Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
09/2012
09/05/2012CN101652712B Colored composition and color filter therefrom
09/05/2012CN101627337B Method to form a pattern of functional material on a substrate by treating a surface of a stamp
09/05/2012CN101622579B Processed substrates having water-repellent areas in patterns, process for production thereof, and process for production of members having patterms made of functional material films
09/05/2012CN101591423B Alkaline water-soluble resin and manufacture method, as well as photosensitive resin composition, cured resin and color filter
09/05/2012CN101520605B Photosensitive linear resin composition and separator for liquid crystal display element
09/05/2012CN101517488B Optical system for semiconductor lithography
09/05/2012CN101497599B Monomer, resin, resist composition using the resin, and method producing semiconductor device using the resist composition
09/05/2012CN101490622B Antireflective coating compositions
09/05/2012CN101454723B Method of making a photopolymer printing plate
09/05/2012CN101446774B A substrate, method of preparing a substrate, a device manufacturing method
09/05/2012CN101432661B Photosensitive resin laminate
09/05/2012CN101398616B Resin relief and manufacturing method thereof
09/05/2012CN101385120B Measuring device and method, processing device and method, pattern forming device and method, exposing device and method, and device fabricating method
09/05/2012CN101334590B Charting device
09/05/2012CN101271274B Minute structure and information recording medium
09/05/2012CN101226329B Radiation sensitive resin composition, laminated insulating film, micro lens and preparation method thereof
09/05/2012CN101206403B Photosensitive resin composition and organic insulating film produced using the same
09/05/2012CN101194208B Method for multi-exposure beam lithography device
09/05/2012CN101192006B Chemically amplified positive resist composition
09/05/2012CN101063812B Device and method for creating a three dimensional object using mask illumination
09/05/2012CN101060072B Coating and developing device, method of controlling coating and developing device
09/04/2012US8258080 Tissue markings and methods for reversibly marking tissue employing the same
09/04/2012US8257913 Processing method of lithographic printing plate precursor
09/04/2012US8257912 Photolithography
09/04/2012US8257911 Method of process optimization for dual tone development
09/04/2012US8257910 Underlayers for EUV lithography
09/04/2012US8257909 Smooth wall surfaces; heating, development, etching
09/04/2012US8257908 Coating-type underlayer coating forming composition for lithography containing vinylnaphthalene resin derivative
09/04/2012US8257907 Negative-working imageable elements
09/04/2012US8257906 Multi-layered radiation imageable coating
09/04/2012US8257905 Method of fabricating thin film transistor substrate and negative photoresist composition used therein
09/04/2012US8257904 Resist composition and method of forming resist pattern
09/04/2012US8257903 Compound, positive resist composition and method for formation of resist pattern
09/04/2012US8257902 Compositons and processes for immersion lithography
09/04/2012US8257901 Polyimide-based polymers, copolymers thereof and positive type photoresist compositions comprising the same
09/04/2012US8257605 Apparatus and method for removing coating film
09/04/2012US8257546 Method and system for monitoring an etch process
09/04/2012US8256912 High positioning reproducible low torque mirror-actuator interface
09/04/2012CA2378725C Merged-mask micro-machining process
08/2012
08/30/2012WO2012115255A1 Light-shielding composition, method for producing a light-shielding composition, solder resist, method for forming a pattern, and solid-state imaging device
08/30/2012WO2012115124A1 Process of producing lithographic printing plate
08/30/2012WO2012115029A1 Photoresist resin composition
08/30/2012WO2012115002A1 Holding device, exposure device and production method for device
08/30/2012WO2012114963A1 Negative-pattern-forming method and photoresist composition
08/30/2012WO2012114864A1 Silane compound and composition for formation of monolayer or multilayer using same
08/30/2012WO2012114859A1 Curable coloring composition, color filter and manufacturing method for same, liquid crystal display device, solid-state image-capturing device, and dye compound.
