| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 12/19/2012 | CN102834779A Developer for processing planographic printing plate precursor, method for preparing planographic printing plate using the developer, and method for printing |
| 12/19/2012 | CN102834778A Exposure apparatus, substrate processing apparatus, and device manufacturing method |
| 12/19/2012 | CN102834777A Lithographic apparatus and device manufacturing method |
| 12/19/2012 | CN102834776A Method for operating a projection exposure apparatus for microlithography with correction of imaging aberrations induced by rigorous effects of the mask |
| 12/19/2012 | CN102834775A Manufacturing method of exposure apparatus and device manufacturing method |
| 12/19/2012 | CN102834774A Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method |
| 12/19/2012 | CN102834273A Original film for laser engraving type flexographic printing plate |
| 12/19/2012 | CN102834264A Method for producing lithographic printing plate |
| 12/19/2012 | CN102832187A Wafer level chip scale package with reduced stress on solder balls |
| 12/19/2012 | CN102832168A Trench-first copper interconnection manufacturing method |
| 12/19/2012 | CN102832123A Power electric switch device and manufacturing method thereof |
| 12/19/2012 | CN102832106A Method of manufacturing semiconductor device |
| 12/19/2012 | CN102830596A Film fading liquid composition with disubstituted benzothiazole as corrosion inhibitor |
| 12/19/2012 | CN102830595A Method and equipment for monitoring developing liquid |
| 12/19/2012 | CN102830594A Exposed out-of-focus SEM (Scanning Electron Microscope) detection device and detection method thereof |
| 12/19/2012 | CN102830593A Clamping device, assembly and lithographic projection apparatus |
| 12/19/2012 | CN102830592A Exposure apparatus for photoalignment process and method for manufacturing liquid crystal display |
| 12/19/2012 | CN102830591A Photo-etching machine silicon wafer stage driving apparatus |
| 12/19/2012 | CN102830590A Light source life monitoring system and its monitoring method |
| 12/19/2012 | CN102830589A Resin composition of negative photoresist and preparation method thereof |
| 12/19/2012 | CN102830588A Method for fabricating phase-shift photomask |
| 12/19/2012 | CN102830587A Mask plate, CF (Color Filter), LCD (Liquid Crystal Display) device and manufacturing method |
| 12/19/2012 | CN102830535A Display device, color film substrate and method for manufacturing same |
| 12/19/2012 | CN102830487A Catadioptric projection objective |
| 12/19/2012 | CN102830457A CF (Color Filter) substrate |
| 12/19/2012 | CN102830456A Color filter and forming method thereof |
| 12/19/2012 | CN102827708A Plasma etching residue cleaning fluid |
| 12/19/2012 | CN102827707A Plasma etching residue cleaning fluid |
| 12/19/2012 | CN102827323A Curable resin composition containing alicyclic epoxy group, manufacturing method and cured material thereof |
| 12/19/2012 | CN102826504A Nanowire manufacturing method |
| 12/19/2012 | CN102826503A Preparation method of wedge microstructure on surface of polymer |
| 12/19/2012 | CN102255472B Permanent magnet linear synchronous motor with aerostatic slideways |
| 12/19/2012 | CN102236270B Focus detection device applicable to double workpiece table projection lithography machine |
| 12/19/2012 | CN102215636B Circuit board wet processing device |
| 12/19/2012 | CN102083888B Method for preparing a photo-crosslinkable composition |
| 12/19/2012 | CN101963755B Self-aligned spacer multiple patterning methods |
| 12/19/2012 | CN101963754B Methods of forming electronic device |
| 12/19/2012 | CN101943868B Method for removing photoresist and device thereof |
| 12/19/2012 | CN101925858B Polychromic substances and their use |
| 12/19/2012 | CN101868743B 偏振器 Polarizer |
| 12/19/2012 | CN101821678B 微光刻投射曝光设备 Microlithography projection exposure apparatus |
| 12/19/2012 | CN101802715B Illumination system of a microlithographic projection exposure apparatus |
| 12/19/2012 | CN101614970B Photoresist cleaning agent composition |
| 12/19/2012 | CN101365758B Method of producing fine particles of anthraquinone structure-containing pigment, fine particles of anthraquinone structure-containing pigment produced thereby |
| 12/19/2012 | CN101278377B Semiconductor substrate and method for manufacturing same |
| 12/19/2012 | CN101248392B Optical imaging arrangement |
| 12/19/2012 | CN101174096B Mask etch plasma reactor with cathode providing a uniform distribution of etch rate |
| 12/19/2012 | CN101063811B Device and method for creating a three dimensional object using mask illumination |
| 12/18/2012 | US8335039 Method of measuring aerial image of EUV mask |
| 12/18/2012 | US8335038 Apparatus for measuring aerial image of EUV mask |
| 12/18/2012 | US8334328 Photopolymerization material for gums isolation |
| 12/18/2012 | US8334221 Methods of forming patterned photoresist layers over semiconductor substrates |
| 12/18/2012 | US8334092 Photo-sensitive resin composition and a protective film for printed circuit board having superior heat resistant and mechanical property |
| 12/18/2012 | US8334091 Resist pattern swelling material, and method for patterning using same |
| 12/18/2012 | US8334089 Method of fine patterning semiconductor device |
| 12/18/2012 | US8334088 Functionalized carbosilane polymers and photoresist compositions containing the same |
| 12/18/2012 | US8334087 Polymer, radiation-sensitive composition, monomer, and method of producing compound |
