Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
07/2012
07/11/2012CN102566254A Methods for performing model-based lithography guided layout design
07/11/2012CN102566136A Color liquid crystal display device
07/11/2012CN102566134A Method for manufacturing substrate with colored film and manufacturing device
07/11/2012CN102566011A Projection optical system
07/11/2012CN102565983A Axial fine-adjustment device for movable mirror
07/11/2012CN102565905A Preparation method for convex-surface double-blazed grating
07/11/2012CN102565904A Method for preparing large-size grating by utilizing grating imaging scan lithography
07/11/2012CN102565903A Method for preparing random dammann grating
07/11/2012CN102564303A Measuring apparatus and measuring method
07/11/2012CN102563330A Safety protection device of workpiece table
07/11/2012CN102558523A Polymer, method for producing the same, and resist composition containing the same
07/11/2012CN102558510A Radiation curable resin composition and rapid three dimensional imaging process using the same
07/11/2012CN102558202A Dipyrromethene metal complex compound, and colored composition, ink sheet for recording heat-sensitive transfer, color toner, inkjet recording ink and color filter containing the dipyrromethene metal complex compound
07/11/2012CN102557945A Novel Phenol Compounds and Positive Photosensitive Resin Composition Including the Same
07/11/2012CN102555419A Method for wax printing by carving and printing of iron roller and method for processing iron roller
07/11/2012CN102553506A Method for directly forming pattern on polydimethylsiloxane (PDMS) through photoetching
07/11/2012CN102033425B Method for manufacturing micromechanical shutter
07/11/2012CN101928489B Pigment dispersion, pigment photoresist and color filter
07/11/2012CN101923295B Rotary label and method for monitoring photolithographic quality using same
07/11/2012CN101894751B Method of removing photoresist
07/11/2012CN101807004B Method for manufacturing working printing plate for production of color kinescope screen printing plate
07/11/2012CN101608944B Optical fiber vibration sensing head and manufacturing method thereof
07/11/2012CN101592864B Single-component water-emulsion type rotary screen stenciling sensitive material
07/11/2012CN101479665B Optical imaging device with thermal attenuation
07/11/2012CN101313249B Photosensitive transfer material, partition wall and method for forming same, optical device and method for producing same, and display
07/11/2012CN101295132B Method of forming a thin film pattern and method of fabricating a liquid crystal display device
07/11/2012CN101285959B Color filter substrate for liquid crystal display and method of fabricating the same
07/10/2012US8218852 System and method for repairing composite parts
07/10/2012US8218127 Exposure apparatus and device manufacturing method
07/10/2012US8218125 Immersion lithographic apparatus with a projection system having an isolated or movable part
07/10/2012US8217095 Active energy ray-curable ink-jet printing ink
07/10/2012US8216775 Anti-reflection film forming material, and method for forming resist pattern using the same
07/10/2012US8216774 Patterning process
07/10/2012US8216773 Broadband plasma light sources for substrate processing
07/10/2012US8216772 Method for manufacturing mechanical shutter blades using beryllium-copper alloy substrate
07/10/2012US8216771 Method for making a lithographic printing plate
07/10/2012US8216769 Negative working, heat sensitive lithographic printing plate precursor
07/10/2012US8216768 Photoacid generator and photoreactive composition
07/10/2012US8216767 Patterning process and chemical amplified photoresist with a photodegradable base
07/10/2012US8216766 Polymer, polymer preparation method, resist composition and patterning process
07/10/2012US8216765 Reimageable and reusable medium and method of producing and using the reimageable and reusable medium
07/10/2012US8216764 Positive resist composition and method of forming resist pattern
07/10/2012US8216763 Photosensitive resin composition and method of forming pattern
07/10/2012US8216749 Curable composition, negative type color filter and method of producing the same
07/10/2012CA2652294C New materials for lithographic plates coatings, lithographic plates and coatings containing same, methods of preparation and use
07/05/2012WO2012091977A1 Simultaneous measurement of multiple overlay errors
07/05/2012WO2012091453A1 Photosensitive resin composition, overcoat layer and electronic device using the same
07/05/2012WO2012091401A2 Photosensitive resin composition for resin black matrix
07/05/2012WO2012091271A2 Method for manufacturing nano-imprint mould, method for manufacturing light-emitting diode using the nano imprint mould manufactured thereby, and light-emitting diode manufactured thereby
07/05/2012WO2012091224A1 Photosensitive resin composition for color filter and color filter using same
07/05/2012WO2012091163A1 Liquid immersion member, immersion exposure apparatus, exposing method, device fabricating method, program, and storage medium
07/05/2012WO2012091162A1 Liquid immersion member and cleaning method
