Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2012
10/24/2012CN102749806A Colored curable resin composition
10/24/2012CN102749805A Photoresist composition and method for producing photoresist pattern
10/24/2012CN102749804A Optical cemented component manufacturing method
10/24/2012CN102749803A Layered radiation-sensitive materials with varying sensitivity
10/24/2012CN102746760A Compositions and processes for photolithography
10/24/2012CN102746457A Resin and photoresist composition comprising same
10/24/2012CN102207677B Radiosensitive composition
10/24/2012CN101923293B Lithographic apparatus and method for illumination uniformity correction and uniformity drift compensation
10/24/2012CN101896537B Alkali-developable curable composition, insulating thin film using the same, and thin film transistor
10/24/2012CN101876788B Photosensitive colored composition and color filter
10/24/2012CN101833242B Resist solution and method of forming pattern using thereof
10/24/2012CN101802716B Lithographic apparatus and device manufacturing method
10/24/2012CN101546004B Colored filter
10/24/2012CN101441420B Lithographic apparatus and device manufacturing method
10/24/2012CN101191997B Photomask and its manufacture method and pattern definition method
10/23/2012US8294876 Exposure apparatus and device manufacturing method
10/23/2012US8293810 Rapid prototyping resin compositions
10/23/2012US8293694 Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
10/23/2012US8293461 Direct emulsion process for making printed circuits
10/23/2012US8293460 Double exposure patterning with carbonaceous hardmask
10/23/2012US8293458 Method for forming fine pattern in semiconductor device
10/23/2012US8293457 Substrate having film pattern and manufacturing method of the same, manufacturing method of semiconductor device, liquid crystal television, and EL television
10/23/2012US8293455 Mandrel
10/23/2012US8293454 Process of making a lithographic structure using antireflective materials
10/23/2012US8293453 Photosensitive adhesive composition, and obtained using the same, adhesive film, adhesive sheet, semiconductor wafer with adhesive layer, semiconductor device and electronic part
10/23/2012US8293451 Near-infrared absorbing film compositions
10/23/2012US8293450 Comprising polymer matrix, labeling dye which absorbs electromagnetic radiation in visible range of 400-700 nm to provide visible coloration, wherein labeling dye forms reaction product upon exposure to radiation energy at wavelength of 400-900 nm, and where product has color different from labeling dye
10/23/2012US8293449 Sensitivity and resolution
10/23/2012US8293448 Resin composition for stereolithography
10/23/2012US8293438 Erasable media with binder
10/23/2012US8293435 Photomask blank, photomask, and methods of manufacturing the same
10/23/2012US8293326 Spin-coating method, determination method for spin-coating condition and mask blank
10/23/2012US8293150 Near-infrared absorbing material
10/23/2012US8293149 Photosensitive resin composition for color filter and color filter using the same
10/23/2012US8293124 Method of multi-stage substrate etching and terahertz oscillator manufactured using the same method
10/23/2012US8293021 Instrument for cleaning an aluminum workpiece
10/23/2012US8291820 Intaglio printing plate, production method for intaglio printing plate, production method for electronic substrate, and production method for display device
10/23/2012CA2626799C Microstructure synthesis by flow lithography and polymerization
10/18/2012WO2012142149A1 Method of processing a wafer by using and reusing photolithographic masks
10/18/2012WO2012141210A1 Photosensitive organic particle
10/18/2012WO2012141209A1 Upper surface antireflective film forming composition and pattern forming method using same
10/18/2012WO2012141165A1 Positive photoresist composition, coating film thereof, and novolac phenol resin
10/18/2012WO2012141153A1 Photocurable resin composition, dry film, cured product, and printed wiring board
10/18/2012WO2012141000A1 Copolymer, resin composition and photosensitive resin composition each containing said copolymer, and color filter
10/18/2012WO2012140210A1 Process for producing three-dimensional structures
10/18/2012WO2012140106A1 Lithography process
10/18/2012WO2012139744A1 Spatially relaying radiation components
10/18/2012WO2012139649A1 Facet mirror device
10/18/2012WO2012087075A3 Method for forming fine pattern in large area using laser interference exposure, method for non-planar transfer of the fine pattern formed by the method, and article to which the fine pattern is transferred by the transfer method
10/18/2012WO2012086959A3 Photo-curable resin composition for printing process
10/18/2012US20120264067 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server
10/18/2012US20120264066 Optical Imaging Writer System
