Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2012
11/15/2012WO2012153841A1 Filter box, filter device, and exposure device
11/15/2012WO2012153840A1 Filter box, filter device, and exposure device
11/15/2012WO2012153777A1 Pattern forming method using photosensitive resin composition, pattern, color filter, and image display device
11/15/2012WO2012153648A1 Positive-acting photosensitive composition and hardened material thereof
11/15/2012WO2012152520A1 Arrangement for actuating an element in a projection exposure apparatus
11/15/2012WO2012152294A1 Illumination system of a microlithographic projection exposure apparatus
11/15/2012WO2012134291A4 Interferometer module
11/15/2012WO2012134290A4 Lithography system with differential interferometer module
11/15/2012WO2012126621A3 Lithography apparatus
11/15/2012WO2012013320A3 Method and apparatus for qualifying optics of a projection exposure tool for microlithography
11/15/2012US20120288803 Manufacturing device of optical deflector and manufacturing method of the same
11/15/2012US20120288802 Method of forming gate conductor structures
11/15/2012US20120288801 Flexographic printing plate assembly
11/15/2012US20120288800 Electron beam drawing apparatus and method of manufacturing device
11/15/2012US20120288799 Charged-particle beam lithographic apparatus and method of manufacturing device
11/15/2012US20120288798 Positive photosensitive resin composition, method for producing patterned cured film and electronic component
11/15/2012US20120288797 Photoresist compositions and methods of use in high index immersion lithography
11/15/2012US20120288796 Resist composition and patterning process
11/15/2012US20120288795 Composition for formation of photosensitive resist underlayer film and method for formation of resist pattern
11/15/2012US20120288794 Polymers, photoresist compositions and methods of forming photolithographic patterns
11/15/2012US20120288786 Rc extraction for single patterning spacer technique
11/15/2012US20120288785 Holographic sensor
11/15/2012US20120288691 Pattern forming method, pattern, chemical amplification resist composition and resist film
11/15/2012US20120288682 Photosensitive resin composition, printing plate precursor and flexographic printing plate
11/15/2012US20120288626 Templated Monolayer Polymerization and Replication
11/15/2012US20120288479 Cross-Linked Polymer Based Hydrogel Material Compositions, Methods and Applications
11/15/2012US20120287525 Exposure method for color filter substrate
11/15/2012US20120287524 Novel Compound, Pigment Dispersion Composition and Photosensitive Resin Composition Including the Same, and Color Filter Using the Same
11/15/2012US20120287523 Color filter and manufacturing method thereof
11/15/2012US20120287393 Positive photosensitive resin composition and method for forming patterns by using the same
11/15/2012US20120286145 Pigment dispersion composition, colored curable composition, color filter for solid-state image sensor and method of producing the same, and solid-state image sensor
11/15/2012DE112010004081T5 Rezeptur für die Rotationsbeschichtung und Verfahren zum Ablösen eines lonenimplantiertenFotolacks Formulation for the spin coating and method for peeling a lonenimplantiertenFotolacks
11/15/2012DE102011086565A1 Collector used in projection exposure system, for aligning extreme UV (EUV) radiation of EUV laser plasma source, has sub unit whose passage opening feeds material from plasma source feed device and adapts to scattering of trajectories
11/15/2012DE102011075579A1 Spiegel und Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Spiegel Mirror and projection exposure system for microlithography with such a mirror
11/14/2012EP2523210A1 Liquid-immersion member, exposing device, exposing method, and device manufacturing method
11/14/2012EP2523044A1 Device for producing stamp printing plates
11/14/2012EP2522129A1 Image projection apparatus and method
11/14/2012EP2521941A1 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film
11/14/2012CN202534099U Production alarm apparatus and exposure machine
11/14/2012CN202533712U Baking oven
11/14/2012CN202533711U Developer spraying device capable of realizing uniform and stable development
11/14/2012CN202533710U UV ink light curing machine
11/14/2012CN202533709U Nano graphical system and magnetic field applying device thereof
11/14/2012CN202533636U Connecting mechanism used for focusing and leveling
11/14/2012CN1902546B Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
11/14/2012CN1670624B Etching composition
11/14/2012CN102782585A Integrated sensor system
11/14/2012CN102782584A Exposure method
