Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2012
10/31/2012CN101720448B Method and apparatus for determining the effect of process variations
10/31/2012CN101713926B Peripheral exposure device and method thereof
10/31/2012CN101542394B Photosensitive siloxane composition, hardened film formed therefrom and device having the hardened film
10/31/2012CN101424888B Combination for tripping photoresist, tripping method and making method of display device
10/31/2012CN101390017B Heat curable composition for protective film, cured product, and liquid crystal display device
10/31/2012CN101286001B Focusing evaluation method
10/31/2012CN101281364B Manufacturing method of colorful optical filter and liquid crystal display panel
10/30/2012US8301291 Charged particle beam writing apparatus, write data creation method and charged particle beam writing method
10/30/2012US8298755 Methods for producing organic nanocrystals
10/30/2012US8298754 Method for forming thick film pattern, method for manufacturing electronic component, and photolithography photosensitive paste
10/30/2012US8298751 Alkaline rinse agents for use in lithographic patterning
10/30/2012US8298750 Positive-working radiation-sensitive imageable elements
10/30/2012US8298749 Directly imageable waterless planographic printing plate precursor and method for producing same
10/30/2012US8298748 Positive resist composition, method of forming resist pattern, and polymeric compound
10/30/2012US8298747 Photosensitive resin composition, process for producing patterned hardened film with use thereof and electronic part
10/30/2012US8298746 Chemically amplified positive resist composition
10/30/2012US8298745 Polymeric compound, positive resist composition, and method of forming resist pattern
10/30/2012US8298744 Coating material for photoresist pattern and method of forming fine pattern using the same
10/30/2012US8298743 Positive-type photosensitive composition, transparent conductive film, display element and integrated solar battery
10/30/2012US8298732 Exposure method and method of making a semiconductor device
10/30/2012US8298731 Dye-containing negative curable composition, color filter and method of producing color filter
10/30/2012US8298454 Photosensitive resin composition and light blocking layer using the same
10/30/2012US8297991 Exposure device, exposure method and method of manufacturing semiconductor device
10/26/2012WO2012145282A2 Enhanced multi-photon imaging resolution method
10/26/2012WO2012145162A1 Aluminum substrates and lithographic printing plate precursors
10/26/2012WO2012145111A1 Photosensitive resin laminate and thermal processing of the same
10/26/2012WO2012144798A2 Polymer and photosensitive resin composition containing same
10/26/2012WO2012144762A2 Method for printing a conductive circuit using a uv rotational molding machine
10/26/2012WO2012144735A2 Novel diblock copolymer, preparation method thereof, and method of forming nano pattern using the same
10/26/2012WO2012144521A1 Colorant dispersion liquid, colored resin composition for use in color filters, color filter, liquid crystal display device, and organic light-emitting display device
10/26/2012WO2012143446A1 Methods and materials for lithography of a high resolution hsq resist
10/26/2012WO2012143275A1 Arrangement for actuating an element in a microlithographic projection exposure apparatus
10/26/2012WO2012143188A1 Lithographic apparatus, method for maintaining a lithographic apparatus and device manufacturing method
10/26/2012WO2012143166A1 Method for producing a ceramic component composed of a plurality of preforms
10/26/2012CA2830267A1 Photosensitive resin laminate and thermal processing of the same
10/25/2012US20120270763 Spin-on formulation and method for stripping an ion implanted photoresist
10/25/2012US20120270159 Patterning process
10/25/2012US20120270158 Manufacturing method of metal structure of flexible multi-layer substrate
10/25/2012US20120270157 Resist underlayer film-forming composition and method for forming pattern
10/25/2012US20120270156 Photosensitive Resin Laminate and Thermal Processing of the Same
10/25/2012US20120270155 Compound, polymeric compound, acid generator, resist composition, and method of forming resist pattern
10/25/2012US20120270154 Resin and photoresist composition comprising same
10/25/2012US20120270153 Photoresist composition and method for producing photoresist pattern
10/25/2012US20120270152 Aluminum substrates and lithographic printing plate precursors
10/25/2012US20120270151 Radiation sensitive resin composition and method of forming an interlayer insulating film
10/25/2012US20120270150 Substrate distortion measurement
10/25/2012US20120270144 Pattern forming device, pattern forming method, and device manufacturing method
10/25/2012US20120270143 Resist underlayer composition and method of manufacturing semiconductor integrated circuit devices using the same
10/25/2012US20120270142 Photosensitive composition and method of manufacturing a substrate for a display device using the same
10/25/2012US20120269421 System and Method for Lithography Simulation
10/25/2012US20120268726 Lyophobic Run-Off Path to Collect Liquid for an Immersion Lithography Apparatus
10/25/2012US20120268700 Color filter substrate, fabricating method thereof and lcd with the same
10/25/2012US20120266768 Lithographic Printing Plate Precursor
10/25/2012US20120266767 Uv curing creating flattop and roundtop structures on a single printing plate
10/25/2012DE102011088980A1 Catoptric imaging optics of optical system used in projection exposure system, has mirrors for reproducing object field in object plane into image field of image plane
10/25/2012DE102011081603A1 Adaptive mirror, particularly for microlithographic projection exposure apparatus, for certain wavelengths, has substrate, electrical leads, electrically insulating insulation layer, and array of control electrodes
10/25/2012DE102011007917A1 Anordnung zur Aktuierung eines Elementes in einer mikrolithographischen Projektionsbelichtungsanlage Arrangement for actuation of an element in a microlithography projection exposure apparatus
10/24/2012EP2515324A1 Substrate treatment device
10/24/2012EP2515171A1 Illumination optical apparatus and device manufacturing method
10/24/2012EP2515170A2 Thermal conditioning system for thermal conditioning a part of a lithographic apparatus and a thermal conditioning method
10/24/2012EP2515168A2 Methods and apparatus for calculating electromagnetic scattering properties of a structure and for reconstruction of approximate structures
10/24/2012EP2515159A2 A device having a light-absorbing mask and a method for fabricating same.