10/18/2012US20120264065 Method of Optical Fabrication of Three-Dimensional Polymeric Structures With Out of Plane Profile Control
10/18/2012US20120264064 Method for fabricating an amplification gap of an avalanche particle detector
10/18/2012US20120264063 Method and system for feed-forward advanced process control
10/18/2012US20120264062 Electron beam lithography system and method for improving throughput
10/18/2012US20120264061 Resist composition, method of forming resist pattern, novel compound, and acid generator
10/18/2012US20120264060 Salt, photoresist composition, and method for producing photoresist pattern
10/18/2012US20120264059 Resist composition and method for producing resist pattern
10/18/2012US20120264058 Resist composition for negative development and method of forming resist pattern
10/18/2012US20120264057 Patterning process and photoresist with a photodegradable base
10/18/2012US20120264056 Method of making radiation-sensitive sol-gel materials
10/18/2012US20120264055 Photoresist composition
10/18/2012US20120264054 Pattern forming method, actinic-ray-sensitive or radiation-sensitive resin composition, and resist film
10/18/2012US20120264053 Compositions and processes for photolithography
10/18/2012US20120264052 Resist composition, method of forming resist pattern, and polymeric compound
10/18/2012US20120263921 Optical lithography using graphene contrast enhancement layer
10/18/2012US20120263920 Photosensitive Polymer Composition, Method of Producing Pattern and Electronic Parts
10/18/2012US20120263893 Card-shaped data carrier
10/18/2012US20120262793 Black curable composition for wafer - level lens, and wafer - level lens
10/18/2012US20120262684 Environmental system including vacuum scavenge for an immersion lithography apparatus
10/18/2012US20120261263 Three-dimensional nanochannel device and method of manufacturing the same
10/17/2012EP2511945A1 Multilayer mirror for euv lithography and process for producing same
10/17/2012EP2511944A1 Reflective-layer-equipped substrate for euv lithography, reflective mask blank for euv lithography, reflective mask for euv lithography, and process for producing reflective-layer-equipped substrate
10/17/2012EP2511943A1 Optical member for use in euv lithography
10/17/2012EP2511766A1 Topcoat compositions for photoresist and immersion photolithography process using them
10/17/2012EP2511765A2 Regulator for regulating a flat assembly of individually drivable beam deviation elements in a microlithographic projection exposure system
10/17/2012EP2511751A1 Spatially relaying radiation components
10/17/2012EP2510538A2 Removal of masking material
10/17/2012EP2510400A1 Uv-led curable compositions and inks
10/17/2012EP2510399A1 Black curable composition, light-shielding color filter, light-shielding film and method for manufacturing the same, wafer level lens, and solid-state imaging device
10/17/2012EP2510398A2 Compositions comprising base-reactive component and processes for photolithography
10/17/2012EP2510397A1 Method for manufacturing a multilayer structure with a lateral pattern for application in the xuv wavelength range, and bf and lmag structures manufactured according to this method
10/17/2012EP2509948A1 Photoinitiators for uv-led curable compositions and inks
10/17/2012CN202494863U Uniform photoetching system through detection and location of gauss light spot
10/17/2012CN202494862U Focusing leveling device
10/17/2012CN102741993A Substrate support member, substrate conveyance apparatus, substrate conveyance method, exposure apparatus, and device manufacturing method
10/17/2012CN102741978A Method for maintaining substrate processing apparatus, and safety apparatus for substrate processing apparatus
10/17/2012CN102741753A Antireflective compositions and methods of using same
10/17/2012CN102741752A Positive photosensitive resin composition and liquid-repellent film
10/17/2012CN102741751A Photosensitive composition, photosensitive film, photosensitive laminate, method for forming permanent pattern, and printed board
10/17/2012CN102741750A Photosensitive resin composition, photosensitive dry film, and pattern forming method
10/17/2012CN102741749A Negative photosensitive resin composition, pattern formation method, and liquid discharge head
10/17/2012CN102741748A Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition
10/17/2012CN102741747A Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same
10/17/2012CN102741746A Photomask, exposure device, and method for producing liquid crystal display panel
10/17/2012CN102741726A Exposure system
10/17/2012CN102741650A System and method for assessing inhomogeneous deformations in multilayer plates
10/17/2012CN102739486A Synchronous data transmission bus system and method
10/17/2012CN102738698A Production method of deep submicron etched groove based on ultraviolet lithography process
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