| 12/18/2012 | US8334085 Colored curable composition, color filter and method of producing the same, and dipyrromethene metal complex compound and tautomer thereof |
| 12/18/2012 | US8334083 Etch process for controlling pattern CD and integrity in multi-layer masks |
| 12/18/2012 | US8334025 Antimony-free photocurable resin composition and three dimensional article |
| 12/18/2012 | US8333934 Gradient structures interfacing microfluidics and nanofluidics |
| 12/18/2012 | CA2648539C Stabilized metal nanoparticles and methods for depositing conductive features using stabilized metal nanoparticles |
| 12/18/2012 | CA2522014C Novel trifunctional photoinitiators |
| 12/13/2012 | WO2012170204A1 Photoresists containing polymer-tethered nanoparticles |
| 12/13/2012 | WO2012169620A1 Solvent-developable negative resist composition, resist pattern formation method, and method for forming pattern of layer including block copolymer |
| 12/13/2012 | WO2012169580A1 Block copolymer and resist underlayer film-forming composition |
| 12/13/2012 | WO2012169415A1 Color filter, ccd sensor, cmos sensor, organic cmos sensor, and solid-state image sensor |
| 12/13/2012 | WO2012169385A1 Composition, photosensitive film, photosensitive laminate, method for forming permanent pattern, and printed board |
| 12/13/2012 | WO2012169089A1 Illumination optical system, exposure apparatus, device production method, and light polarization unit |
| 12/13/2012 | WO2012168485A1 Composition of solutions and conditions for use enabling the stripping and complete dissolution of photoresists |
| 12/13/2012 | WO2012168272A1 Measuring system |
| 12/13/2012 | WO2012167410A1 Scanning and degumming system using radio frequency, dielectric barrier atmospheric pressure glow plasma |
| 12/13/2012 | WO2012143548A3 Network architecture and protocol for cluster of lithography machines |
| 12/13/2012 | WO2012136434A3 Lithographic apparatus, programmable patterning device and lithographic method |
| 12/13/2012 | WO2012111927A9 Compound and organic electrical element using same, and electronic device and heat-resistance measuring method therewith |
| 12/13/2012 | WO2012107815A3 Laser apparatus, extreme ultraviolet light generation system, method for controlling the laser apparatus, and method for generating the extreme ultraviolet light |
| 12/13/2012 | WO2012082555A3 Cyclic error compensation in inteferometric encoder systems |
| 12/13/2012 | US20120315583 Methods of generating three-dimensional process window qualification |
| 12/13/2012 | US20120315582 Patterned substrate and method for producing same |
| 12/13/2012 | US20120315581 Patterning process and resist composition |
| 12/13/2012 | US20120315580 Salt, photoresist composition and method for producing photoresist pattern |
| 12/13/2012 | US20120315579 Colored curable composition, color filter and method of producing the same, and dipyrromethene metal complex compound and tautomer thereof |
| 12/13/2012 | US20120315578 Apparatus and method for spin-coating, and method for manufacturing substrate having structure |
| 12/13/2012 | US20120315451 Metal-Containing Compositions and Method of Making Same |
| 12/13/2012 | US20120315449 Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method |
| 12/13/2012 | US20120314388 Substrates with transferable chiplets |
| 12/13/2012 | US20120314196 Lithography wave-front control system and method |
| 12/13/2012 | US20120314143 Lens panel, method for manufacturing lens panel, and display apparatus having lens panel |
| 12/13/2012 | US20120313096 Oxide semiconductor composition and preparation method thereof, method of forming oxide semiconductor thin film, method of fabricating electronic device and electronic device fabricated thereby |
| 12/13/2012 | DE102011087323A1 Method for manufacturing optical element involves curving optical surface by deformation to obtain optical element with curved optical surface after obtaining optical surface with defined surface quality |
| 12/13/2012 | DE102011077234A1 Extreme UV mirror arrangement for use as e.g. pupil facet mirror arranged in region of pupil plane of e.g. illumination system, has multilayer arrangement including active layer arranged between entrance surface and substrate |
| 12/13/2012 | DE102011077223A1 Messsystem Measuring system |
| 12/13/2012 | DE102009015717B4 Verfahren und System zum Erkennen einer Teilchenkontamination in einer Immersionslithographieanlage Method and system for detecting a particle contamination in immersion lithography system |
| 12/13/2012 | DE102007001796B4 Verfahren zum Ausbilden von Resiststruktur und Herstellungsverfahren für eine Halbleitervorrichtung A method of forming resist pattern and manufacturing method of a semiconductor device |
| 12/12/2012 | EP2533279A1 Support and transport unit for a print substrate for a plant for depositing print tracks, and relative deposition method |
| 12/12/2012 | EP2533104A1 Imaging optical system and projection exposure apparatus therewith |
| 12/12/2012 | EP2533103A1 Method of manufacturing interconnection member and electronic device, interconnection member, multilayered interconnections, electronic device, electronic device array and display device using the method |
| 12/12/2012 | EP2533102A2 Apparatus and method for spin-coating, and method for manufacturing substrate having structure |
| 12/12/2012 | EP2533101A2 Sulfonium salt, polymer, chemically amplified resist composition using said polymer, and resist patterning process |
| 12/12/2012 | EP2533100A1 Positive photosensitive resin composition and liquid-repellent film |