Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
07/2012
07/04/2012EP2472331A1 Gumming device and method
07/04/2012EP2472330A1 Titanium black dispersion composition for forming light blocking film and method of producing the same, black radiation-sensitive composition, black cured film, solid-state imaging element, and method of producing black cured film
07/04/2012EP2472329A1 Coating compositions for use with an overcoated photoresist
07/04/2012EP2472328A1 Coating compositions for use with an overcoated photoresist
07/04/2012EP2472327A1 Photoresists and methods for use thereof
07/04/2012EP2472326A1 Polymers, photoresist compositions and methods of forming photolithographic patterns
07/04/2012EP2472325A1 Polymers, photoresist compositions and methods of forming photolithographic patterns
07/04/2012EP2472324A1 Monomers, polymers, photoresist compositions and methods of forming photolithographic patterns
07/04/2012EP2472323A2 Polymerizable photoacid generators
07/04/2012EP2472322A2 Photoacid generating monomer and precursor thereof
07/04/2012EP2472321A1 Method of preparing photoacid-generating monomer
07/04/2012EP2472320A2 Compositions comprising base-reactive component and processes for photolithography
07/04/2012EP2472319A2 Titanium black dispersion composition, black radiation-sensitive composition containing the same, black cured film, solid state imaging element and method for producing a black cured film
07/04/2012EP2472293A1 Photosensitive resin composition for microlens
07/04/2012EP2470963A1 Processing solution for flexographic printing plates and method of use
07/04/2012EP2470962A1 Exposure apparatus, exposure method, and device manufacturing method
07/04/2012EP2470961A1 Exposure method, exposure apparatus, and device manufacturing method
07/04/2012EP2470960A1 Metrology method and apparatus, lithographic apparatus, lithographic processing cell and substrate comprising metrology targets
07/04/2012EP2470959A2 Patterning hydrogels
07/04/2012EP2470958A1 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition
07/04/2012EP2470957A1 Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same
07/04/2012EP2470956A1 Functional nanoparticles
07/04/2012EP2470939A1 Metrology module for laser system
07/04/2012EP2470369A1 Lithographic printing plate precursors and stacks
07/04/2012EP2246739B1 Photosensitive colored composition, color filter and method for producing the same
07/04/2012EP1747175B1 Quartz glass blank and method for producing said blank
07/04/2012EP1655315B1 Resin for resist, positive resist composition, and method of forming resist pattern
07/04/2012CN202306141U 一种pcb曝光辅助装置 One kind pcb exposure auxiliary device
07/04/2012CN202306140U 一种大面积tft光刻装置 One kind of large-scale lithographic apparatus tft
07/04/2012CN202306139U 一种用于浸没单元调节的3-psr-v并联机构 For an immersion unit adjustable 3-psr-v parallel mechanism
07/04/2012CN202306138U 无掩模曝光装置 Maskless exposure device
07/04/2012CN202306137U 一种三层板涂布装置 A three-layer plate coating device
07/04/2012CN202306136U 一种用于菲林的贴保护膜装置 A film posted protective film means for
07/04/2012CN1975579B Lithographic apparatus and device manufacturing method that compensates for reticle induced CDU
07/04/2012CN1971429B Lithographic apparatus and device manufacturing method
07/04/2012CN1954408B Exposure apparatus, exposure method, and method for producing device
07/04/2012CN1945436B Lithographic printing plate precursor and lithographic printing method
07/04/2012CN1940728B Lithographic apparatus and method for conditioning an interior space of a device manufacturing apparatus
07/04/2012CN1920664B Etching tape and method of fabricating array substrate for liquid crystal display using the same
07/04/2012CN1818784B Positive type resist composition and resist pattern formation method using same
07/04/2012CN102549714A Coating material composition for liquid immersion exposure apparatus, laminate, method for forming laminate, and liquid immersion exposure apparatus
07/04/2012CN102549504A Exposure apparatus, exposure method, and device manufacturing method
07/04/2012CN102549503A Optical arrangement in a projection exposure apparatus for EUV lithography
07/04/2012CN102549502A Exposure apparatus and device manufacturing method
07/04/2012CN102549501A Exposure apparatus, exposure method, and device manufacturing method
07/04/2012CN102549500A Dry film photoresist
07/04/2012CN102549499A 干膜光致抗蚀剂 Dry film photoresist
07/04/2012CN102549498A Photosensitive resin composition for resist material, and photosensitive resin laminate
07/04/2012CN102549497A Photosensitive resin composition and method for producing photosensitive resin film
07/04/2012CN102549496A Radiation-sensitive resin composition and method of forming interlayer dielectric
