Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2012
12/05/2012CN101569243B Reducing fast ions in a plasma radiation source
12/05/2012CN101484320B Methods and apparatus for applying patterns of non-contiguous features
12/05/2012CN101346669B Writing apparatuses and methods
12/05/2012CN101320104B Optical element, method for producing same, replica substrate configured to form optical element, and method for producing replica substrate
12/05/2012CN101303525B Double-pattern exposure process
12/05/2012CN101228481B Method to remove resist, etch residue, and copper oxide from substrates having copper and low-K dielectric
12/04/2012US8325326 Stage unit, exposure apparatus, and exposure method
12/04/2012US8325323 Method and system for correcting image changes
12/04/2012US8323880 Positive resist processing liquid composition and liquid developer
12/04/2012US8323879 Method of forming resist pattern
12/04/2012US8323877 Patterning method and method for fabricating dual damascene opening
12/04/2012US8323876 Methods of forming integrated circuit devices using anti-penetration films to block acid transfer into anti-reflective coatings
12/04/2012US8323874 Method of making lithographic printing plates
12/04/2012US8323873 Photosensitive adhesive composition, and obtained using the same, adhesive film, adhesive sheet, semiconductor wafer with adhesive layer, semiconductor device and electronic part
12/04/2012US8323872 Resist protective coating material and patterning process
12/04/2012US8323871 Antireflective hardmask composition and a method of preparing a patterned material using same
12/04/2012US8323870 Method and photoresist with zipper mechanism
12/04/2012US8323869 Positive resist composition and method of forming resist pattern
12/04/2012US8323868 Bilayer systems including a polydimethylglutarimide-based bottom layer and compositions thereof
12/04/2012US8323867 Materials for lithographic plates coatings, lithographic plates and coatings containing same, methods of preparation and use
12/04/2012US8323866 Inorganic resist sensitizer
12/04/2012US8323536 Near-infrared absorbing dye, near-infrared absorptive film-forming composition, and near-infrared absorptive film
11/2012
11/29/2012WO2012162271A2 Method and system for manufacture of a electronic devices based on localized deposition of precursor gases
11/29/2012WO2012161126A1 Composition for forming organic hard mask layer for use in lithography containing polymer having acrylamide structure
11/29/2012WO2012161025A1 Positive photosensitive siloxane composition
11/29/2012WO2012160975A1 Photosensitive resin composition
11/29/2012WO2012160721A1 Photoresist stripping solution, stripping solution recycling system and operating method, and method for recycling stripping solution
11/29/2012WO2012160061A1 Illumination optical unit for projection lithography
11/29/2012WO2012159968A2 Illumination optical unit
11/29/2012WO2012159880A1 Illumination optical unit
11/29/2012WO2012134292A4 Alignment of an interferometer module for an exposure tool
11/29/2012WO2012133862A3 Method for removing foreign particles adhered to molds
11/29/2012WO2012089072A8 Infrared sensitive and chemical treatment free photosensitive composition and lithographic plate fabricated by using same
11/29/2012US20120302483 Photoresist removal
11/29/2012US20120301833 Method of reducing microloading effect
11/29/2012US20120301832 Substrate warpage removal apparatus, substrate processing apparatus, substrate warpage removal method, substrate processing method and storage medium
11/29/2012US20120301831 Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same
11/29/2012US20120301830 Photosensitive resin composition, photosensitive dry film and method for forming pattern
11/29/2012US20120301829 Resist composition, method of forming resist pattern, novel compound, and acid generator
11/29/2012US20120301828 Near-infrared absorptive layer-forming composition and multilayer film comprising near-infrared absorptive layer
11/29/2012US20120301827 Positive photosensitive resin composition and lyophobic film
11/29/2012US20120301826 Polyimide-based polymers, copolymers thereof and positive type photoresist compositions comprising the same
11/29/2012US20120301825 Layered structure and photosensitive dry film to be used therefor
11/29/2012US20120301824 Layered structure and photosensitive dry film to be used therefor
11/29/2012US20120301823 Polymer composition and photoresist comprising the polymer
11/29/2012US20120301817 Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method
11/29/2012US20120301684 Photosensitive film pattern and method for manufacturing a photosensitive film pattern
11/29/2012US20120301094 Methods for Fabricating Flexible Waveguides Using Alkyl-Functional Silsesquioxane Resins
11/29/2012US20120298842 Production method of microlens