11/14/2012CN102782583A Method for preparing a planographic printing plate and developer solution for master planographic printing plate
11/14/2012CN102782582A Radiation source, lithographic apparatus and device manufacturing method
11/14/2012CN102782581A Lithographic apparatus and device manufacturing method
11/14/2012CN102782580A Pattern forming method
11/14/2012CN102782579A Negative photosensitive resin composition, interlayer insulating film and method of formation of same
11/14/2012CN102782578A Photosensitive resin composition, photosensitive dry film, and pattern forming method
11/14/2012CN102782577A Method for manufacturing stamper for injection molding
11/14/2012CN102782531A Reflective optical element for EUV lithography
11/14/2012CN102782444A Capacitive sensing system with differential pairs
11/14/2012CN102782001A A self-imageable film forming polymer, compositions thereof and devices and structures made therefrom
11/14/2012CN102781911A Latent acids and their use
11/14/2012CN102781670A UV irradiation device and inkjet printer
11/14/2012CN102779951A Method for forming photoelectric element by protection layer
11/14/2012CN102778822A Focusing and leveling device
11/14/2012CN102778821A Method for stripping photoresist on Array plate
11/14/2012CN102778820A Maskless graphic exposure system based on spatial light modulator
11/14/2012CN102778819A Exposure frame data generation method used for dot-matrix maskless photoetching
11/14/2012CN102778818A Photoetching method for preparing tellurium-cadmium-mercury deep-hole table facet chip film
11/14/2012CN102778817A Defoaming method and device of photoresist
11/14/2012CN102778816A Positive photosensitive resin composition and method for forming patterns by using the same
11/14/2012CN102778815A Photosensitive resin composition, photosensitive element, method of forming anti-corrosion pattern and method of manufacturing pcb
11/14/2012CN102778814A Photo-sensitive composition containing ketoximes ester type photoinitiator and application thereof
11/14/2012CN102778813A Photosensitive resin composition
11/14/2012CN102778812A Coloring composition, colour filter and dispaly element
11/14/2012CN102778811A Preparation method of nickel oxide based memory film fine pattern
11/14/2012CN102778714A Color filter and manufacturing method thereof
11/14/2012CN102778713A Femtosecond infrared laser point-to-point writing fiber grating system for optimized focus of beam spot
11/14/2012CN102778711A Light diffusion member, method for producing same, and display device
11/14/2012CN102778709A Light diffusion member, method for producing same and display device
11/14/2012CN102221789B Method for evaluating and filtering noise of space images of photoetching machine
11/14/2012CN102221787B Integrated mounting and calibrating device of high-precision exposure lens unit
11/14/2012CN102169293B Method for adjusting parallelism of measurement light paths of workpiece table and mask table
11/14/2012CN102141733B Vibration absorption device and photolithographic device using same
11/14/2012CN102129176B Method for eliminating oblique error caused by surface shape of elongated lens
11/14/2012CN102122111B Pixel-based optimization method for optical proximity correction
11/14/2012CN102109770B MDOF (multiple degree of freedom) coarse motion workpiece platform
11/14/2012CN102043352B Focusing and leveling detection device
11/14/2012CN102043351B Leveling and focusing mechanism and mask platform with same
11/14/2012CN102023733B Touch screen, color film substrate and manufacturing method thereof
11/14/2012CN102012638B Photoetching machine worktable with driving device capable of balancing torque
11/14/2012CN101976021B Installation and adjustment device and method for alignment system reference board and detection optical fiber
11/14/2012CN101957562B Double-exposure method
11/14/2012CN101918897B Exposure method, exposure apparatus, and method for producing device
11/14/2012CN101849210B Lithographic projection apparatus and method of compensating perturbation factors
11/14/2012CN101836162B Film type transfer material
11/14/2012CN101762988B Optimization method and a lithographic cell
11/14/2012CN101738651B Optical sheet and method for producing the same
11/14/2012CN101546132B Projection exposure device
11/14/2012CN101546122B Color resist composition and a color filter using the same
11/14/2012CN101504512B Exposure method, expose apparatus, carrier apparatus and equipment manufacturing method
11/14/2012CN101487979B Stage system, lithographic apparatus including such stage system, and correction method
11/14/2012CN101482701B Lithographic apparatus and device manufacturing method
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