| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 12/06/2012 | WO2012165387A1 Colored curable composition, colored cured film, color filter and process for producing same, display device, and novel compound |
| 12/06/2012 | WO2012165205A1 Exposure device |
| 12/06/2012 | WO2012165143A1 Photosensitive resin composition for forming biochip, and biochip |
| 12/06/2012 | WO2012165060A1 Presensitized plate for lithographic printing and method for processing same |
| 12/06/2012 | WO2012164824A1 Method for manufacturing microstructure, and microstructured die |
| 12/06/2012 | WO2012164539A1 Printing periodic patterns using multiple lasers |
| 12/06/2012 | WO2012164512A1 Method for producing three-dimensional monolithic microfluidic devices |
| 12/06/2012 | WO2012163794A1 Imaging optical unit |
| 12/06/2012 | WO2012163643A1 Movement of an optical element in a microlithographic projection exposure apparatus |
| 12/06/2012 | WO2012099366A3 Photosensitive resin composition, and photosensitive material comprising same |
| 12/06/2012 | US20120309276 Retainer rings of chemical mechanical polishing apparatus and methods of manufacturing the same |
| 12/06/2012 | US20120309136 Manufacture methods of thin film transistor and array substrate and mask |
| 12/06/2012 | US20120308939 Bottom antireflective coating compositions and processes thereof |
| 12/06/2012 | US20120308938 Method for forming pattern and developer |
| 12/06/2012 | US20120308937 Uni-Directional Beam Splitter Coating |
| 12/06/2012 | US20120308936 Exposure apparatus for photoalignment process and method for manufacturing liquid crystal display |
| 12/06/2012 | US20120308935 Flexographic processing solution and use |
| 12/06/2012 | US20120308934 Method for preparing a composite printing form |
| 12/06/2012 | US20120308933 Radiation sensitive self-assembled monolayers and uses thereof |
| 12/06/2012 | US20120308932 Polymer, chemically amplified resist composition, and patterning process using said chemically amplified resist composition |
| 12/06/2012 | US20120308931 Resist composition and method of forming resist pattern |
| 12/06/2012 | US20120308930 Patterning process and resist composition |
| 12/06/2012 | US20120308929 Wet lamination of photopolymerizable dry films onto substrates and compositions relating thereto |
| 12/06/2012 | US20120308928 Resist composition, method of forming resist pattern, polymeric compound and method of producing the same |
| 12/06/2012 | US20120308927 Polymers, photoresist compositions and methods of forming photolithograhic patterns |
| 12/06/2012 | US20120308920 Sulfonium salt, polymer, chemically amplified resist composition using said polymer, and resist patterning process |
| 12/06/2012 | US20120308919 Manufacturing Method for Color Filter Substrate, Photomask and Photoreactive Layer |
| 12/06/2012 | US20120308918 Photosensitive Recording Material |
| 12/06/2012 | US20120308788 Overlay mark set and method for positioning two different layout patterns |
| 12/06/2012 | US20120308741 Transparent, highly heat-resistant polyimide precursor and photosensitive polyimide composition thereof |
| 12/06/2012 | US20120307363 Photo-induced dichroic polarizers and fabrication methods thereof |
| 12/06/2012 | US20120307225 Optical Imaging Writer System |
| 12/06/2012 | US20120306961 Negative photosensitive resin composition, pattern formation method, and liquid discharge head |
| 12/06/2012 | US20120305183 Semiconductor device manufacturing apparatus |
| 12/06/2012 | DE102011080409A1 Method for removing layer of extreme UV (EUV) radiation reflecting multilayer coating portion of EUV mirror, involves introducing hydrogen into silicon-containing layer of coating portion to separate layers of coating portion |
| 12/06/2012 | DE102011076752A1 Abbildende Optik The imaging optics |
| 12/06/2012 | DE102011050824A1 Device for rotary coating of e.g. wafer with photoresist during semiconductor manufacturing process, has cover unit covering substrate during medium distribution process, and turntable atmospherically sealed on side opposite to substrate |
| 12/06/2012 | DE102006058560B4 Verfahren zur Bildung hochaufgelöster Strukturen mit gewünschter Dicke oder hohem Aspektverhältnis mittels eines Trockenfilmresists A method for forming high-resolution structures of the desired thickness or high aspect ratio by a dry film resist |
| 12/06/2012 | DE102006058559B4 Verfahren zur Bildung hochaufgelöster Strukturen mit gewünschter Dicke oder hohem Aspektverhältnis mittels tiefer Ablation A method for forming high-resolution structures of the desired thickness or high aspect ratio with a deeper ablation |
| 12/06/2012 | CA2838018A1 Method for producing three-dimensional monolithic microfluidic devices |
| 12/05/2012 | EP2530527A1 Exposure apparatus, liquid crystal display device, and method for manufacturing liquid crystal display device |
| 12/05/2012 | EP2530526A2 Device for coating substrates in a rotating manner |
| 12/05/2012 | EP2530525A1 Method for forming pattern and developer |
| 12/05/2012 | EP2530524A1 Positive-type resist composition and method for producing microlens |
| 12/05/2012 | EP2530523A1 Polymerizable composition for solder resist, and solder resist pattern formation method |
| 12/05/2012 | EP2529277A1 Flexographic processing solution and use |