11/29/2012US20120298411 On-chip interconnects with reduced capacitance and method of afbrication
11/29/2012US20120297905 Patterning nano-scale patterns on a film comprising unzipping copolymers
11/29/2012DE112006003495B4 Maskenrohling und Maske Mask blank and mask
11/29/2012DE102011076549A1 Optische Anordnung in einer mikrolithographischen Projektionsbelichtungsanlage Optical arrangement in a microlithography projection exposure apparatus
11/29/2012DE102011076460A1 Beleuchtungsoptik Illumination optics
11/29/2012DE102011076436A1 Beleuchtungsoptik für die Projektionslithografie Illumination optics for projection lithography
11/29/2012DE102011076435A1 Verfahren sowie Vorrichtung zur Einstellung einer Beleuchtungsoptik Method and apparatus for adjusting illumination optics
11/29/2012DE102011076434A1 Illumination device for use in microlithographic projection exposure system for illuminating mask i.e. reticle, for manufacturing e.g. LCD, has optical element arranged between mirror assembly and pupil plane of illumination device
11/29/2012DE102011076297A1 Blende Aperture
11/29/2012DE102011016058B4 Verfahren und Vorrichtung zur Einstellung von Eigenschaften eines Strahlenbündels aus einem Plasma emittierter hochenergetischer Strahlung Method and apparatus for setting the properties of a beam emitted from a plasma of high energy radiation
11/28/2012EP2527921A2 Exposure method and exposure apparatus
11/28/2012EP2527920A1 Illumination optical apparatus, exposure apparatus, and device manufacturing method
11/28/2012EP2527919A1 Photoresist compositions and methods of forming photolithographic patterns
11/28/2012EP2527918A2 Photoresist composition
11/28/2012EP2527380A1 Photosensitive compositions
11/28/2012EP2527379A1 Polymer and photoresist comprising the polymer
11/28/2012EP2527377A1 Surface active additive and photoresist composition comprising same
11/28/2012EP2526463A1 Liquid radiation curable resins capable of curing into layers with selective visual effects and methods for the use thereof
11/28/2012EP2526462A1 Method for controlling the electron beam exposure of wafers and masks using proximity correction
11/28/2012EP2526447A1 Black curable composition for wafer-level lens, and wafer-level lens
11/28/2012CN202563243U Exposing machine of glass substrate
11/28/2012CN202563241U Mask plate
11/28/2012CN1959540B Method for attaching a scale to a carrier, a scale, and carrier having a scale
11/28/2012CN1942826B Positive-working photoimageable bottom antireflective coating
11/28/2012CN102804074A Resist stripping compositions and methods for manufacturing electrical devices
11/28/2012CN102804073A Inspection for lithography
11/28/2012CN102804072A Faceted mirror for use in microlithography
11/28/2012CN102804071A Optical imaging with reduced immersion liquid evaporation effects
11/28/2012CN102804070A Lithographic apparatus and device manufacturing method
11/28/2012CN102804069A Lithographic apparatus and method
11/28/2012CN102804068A 平版印刷版前驱体 Lithographic printing plate precursor
11/28/2012CN102804067A Negative-working Imageable Elements
11/28/2012CN102804066A Photocurable and thermocurable resin composition, and dry film solder resist
11/28/2012CN102804065A Radiation-sensitive resin composition
11/28/2012CN102804064A Conductive composition, transparent conductive film, display element and integrated solar battery
11/28/2012CN102804062A Laser imaging
11/28/2012CN102804061A Functionalized perfluoropolyether material as a hydrophobic coating
11/28/2012CN102803562A Methods of wet etching a self-assembled monolayer patterned substrate and metal patterned articles
11/28/2012CN102803399A Colored composition, inkjet ink, color filter and method of producing the same, solid-state image sensor and display device
11/28/2012CN102803324A Carbazole Novolak Resin
11/28/2012CN102803274A Silane coupling agent, negative-type photosensitive resin composition, curable film and touch panel component
11/28/2012CN102800623A Method of forming double-embedding structure
11/28/2012CN102800567A Deep silicon etching method
11/28/2012CN102799083A Photoresist removal system and photoetching device
11/28/2012CN102799082A Oven and adjustable baking system
11/28/2012CN102799081A Mask plate workpiece platform of stepping type multi-exposure stepper and exposure technology
11/28/2012CN102799080A Method for eliminating inclined imaging of mask grating alignment marks
11/28/2012CN102799079A Illumination system for a microlithographic projection exposure apparatus
11/28/2012CN102799078A Auxiliary device achieving identical exposure on both sides of PCB and method
11/28/2012CN102799077A Lithographic apparatus and device manufacturing method
11/28/2012CN102799076A Exposure method for non-planar base material and exposure device
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