Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2012
11/07/2012CN101903831B A method for preparing lithographic printing plate precursors
11/07/2012CN101738875B Nozzle and apparatus and method for processing substrate using the nozzle
11/07/2012CN101738856B Heat-sensible composition for positive thermosensitive CTP plate without preheating and plate-making method by using same
11/07/2012CN101680747B Moving body driving system, pattern forming apparatus, exposure apparatus, exposure method and device manufacturing method
11/07/2012CN101538348B Active energy ray solidification type resin composition using reactivity compound with fire retardance and condensate thereof
11/07/2012CN101124520B Single- and multi-photon polymerizable pre-ceramic polymeric compositions
11/07/2012CN101084468B Material composition for nano-and micro-lithography
11/07/2012CN101067720B Solid imaging system
11/06/2012US8305552 Exposure apparatus, exposure method, and method for producing device
11/06/2012US8304724 Microstructured pattern inspection method
11/06/2012US8304179 Method for manufacturing a semiconductor device using a modified photosensitive layer
11/06/2012US8304178 Top antireflective coating composition containing hydrophobic and acidic groups
11/06/2012US8304175 Patterning method
11/06/2012US8304174 Method for fabricating semiconductor device
11/06/2012US8304173 Photomasks, methods of exposing a substrate to light, methods of forming a pattern, and methods of manufacturing a semiconductor device
11/06/2012US8304172 Semiconductor device fabrication using a multiple exposure and block mask approach to reduce design rule violations
11/06/2012US8304171 Plate making method of lithographic printing plate precursor
11/06/2012US8304170 Negative-working imageable element and method of use
11/06/2012US8304169 Alkali-developable resins, method for preparing the same and photosensitive composition comprising the alkali-developable resins
11/06/2012US8304168 Lithographic printing plate precursor and process for producing lithographic printing plate
11/06/2012US8304166 Heat sensitive positive-working lithographic printing plate precursor
11/06/2012US8304165 Negative working, heat-sensitive lithographic printing plate precursor
11/06/2012US8304164 Photoresist composition
11/06/2012US8304163 Compound, dissolution inhibitor, positive type resist composition, and method of forming resist pattern
11/06/2012US8304162 Processless printing plates
11/06/2012US8304161 Silsesquioxane resins
11/06/2012US8304160 Photosensitive resin composition and circuit formation substrate using the same
11/06/2012US8304149 Photosensitive polymer composition, method of forming relief patterns, and electronic equipment
11/06/2012US8303866 Mass production of micro-optical devices, corresponding tools, and resultant structures
11/06/2012US8303862 Photosensitive resin composition for color filter and color filter using same
11/01/2012WO2012148884A2 Orthogonal solvents and compatible photoresists for the photolithographic patterning of organic electronic devices
11/01/2012WO2012148274A1 Charged particle system for processing a target surface
11/01/2012WO2012148267A1 Charged particle system comprising a manipulator device for manipulation of one or more charged particle beams
11/01/2012WO2012147954A1 Color curable composition for color filters, color cured film, method for producing color filter, color filter, and display device
11/01/2012WO2012147795A1 Dye dispersion, photosensitive resin composition for color filter, color filter, liquid crystal display device, and organic light-emitting display device
11/01/2012WO2012147745A1 Novel photosensitive resin composition and use thereof
11/01/2012WO2012147706A1 Photosensitive resin composition, color filter, protective film, photospacer, substrate for liquid crystal display devices, liquid crystal display device, and solid-state imaging element
11/01/2012WO2012147626A1 Negative photosensitive resin composition, cured film, partition wall, black matrix, method for producing partition wall, method for producing black matrix, color filter, and organic el element
11/01/2012WO2012147210A1 Composition for forming resist underlayer film and pattern formation method
11/01/2012WO2012146789A1 Apparatus for transferring a substrate in a lithography system
11/01/2012WO2012146788A1 Method of processing a substrate in a lithography system
11/01/2012WO2012146339A1 Selectively etching of a polymer matrix on pet
11/01/2012WO2012110465A3 System for magnetic shielding
11/01/2012WO2012101080A3 Optical arrangement for an euv projection exposure apparatus and method for cooling an optical component
11/01/2012US20120276804 Photo-customization for figurines
11/01/2012US20120276485 Patterning process
11/01/2012US20120276484 Method for manufacturing organic el display device
11/01/2012US20120276483 Patterning process
11/01/2012US20120276482 Radiation sensitive resin composition, method for forming a pattern, polymer and compound
