Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2012
11/14/2012CN101479031B Monoparticulate-film etching mask and process for producing the same, process for producing fine structure with the monoparticulate-film etching mask, and fine structure obtained by the production pro
11/14/2012CN101226333B Curable composition, color filter using the same and manufactuirng method therefor, and solid image pickup element
11/14/2012CN101061058B Imprinting of supported and free-standing 3-D micro-or nano-structures
11/13/2012US8312396 Set of masks, method of generating mask data and method for forming a pattern
11/13/2012US8309371 System and method for creating a flat wavefront using a photonic crystal
11/13/2012US8309297 Methods of lithographically patterning a substrate
11/13/2012US8309296 Method for processing workpiece with photoresist layer
11/13/2012US8309295 Photosensitive insulating resin composition, hardening product thereof, and circuit board equipped therewith
11/13/2012US8309294 Lithographic printing plate precursor and plate making method
11/13/2012US8309281 Photosensitive polymeric networks
11/13/2012US8309280 Positive-type photosensitive resin composition, cured film, protective film, insulating film, and semiconductor device
11/08/2012WO2012151497A1 Suppression of dewetting of polymer films via inexpensive soft lithography
11/08/2012WO2012151167A2 Euv lithography flare calculation and compensation
11/08/2012WO2012151033A2 Method for offset imaging
11/08/2012WO2012150263A1 Method for controlling deposition
11/08/2012WO2012150215A1 Optical module with a measuring device
11/08/2012WO2012149887A1 Centre of mass calibration method for coarse stage of lithography equipment
11/08/2012WO2012121418A3 Nanoimprinting method and nanoimprinting apparatus for executing the method
11/08/2012WO2012121416A3 Nanoimprinting mold
11/08/2012WO2012121401A3 Nanoimprinting method
11/08/2012WO2012118621A3 Method and system for design of enhanced patterns for charged particle beam lithography
11/08/2012WO2012041458A3 Projection exposure tool for microlithography and method for microlithographic exposure
11/08/2012US20120282774 Patterning Methods and Masks
11/08/2012US20120282554 Large area nanopatterning method and apparatus
11/08/2012US20120282553 Immersion upper layer film forming composition and method of forming photoresist pattern
11/08/2012US20120282552 Method for offset imaging
11/08/2012US20120282551 Resist composition, method of forming resist pattern and polymeric compound
11/08/2012US20120282550 Radiation-sensitive composition
11/08/2012US20120282549 Photosensitive composition, photosensitive film, photosensitive laminate, method for forming permanent pattern, and printed board
11/08/2012US20120282548 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film
11/08/2012US20120282547 Photosensitive adhesive
11/08/2012US20120282546 Cyclic compound, production process thereof, radiation-sensitive composition and resist pattern formation method
11/08/2012US20120282439 Radiation curable resin composition and rapid three dimensional imaging process using the same
11/08/2012US20120281408 High efficiency solid-state light source and methods of use and manufacture
11/08/2012US20120281196 Projection objective of a microlithographic projection exposure apparatus
11/08/2012DE102012008216A1 Verdunstungs-wärmemanagement von kollektoren mit streifendem einfall für die euv-lithographie Evaporative heat management of grazing-incidence collectors for EUV lithography
11/08/2012DE102011075465A1 Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage Projection objective of a microlithography projection exposure apparatus
11/08/2012DE102011075393A1 Anordnung zur Aktuierung eines Elementes in einer Projektionsbelichtungsanlage Arrangement for actuation of an element in a projection exposure apparatus
11/08/2012DE102011075316A1 Optisches Modul mit einer Messeinrichtung An optical module with a measuring device
11/08/2012DE102008047562B4 Vorrichtung zur Dämpfung von Schwingungen in Projektionsbelichtungsanlagen für die Halbleiterlithographie A device for damping vibrations in projection exposure apparatuses for semiconductor lithography
11/08/2012CA2835073A1 Suppression of dewetting of polymer films via inexpensive soft lithography
11/07/2012EP2521163A1 Liquid immersion member, method for manufacturing liquid immersion member, exposure apparatus, and device manufacturing method
11/07/2012EP2520977A1 Positive-type photosensitive resin composition
11/07/2012EP2520440A1 Method for producing flexographic printing plate and flexographic printing plate
11/07/2012EP2520414A2 Device for heat stamping a polymer layer
11/07/2012EP2519967A2 Mobile electrostatic carriers for thin wafer processing
11/07/2012EP2519859A1 Integrated sensor system
11/07/2012EP2519858A1 Exposure method
11/07/2012EP2519801A1 Capacitive sensing system
11/07/2012EP2519800A1 Capacitive sensing system with differential pairs
11/07/2012CN202522843U Preparation device for organic photoresist stripper
11/07/2012CN202522842U Environmental-friendly printing processing system
11/07/2012CN1942827B Method of producing a relief image
