Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2012
11/22/2012US20120293779 Reflective optical element and euv lithography appliance
11/22/2012US20120293763 Exposure apparatus, liquid crystal display device, and method for manufacturing liquid crystal display device
11/22/2012US20120292487 Positive resist composition and method for producing microlens
11/22/2012US20120292412 Photosensitive resin composition, method for producing structure, and liquid discharge head
11/22/2012US20120292286 Method for manufacturing micro-structure and optically patternable sacrificial film-forming composition
11/22/2012US20120291952 Method and system for monitoring an etch process
11/22/2012US20120291702 Electrospray emitter and method of manufacture
11/22/2012DE112010003836T5 Behandlungslösung zur Verhinderung eines Musterzusammenbruchs in einem feinen Metallstrukturkörper und Verfahren zur Herstellung eines feinen Metallstrukturkörpers, bei dem diese eingesetzt wird Treatment solution for preventing a pattern collapse in a fine metal structure body and method for producing a fine metal structure body in which it is used
11/22/2012DE102011076145A1 Method for assigning pupil facet to field facet for defining illumination channel for partial bracket of illumination light, involves identifying illumination parameter, with which illumination of object field is evaluated
11/22/2012DE102011076011A1 Reflektives optisches Element und optisches System für die EUV-Lithographie The reflective optical element and optical system for EUV lithography
11/22/2012CA2835246A1 High resolution high contrast edge projection
11/21/2012EP2524914A1 Novel sulfonic acid derivative compound and novel naphthalic acid derivative compound
11/21/2012EP2524907A1 Bicyclohexane derivative and production method for same
11/21/2012EP2524811A1 Image recording apparatus
11/21/2012EP2524266A2 Nanopatterning method and apparatus
11/21/2012EP2524007A1 Pigment dispersion composition, colored curable composition, color filter for solid-state image sensor and method of producing the same, and solid-state image sensor
11/21/2012CN202551504U Defoaming device
11/21/2012CN202548532U Vertical developing machine
11/21/2012CN202548531U Metal photomask
11/21/2012CN202548530U Mask plate and mask plate system
11/21/2012CN202538645U Developing film residue ultrafiltration system
11/21/2012CN1685285B 193nm resist
11/21/2012CN102792412A Photocurable composition
11/21/2012CN102792377A Photopolymer formulations having the adjustable mechanical modulus GUV
11/21/2012CN102792229A Method of forming pattern
11/21/2012CN102792228A Spectral purity filter, lithographic apparatus, method for manufacturing a spectral purity filter and method of manufacturing a device using lithographic apparatus
11/21/2012CN102792227A Positive photosensitive resin composition, method for forming cured film, cured film, liquid crystal display device, and organic EL display device
11/21/2012CN102792226A Photosensitive resin composition
11/21/2012CN102792225A Photocurable resin composition
11/21/2012CN102792224A Photosensitive resin composition having excellent heat resistance and mechanical properties, and protective film for a printed circuit board
11/21/2012CN102792223A Photosensitive resin composition, printing plate precursor and flexographic printing plate
11/21/2012CN102792222A Method for manufacturing a multilayer structure with a lateral pattern for application in the XUV wavelength range, and BF and LMAG structures manufactured according to this method
11/21/2012CN102791758A Methods for producing photosensitive microparticles, non-aqueous dispersions thereof and articles prepared therewith
11/21/2012CN102791489A Method for printing product features on a substrate sheet
11/21/2012CN102789144A Adjustment mechanism of lithography aligning system reference plate, and adjustment method thereof
11/21/2012CN102789143A Exposure machine target image alignment device, and exposure machine using exposure machine target image alignment device
11/21/2012CN102789142A Systems and methods for facilitating lift-off processes
11/21/2012CN102789141A Color film developing machine
11/21/2012CN102789140A Developing tank automatic defoaming device
11/21/2012CN102789139A Voltage stabilizing and odor removing apparatus for ammonia water developer
11/21/2012CN102789138A Moire fringe inclination angle measuring method
11/21/2012CN102789137A Reflection-type lithography aligning device based on moire fringe
11/21/2012CN102789136A Air-flotation support system
11/21/2012CN102789135A Focusing and leveling measure device
11/21/2012CN102789134A Method for optimizing performances of exposure system
11/21/2012CN102789133A After develop inspection method
11/21/2012CN102789132A Extreme ultraviolet light photo mask storage delivery box having fixation structure
11/21/2012CN102789131A Photosensitive conductive film, method for forming conductive film, method for forming conductive pattern, and conductive film substrate
