Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2012
12/12/2012EP2533099A2 Method for manufacturing micro-structure and optically patternable sacrificial film-forming composition
12/12/2012EP2533078A1 Radiation source and lithographic apparatus
12/12/2012EP2531892A1 Photopolymer formulation having triazine-based writing monomers
12/12/2012EP2531891A1 Negative photosensitive resin composition, pattern formation method, and liquid discharge head
12/12/2012EP2531890A1 Photosensitive resin composition, method for producing structure, and liquid discharge head
12/12/2012EP2531889A1 Photopolymer formulation having ester-based writing monomers
12/12/2012EP2531888A1 Method and process for metallic stamp replication for large area nanopatterns
12/12/2012CN202600361U Exposure machine and illumination control device of the same
12/12/2012CN202600360U Dual surface lithography device
12/12/2012CN202600359U Dual-functional bottom device for reticle stage
12/12/2012CN1812050B Substrate processing apparatus
12/12/2012CN102823330A EUV radiation source and EUV radiation generation method
12/12/2012CN102822943A Mask pattern formation method and manufacturing method for semiconductor device
12/12/2012CN102822749A Lithographic apparatus and device manufacturing method
12/12/2012CN102822748A Laser exposure method and product
12/12/2012CN102822747A Photo-curable thermosetting resin composition
12/12/2012CN102822746A Pattern forming method and resist composition
12/12/2012CN102822745A Photosensitive resin composition and light receiving device
12/12/2012CN102822742A Method for controlling the electronic beam exposure of wafers and masks using proximity correction
12/12/2012CN102822284A Curable resin composition, dry film using same, and printed wiring board
12/12/2012CN102821969A Master planographic printing plate and manufacturing method therefor
12/12/2012CN102821968A Planographic printing master plate and production method therefor
12/12/2012CN102821967A Gravure printing plate and method for producing gravure printing plate
12/12/2012CN102820311A Method for manufacturing polarization-sensitive photoelectric detector
12/12/2012CN102820298A IC (integrated circuit) comprising multiple MOS (metal oxide semiconductor) tubes, and photoetching method and preparation method for aluminum line of IC
12/12/2012CN102820204A Scanning and photoresist removing system using radiofrequency and dielectric-barrier atmospheric-pressure glow plasmas
12/12/2012CN102819199A Lithography system
12/12/2012CN102819198A Side lobe image searching method in lithography
12/12/2012CN102819197A Imaging optical system, projection exposure installation, micro-lithography, and producing method thereof
12/12/2012CN102819196A Projection objective for microlithography
12/12/2012CN102819195A Exposure apparatus and exposure method, and exposure unit and use method for exposure unit
12/12/2012CN102819194A Radiation source and lithographic apparatus
12/12/2012CN102819193A Method for determining illumination source with optimized depth of focus
12/12/2012CN102819192A Resist underlayer composition and method of manufacturing integrated circuit device using the same
12/12/2012CN102819191A Compositions and processes for photolithography
12/12/2012CN102819190A Anti-etching compound and base material coated with same
12/12/2012CN102819189A Dyeing composition
12/12/2012CN102819188A Coloring photosensitive resin composition
12/12/2012CN102819187A Photoetching production technology of single glass and single-layer glass black matrix
12/12/2012CN102819186A 3T1R four-degrees-of-freedom precise location workbench
12/12/2012CN102819185A Etching method and etching device for non-planar base material
12/12/2012CN102819184A Storage method for large-scale shield
12/12/2012CN102819183A Mask plate, method for manufacturing array substrate by utilizing mask plate, and array substrate
12/12/2012CN102819182A Photo mask base plate and manufacturing method thereof, photo mask manufacturing method, and pattern transfer method
12/12/2012CN102819056A Color filter, manufacturing method thereof, liquid crystal display panel and liquid crystal display device
12/12/2012CN102816097A Salt, photoresist composition and method for producing photoresist pattern
12/12/2012CN102269927B Anti-counterfeiting microstructure pigment and manufacturing process thereof
12/12/2012CN102221786B Axial positioning maintaining device of optical element
12/12/2012CN102213914B Semiconductor lithography process
12/12/2012CN102196913B 一种平版印版 A planographic printing plate
12/12/2012CN102147572B Wafer edge exposure module and wafer edge exposure method
