Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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02/10/2015 | US8952373 Hardmask composition and method of forming patterns and semiconductor integrated circuit device including the patterns |
02/10/2015 | US8952344 Techniques for processing photoresist features using ions |
02/10/2015 | US8952204 Sulfonium salt, method for producing the same, and photoacid generator |
02/10/2015 | US8951948 Metal and dielectric compatible sacrificial anti-reflective coating cleaning and removal composition |
02/10/2015 | US8951917 Composition for forming resist underlayer film and patterning process using the same |
02/10/2015 | US8951890 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition |
02/10/2015 | US8951820 Method of fabricating nano-imprint mold for a light emitting diode |
02/10/2015 | US8951718 Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method |
02/10/2015 | US8951717 Methods for manufacturing resin structure and micro-structure |
02/10/2015 | US8951716 Surface modification, functionalization and integration of microfluidics and biosensor to form a biochip |
02/10/2015 | US8951715 Method of forming patterned film on a bottom and a top-surface of a deep trench |
02/10/2015 | US8951713 Alkali-soluble resin and negative-type photosensitive resin composition comprising the same |
02/10/2015 | US8951712 Resist protective film-forming composition and patterning process |
02/10/2015 | US8951711 Patterning process and composition for forming silicon-containing film usable therefor |
02/10/2015 | US8951710 Chemically amplified negative resist composition and patterning process |
02/10/2015 | US8951709 Resist composition and method for producing resist pattern |
02/10/2015 | US8951700 Methods of manufacturing optical filters and methods of manufacturing organic light emitting display devices having optical filters |
02/10/2015 | US8951609 CNT devices, low-temperature fabrication of CNT and CNT photo-resists |
02/10/2015 | US8951433 Compositions for use in semiconductor devices |
02/10/2015 | US8951386 Treatment of synthetic quartz glass substrate |
02/10/2015 | US8951031 Imprinting apparatus and article manufacturing method |
02/05/2015 | WO2015016424A1 Device for manufacturing amphiphilic pattern and method for manufacturing same |
02/05/2015 | WO2015016362A1 Photosensitive-resin composition |
02/05/2015 | WO2015016360A1 Photosensitive-resin composition |
02/05/2015 | WO2015016294A1 Colored curable resin composition |
02/05/2015 | WO2015016243A1 Coloring composition, cured film, color filter, method for manufacturing color filter, solid-state image pickup device, and image display device |
02/05/2015 | WO2015016242A1 Colored composition, cured film, color filter, method for producing color filter, solid-state image sensor, and image display device |
02/05/2015 | WO2015016241A1 Colored composition, cured film, color filter, production method for color filter, solid-state imaging element, and image display device |
02/05/2015 | WO2015016194A1 Pattern formation method, active-light-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device |
02/05/2015 | WO2015016191A1 Pattern formation method, pattern, and etching method, electronic device manufacturing method, and electronic device using same |
02/05/2015 | WO2015016175A1 Colored composition, cured film, color filter, method for producing color filter, solid-state image sensor, and image display device |
02/05/2015 | WO2015016156A1 Dispersant-containing carbon material film containing light-responsive dispersant, and method for producing carbon material film using said dispersant-containing carbon material film |
02/05/2015 | WO2015016089A1 Pattern formation method and surface treatment agent used therein, method for producing electronic device, and electronic device |
