Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2012
11/28/2012CN102799075A Computational Process Control
11/28/2012CN102799074A Lithographic apparatus and component
11/28/2012CN102799073A Exposure device, exposure and inspection method, and manufacturing method for substrate of display panel
11/28/2012CN102799072A Multi-stage system, a control method therefor, and a lithographic apparatus
11/28/2012CN102799071A Lithographic apparatus comprising a substrate table
11/28/2012CN102799070A Double coating negative photoresist dry film
11/28/2012CN102799069A Photo-polymerization type lithographic printing plate body
11/28/2012CN102799068A 光刻胶组合物 The photoresist composition of
11/28/2012CN102799067A Colouring solidification resin composition
11/28/2012CN102799066A Method for preparing concave lens array structure on titanium dioxide inorganic-organic photosensitive composite film
11/28/2012CN102799065A Pattern roller for release paper and preparation method thereof
11/28/2012CN102799064A Device for separating mask plate from substrate by electrostatic field force for metal pattern direct impression transfer
11/28/2012CN102799063A Method for preparing photoresist template and patterned ZnO nanorod array
11/28/2012CN102799062A Mask, wafer and monitor method
11/28/2012CN102799061A Photomask set for double exposure manufacture process and formation method thereof
11/28/2012CN102799031A Liquid crystal display panel, manufacturing method of the same, and liquid crystal display apparatus
11/28/2012CN102799019A Blue-phase liquid crystal display device and production method thereof
11/28/2012CN102799017A Colorful film substrate, liquid crystal display panel and manufacture method of liquid crystal display panel
11/28/2012CN102798930A Holographic-interferometry-based photonic crystal manufacturing device
11/28/2012CN102798902A Novel multilayer film for improving extreme ultraviolet (EUV) spectral purity
11/28/2012CN102796223A Polymer composition and photoresist comprising the same
11/28/2012CN102796221A Surface active additive and photoresist composition comprising same
11/28/2012CN102236258B Photosensitive resin composition and colour filter formed by same and liquid crystal display assembly containing colour filter
11/28/2012CN102221723B Grating manufacture method
11/28/2012CN102200692B Method for controlling exposure energy
11/28/2012CN102176108B Automatically partitioned vacuumizing mechanism of platemaking roller
11/28/2012CN102156384B Electro-deposition photoresist and preparation method and film forming method thereof
11/28/2012CN102096134B Quantum dot implant reflection type active grating and manufacturing method thereof
11/28/2012CN102073224B Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask
11/28/2012CN101989050B Positioning system, lithographic apparatus and method
11/28/2012CN101969042B Ink jet printing and laser interference exposure based circuit interconnecting method
11/28/2012CN101960388B Semiconductor surface treating agent composition and method for treating semiconductor surface using the semiconductor surface treating agent composition
11/28/2012CN101859065B Method to mitigate resist pattern critical dimension variation in double-exposure process
11/28/2012CN101849209B Composition for formation of top antireflective film, and pattern formation method using the composition
11/28/2012CN101750906B Method for a lithographic apparatus
11/28/2012CN101681126B Method and apparatus for detecting non-uniform fracturing of a photomask shape
11/28/2012CN101625524B Resist composition and patterning process
11/28/2012CN101617273B Composition for antireflective coating
11/28/2012CN101606442B Plasma radiation source with axial magnetic field
11/28/2012CN101546127B Radiation sensitive resin composition, interlayer insulation film and method for manufacturing micro-lens
11/28/2012CN101506939B Low-k damage avoidance during bevel etch processing
11/28/2012CN101473269B Photopolymerisable layered composite for producing flexo printing elements
11/28/2012CN101435995B Light-sensitive compound and photoresist composition comprising the same
11/28/2012CN101414129B 电子束曝光系统 Electron beam exposure system
11/28/2012CN101410754B A method of applying a pattern of metal, metal oxide and/or semiconductor material on a substrate
11/28/2012CN101403860B Apparatus and method of sensing leakage of chemical liquid
11/28/2012CN101359174B Radiation-sensitive resin composition, layer insulation film and microlens and manufacture method thereof
11/28/2012CN101281372B Coater and method of coating a process solution on a substrate using the same
11/28/2012CN101073035B Positive type dry film photoresist
11/28/2012CN101055425B Lithographic apparatus and device manufacturing method