07/05/2012WO2012090965A1 Photosensitive phenol resin composition for alkaline development, cured relief pattern, method for producing semiconductor, and biphenyl-diyl-trihydroxybenzene resin
07/05/2012WO2012090959A1 Radiation-sensitive resin composition and compound
07/05/2012WO2012090896A1 Photosensitive resin laminate
07/05/2012WO2012090752A1 Photocurable resin composition
07/05/2012WO2012090639A1 Planographic printing plate precursor and planographic printing method
07/05/2012WO2012090532A1 Photocurable resin composition, dry film and cured object obtained therefrom, and printed wiring board obtained using these
07/05/2012WO2012090408A1 Aromatic hydrocarbon resin, composition for forming lithographic underlayer film, and method for forming multilayer resist pattern
07/05/2012WO2012089934A1 Process for fabricating high-precision objects by high-resolution lithography and dry deposition and objects thus obtained
07/05/2012WO2012089224A1 Illumination system of a microlithographic projection exposure apparatus
07/05/2012WO2012089072A1 Infrared sensitive and chemical treatment free photosensitive composition and lithographic plate fabricated by using same
07/05/2012WO2012089002A1 Large view field projection lithography objective
07/05/2012WO2012046233A3 Global landmark method for critical dimension uniformity reconstruction
07/05/2012US20120172557 Photosensitive resin composition containing copolymer
07/05/2012US20120172274 Resist remover composition and method for removing resist using the composition
07/05/2012US20120171866 Substrate structure including functional region and method for transferring functional region
07/05/2012US20120171865 Method for fabricating fine patterns
07/05/2012US20120171627 Inspection device and inspecting method for spatial light modulator, illumination optical system, method for adjusting the illumination optical system, exposure apparatus, and device manufacturing method
07/05/2012US20120171626 Compositions comprising base-reactive component and processes for photolithography
07/05/2012US20120171625 Immersion exposure apparatus and method of operating thereof
07/05/2012US20120171624 Printed circuit board for optical waveguide and method of manufacturing the same
07/05/2012US20120171623 Fabrication of a high fill ratio silicon spatial light modulator
07/05/2012US20120171622 Filter, exposure apparatus, and method of manufacturing device
07/05/2012US20120171621 Method for manufacturing electronic device and electronic device
07/05/2012US20120171620 Method of Improving Print Performance in Flexographic Printing Plates
07/05/2012US20120171619 Method of studying chirality controlled artificial kagome spin ice building blocks
07/05/2012US20120171618 Actinic-ray- or radiation-sensitive resin composition and method of forming a pattern using the same
07/05/2012US20120171617 Polymers, photoresist compositions and methods of forming photolithographic patterns
07/05/2012US20120171616 Polymerizable photoacid generators
07/05/2012US20120171615 Cyclic compound, process for production of the cyclic compound, radiation-sensitive composition, and method for formation of resist pattern
07/05/2012US20120171614 Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Film
07/05/2012US20120171613 Upper layer film-forming composition and method of forming photoresist pattern
07/05/2012US20120171612 Radiation-sensitive resin composition, resist pattern formation method, and polymer
07/05/2012US20120171611 Aromatic hydrocarbon resin and composition for forming underlayer film for lithography
07/05/2012US20120171610 Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Film
07/05/2012US20120171609 Positive Photosensitive Resin Composition, Photosensitive Resin Layer Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Layer
07/05/2012US20120171600 Time Differential Reticle Inspection
07/05/2012US20120171433 Fluorinated coating and phototools made therewith
07/05/2012US20120170044 Polymer Analysis Chip
07/05/2012US20120168841 Multiple Patterning Method
07/05/2012US20120168210 Methods and Structures Involving Terminal Connections
07/05/2012US20120168203 Integrated circuit system with ultra-low k dielectric and method of manufacture thereof
07/05/2012DE112010003331T5 Nahinfrarot absorbierende Dünnschichtzusammensetzungen Near infrared absorbing thin film compositions
07/05/2012DE102011090192A1 Spiegel, Verfahren zu dessen Herstellung, Belichtungsgerät, und Vorrichtungsherstellungsverfahren Mirror, process for its preparation, exposure apparatus and device manufacturing method
07/05/2012DE102011090191A1 Optisches Beleuchtungssystem, Belichtungsvorrichtung und Verfahren zur Herstellung eines Bauteils An illumination optical system, exposure apparatus and method for producing a component
07/05/2012DE102011080919A1 Microlithographic projection exposure system i.e. vacuum projection exposure system, operating method, involves changing bandwidth of projection light produced by light sources of system while exposing regions on photosensitive layer
07/05/2012DE102005034386B4 Tiefe Justiermarken auf Rand-Chips zum anschließenden Ausrichten von opaken Schichten Depth marks on edge chips for subsequent alignment of opaque layers
07/04/2012EP2472655A1 Negative electrode base member
07/04/2012EP2472332A1 Exposure apparatus and device fabricating method