02/05/2015 | WO2015016041A1 Color filter, production method therefor, colored curable composition, solid state imaging element, and colored curable composition and kit |
02/05/2015 | WO2015016027A1 Radiation-sensitive resin composition, resist pattern formation method, polymer, and compound |
02/05/2015 | WO2015015984A1 Pattern forming method, actinic ray sensitive or radiation sensitive resin composition, resist film, method for manufacturing electronic device using same, and electronic device |
02/05/2015 | WO2015015974A1 Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device |
02/05/2015 | WO2015015946A1 Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device |
02/05/2015 | WO2015015749A1 Light source and exposure apparatus |
02/05/2015 | WO2015014947A1 Optical device and lithography system |
02/05/2015 | WO2015014753A1 Projection optical unit for imaging an object field into an image field, and projection exposure apparatus comprising such a projection optical unit |
02/05/2015 | WO2015014531A1 Component for a radiation source, associated radiation source and lithographic apparatus |
02/05/2015 | WO2015014078A1 Method for manufacturing color filter and color filter |
02/05/2015 | WO2015014071A1 Mask plate |
02/05/2015 | US20150037736 Acidic treatment-subjected monoalkylnaphthalene formaldehyde resin |
02/05/2015 | US20150037735 Molecular glass photoresists containing bisphenol a framework and method for preparing the same and use thereof |
02/05/2015 | US20150037734 Resist composition, acid generator, polymeric compound and method of forming resist pattern |
02/05/2015 | US20150037733 Acrylic acid ester derivative and method for producing same, intermediate and method for producing same, high-molecular-weight compound, and photoresist composition |
02/05/2015 | US20150037595 Coatings |
02/05/2015 | US20150037588 Photosensitive resin composition, cured product thereof, and printed wiring board |
02/05/2015 | US20150037540 Template, a method of processing a template, a method of producing a pattern, and resist |
02/05/2015 | US20150036118 Pattern forming apparatus and pattern forming method, movable body drive system and movable body drive method, exposure apparatus and exposure method, and device manufacturing method |
02/05/2015 | US20150036117 Maskless nanoimprint lithography |
02/05/2015 | US20150036116 Aperture for photolithography |
02/05/2015 | US20150036115 Illumination optical unit for euv projection lithography |
02/05/2015 | US20150036113 Apparatus and method for providing fluid for immersion lithography |
02/05/2015 | US20150036112 Exposure apparatus, exposure method, and device manufacturing method |
02/05/2015 | US20150036111 Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method |
02/05/2015 | US20150036110 Developing apparatus, developing method and storage medium |
02/05/2015 | US20150036109 Developing method, developing apparatus and storage medium |
02/05/2015 | US20150034886 Photosensitive Resin Composition and Color Filter Using the Same |
02/05/2015 | US20150034845 Euvl light source system and method |
02/05/2015 | US20150034844 System and method for reducing contamination in extreme ultraviolet lithography light source |
02/05/2015 | US20150034788 Rotatable Frame For a Lithographic Apparatus |
02/05/2015 | US20150034595 Method of producing structure containing phase-separation structure, method of forming pattern, and method of forming fine pattern |
02/05/2015 | US20150034594 Methods of providing patterned templates for self-assemblable block copolymers for use in device lithography |
02/05/2015 | DE102014224418A1 Halteeinrichtung und Lithographieanlage Holding means and lithography tool |
02/05/2015 | DE102013215292A1 Verfahren zum Beladen eines Rohlings aus Quarzglas mit Wasserstoff, Linsenelement und Projektionsobjektiv A method of loading a blank of silica glass with hydrogen, the lens element and the projection lens |
