| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 12/26/2012 | CN102200697B System and method for detecting wave aberration of photoetching projection objective |
| 12/26/2012 | CN102183878B Microstructural stereoscopic anaglyph image-text platemaking method |
| 12/26/2012 | CN102112922B Positive photosensitive composition and permanent resist |
| 12/26/2012 | CN102053489B Mercaptan-alkene based high-precision ultraviolet imprinting method of continuous embossment micro optical elements |
| 12/26/2012 | CN102047152B Method for producing color filter, method for producing substrate with pattern, and small photomask |
| 12/26/2012 | CN101974120B Nano-crystalline silicon containing deep ultraviolet negative amplification type photoresist and film forming resin thereof |
| 12/26/2012 | CN101910950B Folded optical encoder and applications for same |
| 12/26/2012 | CN101846891B Integrated post-exposure bake track |
| 12/26/2012 | CN101845219B Curable resin composition, dry membrane and printed circuit board using same |
| 12/26/2012 | CN101840099B Liquid crystal display panel and manufacture method thereof |
| 12/26/2012 | CN101833245B Gluing device and gluing method |
| 12/26/2012 | CN101825624B Miniaturized total analysis device formed by six-channel microfluidic chip and quartz crystal microbalance |
| 12/26/2012 | CN101794081B Vacuum system for immersion photolithography |
| 12/26/2012 | CN101788766B 光敏树脂组合物 The photosensitive resin composition of the |
| 12/26/2012 | CN101762972B Infrared positive thermal-sensitive imaging composition |
| 12/26/2012 | CN101681107B Photosensitive resin composition, photosensitive element, method of forming resist pattern, and process for producing printed wiring board |
| 12/26/2012 | CN101634812B Lithographic apparatus and device manufacturing method |
| 12/26/2012 | CN101613276B Color photoresist for color filter |
| 12/26/2012 | CN101592863B Resin composition for liquid crystal panel, and color filter and liquid crystal panel using the same |
| 12/26/2012 | CN101583908B Photosensitive resin composition, cured photosensitive resin product, photosensitive resin film, cured photosensitive resin film product, and optical waveguide produced by using those products |
| 12/26/2012 | CN101544784B Photocurable resin composition, dry film and cured object thereof, and printed circuit board with the same |
| 12/26/2012 | CN101464628B Novel compound and method of producing the same, acid generator, resist composition and method of forming resist pattern |
| 12/26/2012 | CN101435990B Mask plate and manufacturing method thereof |
| 12/26/2012 | CN101410756B Negative photoresist compositions |
| 12/26/2012 | CN101371197B Photosensitive dry film resist, printed wiring board making use of the same, and process for producing printed wiring board |
| 12/26/2012 | CN101256365B Lithographic apparatus and device manufacturing method |
| 12/26/2012 | CN101236323B Systems for displaying images and methods for fabricating the same |
| 12/26/2012 | CN101171551B Compositions for the removal of post-etch and ashed photoresist residues and bulk photoresist |
| 12/26/2012 | CN101075584B Method of manufacturing LCD apparatus by using halftone exposure method |
| 12/25/2012 | US8340393 Advanced roughness metrology |
| 12/25/2012 | US8339614 Method of measuring shot shape and mask |
| 12/25/2012 | US8339578 Optical system, exposure system, and exposure method |
| 12/25/2012 | US8338556 Patterned ferroelectric layer on a substrate |
| 12/25/2012 | US8338304 Methods to reduce the critical dimension of semiconductor devices and related semiconductor devices |
| 12/25/2012 | US8338087 Composition and process for post-etch removal of photoresist and/or sacrificial anti-reflective material deposited on a substrate |
| 12/25/2012 | US8338086 Method of slimming radiation-sensitive material lines in lithographic applications |
| 12/25/2012 | US8338085 Method to align mask patterns |
| 12/25/2012 | US8338084 Patterning method |
| 12/25/2012 | US8338083 Methods of forming electronic devices |
| 12/25/2012 | US8338082 DI water rinse of photoresists with insoluble dye content |
| 12/25/2012 | US8338081 Alkali-developable photosensitive resin composition and β-diketone compound |
| 12/25/2012 | US8338080 Process for forming resist pattern, semiconductor device and fabrication thereof |
| 12/25/2012 | US8338079 Compositions and methods for forming electronic devices |
| 12/25/2012 | US8338078 Photoresist undercoat-forming material and patterning process |
| 12/25/2012 | US8338077 Photoacid generators and photoresists comprising same |
| 12/25/2012 | US8338076 Resist composition, method of forming resist pattern, novel compound, and acid generator |
| 12/25/2012 | US8338075 Base component which exhibits increased solubility in an alkali developing solution under the action of acid, an acid generator, and organic solvent having a boiling point of at least 150 degrees C.; hole-like resist pattern can be formed with a high level of resolution and minute dimensions |
| 12/25/2012 | US8338074 Actinic radiation-curable stereolithographic resin composition having improved stability |
| 12/25/2012 | US8338073 Lithographic printing plate support, method of manufacturing the same, and presensitized plate |
| 12/25/2012 | US8338072 Resist composition, resist pattern forming process, and method for manufacturing semiconductor device |
| 12/20/2012 | WO2012173506A2 Procedure of 2d and 3d optically assisted fountain pen nanolithography and aperture pen nanolithography |
| 12/20/2012 | WO2012173282A1 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern |
