use in photolithography
08/02/2012US20120194790 Lithographic apparatus and device manufacturing method
08/02/2012US20120194753 Method of forming a vertical alignment layer, a method of manufacturing a display apparatus using the same, and a display apparatus made with the manufacturing method
08/02/2012US20120193762 Reversal lithography approach by selective deposition of nanoparticles
08/02/2012US20120193285 Method for producing resin porous membrane with adhesive layer, resin porous membrane with adhesive layer, and filter member
08/02/2012US20120192741 Method for preparing lithographic printing plates
08/02/2012DE112010003634T5 Katadioptrisches System, Aberrationsmessvorrichtung, Verfahren zum Einstellen eines optischen Systems, Belichtungsvorrichtung und Vorrichtungsherstellungsverfahren Catadioptric system, Aberrationsmessvorrichtung, A method of adjusting an optical system, exposure apparatus and device manufacturing method
08/02/2012DE102011077315A1 Optical arrangement for projection lens of extreme UV (EUV) projection exposure system for manufacturing e.g. LCD, has diaphragm that is arranged outside workspace of projecting lens, based on operating position of positioning device
08/02/2012DE102011010462A1 Optische Anordnung für eine EUV-Projektionsbelichtungsanlage sowie Verfahren zum Kühlen eines optischen Bauelements Optical arrangement for an EUV projection exposure apparatus and method for cooling an optical component
08/02/2012DE102011003357A1 Spiegel für den EUV-Wellenlängenbereich, Herstellungsverfahren für einen solchen Spiegel, Projektionsobjektiv für die Mikrolithographie mit einem solchen Spiegel und Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Projektionsobjektiv Mirror for the EUV wavelength range, manufacturing process for such a mirror projection objective for microlithography with such a mirror and projection exposure system for microlithography with such a projection lens
08/02/2012DE102011003302A1 Vergrößerte abbildende Optik sowie Metrologiesystem mit einer derartigen abbildenden Optik Enlarged imaging optics and metrology system with such imaging optics
08/02/2012CA2825339A1 Separating fluid, method and installation for separating multilayer systems
08/01/2012EP2482134A2 Composition useful for removal of post-etch photoresist and bottom anti-reflection coatings
08/01/2012EP2482133A1 Method for processing waste solution in plate-making process of photosensitive lithographic printing plate
08/01/2012EP2482132A1 Resist pattern forming process
08/01/2012EP2482131A1 Resist composition and patterning process using the same
08/01/2012EP2481603A1 Lithographic printing original plate
08/01/2012EP2480936A1 Source collector apparatus, lithographic apparatus and device manufacturing method
08/01/2012EP2480935A1 Spectral purity filter, lithographic apparatus, and device manufacturing method
08/01/2012EP2480933A1 Limiting plate shifting within a plate pallet
08/01/2012EP2198344B1 Microlithographic projection exposure apparatus
08/01/2012EP2150856B1 Mask aligner
08/01/2012EP2097789B1 Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations
08/01/2012EP2057506B1 A method and a system for reducing overlay errors within exposure fields by apc control strategies
08/01/2012EP2010966B1 Alignment method
08/01/2012EP1557413B1 Novel aromatic sulfonium salt compound, photo-acid generator comprising the same and photopolymerizable composition containing the same, resin composition for optical three-dimensional shaping, and method of optically forming three-dimensional shape
08/01/2012CN202362585U Liquid knife
08/01/2012CN202362584U Development waste liquid purification and plate punching water circulation system
08/01/2012CN1571788B Photoactivable nitrogen bases
08/01/2012CN102625924A Exposure method, exposure apparatus, and device manufacturing method
08/01/2012CN102623545A Radiation detector, method of manufacturing a radiation detector and lithographic apparatus comprising a radiation detector
08/01/2012CN102623423A Integrated circuit pattern and multiple patterning method
08/01/2012CN102623328A Process for treatment of substrates with water vapor or steam
08/01/2012CN102623302A Reworking control method and control system thereof
08/01/2012CN102621828A Secondary development method
08/01/2012CN102621827A Maskless exposure system and exposure method thereof
08/01/2012CN102621826A Synchronous control system of step scanning photoetching machine based on VME (Virtual Mobile Engine) bus and synchronous control method thereof
08/01/2012CN102621825A Projection objective lens comprising lens elements with reflective coatings
08/01/2012CN102621824A Optical processing system and method
08/01/2012CN102621823A Multi-beam parallel laser direct writing device and method
08/01/2012CN102621822A Lens for achieving curved-surface-to-plane super-resolution demagnification imaging photo-etching
08/01/2012CN102621821A Surface plasma super diffraction lithographic equipment with overlong working distance and method thereof
08/01/2012CN102621820A Manufacturing method of efficient super-resolution focusing devices for photo-etching
08/01/2012CN102621819A Detection method for lithography machine projecting lens large aberration
08/01/2012CN102621818A Immersion control device for lithography machine
08/01/2012CN102621817A Method for the removal of deposition, method for the protection of an optical element, device manufacturing method, and lithographic apparatus
08/01/2012CN102621816A Method of adopting gray scale mode in write-through photoetching system to improve exposure graph quality
08/01/2012CN102621815A Reflective optical components for lithographic apparatus and device manufacturing method
08/01/2012CN102621814A Resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating
08/01/2012CN102621813A Coating compositions for use with an overcoated photoresist
08/01/2012CN102621812A Resin composition for laser engraving, relief printing plate precursor for laser engraving, and relief printing plate and process for making the same
08/01/2012CN102621811A Developable photosensitive resin composition for panel structures
08/01/2012CN102621810A Photosensitive resin composition, photosensitive element, method of forming resist pattern, and process for producing printed wiring board
08/01/2012CN102621809A Colored photosensitive resin composition
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