| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/19/2012 | US20120183899 Resist composition and method of forming resist pattern |
| 07/19/2012 | US20120183892 Resist composition and patterning process |
| 07/19/2012 | US20120183891 Manufacturing method of photomask, method for optical proximity correction, and manufacturing method of semiconductor device |
| 07/19/2012 | US20120183888 Photopolymer for volume holographic recording and its production process |
| 07/19/2012 | US20120183751 Base generator, photosensitive resin composition, pattern forming material comprising the photosensitive resin composition, pattern forming method using the photosensitive resin composition and products comprising the same |
| 07/19/2012 | US20120183739 High ultraviolet transmitting double-layer wire grid polarizer for fabricating photo-alignment layer and fabrication method thereof |
| 07/19/2012 | US20120182638 Colored curable composition, color filter, and method for producing color filter |
| 07/19/2012 | US20120181702 Photosensitive adhesive composition having alkali soluble epoxy resin, and patternable adhesive film using the same |
| 07/19/2012 | US20120181251 Pattern forming method and resist underlayer film-forming composition |
| 07/19/2012 | US20120181249 Processing liquid for suppressing pattern collapse of fine metal structure and method for producing fine metal structure using same |
| 07/19/2012 | US20120181248 Resist stripping solution composition, and method for stripping resist by using same |
| 07/19/2012 | DE102011087389A1 Variable stopper for optic element e.g. mirror used in projection exposure system, has stopper element that is provided to limit movement path of optical element |
| 07/19/2012 | DE102011079548A1 Micro-lithographic projection exposure system for manufacturing e.g. integrated switching circuits, has optical arrangement configured in such manner that modification of maximum value is minimized in comparison with analog system |
| 07/19/2012 | DE102010038697B4 Verfahren und Vorrichtung zur Qualifizierung einer Optik einer Projektionsbelichtungsanlage für die Mikrolithographie Method and apparatus for classifying a look of a projection exposure system for microlithography |
| 07/19/2012 | CA2824148A1 Method for producing mold for minute pattern transfer, method for producing diffraction grating using the same, and method for producing organic el element including the diffraction grating |
| 07/18/2012 | EP2477073A1 Resist composition for electron beam, EUV or X-ray |
| 07/18/2012 | EP2477069A1 Optical device, exposure apparatus and laser apparatus |
| 07/18/2012 | EP2476713A1 Resist underlayer film composition and patterning process using the same |
| 07/18/2012 | EP2476710A1 Method for producing polybutadiene |
| 07/18/2012 | EP2476662A1 Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern |
| 07/18/2012 | EP2476538A2 Method of imprinting texture on rigid substrate using flexible stamp |
| 07/18/2012 | EP2476026A1 Optical element with low surface figure deformation |
| 07/18/2012 | EP2476025A2 Method for manufacturing stamper for injection molding |
| 07/18/2012 | EP2176709B1 Imprint method and processing method of substrate using the imprint method |
| 07/18/2012 | CN202339477U 平行曝光机的反光装置 Reflectors parallel exposure machine |
| 07/18/2012 | CN202339476U 曝光机自动找平升降装置 Exposure automatic leveling lifting device |
| 07/18/2012 | CN202339475U 平行光曝光机的同向开合装置 Parallel light exposure machine with the opening and closing device |
| 07/18/2012 | CN202338882U 平行光曝光机的灯源内循环冷却装置 Parallel light exposure light source within the machine cycle cooling device |
| 07/18/2012 | CN1930524B Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof |
| 07/18/2012 | CN1912740B 曝光掩模 Exposure mask |
| 07/18/2012 | CN1902550B Composition for forming nitride coating film for hard mask |
| 07/18/2012 | CN1881081B Radiation sensitive composition and color filter for forming coloration layer |
| 07/18/2012 | CN1831654B Composition for photoresist stripping solution and process of photoresist stripping |
| 07/18/2012 | CN1825208B Lithographic apparatus and device manufacturing method |
| 07/18/2012 | CN1821881B Lithographic apparatus and device manufacturing method |
| 07/18/2012 | CN102598225A Apparatus and method of applying a film to a semiconductor wafer and method of processing a semiconductor wafer |
| 07/18/2012 | CN102598222A Silicon-selective dry etch for carbon-containing films |
| 07/18/2012 | CN102597890A Holographic mask inspection system with spatial filter |
| 07/18/2012 | CN102597881A Exposure apparatus and photomask used therein |
| 07/18/2012 | CN102597880A Exposure device and photo mask |
| 07/18/2012 | CN102597879A Photosensitive resin composition |
| 07/18/2012 | CN102597878A Radiation-sensitive resin composition, polymer and resist pattern formation method |
| 07/18/2012 | CN102597877A Photosensitive resin composition, photosensitive element using same, method for forming resist pattern, method for producing lead frame, printed wiring board, and method for producing printed wiring board |
| 07/18/2012 | CN102597876A Quinonediazide photosensitizer solution and positive-type resist composition |
| 07/18/2012 | CN102597875A Method for producing microparticles |
| 07/18/2012 | CN102597874A Stabilizers for vinyl ether resist formulations for imprint lithography |