11/27/2012US8320043 Illumination apparatus for microlithographyprojection system including polarization-modulating optical element
11/27/2012US8319941 Exposure apparatus, and device manufacturing method
11/27/2012US8318412 Method of manufacturing semiconductor device
11/27/2012US8318411 Method for fabricating an interposer
11/27/2012US8318410 Sulfur atom-containing resist underlayer film forming composition and method for forming resist pattern
11/27/2012US8318409 Dynamic masking method for micro-truss foam fabrication
11/27/2012US8318408 Method of forming patterns of semiconductor device
11/27/2012US8318407 Solution processed thin films and laminates, devices comprising such thin films and laminates, and method for their use and manufacture
11/27/2012US8318405 Negative-working imageable elements with overcoat
11/27/2012US8318404 Salt and photoresist composition containing the same
11/27/2012US8318403 Salt and photoresist composition containing the same
11/27/2012US8318402 Photosensitive compound and photosensitive composition including the same
11/27/2012US8318401 Positive typed photosensitive composition
11/27/2012US8318388 Mask blank providing system, mask blank providing method, mask blank transparent substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method
11/27/2012US8318386 Fabrication of nanostructured devices
11/27/2012US8318288 Optical element, lithographic apparatus including such optical element and device manufacturing method, and device manufactured thereby
11/27/2012US8318258 Silsesquioxane resins
11/27/2012US8318053 Photosensitive resin composition and color filter using the same
11/27/2012US8317984 Graphene oxide deoxygenation
11/22/2012WO2012157784A1 Dispersion composition, curable composition, transparent film, microlens and solid-state image sensing device using the same, method for manufacturing transparent film, method for manufacturing microlens and method for manufacturing solid-state image sensing device
11/22/2012WO2012157697A1 Diffraction grating manufacturing method, spectrophotometer, and semiconductor device manufacturing method
11/22/2012WO2012157696A1 Photosensitive siloxane resin composition
11/22/2012WO2012157607A1 Resist underlayer film-forming composition including polymer containing bisphenol s
11/22/2012WO2012157543A1 Condensation product, photosensitive composition, method for producing photosensitive composition, and method for forming negative resist pattern using photosensitive composition
11/22/2012WO2012157433A1 Method of forming double pattern
11/22/2012WO2012157409A1 Exposure device and light-shielding plate
11/22/2012WO2012157352A1 Photoresist composition
11/22/2012WO2012157231A1 Substrate-replacement device
11/22/2012WO2012157230A1 Substrate-replacement method
11/22/2012WO2012156732A1 Maskless micro- and nano-templating
11/22/2012WO2012156394A1 Reflective optical element and optical system for euv lithography
11/22/2012WO2012155237A1 High resolution high contrast edge projection
11/22/2012US20120296053 Photosensitive composition, cured film and electronic part
11/22/2012US20120295828 Composition for Removing Photoresist and/or Etching Residue From a Substrate and Use Thereof
11/22/2012US20120295205 Radiation Source, Lithographic Apparatus and Device Manufacturing Method
11/22/2012US20120295204 Processing method of lithographic printing plate preursor
11/22/2012US20120295203 Drawing apparatus and method of manufacturing article
11/22/2012US20120295202 Drawing apparatus and method of manufacturing article
11/22/2012US20120295201 Compound, resin, photoresist composition, and method for producing photoresist pattern
11/22/2012US20120295200 Photocurable and thermosetting resin composition and printed circuit boards made by using the same
11/22/2012US20120295199 Long-chain alkylene-containing curable epoxy resin composition
11/22/2012US20120295198 Radiation-sensitive resin composition
11/22/2012US20120295197 Radiation-sensitive resin composition, polymer and method for forming a resist pattern
11/22/2012US20120295186 Double patterning mask set and method of forming thereof
11/22/2012US20120295185 Holographic Reticle and Patterning Method
11/22/2012US20120295029 Methods utilizing scanning probe microscope tips and products therefor or produced thereby
11/22/2012US20120293884 Color filter substrate, display device, and exposure method
11/22/2012US20120293883 Color filter substrate and method of manufacturing the same
11/22/2012US20120293857 Electrophoretic Display Apparatus and Method for Manufacturing the Same
11/22/2012US20120293786 Illumination system of a microlithographic projection exposure apparatus
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