08/30/2012WO2012114172A1 Laser apparatus, extreme ultraviolet light generation system including the laser apparatus, and method for controlling the laser apparatus
08/30/2012WO2012113591A1 Grazing incidence reflector, lithographic apparatus, method for manufacturing grazing incidence reflector and method for manufacturing a device
08/30/2012WO2012072914A3 Machine for exposing panels
08/30/2012WO2012066489A4 Method and apparatus for printing high-resolution two-dimensional periodic patterns
08/30/2012WO2012041459A3 Imaging optical system for microlithography
08/30/2012US20120220112 Positive resist composition and patterning process
08/30/2012US20120219919 Composition for Coating over a Photoresist Pattern Comprising a Lactam
08/30/2012US20120219918 Method for forming a wiring pattern by laser irradiation
08/30/2012US20120219917 Multiple patterning consistency processing
08/30/2012US20120219916 Microstructure manufacturing method
08/30/2012US20120219915 Preparation of lithographic printing plates
08/30/2012US20120219914 Drawing apparatus, drawing method and method of manufacturing article
08/30/2012US20120219913 Pattern forming method, actinic-ray-sensitive or radiation-sensitive resin composition, and resist film
08/30/2012US20120219912 Resist composition and method for producing resist pattern
08/30/2012US20120219911 Lithographic printing plate precursor and plate making method thereof
08/30/2012US20120219910 Photosensitive composition and pattern forming method using same
08/30/2012US20120219909 Resist composition and method for producing resist pattern
08/30/2012US20120219908 Resist composition and method for producing resist pattern
08/30/2012US20120219907 Resist composition and method for producing resist pattern
08/30/2012US20120219906 Resist composition and method for producing resist pattern
08/30/2012US20120219905 Resist composition and method for producing resist pattern
08/30/2012US20120219904 Resist composition and method for producing resist pattern
08/30/2012US20120219903 Radiation-sensitive resin composition
08/30/2012US20120219902 Photoresist compositions and methods of forming photolithographic patterns
08/30/2012US20120219901 Photoresist compositions and methods of forming photolithographic patterns
08/30/2012US20120219900 Lithographic printing plate precursor and plate making method thereof
08/30/2012US20120219899 Resist composition and method for producing resist pattern
08/30/2012US20120219898 Resist composition and method for producing resist pattern
08/30/2012US20120219897 Photoresist having improved extreme-ultraviolet lithography imaging performance
08/30/2012US20120219891 Resist composition, resist film therefrom and method of forming negative pattern using the composition
08/30/2012US20120219888 Chemically amplified negative resist composition and patterning process
08/30/2012US20120219887 Chemically amplified negative resist composition and patterning process
08/30/2012US20120219886 Method and system for forming patterns using charged particle beam lithography with variable pattern dosage
08/30/2012US20120219883 Method for producing a holographic film
08/30/2012US20120219758 Resist composition, resist film therefrom and method of forming negative pattern using the composition
08/30/2012US20120219755 Developer compositions and methods of forming photolithographic patterns
08/30/2012US20120217421 Method and system for forming patterns using charged particle beam lithography with overlapping shots
08/30/2012DE112010003408T5 Chemisch verstärkte Fotolack-Zusammensetzunig und Verfahren zu ihrer Verwendung Chemically amplified photoresist Zusammensetzunig and methods for their use
08/30/2012DE102011090083A1 Device for suppressing solid particle portions carried with effective radiation along optical path in light source system of e.g. metrology system, has deflection device comprising electrodes for deflecting solid particle portions from path
08/30/2012DE102011083464A1 Mirror i.e. free-form mirror, for extreme UV-projection exposure system for extreme UV microlithography to produce structures in e.g. nanometer range for electronic components, has mirror surface, where mirror has specific surface roughness
08/30/2012DE102009004392B9 Datenerzeugungsverfahren für Halbleitervorrichtung und Elektronenstrahlbelichtungssystem Data forming method for the semiconductor device and electron beam exposure system
08/29/2012EP2492753A2 Developer compositions and methods of forming photolithographic patterns
08/29/2012EP2492752A1 Lithographic printing plate precursor and plate making method thereof
08/29/2012EP2492751A1 Lithographic printing plate precursor and plate making method thereof
08/29/2012EP2492750A1 Photoresist compositions and methods of forming photolithographic patterns
08/29/2012EP2492749A1 Photoresist compositions and methods of forming photolithographic patterns
08/29/2012EP2492748A1 Lithographic printing plate precursor and plate making method thereof
08/29/2012EP2492747A2 Chemically amplified negative resist composition and patterning process
08/29/2012EP2492746A2 Chemically amplified negative resist composition and patterning process
08/29/2012EP2492716A1 Titanium black dispersion, photosensitive resin composition, wafer level lens, light blocking film, method for producing the light blocking film, and solid-state image pickup element
08/29/2012EP2491459A1 Plate developer with a configurable transport path
08/29/2012EP2491458A2 Methods of making patterned structures of fluorine-containing polymeric materials and fluorine-containing polymers
08/29/2012CN202404352U Mask aligner system capable of improving blowing cleanliness
08/29/2012CN1979336B Apparatus for transferring a pattern with intermediate stamp
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