10/24/2012EP2515149A1 Optical element, lithographic apparatus including such an optical element, device manufacturing method
10/24/2012EP2514696A2 Controlling device for preventing snaking of patterns of patterned films
10/24/2012EP2513961A2 Cylindrical magnetic levitation stage and lithography
10/24/2012EP2513723A1 Light-shielding curable composition, wafer level lens and light-shielding color filter
10/24/2012EP2513722A1 Led curable liquid resin compositions for additive fabrication
10/24/2012EP2513721A2 Reflective mask for euv lithography
10/24/2012EP2513703A1 Selective diffractive optical element and a system including the same
10/24/2012EP2513686A1 Reflective optical element for euv lithography
10/24/2012EP2513685A1 Mirror for the euv wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objective
10/24/2012CN1950750B Pattern forming material, pattern forming apparatus and pattern forming method
10/24/2012CN102754035A Lithographic apparatus and device manufacturing method
10/24/2012CN102754034A Composition for formation of resist underlayer film containing silicon having nitrogen-containing ring
10/24/2012CN102754033A Underlayer film material, and method for formation of multilayer resist pattern
10/24/2012CN102754032A Photosensitive resin composition and photosensitive element using same, resist pattern formation method and printed circuit board manufacturing method
10/24/2012CN102754031A Layered structure and light-sensitive dry film used in same
10/24/2012CN102754030A Photocurable resin composition, dry film, cured article, and printed wiring board
10/24/2012CN102754029A Photosensitive resin composition, method for manufacturing structural body, and liquid discharge head
10/24/2012CN102754028A Photosensitive resin composition, method for producing structure, and liquid discharge head
10/24/2012CN102754027A Photosensitive composition and printed circuit board
10/24/2012CN102754026A Photopolymer formulation having ester-based writing monomers
10/24/2012CN102754009A Imaging optics
10/24/2012CN102753931A Capacitive sensing system
10/24/2012CN102753651A Copper oxide etchant and etching method using same
10/24/2012CN102753509A Cyclic compound, process for production of the cyclic compound, radiation-sensitive composition, and method for formation of resist pattern
10/24/2012CN102751312A OLED (Organic Light Emitting Diode) display and manufacturing method thereof
10/24/2012CN102751241A Manufacturing method of array substrate via holes and manufacturing method of array substrate
10/24/2012CN102751223A Control circuit of wafer transmission device, wafer transmission device and lithography equipment
10/24/2012CN102751179A Method for preparing graphene devices
10/24/2012CN102749816A Focusing and leveling measurer
10/24/2012CN102749815A Detection method for alignment precision
10/24/2012CN102749814A Exposure alignment method
10/24/2012CN102749813A Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
10/24/2012CN102749812A Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
10/24/2012CN102749811A Multi-focus scanning with a tilted mask or wafer
10/24/2012CN102749810A Imaging optical system and projection exposure installation
10/24/2012CN102749809A Thermal conditioning system for thermal conditioning a part of a lithographic apparatus and a thermal conditioning method
10/24/2012CN102749808A Focusing and leveling measurer
10/24/2012CN102749807A Photosensitive resin composition
1 ... 134 135 136 137 138 139 140 141 142 143 144 145 146 147 148 149 150 151 152 153 154 ... 1272