12/12/2012CN102141735B Silicon chip edge protection device and application method thereof
12/12/2012CN102129954B Wafer back cleaning device for decreasing defocusing probability during exposure
12/12/2012CN102109766B Decoupling mechanism and exposure machine using same
12/12/2012CN102103332B High-speed digital scanning direct write photoetching device
12/12/2012CN102066124B Substrate and imageable element with hydrophilic interlayer
12/12/2012CN102036821B Method of imaging and developing positive-working imageable elements
12/12/2012CN102033315B Projection optical system, exposure apparatus and method of manufacturing a device
12/12/2012CN101996948B Method for forming semiconductor device
12/12/2012CN101989043B Multi-gray scale photomask, photomask blank, method of manufacturing multi-gray scale photomask and pattern transfer method
12/12/2012CN101989007B Colourful film substrate and manufacturing method thereof
12/12/2012CN101971102B On-track process for patterning hardmask by multiple dark field exposures
12/12/2012CN101958278B Manufacturing method of semiconductor device
12/12/2012CN101855597B Radiation-sensitive resin composition for forming spacer, spacer, method for forming spacer, and liquid crystal display device
12/12/2012CN101799631B Worktable cleaner, describing device and substrate processing device
12/12/2012CN101779166B Hydrocarbon getter for lithographic exposure tools
12/12/2012CN101650534B Method for measuring focal plane uniformity of exposure machine
12/12/2012CN101627336B Method to form a pattern of functional material on a substrate using a stamp having a surface modifying material
12/12/2012CN101616804B Radiation-sensitive compositions and elements with basic development enhancers
12/12/2012CN101542393B Colored resin composition, color filter, liquid crystal display device, and organic el display
12/12/2012CN101529332B Photosensitive resin composition, insulating film, protective film, and electronic equipment
12/12/2012CN101495922B Lithography system, method of heat dissipation and frame
12/12/2012CN101477307B Photomask blank, resist pattern forming process, and photomask preparation process
12/12/2012CN101449207B Antireflective hardmask composition
12/11/2012US8330935 Exposure apparatus and measuring device for a projection lens
12/11/2012US8330934 Exposure apparatus and device manufacturing method
12/11/2012US8330281 Overlay marks, methods of overlay mark design and methods of overlay measurements
12/11/2012US8330072 System method and apparatus for dry-in, dry-out, low defect laser dicing using proximity technology
12/11/2012US8329838 Norbornene-type polymers, compositions thereof and lithographic processes using such compositions
12/11/2012US8329815 Silicone-containing polymer and a heat-resistant resin composition comprising the silicon-containing polymer
12/11/2012US8329773 Holographic media and photopolymers
12/11/2012US8329387 Antireflective coating compositions
12/11/2012US8329386 Method to assemble nano-structure on a substrate and nano-molecule device comprising nano-structure formed thereby
12/11/2012US8329385 Method of manufacturing a semiconductor device
12/11/2012US8329384 Resist-modifying composition and pattern forming process
12/11/2012US8329383 Negative-working lithographic printing plate precursors
12/11/2012US8329382 Method of processing elements with coalesced particles
12/11/2012US8329380 Positive photosensitive resin composition and method for forming cured film using the same
12/11/2012US8329379 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the same
12/11/2012US8329378 Positive resist composition, method of forming resist pattern, and polymeric compound
12/11/2012US8329377 Imide compound and chemically amplified resist composition containing the same
12/11/2012US8329376 Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method
12/11/2012CA2791249A1 Method and system for ion beam delayering of a sample and control thereof
12/06/2012WO2012166953A1 Method and apparatus for lithographic manufacture of multi-component polymeric fiber plates
12/06/2012WO2012166053A1 A filtering membrane
12/06/2012WO2012165604A1 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device
12/06/2012WO2012165537A1 Colored composition, color filter, and display element
12/06/2012WO2012165507A1 Phenolic resin and material for forming underlayer film for lithography
12/06/2012WO2012165473A1 Polymer and method for producing same
12/06/2012WO2012165448A1 Resin composition and semiconductor element substrate
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