Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2012
10/17/2012CN102738049A Substrate transport method, substrate transport apparatus, and coating and developing system
10/17/2012CN102737960A Method and system for feed-forward advanced process control
10/17/2012CN102736935A Method for adding character strings in maskless lithography machine exposure in real time
10/17/2012CN102736452A Device and method for near-field alignment of lithography equipment
10/17/2012CN102736451A Three-beam interference lithography method and system
10/17/2012CN102736450A Metallic target generator without vibrating rod
10/17/2012CN102736449A Tilt-scanned image data compression method in direct-write lithography system
10/17/2012CN102736448A Compression method for image gradation data in direct writing lithography system
10/17/2012CN102736447A Compression method for image data string in direct writing lithography system
10/17/2012CN102736446A Exposure apparatus, exposure method, and method for producing device
10/17/2012CN102736445A Aligning method of mask and workpiece
10/17/2012CN102736444A Optical apparatus for conditioning a radiation beam for use by an object, lithography apparatus and method of manufacturing devices
10/17/2012CN102736443A Double EUV illumination uniformity correction system and method
10/17/2012CN102736442A Lithographic apparatus and method
10/17/2012CN102736441A Multi-layer reflecting mirror and lithographic device
10/17/2012CN102736440A Lithographic
10/17/2012CN102736439A Planar motor and lithographic apparatus comprising such planar motor
10/17/2012CN102736438A Electron beam lithography system and method for improving throughput
10/17/2012CN102736437A Pattern formation apparatus and pattern formation method
10/17/2012CN102736436A Illumination design for lens heating mitigation
10/17/2012CN102736435A Device for driving mask aligner to carry out linear motion
10/17/2012CN102736434A Forming method of packaging pattern
10/17/2012CN102736433A Protection device for leak of workpiece platform
10/17/2012CN102736432A Overlay method for nano-scale components
10/17/2012CN102736431A Measuring device for measuring motion precision of motion bench and measuring method thereof
10/17/2012CN102736430A Measuring method for focusing and leveling system
10/17/2012CN102736429A Silicon chip temperature stabilizing device
10/17/2012CN102736428A Focusing and leveling device and method
10/17/2012CN102736427A Exposure device and method of same
10/17/2012CN102736426A Integrated sensor for lithography device
10/17/2012CN102736425A 掩模对准自适应扫描方法 Adaptive Scanning Method mask alignment
10/17/2012CN102736424A Auxiliary apparatus for rotation of object lens
10/17/2012CN102736423A Object holding platform, error compensated measurement apparatus and error compensated method
10/17/2012CN102736422A Proximity field exposure device and method
10/17/2012CN102736421A Proximity contact scan exposure device and method
10/17/2012CN102736420A Movable narrow crack blade
10/17/2012CN102736419A Defoaming device for photoresist
10/17/2012CN102736418A Composition for coating over a photoresist pattern
10/17/2012CN102736417A 光致抗蚀剂组合物 The photoresist composition of
10/17/2012CN102736416A Dyeing photosensory resin composition
10/17/2012CN102736415A Phtotocuring thermocuring resin composition, dry film and cured resin thereof, and printed circuit board using the same
10/17/2012CN102736414A Dyeing composition and color filter using same
10/17/2012CN102736413A Red dyeing composition for color filter, and color filter
10/17/2012CN102736412A Dyeing photosensory resin composition
10/17/2012CN102736411A Photosensitive resin composition and color filter and liquid crystal display device using the same
10/17/2012CN102736410A Method for machining large-area nanoimprint silicon die under multi-point contact mode
10/17/2012CN102736409A Uv curing creating flattop and roundtop structures on a single printing plate
10/17/2012CN102736408A Method for forming pixel pattern, color filter and display element
10/17/2012CN102736407A Pattern transfer apparatus and pattern transfer method
10/17/2012CN102736406A Plate burning process of precise screen
10/17/2012CN102736402A Substrate for photomask, photomask, method for manufacturing photomask and method for transfering pattern
10/17/2012CN102736398A Substrate for photomask, photomask and pattern transfer method
10/17/2012CN102736397A Photomask substrate, photomask, photomask substrate set, photomask set, method for manufacturing photomask and pattern transfer method
