| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/01/2013 | US8343713 Method for patterning material layer |
| 01/01/2013 | US8343711 Patterning process |
| 01/01/2013 | US8343710 Photodegradable groups for tunable polymeric materials |
| 01/01/2013 | US8343709 Processed pigment, pigment-dispersed composition, colored photosensitive composition, color filter, liquid crystal display element, and solid image pickup element |
| 01/01/2013 | US8343708 Positive resist composition and pattern forming method |
| 01/01/2013 | US8343707 Lithographic printing plate for in-solidus development on press |
| 01/01/2013 | US8343706 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same |
| 01/01/2013 | US8343696 Colored curable composition, fluorine-containing dipyrromethene compound and tautomer thereof, and fluorine-containing dipyrromethene metal complex and tautomer thereof, and color filter using the same and method for producing the color filter |
| 01/01/2013 | US8343694 Photomask blank, resist pattern forming process, and photomask preparation process |
| 01/01/2013 | US8343691 Hologram recording material and hologram recording medium |
| 12/27/2012 | WO2012177839A1 Oligosaccharide/silicon-containing block copolymers for lithography applications |
| 12/27/2012 | WO2012176941A1 Method and apparatus to allow a plurality of stages to operate in close proximity |
| 12/27/2012 | WO2012176816A1 Negative photosensitive resin composition, partition wall, black matrix, color filter, and liquid crystal display element |
| 12/27/2012 | WO2012176767A1 Resist underlayer film forming composition containing polyhydroxybenzene novolac resin |
| 12/27/2012 | WO2012176750A1 Negative photosensitive resin composition and cured product of same |
| 12/27/2012 | WO2012176718A1 Positive-type resist composition |
| 12/27/2012 | WO2012176694A1 Negative-type photosensitive resin composition, pattern forming method, cured film, insulating film, color filter, and display device |
| 12/27/2012 | WO2012176693A1 Novel compound |
| 12/27/2012 | WO2012176291A1 Method for forming silicon oxynitride film, and substrate having silicon oxynitride film produced using this formation method |
| 12/27/2012 | WO2012176043A1 An underlayer composition and process thereof |
| 12/27/2012 | WO2012175501A1 Projection arrangement |
| 12/27/2012 | WO2012175494A1 Method for producing a reflective optical element for euv lithography |
| 12/27/2012 | WO2012175343A1 Self-assemblable polymer and methods for use in lithography |
| 12/27/2012 | WO2012175342A2 Self-assemblable polymer and method for use in lithography |
| 12/27/2012 | WO2012175253A1 Inspection method and apparatus |
| 12/27/2012 | WO2012175116A1 Facet mirror device |
| 12/27/2012 | WO2012143555A3 Network architecture for lithography machine cluster |
| 12/27/2012 | WO2012136512A3 Method for producing a screen printing mold and solar cell produced therewith |
| 12/27/2012 | WO2012133932A4 Method for forming resist patterns and method for producing patterend substrates employing the resist patterns |
| 12/27/2012 | WO2012128526A3 Noble polyamic acid, photosensitive resin composition, dry film, and circuit board |
| 12/27/2012 | WO2012128481A3 Method for duplicating pattern using exposure process on cylindrical mold |
| 12/27/2012 | WO2012125009A3 Chemically amplified positive photosensitive composition for an organic insulation film, and method for forming an organic insulation film using same |
| 12/27/2012 | WO2012121418A4 Nanoimprinting method and nanoimprinting apparatus for executing the method |
| 12/27/2012 | WO2012110465A4 System for magnetic shielding |
| 12/27/2012 | US20120328993 Method of producing polymeric compound, resist composition, and method of forming resist pattern |
| 12/27/2012 | US20120328992 Semiconductor device manufacturing method |
| 12/27/2012 | US20120328991 Method of fabricating a thin film transistor substrate and a photosensitive composition used in the thin film transistor substrate |
| 12/27/2012 | US20120328990 Underlayer composition and process thereof |
| 12/27/2012 | US20120328989 Slip Film for Relief Image Printing Element |
| 12/27/2012 | US20120328988 Drawing apparatus, method of manufacturing article, and processing apparatus |
| 12/27/2012 | US20120328987 Patterning process and resist composition |
| 12/27/2012 | US20120328986 Salt, photoresist composition, and method for producing photoresist pattern |
| 12/27/2012 | US20120328985 Fluorine-Containing Sulfonate Resin, Fluorine-Containing N-Sulfonyloxyimide Resin, Resist Composition and Pattern Formation Method |
| 12/27/2012 | US20120328984 Process for producing azo compounds, pigment dispersion, coloring composition, ink for inkjet recording, coloring composition for color filter, and color filter |
| 12/27/2012 | US20120328983 Polymer composition and photoresist comprising same |
| 12/27/2012 | US20120328982 Positive resist composition and method of forming resist pattern |
| 12/27/2012 | US20120328856 Photosensitive resin composition and circuit formation substrate using the same |
| 12/27/2012 | US20120328836 Method and Apparatus to Allow a Plurality of Stages to Operate in Close Proximity |
| 12/27/2012 | US20120328834 Microfabricated elastomeric valve and pump systems |
| 12/27/2012 | US20120328799 Positive photosensitive resin composition and method for forming patterns by using the same |
| 12/27/2012 | US20120327685 Light guide plate for backlight and manufacturing method therefor |