| 07/18/2012 | CN102597873A Focus test mask, focus measuring method, exposure apparatus, and exposure method |
| 07/18/2012 | CN102597872A Method of pattern selection for source and mask optimization |
| 07/18/2012 | CN102597138A Silicon containing coating compositions and methods of use |
| 07/18/2012 | CN102597116A Curable composition, method of coating a phototool, and coated phototool |
| 07/18/2012 | CN102597061A Polyimide precursor and photosensitive resin composition containing the polyimide precursor |
| 07/18/2012 | CN102597034A Cyclic compound, manufacturing method therefor, radiation-sensitive composition, and method for forming a resist pattern |
| 07/18/2012 | CN102596874A Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern |
| 07/18/2012 | CN102596135A Method of producing color change in overlapping layers |
| 07/18/2012 | CN102594084A System and method for design of linear motor for vacuum environment |
| 07/18/2012 | CN102593718A Preparation method for intermediate infrared laser |
| 07/18/2012 | CN102592978A Photoresists and methods for use thereof |
| 07/18/2012 | CN102592002A Method for generating mask data, method for manufacturing mask, and exposure method |
| 07/18/2012 | CN102591161A Photoresist compositions and method for multiple exposures with multiple layer resist systems |
| 07/18/2012 | CN102591160A Rinse solution for lithography |
| 07/18/2012 | CN102591159A Optical machining system and method |
| 07/18/2012 | CN102591158A Method for accurately measuring WEE (wafer edge exclusion) width |
| 07/18/2012 | CN102591157A Exposure method and exposure apparatus |
| 07/18/2012 | CN102591156A Exposure device and exposure method |
| 07/18/2012 | CN102591155A Heat stability processing method for 830-nanometer infrared photosensitive heat-sensitive CTP (computer to plate) |
| 07/18/2012 | CN102591154A Coating compositions for use with an overcoated photoresist |
| 07/18/2012 | CN102591153A Light-sensitive resin as well as preparation method and application thereof |
| 07/18/2012 | CN102591152A Resist composition and patterning process |
| 07/18/2012 | CN102591151A Colored photosensitive composition, color filter and manufacturing method thereof, liquid crystal display device, and organic EL display device |
| 07/18/2012 | CN102591150A Heat curable composition for protective film, cured product, and liquid crystal display device |
| 07/18/2012 | CN102591149A Thermal sensitive composition and usage thereof |
| 07/18/2012 | CN102591148A Colored photosensitive resin composition for touch panel, touch panel and display device |
| 07/18/2012 | CN102591147A Compositions comprising sugar component and processes for photolithography |
| 07/18/2012 | CN102591146A Photocurable resin composition, dry film and cured product thereof, and printed wiring board using the same |
| 07/18/2012 | CN102591145A Photoresists comprising multi-amide component |
| 07/18/2012 | CN102591144A Metal microstructure formation method |
| 07/18/2012 | CN102591143A Device and method for large-area nano imprinting photoetching |
| 07/18/2012 | CN102591142A Nano imprinting device and method for imaging sapphire substrate |
| 07/18/2012 | CN102591141A Method for preparing bottom die for flexible resin plates |
| 07/18/2012 | CN102591140A Nanoimprint method |
| 07/18/2012 | CN102591139A Photoetching method of superfine structure |
| 07/18/2012 | CN102591138A Double-light-resistance wall and preparation method thereof |
| 07/18/2012 | CN102591137A Ablative black film for directly making plate by flexographic plate computer and preparation method of ablative black film |
| 07/18/2012 | CN102591135A Monitoring method for graphic changes caused by lens heating during continuous exposure |
| 07/18/2012 | CN102590989A Method for selecting non-spherical position of lithography lens |
| 07/18/2012 | CN102590974A Position fine adjustment device and objective lens adopting same |
| 07/18/2012 | CN102590919A Method of manufacturing the patterned retarder |
| 07/18/2012 | CN102590915A Method for manufacturing X-ray diffraction grating with large height-width ratio |
| 07/18/2012 | CN102589686A Calibration method of energy sensors |
| 07/18/2012 | CN102585066A Poly (methyl) acrylate oligomer containing vinyl ether functional group |
| 07/18/2012 | CN102585040A Beta-cyclodextrin derivative based on annular alkamine as well as preparation method and application of beta-cyclodextrin derivative |
| 07/18/2012 | CN102582312A Low chemical treatment violet laser photopolymerization type planographic printing plate |
| 07/18/2012 | CN102054641B Manufacture process of grid-control TWT grid and mold-pressing grinding tool thereof |
| 07/18/2012 | CN101969026B Electrode preparation method based on ink jet printing and laser interference exposure |
| 07/18/2012 | CN101943859B Reel-to-reel ultraviolet nanometer coining device and method |
| 07/18/2012 | CN101923290B Lithographic apparatus and device manufacturing method |
| 07/18/2012 | CN101894756B Groove formation method, metal wire formation method, photoetching method and equipment |
| 07/18/2012 | CN101802660B Pigment dispersing composition for color filters |
| 07/18/2012 | CN101796100B Method for producing polyamide and resin composition |
| 07/18/2012 | CN101790704B Composition for resist lower layer film formation for lithography and process for producing semiconductor device |