07/04/2012CN102549495A Electrode comprising a boron oxide oxidation resistance layer and method for manufacturing the same
07/04/2012CN102549494A Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same
07/04/2012CN102549468A Holding arrangement for an optical element
07/04/2012CN102549461A Illumination optical unit for microlithography
07/04/2012CN102549460A Coloring composition and color filter
07/04/2012CN102549078A Curable composition, curable film, curable laminate, method for forming a permanent pattern, and printed substrate
07/04/2012CN102549042A Fluorinated coating and phototools made therewith
07/04/2012CN102549023A Method for producing polybutadiene
07/04/2012CN102548770A Method for producing planographic printing plate precursor
07/04/2012CN102548769A 平版印刷版原版 Lithographic printing plate precursor
07/04/2012CN102545528A Planar motor and reticle stage system applying same
07/04/2012CN102543867A Method for manufacturing metal oxide thin film transistor array substrate
07/04/2012CN102543748A Manufacturing method of semi-conductor device
07/04/2012CN102543712A Novel gate graph dimension shrinkage method
07/04/2012CN102543697A Method for manufacturing tunnel oxide layer window in electrically erasable programmable read only memory (EEPROM)
07/04/2012CN102543685A Substrate processing device and method
07/04/2012CN102543683A Reprocessing method for photoetching process
07/04/2012CN102543630A Medium for discharge plasma extreme ultraviolet lithography light source and application system thereof
07/04/2012CN102540966A Control device and method for photoetching machines
07/04/2012CN102540784A Method of updating calibration data and a device manufacturing method
07/04/2012CN102540783A Automatic calibration device and method for abbe cosine error of interferometer
07/04/2012CN102540782A Alignment device and method for photoetching equipment
07/04/2012CN102540781A Backside alignment device and method
07/04/2012CN102540780A Alignment signal processing system and alignment signal processing method for photoetching equipment
07/04/2012CN102540779A Mask fixing device and mask fixing method used in lithography machine
07/04/2012CN102540778A Measuring system and photoetching device using same
07/04/2012CN102540777A Aligning scan method capable of improving aligning accuracy
07/04/2012CN102540776A Stripping liquid for removing residual photoresist in semiconductor technology
07/04/2012CN102540775A Method for removing photoresist of silicide protection layer
07/04/2012CN102540774A Cleaning agent for thick-film photoresist
07/04/2012CN102540773A Novel method for inspecting photolithographic process by utilizing optical proximity correction (OPC) models of post exposure bake
07/04/2012CN102540772A Low-tension developer for positive photoresist and preparation method thereof
07/04/2012CN102540771A Developing solution for positive photoresist and developing method in photoetching process
07/04/2012CN102540770A Developing method, developing device and coating developing processing system having the developing device
07/04/2012CN102540769A Developing method
07/04/2012CN102540768A Alignment device and alignment method for exposure of PCB (Printed Circuit Board)
07/04/2012CN102540767A Exposure apparatus, movable body drive system, pattern formation apparatus, and exposure method, and device manufacturing method
07/04/2012CN102540766A Optical arrangement for immersion lithography with a hydrophobic coating and projection exposure apparatus comprising the same
07/04/2012CN102540765A Device and method for positioning printed circuit board (PCB) of high-accuracy parallel light exposure machine
07/04/2012CN102540764A Exhaust system of light source unit and photoetching machine
07/04/2012CN102540763A Method for reducing overheating of lithography machine lens
07/04/2012CN102540762A Digital ultraviolet exposure controller
07/04/2012CN102540761A Immersion lithography defect reduction
07/04/2012CN102540760A Lithographic apparatus and method of modifying a beam of radiation within a lithographic apparatus
07/04/2012CN102540759A Photolithographic led fabrication using phase-shift mask
07/04/2012CN102540758A Method for matching different photolithography coating devices in same photolithography process
07/04/2012CN102540757A Light irradiating device
07/04/2012CN102540756A Controller, lithographic apparatus, method of controlling the position of an object and device manufacturing method
07/04/2012CN102540755A Exposure apparatus, exposure method, and method of making panel substrate for display
07/04/2012CN102540754A Optimization flows of source, mask and projection optics
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