| 12/27/2012 | US20120327382 Projection objective for microlithography |
| 12/27/2012 | DE10319154B4 Maskenloses Lithographiesystem Maskless lithography system |
| 12/27/2012 | DE102011082481A1 Illumination system for micro-lithographic projection exposure apparatus, has several light deflection elements which generate two respective light spots whose intensity differs from each other by the polarization state of light spots |
| 12/27/2012 | DE102011077983A1 Verfahren zur Herstellung eines reflektiven optischen Elements für die EUV-Lithographie A process for producing a reflective optical element for EUV lithography |
| 12/27/2012 | DE10019282B4 Verfahren zur Erzeugung einer feinen Struktur in einem Halbleitersubstrat und Resistzusammensetzung hierfür A method for producing a fine structure in a semiconductor substrate and the resist composition of this |
| 12/26/2012 | EP2538276A1 Composition for formation of resist underlayer film containing silicon having nitrogen-containing ring |
| 12/26/2012 | EP2538275A1 Process for making lithographic printing plate |
| 12/26/2012 | EP2537665A1 Improvements for rapid prototyping apparatus and method |
| 12/26/2012 | EP2537304A1 Substrate support structure, clamp preparation unit, and lithography system |
| 12/26/2012 | EP2537069A1 Lithographic apparatus and device manufacturing method |
| 12/26/2012 | EP2537068A1 Antireflective compositions and methods of using same |
| 12/26/2012 | EP2537067A2 Method and device for active wedge error compensation between two objects that can be positioned substantially parallel to each other |
| 12/26/2012 | EP2536564A1 Method for printing product features on a substrate sheet |
| 12/26/2012 | CN202633364U Substrate imprint device of light emitting diode |
| 12/26/2012 | CN202631950U Multi-light-beam exposure system capable of being used for manufacturing photonic crystal mask layer |
| 12/26/2012 | CN202631949U Exposure frame capable of exposing two single panels simultaneously |
| 12/26/2012 | CN1808273B Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel |
| 12/26/2012 | CN1685492B Comprehensive integrated lithographic process control system based on product design and yield feedback system |
| 12/26/2012 | CN102844845A Method and system for cleaning electronic material |
| 12/26/2012 | CN102844715A Method for merging multiple geometrical pixel images and generating single modulator pixel image |
| 12/26/2012 | CN102844714A Lithographic apparatus and device manufacturing method |
| 12/26/2012 | CN102844713A Lithographic apparatus and device manufacturing method |
| 12/26/2012 | CN102844712A Addition copolymer, photosensitive resin composition, and color filter |
| 12/26/2012 | CN102844711A Solder resist composition and printed-circuit board |
| 12/26/2012 | CN102844710A Pattern forming method and resist composition |
| 12/26/2012 | CN102844709A Photosensitive resin composition, photoresist film using same, method for forming resist pattern, and method for manufacturing printed wiring board |
| 12/26/2012 | CN102844708A Negative photosensitive resin composition, and protective film and touch panel member using the same |
| 12/26/2012 | CN102844707A Compositions comprising base-reactive component and processes for photolithography |
| 12/26/2012 | CN102842656A High-power white-light LED fluorescent powder coating method |
| 12/26/2012 | CN102842655A Method for coating high-power white light light-emitting diode (LED) fluorescent powder |
| 12/26/2012 | CN102842485A Silicon wafer processing device and the processing method thereof |
| 12/26/2012 | CN102841515A Alignment method and apparatus based on multi-cycle marker |
| 12/26/2012 | CN102841514A Method for implementing exposure of high-step surface graph by wet developable filling material |
| 12/26/2012 | CN102841513A A lithographic apparatus, a projection system and a device manufacturing method |
| 12/26/2012 | CN102841512A Method of manufacturing semiconductor device |
| 12/26/2012 | CN102841511A Wavefront modification apparatus, lithographic apparatus and method |
| 12/26/2012 | CN102841510A System and method to ensure source and image stability |
| 12/26/2012 | CN102841509A Integration of lithography apparatus and mask optimization process with multiple patterning process |
| 12/26/2012 | CN102841508A Shunt type air bath duct |
| 12/26/2012 | CN102841507A Laser direct writing type nanometer periodic structure pattern manufacturing equipment |
| 12/26/2012 | CN102841506A Laser interferometer measuring system and measuring method |
| 12/26/2012 | CN102841505A Substrate-precise-positioning workpiece stage |
| 12/26/2012 | CN102841504A Positive photosensitive resin composition and method for forming patterns by using the same |
| 12/26/2012 | CN102841503A Photolithographic electronic silver paste composition for touch screen and preparation thereof |
| 12/26/2012 | CN102841502A Imaging liquid for thermosensitive CTP (cytidine triphosphate) plate |
| 12/26/2012 | CN102841443A Digital adjustable micromirror chip on basis of microfluidics and preparation method thereof |
| 12/26/2012 | CN102838578A Salt and coloring curing combination |
| 12/26/2012 | CN102838082A Method for preparing micro-nano structure on material surface based on laser interference photolithography |
| 12/26/2012 | CN102253597B Compression type gas pressure method-based nano-scale pressure printing device |