02/05/2015 | DE102013215169A1 Optische vorrichtung und lithographieanlage Optical lithography apparatus and system |
02/05/2015 | DE102013215040A1 Kompakte Vorrichtung zur Herstellung eines dreidimensionalen Objekts durch Verfestigen eines fotohärtenden Materials A compact apparatus for producing a three-dimensional object by solidification of a photo-curing material |
02/05/2015 | DE102012205790B4 Vorrichtung zur Homogenisierung von Laserstrahlung sowie Verfahren zu ihrer Herstellung An apparatus for homogenizing the laser radiation, as well as processes for their preparation |
02/04/2015 | EP2833204A1 Method for treating a layer of photosensitive resin and method for manufacturing a metal component |
02/04/2015 | EP2833203A1 Photosensitive resin composition |
02/04/2015 | EP2833202A1 Photosensitive resin composition for ctp flexographic printing original plates and printing original plate obtained from same |
02/04/2015 | EP2832807A1 Underlayer film forming composition for self-assembled films |
02/04/2015 | EP2831672A2 Printing form precursor having elastomeric cap layer and a method of preparing a printing form from the precursor |
02/04/2015 | CN204145893U 一种用于印制板的曝光定位装置 A positioning device for PCB exposure |
02/04/2015 | CN204143154U 曝光机光源照射强度调整机构 Exposure light source intensity adjustment mechanism |
02/04/2015 | CN204143153U 紫外led灯曝光改装机 UV light exposure led modified machine |
02/04/2015 | CN204143071U 基于自清洁表面结构制造的六光束干涉系统 Based on self-cleaning surface structure made six beam interferometer system |
02/04/2015 | CN104335122A 包括磁致伸缩材料的光学元件 Optical element comprising magnetostrictive material |
02/04/2015 | CN104335121A 光刻仪器 Lithography equipment |
02/04/2015 | CN104335120A 光敏树脂组合物、使用其形成的图案以及包含其的显示面板 The photosensitive resin composition, the use of which contains its patterning and a display panel |
02/04/2015 | CN104335119A 图案形成方法、光化射线敏感或放射线敏感树脂组合物、抗蚀剂膜、电子器件的制造方法以及电子器件 Pattern forming method, an actinic ray-sensitive or radiation-sensitive resin composition, a resist film, a method of manufacturing an electronic device, and electronic device |
02/04/2015 | CN104335096A 分面反射镜 Faceted mirror |
02/04/2015 | CN104335079A 可显影底部抗反射涂层组合物以及使用其的图案形成方法 May be at the bottom of the developing antireflective coating composition and the use thereof in the pattern forming method |
02/04/2015 | CN104335021A 波前测量方法及装置、以及曝光方法及装置 Wavefront measurement method and device, and exposure method and apparatus |
02/04/2015 | CN104334684A 潜伏性添加剂以及含有该添加剂的组合物 Latent composition containing the additive and the additive |
02/04/2015 | CN104334594A 着色固化性组合物及滤色器 Colored curable composition and a color filter |
02/04/2015 | CN104334588A 用于定向自组装的中性层聚合物组合物及其方法 Directed self-assembly of the neutral layer polymer compositions and methods for |
02/04/2015 | CN104334351A 平版印刷版前体 Lithographic printing plate precursor |
02/04/2015 | CN104332394A 一种柔性衬底基板的制作方法 A method of making a flexible substrate board |
02/04/2015 | CN104332393A 一种制备tsv立体集成rdl电镀掩膜的厚胶工艺 A three-dimensional integrated process tsv thick rubber rdl plating mask preparation |
02/04/2015 | CN104330959A 光刻胶剥离液制备方法 Photoresist stripping liquid preparation |
02/04/2015 | CN104330958A 正胶显影液制备方法 Positive Photoresist developer is prepared |
02/04/2015 | CN104330957A 用于图案形成方法的光化射线敏感或辐射敏感树脂组合物 The method for patterning actinic ray-sensitive or radiation-sensitive resin composition |
02/04/2015 | CN104330956A 光致抗蚀组合物、涂覆的基材和形成电子器件的方法 Photoresist composition, the coated substrate and the method of forming an electronic device |
02/04/2015 | CN104330955A 用于eb 或euv 平版印刷的化学放大正性抗蚀剂组合物和图案化方法 Chemical or euv for lithographic printing eb amplified positive resist compositions and patterning method |
02/04/2015 | CN104330926A 显示基板及其制作方法、显示面板 Display substrate and its production method, the display panel |
02/04/2015 | CN104330840A 一种多台阶微透镜制作方法以及光学元件台阶制作方法 A multi-step method of manufacturing a microlens and a method of manufacturing an optical element step |