11/21/2012CN102789130A Negative film protecting film and production method thereof
11/21/2012CN102789129A Light-cured colorized composition for color filter
11/21/2012CN102789128A Method for preparing patterned ZnO nanorod array
11/21/2012CN102789127A Imprint apparatus, imprint method, and device manufacturing method
11/21/2012CN102789089A Liquid crystal display substrate, manufacturing method thereof, liquid crystal panel and display device
11/21/2012CN102789044A Aspherical focal length-variable photoetching objective lens system
11/21/2012CN102789020A Color filter sheet, liquid crystal display element and manufacture method for color filter sheet
11/21/2012CN102789011A Micro lens array and manufacturing method thereof
11/21/2012CN102789010A Double-sided microlens array and manufacturing method thereof
11/21/2012CN102786662A Macromolecular photosensitizer with diazonium group as well as preparation method thereof and photoresist composition
11/21/2012CN102786631A Photosensitive alkali-soluble resin, preparation method thereof and color photoresist
11/21/2012CN102786419A Compound, resin, photoresist composition, and method for producing photoresist pattern
11/21/2012CN102289160B Developing solution for photoinduced etching agent as well as preparation method and application thereof
11/21/2012CN102207693B Heating device and heating method
11/21/2012CN102207685B Controlling device for injection and recovery of magnetofluid for immersion lithography machine
11/21/2012CN102109764B Positive-type thermosensitive computer to plate (CPT) plate
11/21/2012CN102096333B Variable rectangular window adjusting mechanism
11/21/2012CN102096328B Exposure procedure of liquid crystal panels and mask
11/21/2012CN102060981B Aromatic ring-containing polymer and hard mask composition containing the polymer
11/21/2012CN102012633B Method for making self-supporting structure of nano fluid system based on SU-8 photoresist
11/21/2012CN102007454B Method for analyzing masks for photolithography
11/21/2012CN102001618B Masking method for deep-etching multi-layer silicon structure by dry method
11/21/2012CN101971096B Radiation-sensitive resin composition
11/21/2012CN101971092B 3d mold for manufacture of sub-micron 3d structures using 2-d photon lithography and nanoimprinting and process thereof
11/21/2012CN101963757B Organic silicon modified alkali soluble photosensitive resin, preparation method thereof and printing ink composition
11/21/2012CN101957560B Patterning method and stacking structure for patterning
11/21/2012CN101868852B Photosensitive adhesive, semiconductor device and method for manufacturing semiconductor device
11/21/2012CN101846882B Photocuring thermocuring resin composition, dry membrane, cured product and printed circuit board
11/21/2012CN101819349B Color film base plate and manufacturing method thereof as well as liquid crystal display panel
11/21/2012CN101770108B Color film substrate, manufacture method thereof and liquid-crystal display panel
11/21/2012CN101750910B Developer solution component
11/21/2012CN101606101B Fine pattern transfer material
11/21/2012CN101571677B Lithographic projection apparatus and a method of operating the same
11/21/2012CN101546124B Resin composition for laser engraving, image forming material, relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate
11/21/2012CN101477096B Polymer plane nano-channel production method
11/21/2012CN101470343B Mask blank manufacturing method and coater
11/21/2012CN101266372B Pixel structure and method of manufacture
11/21/2012CN101236356B Photoresist composition, thin film patterning method using the same, and method of fabricating liquid crystal display using the same
11/20/2012US8315499 Functionally-graded three-dimensional ordered open-cellular microstructure and method of making same
11/20/2012US8314921 Exposure apparatus
11/20/2012US8313997 Method of manufacturing a semiconductor memory using two exposure masks to form a same wiring layer
11/20/2012US8313892 Multi-layer body, method for forming resist pattern, method for manufacturing device having pattern by fine processing and electronic device
11/20/2012US8313891 Printed circuits and method for making same
11/20/2012US8313890 Antireflective coating composition, antireflective coating, and patterning process
11/20/2012US8313889 Double patterning method using metallic compound mask layer
11/20/2012US8313888 Photosensitive flexographic printing original plate
11/20/2012US8313887 Ablatable elements for making flexographic printing plates
11/20/2012US8313886 Resist composition and patterning process
11/20/2012US8313885 Lithographic printing plate precursor comprising bi-functional compounds
11/20/2012US8313635 Bare aluminum baffles for resist stripping chambers
11/15/2012WO2012154316A1 Photo-patternable and developable silesquioxane resins for use in device fabrication
11/15/2012WO2012153869A1 Positive resist composition, and resist film, resist-coated mask blank, resist pattern forming method and photomask each using the composition