11/01/2012US20120276481 Method of forming resist pattern and negative tone-development resist composition
11/01/2012US20120276344 Method of making a patterned dried polymer and a patterned dried polymer
11/01/2012US20120275045 Blue photoresist and color filter substrate and display device using the same
11/01/2012US20120274919 Catadioptric projection objective
11/01/2012US20120274918 Catadioptric projection objective
11/01/2012US20120274911 Lithographic apparatus and device manufacturing method
11/01/2012US20120273924 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition
10/2012
10/31/2012EP2518565A1 Illumination optical apparatus, exposure apparatus, and device manufacturing method
10/31/2012EP2518564A1 Illumination optical apparatus and device manufacturing method
10/31/2012EP2518563A1 Lithographic apparatus and method
10/31/2012EP2518562A2 A patterning process
10/31/2012EP2518011A2 Micromechanical composite part and its method of manufature
10/31/2012DE112011100086T5 Flourfreie Heteroaromatische Fotosäuregeneratoren mit Kondensierten Ringen sowie Fotoresist-Zusammensetzungen, die sie enthalten Flourfreie Heteroaromatic photo acid generators with condensed rings and photoresist compositions containing them
10/31/2012DE10359200B4 Verfahren zur Reduzierung eines Überdeckungsfehlers A method for reducing an overlay error
10/31/2012DE10340382B4 Verfahren zur Bestimmung des Abstandes von Projektionspunkten auf der Oberfläche einer Druckform A method for determining the distance of projection points on the surface of a printing forme
10/31/2012DE102011003928B4 Beleuchtungsoptik für die Projektionslithographie Illumination optics for projection lithography
10/31/2012CN202512361U Mask-free exposure system
10/31/2012CN102763041A Lithographic apparatus and device manufacturing method
10/31/2012CN102763040A Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product
10/31/2012CN102763039A Sulfonamide-containing topcoat and photoresist additive compositions and methods of use
10/31/2012CN102763038A Process for making lithographic printing plate
10/31/2012CN102763037A Photopolymer formulation having triazine-based writing monomers
10/31/2012CN102763036A Layered structure and light-sensitive dry film used in same
10/31/2012CN102763021A Selective diffractive optical element and a system including the same
10/31/2012CN102759865A Exposure alignment system
10/31/2012CN102759864A Controlling device for preventing snaking of patterns of patterned films
10/31/2012CN102759863A Film etching method and laser photoetching machine
10/31/2012CN102759862A Optical proximity correction method
10/31/2012CN102759861A Photoetching modifying method for integrated circuit manufacture
10/31/2012CN102759860A Coating treatment apparatus, coating and developing treatment system, and coating treatment method
10/31/2012CN102759859A Method for making resin composition, hardening composition, and resin pattern, hardening composition, and optical component
10/31/2012CN102759858A Photosensitive resin composition for color filter and color filer formed by the same
10/31/2012CN102759857A Roll-in printing manufacturing method of single-track absolute type grating ruler
10/31/2012CN102759856A Reflection-type long grating process method for laser-assisted roll pressing manufacturing machine tool
10/31/2012CN102759855A Single code channel absolute grating scale rolling and impressing mould manufacturing method
10/31/2012CN102759854A Method of nano-patterning and method of manufacturing nano-imprint master and discrete track magnetic recording media
10/31/2012CN102759853A Method of manufacturing discrete track magnetic recording medium
10/31/2012CN102759851A Phase-shifting mask with auxiliary phase areas
10/31/2012CN102758875A Magnetic levitation balance mass framework
10/31/2012CN102758226A Accurate electroplating machining method for long-grating roller stamping mould for machine tool
10/31/2012CN102757871A Cleaning agent for dry-film developing tank of printed circuit board (PCB) and preparation method of cleaning agent
10/31/2012CN102757668A Salt for dye
10/31/2012CN102757014A Preparation method of glass rod surface micro-lens array
10/31/2012CN102755970A On-line SPM generating system and control method thereof
10/31/2012CN102306632B Planarization method suitable for photoetching technology
10/31/2012CN102298275B Developing method
10/31/2012CN102129177B Method and system for monitoring exposure energy of exposure machine station
10/31/2012CN102129174B Method for repairing defocusing of imaging blocks on edge of wafer
10/31/2012CN102007452B Photosensitive resin composition and layered object obtained therewith
10/31/2012CN101974201B Ultraviolet thick-film photoresist and film-forming resin thereof
10/31/2012CN101859069B Light irradiation apparatus for exposure apparatus, exposure apparatus, and exposure method
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