10/17/2012CN102736310A Method for manufacturing color filter
10/17/2012CN102736232A Large view field projection lithography objective lens
10/17/2012CN102736221A Projection lithography objective lens
10/17/2012CN102736176A Method for making waveguide by using laser
10/17/2012CN102735425A Lens heat effect measuring system and measuring method
10/17/2012CN102735170A Lithography system with differential interferometer module
10/17/2012CN102735163A Alignment of an interferometer module for an exposure tool
10/17/2012CN102732062A Salt for dye
10/17/2012CN102732046A Dye compound
10/17/2012CN102731715A Copolymer for resist comprising novel acryl based monomer and resin composition for resist comprising the same
10/17/2012CN102731387A A salt for dye
10/17/2012CN102731347A Salt, photoresist composition, and method for producing photoresist pattern
10/17/2012CN102731346A Salt, photoresist composition, and method for producing photoresist pattern
10/17/2012CN102730629A Microlens preparation method and its product
10/17/2012CN102087478B Mask scanning device
10/17/2012CN101923292B Removal method of chromium residues on border of mask
10/17/2012CN101558359B Surface treatment method and apparatus, exposure method and apparatus, and device manufacturing method
10/17/2012CN101370772B Diketooxime ester compound and use thereof
10/16/2012US8289623 Polarization-modulating optical element
10/16/2012US8289384 Electron beam displacement measuring method, electron beam displacement measuring device, and electron beam recording apparatus
10/16/2012US8289109 Electromagnetic bandgap pattern structure, method of manufacturing the same, and security product using the same
10/16/2012US8288656 Low temperature curable photosensitive resin composition and dry film manufactured by using the same
10/16/2012US8288503 Method for forming organic layer pattern, organic layer pattern prepared by the same and organic memory devices comprising the pattern
10/16/2012US8288083 Methods of forming patterned masks
10/16/2012US8288082 Method of fabricating triode-structure field-emission device
10/16/2012US8288080 Photopolymerizable flexographic printing elements and hard flexographic printing formes which are produced therefrom
10/16/2012US8288079 Photocurable resin composition and a method for forming a pattern
10/16/2012US8288078 Photosensitive resin composition, and pattern formation method using the same
10/16/2012US8288077 Chemically amplified resist composition and salt employed therein
10/16/2012US8288076 Chemically amplified resist composition and pattern forming process
10/16/2012US8288074 Photoimaging method and apparatus
10/16/2012US8288073 Pattern forming method
10/16/2012US8288072 Antireflection film; fast etching speed whcih reduces deformation; accuracy; 2,3-epoxypropyl methacrylate ester-styrene copolymer
10/11/2012WO2012138463A2 Microfrabication of tunnels
10/11/2012WO2012137888A1 Colored composition, colored cured film, color filter, method for producing color filter, liquid crystal display device, solid-state imaging element, and novel dipyrromethene-type metal complex compound or tautomer thereof
10/11/2012WO2012137842A1 Illumination apparatus, exposure apparatus, device production method, light-guiding optical element, and method for producing light-guiding optical element
10/11/2012WO2012137838A1 Photosensitive composition, hardened coating films therefrom, and printed wiring boards using same
10/11/2012WO2012137797A1 Exposure apparatus, exposure method, device manufacturing method, program, and recording medium
10/11/2012WO2012137785A1 Exposure device using microlens array
10/11/2012WO2012137746A1 Colored composition, colored cured film, color filter, method for producing color filter, liquid crystal display device, solid state imaging element, and novel dipyrromethane-based metal complex compound or tautomer thereof
10/11/2012WO2012137740A1 Photocurable resin composition
10/11/2012WO2012137699A1 Optical apparatus, exposure apparatus, and method of manufacturing device
10/11/2012WO2012136892A1 Method of producing highly conformal coatings
10/11/2012WO2012136738A1 Process for manufacturing an electrochemical device based on self-alignment electrolytes on electrodes
10/11/2012WO2012136512A2 Method for producing a screen printing mold and solar cell produced therewith
10/11/2012WO2012136420A1 Mirror, radiation source - collector and lithographic apparatus
10/11/2012WO2012136199A1 Exposure device for the structured exposure of a surface
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