| 12/05/2012 | EP2529276A1 Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method |
| 12/05/2012 | EP2529275A1 Polymerizable composition, color filter, method of producing color filter and solid-state image sensor |
| 12/05/2012 | EP2529274A2 Nanoimprint lithography processes for forming nanoparticles |
| 12/05/2012 | EP2529273A2 Mold for nanoprinting lithography, and methods for producing same |
| 12/05/2012 | EP2529182A1 System and method for assessing inhomogeneous deformations in multilayer plates |
| 12/05/2012 | CN202583698U Development processing system for offset plates |
| 12/05/2012 | CN202583697U Alkaline development printing wastewater treatment device of lithographic printing plate |
| 12/05/2012 | CN202583696U Developer capable of selecting different developing section lengths |
| 12/05/2012 | CN202583695U Multi-lamp light source system for photoetching exposure machine |
| 12/05/2012 | CN202583694U Exposure machine lamp tube cooling device |
| 12/05/2012 | CN202583693U Film convenient for alignment in exposure of printed circuit boards |
| 12/05/2012 | CN202576612U Microtextured device manufactured by laser photoetching assisted electrochemical deposition |
| 12/05/2012 | CN202570021U Dosing tank for line developing liquid |
| 12/05/2012 | CN1963675B Infiltrating type micro-image apparatus and process thereof |
| 12/05/2012 | CN1945441B System and method for compensating for radiation induced thermal distortions |
| 12/05/2012 | CN1802606B Resist pattern swelling material, and method for patterning using same |
| 12/05/2012 | CN102812402A Color developing photosensitive composition, lithographic printing original plate, and method for producing same |
| 12/05/2012 | CN102812401A Photocurable/thermosetting resin composition, dry film thereof and cured substance therefrom, and printed circuit board using same |
| 12/05/2012 | CN102812400A Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same |
| 12/05/2012 | CN102812399A Photosensitive conductive paste and method for forming conductive pattern |
| 12/05/2012 | CN102810464A Photoetching method |
| 12/05/2012 | CN102809903A Secondary pre-alignment device and pre-alignment method |
| 12/05/2012 | CN102809902A Balancing mass system of photoetching machine |
| 12/05/2012 | CN102809901A Matching method for focal distances in various layers of different exposure apparatuses |
| 12/05/2012 | CN102809900A Semiconductor element overlap system and semiconductor element overlap method |
| 12/05/2012 | CN102809899A Position aligning parameter calculation method |
| 12/05/2012 | CN102809898A Colored photosensitive resin composition |
| 12/05/2012 | CN102809897A Curable resin composition |
| 12/05/2012 | CN102809896A Mask and photolithography method thereof |
| 12/05/2012 | CN102809895A Photoetching layout, photoresist graph and method for measuring exposure error of photoresist graph |
| 12/05/2012 | CN102809849A Liquid crystal display device, color film substrate and manufacture method thereof |
| 12/05/2012 | CN102809139A Mercury lamp room with cooling system |
| 12/05/2012 | CN102807768A Pigment for color filter, colored resin composition using the pigment and color filter formed by the resin composition |
| 12/05/2012 | CN102298262B Thermocuring photosensitive resin composition |
| 12/05/2012 | CN102156391B 光刻设备 Lithography equipment |
| 12/05/2012 | CN102135733B Method for removing photoresistance |
| 12/05/2012 | CN102130009B Manufacturing method of transistor |
| 12/05/2012 | CN102129168B Photoresist graph correction method |
| 12/05/2012 | CN102096326B Double exposure method and etching method |
| 12/05/2012 | CN102087468B Method for forming inspected pattern on substrate photoresist by photomask |
| 12/05/2012 | CN102044432B Method for preventing uneven surface of wafer and preventing defocus in exposure |
| 12/05/2012 | CN101976646B Substrate processing method, program, computer-readable recording medium, and substrate processing system |
| 12/05/2012 | CN101950130B 光刻设备和光刻投影设备 Lithographic apparatus and a lithographic projection apparatus |
| 12/05/2012 | CN101930168B Vacuum forming apparatus and method for vacuum forming of substrate |
| 12/05/2012 | CN101921375B Curable composition, cured product, and liquid crystal display device using the same |
| 12/05/2012 | CN101836151B Imaging optical system, projection exposure installation for micro-lithography comprising an imaging optical system of this type, and method for producing a microstructured component with a projection exposure installation of this type |
| 12/05/2012 | CN101788721B Polarization conversion device |
| 12/05/2012 | CN101697064B Process for producing photoresist composition, filter and coating device |
| 12/05/2012 | CN101689026B Movable body apparatus, pattern forming device, exposure device and element manufacture method |
| 12/05/2012 | CN101689024B Movable body apparatus |
| 12/05/2012 | CN101681105B 一种平版印版前体 A planographic printing plate precursor |
| 12/05/2012 | CN101644896B Photoresist composition and process for producing photoresist composition |
| 12/05/2012 | CN101630639B Semiconductor device manufacturing method |
| 12/05/2012 | CN101622578B Solder resist, dry film thereof, cured product and printed wiring board |