| 12/20/2012 | WO2012173242A1 Photocurable/thermosetting resin composition |
| 12/20/2012 | WO2012173241A1 Flame-retardant curable resin composition, dry film using same, and printed wiring board |
| 12/20/2012 | WO2012173235A1 Compound, radical polymerization initiator, method for producing compound, polymer, resist composition, and method for forming resist pattern |
| 12/20/2012 | WO2012173215A1 Pattern forming method, method for manufacturing electronic device by using the same, and electronic device |
| 12/20/2012 | WO2012172793A1 Photosensitive resin composition, method for forming pattern-cured film using photosensitive resin composition, and electronic component |
| 12/20/2012 | WO2012172711A1 Plasma display panel and manfacturing method thereof |
| 12/20/2012 | WO2012172705A1 Illumination optical assembly, exposure device, and device manufacture method |
| 12/20/2012 | WO2012171687A1 Inspection for lithography |
| 12/20/2012 | WO2012171674A1 Multilayer mirror, method of producing a multilayer mirror and lithographic apparatus |
| 12/20/2012 | WO2012133956A4 Method for producing molds |
| 12/20/2012 | US20120322011 Methods and apparatus for performing multiple photoresist layer development and etching processes |
| 12/20/2012 | US20120322010 Novel polymer composition and method of making the same |
| 12/20/2012 | US20120322009 Method of preparing lithographic printing plate and developer for lithographic printing plate precursor |
| 12/20/2012 | US20120322008 Development of printing members having post-anodically treated substrates |
| 12/20/2012 | US20120322007 Pattern forming method, chemical amplification resist composition and resist film |
| 12/20/2012 | US20120322006 Fluorine-Containing Sulfonate Resin, Resist Composition and Pattern Formation Method |
| 12/20/2012 | US20120322000 Reflective mask blank for euv lithography and process for producing the same |
| 12/20/2012 | US20120321998 Photopolymer formulation having triazine-based writing monomers |
| 12/20/2012 | US20120321997 Urethanes used as additives in a photopolymer formulation |
| 12/20/2012 | US20120321855 Pattern forming method and resist composition |
| 12/20/2012 | US20120321246 Asymmetric slotted waveguide and method for fabricating the same |
| 12/20/2012 | US20120320350 Exposure apparatus, exposure method, and device fabrication method |
| 12/20/2012 | US20120320319 Liquid Crystal Display Panel, Color Filter and Manufacturing Method Thereof |
| 12/20/2012 | US20120319287 Semiconductor structure and method for fabricating semiconductor layout |
| 12/20/2012 | DE112010005304T5 Reflexionsmindernde Hartmaskenzusammensetzung und Verfahren zur Herstellungeines strukturierten Materials damit A reflection-reducing hardmask composition and method for producing one structured material so |
| 12/20/2012 | DE10233491B4 Kompakte Einrichtung zur Bebilderung einer Druckform Compact device for imaging a printing forme |
| 12/20/2012 | DE102011115498A1 Storage device e.g. wafer stage for mounting substrate e.g. wafer in microlithography projection exposure system, has coupling unit arranged such that fixing unit is coupled by magnetic forces to supporting unit |
| 12/20/2012 | DE102011104543A1 Illuminating system for extreme UV projection exposure system for transferring structures on photoresist, has control device controlling heating device such that quantity of heat supplied to carrier body is spatially and temporally variable |
| 12/20/2012 | DE102011104357A1 Method for simulating aerial image for e.g. testing reflective masks in extreme ultraviolet lithography, involves determining aerial image from data sets, and varying resolution of one data set based on intensity of pupil plane |
| 12/20/2012 | DE102011086457A1 Extreme UV imaging device e.g. extreme UV lithography system, for manufacturing integrated circuits, has sensor device detecting measuring variable and formed as fiber Bragg lattice sensor |
| 12/20/2012 | DE102011077784A1 Projektionsanordnung Projection device |
| 12/20/2012 | DE102006058795B4 Verfahren zum Ausbilden einer Resiststruktur und Herstellungsverfahren für eine Halbleiter-Vorrichtung A method of forming a resist pattern, and manufacturing method of a semiconductor device |
| 12/19/2012 | EP2535771A1 Pattern forming method |
| 12/19/2012 | EP2535770A1 Clamping device, assembly and lithographic projection apparatus |
| 12/19/2012 | EP2535769A2 Exposure apparatus and method for producing device |
| 12/19/2012 | EP2535768A1 Underlayer film material, and method for formation of multilayer resist pattern |
| 12/19/2012 | EP2535744A2 Incidence surfaces and optical windows that are solvophobic to immersion liquids used in an immersion microlithography system |
| 12/19/2012 | EP2534538A2 Lithographic apparatus and device manufacturing method |
| 12/19/2012 | EP2534537A1 Spectral purity filter |
| 12/19/2012 | EP2534536A2 Process gas confinement for nanoimprint lithography |
| 12/19/2012 | CN202615115U Flat screen developer |
| 12/19/2012 | CN202615114U Gas-tight sealing and gas-liquid separation recovery device for immersion photoetching machine |
| 12/19/2012 | CN202615113U Exposure system, calibration system and optical engines |
| 12/19/2012 | CN202615112U Novel film negative for movies |
| 12/19/2012 | CN202608063U Float bottom face exposure molding device |
| 12/19/2012 | CN202606440U Recycling device for washing liquid of developing machine |
| 12/19/2012 | CN1678443B Methods and apparatus of field-induced pressure imprint lithography |
| 12/19/2012 | CN102834780A Exposure method and exposure apparatus |