11/07/2012CN1806205B Highly reflective substrates for the digital processing of photopolymer printing plates
11/07/2012CN102770812A Developing solution for photoresist on substrate including conductive polymer, and method for forming pattern
11/07/2012CN102770811A Lithographic apparatus and device manufacturing method
11/07/2012CN102770810A Lithographic apparatus and device manufacturing method
11/07/2012CN102770809A Colored photosensitive resin composition for preparation of color filter of solid-state image sensing device using 300 nm or less ultrashort wave exposure equipment, color filter using same, and solid-state image sensing device containing same
11/07/2012CN102770808A Sulfonamide-containing photoresist compositions and methods of use
11/07/2012CN102770807A Antireflective hardmask composition and a method of preparing a patterned material using same
11/07/2012CN102770806A Reflective mask for EUV lithography
11/07/2012CN102770495A Resin composition for polyester base material and dry film and printed circuit boards using same
11/07/2012CN102768477A Focusing and leveling detection apparatus
11/07/2012CN102768476A Method for removing optical resist
11/07/2012CN102768475A Alignment restoring system and method for exposure machines
11/07/2012CN102768474A Projection objective lens wave aberration detection method based on two-order aberration model
11/07/2012CN102768473A Optimization design method for extreme ultraviolet lithographic projection objective lens
11/07/2012CN102768472A Method and device for realizing liquid crystal arbitrary orientation control through numerical control micromirror array photoetching
11/07/2012CN102768471A Device for measuring wave aberration of projection lens and method thereof
11/07/2012CN102768470A Reticle stage vertical measuring apparatus
11/07/2012CN102768469A Focusing and bisecting system and adjustment method thereof
11/07/2012CN102768468A Method for barycenter measurement correction of coarse movement stage for photolithographic apparatus
11/07/2012CN102768467A Sensitizer for chemical amplified positive photoresist and application in preparation of chemical amplified positive photoresist
11/07/2012CN102768466A Chemical amplification-type positive photoresist, preparation method and application thereof in two-photon fine processing
11/07/2012CN102768465A Color photosensitive resin composition and hardened product of the same
11/07/2012CN102768464A Photosensitive conductive aluminium paste and preparation method
11/07/2012CN102768439A Manufacturing method for motherboard orientation film, transfer printing panel and orientation liquid
11/07/2012CN102768397A Projection photoetching object lens
11/07/2012CN102768378A Color filter and manufacturing method of color filter
11/07/2012CN102360160B 2R1T three degree of freedom space flexible precision positioning platform
11/07/2012CN102331616B Fully-spherical projection objective
11/07/2012CN102289152B Optical system wave aberration detection device
11/07/2012CN102279516B Preparation method of calibration standards and method for calibrating by calibration standards thereof
11/07/2012CN102236253B Multi-phase high-silicon photoresist imaging method for micro-photoetching process, multi-phase high-silicon photoresist and use
11/07/2012CN102200695B System error self-corrected online detecting device of projection objective lens wave aberration of photo-etching machine
11/07/2012CN102193338B Device and method for carrying out field measurement on wave aberration of projection objective of photoetching machine adopting extended light sources
11/07/2012CN102129971B Method and system for etching graphical sapphire substrate
11/07/2012CN102110775B Method for realizing graphical semiconductor polymer, and device prepared by applying same
11/07/2012CN102054667B Method for applying photoresist lifting-off technology to protect photoetching alignment marks
11/07/2012CN102033431B New polymer blue-ray engraving material
11/07/2012CN102033430B Photosensitive conductive paste and method for producing same
11/07/2012CN101980085B Exposure apparatus, exposure method, and device manufacturing method
11/07/2012CN101960385B Multi-photon exposure system
11/07/2012CN101943867B Adjacent exposure device, forming method of exposure beam and manufacturing method of panel substrate
11/07/2012CN101937910B LED light source, its manufacturing method, and LED-based exposure apparatus and method
11/07/2012CN101930181B Proximity exposure apparatus, method for controlling substrate temperature and method of manufacturing panel substrate
11/07/2012CN101925976B Illuminating apparatus, exposure apparatus, exposure method and device manufacturing method
11/07/2012CN101925863B Method of making lithographic printing plates
11/07/2012CN101925636B Resin, pigment dispersion liquid, coloring curable composition, color filter produced by using composition, and method for producing color filter
11/07/2012CN101910948B Sulfur atom-containing composition for resist underlayer film formation and method for resist pattern formation
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